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Differential etching apparatus including chamber cleaning means or shield for preventing deposits
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CPC
Y10S156/916
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GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10
USPC classification
Y10S
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S156/00
Adhesive bonding and miscellaneous chemical manufacture
Current Industry
Y10S156/916
Differential etching apparatus including chamber cleaning means or shield for preventing deposits
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Patents Grants
last 30 patents
Information
Patent Grant
Deposit protection cover and plasma processing apparatus
Patent number
8,974,600
Issue date
Mar 10, 2015
Tokyo Electron Limited
Toshihiko Oyama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
8,960,124
Issue date
Feb 24, 2015
Mitsubishi Heavy Industries, Ltd.
Ryuichi Matsuda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Semiconductor manufacturing equipment and manufacturing method of t...
Patent number
8,801,895
Issue date
Aug 12, 2014
Spansion, LLC
Hirotaka Inomata
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus for an improved deposition shield in a plasma processing...
Patent number
8,117,986
Issue date
Feb 21, 2012
Tokyo Electron Limited
Hidehito Saigusa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method and apparatus for an improved upper electrode plate with dep...
Patent number
7,566,379
Issue date
Jul 28, 2009
Tokyo Electron Limited
Shinya Nishimoto
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of manufacturing displays and apparatus for manufacturing di...
Patent number
7,527,658
Issue date
May 5, 2009
Mitsubishi Denki Kabushiki Kaisha
Terushige Hino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Island projection-modified part, method for producing the same, and...
Patent number
7,338,699
Issue date
Mar 4, 2008
Tosoh Corporation
Koyata Takahashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reaction chamber liner consisting essentially of osmium
Patent number
7,293,526
Issue date
Nov 13, 2007
Micron Technology, Inc.
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnet assembly for plasma containment
Patent number
7,294,224
Issue date
Nov 13, 2007
Applied Materials, Inc.
Anthony Vesci
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Particulate reduction using temperature-controlled chamber shield
Patent number
7,182,816
Issue date
Feb 27, 2007
Tokyo Electron Limited
Mark Kleshock
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for an improved upper electrode plate with dep...
Patent number
7,147,749
Issue date
Dec 12, 2006
Tokyo Electron Limited
Shinya Nishimoto
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Double slit-valve doors for plasma processing
Patent number
7,147,719
Issue date
Dec 12, 2006
Applied Materials, Inc.
Michael D. Welch
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for an improved deposition shield in a plasma...
Patent number
7,137,353
Issue date
Nov 21, 2006
Tokyo Electron Limited
Hidehito Saigusa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reaction chamber liner comprising ruthenium
Patent number
7,131,391
Issue date
Nov 7, 2006
Micron Technology, Inc.
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods of etching silicon-oxide-containing compositions
Patent number
7,118,683
Issue date
Oct 10, 2006
Micron Technology, Inc.
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Clean gas injector system for reactor chamber
Patent number
7,055,212
Issue date
Jun 6, 2006
Texas Instruments Incorporated
Ignacio Blanco-Rivera
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Particle-removing method for a semiconductor device manufacturing a...
Patent number
7,045,465
Issue date
May 16, 2006
NEC Electronics Corporation
Natsuko Ito
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma treatment method and apparatus
Patent number
6,991,701
Issue date
Jan 31, 2006
Tokyo Electron Limited
Hiroto Takenaka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processor in plasma confinement region within a vacuum chamber
Patent number
6,984,288
Issue date
Jan 10, 2006
Lam Research Corporation
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods of etching silicon-oxide-containing materials
Patent number
6,953,531
Issue date
Oct 11, 2005
Micron Technology, Inc.
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber having components with textured surfaces and method of manu...
Patent number
6,933,025
Issue date
Aug 23, 2005
Applied Materials, Inc.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for performing self cleaning method of forming deep trenc...
Patent number
6,802,933
Issue date
Oct 12, 2004
Anisul Khan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber components having textured surfaces and method of manufacture
Patent number
6,777,045
Issue date
Aug 17, 2004
Applied Materials Inc.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Anti-binding deposition ring
Patent number
6,733,829
Issue date
May 11, 2004
LSI Logic Corporation
Dave Stacey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Double slit-valve doors for plasma processing
Patent number
6,647,918
Issue date
Nov 18, 2003
Applied Materials, Inc.
Michael D. Welch
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Container for treating with corrosive-gas and plasma and method for...
Patent number
6,645,585
Issue date
Nov 11, 2003
Kyocera Corporation
Shunichi Ozono
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low contamination high density plasma etch chambers and methods for...
Patent number
6,583,064
Issue date
Jun 24, 2003
Lam Research Corporation
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods of enhancing selectivity of etching silicon dioxide relativ...
Patent number
6,547,979
Issue date
Apr 15, 2003
Micron Technology, Inc.
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma treatment method and apparatus
Patent number
6,544,380
Issue date
Apr 8, 2003
Tokyo Electron Limited
Masayuki Tomoyasu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma treatment method and apparatus
Patent number
6,431,115
Issue date
Aug 13, 2002
Tokyo Electron Limited
Mitsuaki Komino
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20120125891
Publication date
May 24, 2012
Mitsubishi Heavy Industries, Ltd.
Ryuichi Matsuda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
DEPOSIT PROTECTION COVER AND PLASMA PROCESSING APPARATUS
Publication number
20110024040
Publication date
Feb 3, 2011
TOKYO ELECTRON LIMITED
Toshihiko Oyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR MANUFACTURING EQUIPMENT AND MANUFACTURING METHOD OF T...
Publication number
20080210170
Publication date
Sep 4, 2008
SPANSION LLC
Hirotaka Inomata
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF REFURBISHING A MAGNET ASSEMBLY FOR PLASMA PROCESS CHAMBER
Publication number
20080066785
Publication date
Mar 20, 2008
APPLIED MATERIALS, INC.
Anthony Vesci
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reaction chamber assemblies
Publication number
20070113975
Publication date
May 24, 2007
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for an improved upper electrode plate with dep...
Publication number
20070034337
Publication date
Feb 15, 2007
TOKYO ELECTRON LIMITED
Shinya Nishimoto
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method and apparatus for an improved deposition shield in a plasma...
Publication number
20070028839
Publication date
Feb 8, 2007
TOKYO ELECTRON LIMITED
Hidehito Saigusa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Particle-removing apparatus for a semiconductor device manufacturin...
Publication number
20060131272
Publication date
Jun 22, 2006
Natsuko Ito
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of manufacturing displays and apparatus for manufacturing di...
Publication number
20060014395
Publication date
Jan 19, 2006
Mitsubishi Denki Kabushiki Kaisha
Terushige Hino
G02 - OPTICS
Information
Patent Application
Magnet assembly for plasma containment
Publication number
20050115678
Publication date
Jun 2, 2005
Anthony Vesci
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods of enhancing selectivity of etching silicon dioxide relativ...
Publication number
20050101150
Publication date
May 12, 2005
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Particulate reduction using temperature-controlled chamber shield
Publication number
20050039679
Publication date
Feb 24, 2005
TOKYO ELECTRON LIMITED
Mark Kleshock
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Chamber having components with textured surfaces and method of manu...
Publication number
20040180158
Publication date
Sep 16, 2004
APPLIED MATERIALS, INC.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Clean gas injector system for reactor chamber
Publication number
20040127059
Publication date
Jul 1, 2004
Ignacio Blanco-Rivera
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Double slit-valve doors for plasma processing
Publication number
20040083978
Publication date
May 6, 2004
APPLIED MATERIALS, INC.
Michael D. Welch
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Island projection-modified part, method for producing the same, and...
Publication number
20040086689
Publication date
May 6, 2004
TOSOH CORPORATION
Koyata Takahashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method and apparatus for an improved deposition shield in a plasma...
Publication number
20040060657
Publication date
Apr 1, 2004
TOKYO ELECTRON LIMITED
Hidehito Saigusa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for an improved upper electrode plate with dep...
Publication number
20040060661
Publication date
Apr 1, 2004
TOKYO ELECTRON LIMITED
Shinya Nishimoto
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma treatment method and apparatus
Publication number
20040026372
Publication date
Feb 12, 2004
TOKYO ELECTRON LIMITED
Hiroto Takenaka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Anti-binding deposition ring
Publication number
20030177981
Publication date
Sep 25, 2003
Dave Stacey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Dual frequency plasma processor
Publication number
20030029567
Publication date
Feb 13, 2003
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods of etching silicon-oxide-containing compositions
Publication number
20030024896
Publication date
Feb 6, 2003
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Process chamber components having textured internal surfaces and me...
Publication number
20030026917
Publication date
Feb 6, 2003
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods of etching silicon-oxide-containing compositions
Publication number
20030019834
Publication date
Jan 30, 2003
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reaction chamber assemblies
Publication number
20030019842
Publication date
Jan 30, 2003
Max F. Hineman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Low contamination high density plasma etch chambers and methods for...
Publication number
20020102858
Publication date
Aug 1, 2002
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma treatment method and apparatus
Publication number
20020088547
Publication date
Jul 11, 2002
TOKYO ELECTRON LIMITED
Masayuki Tomoyasu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Particle-removing apparatus for a semiconductor device manufacturin...
Publication number
20020019141
Publication date
Feb 14, 2002
Natsuko Ito
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Container for treating with corrosive-gas and plasma and method for...
Publication number
20020009560
Publication date
Jan 24, 2002
KYOCERA CORPORATION
Shunichi Ozono
B32 - LAYERED PRODUCTS
Information
Patent Application
Self cleaning method of forming deep trenches in silicon substrates
Publication number
20010051439
Publication date
Dec 13, 2001
Applied Materials, Inc.
Anisul Khan
H01 - BASIC ELECTRIC ELEMENTS