Diffusion sources

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CPC
H01L21/2225

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/2225Diffusion sources

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,020,935
- Issue date Jun 25, 2024
- Mitsubishi Electric Corporation
- Koichi Nishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 11,302,527
- Issue date Apr 12, 2022
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusing agent composition and method of manufacturing semiconduct...
- Patent number 11,120,993
- Issue date Sep 14, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Keisuke Kubo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and apparatus for depositing a monolayer on a three dimensio...
- Patent number 11,031,247
- Issue date Jun 8, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Thomas R. Omstead
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 11,011,379
- Issue date May 18, 2021
- Lam Research Corporation
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having metallic source and drain regions
- Patent number 10,847,653
- Issue date Nov 24, 2020
- Intel Corporation
- Martin D. Giles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,784,105
- Issue date Sep 22, 2020
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inverted organic photosensitive devices
- Patent number 10,770,670
- Issue date Sep 8, 2020
- The Regents of the University of Michigan
- Stephen R. Forrest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 10,699,899
- Issue date Jun 30, 2020
- ASM International N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impurity adding apparatus, impurity adding method, and semiconducto...
- Patent number 10,658,183
- Issue date May 19, 2020
- Fuji Electric Co., Ltd.
- Kenichi Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 10,559,468
- Issue date Feb 11, 2020
- Lam Research Corporation
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diffusing agent composition and method of manufacturing semiconduct...
- Patent number 10,541,138
- Issue date Jan 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yu Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Purification method for purifying liquid, purification method for p...
- Patent number 10,525,418
- Issue date Jan 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,510,530
- Issue date Dec 17, 2019
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity diffusion agent composition and method for manufacturing s...
- Patent number 10,504,732
- Issue date Dec 10, 2019
- TOKYO OHKA KOGYO CO, LTD.
- Yoshihiro Sawada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor device and semiconductor device manufacturing method
- Patent number 10,490,646
- Issue date Nov 26, 2019
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Paste composition
- Patent number 10,446,291
- Issue date Oct 15, 2019
- Toyo Aluminium Kabushiki Kaisha
- Marwin Dhamrin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping of a substrate via a dopant containing polymer film
- Patent number 10,340,144
- Issue date Jul 2, 2019
- Rohm and Haas Electronic Materials LLC
- Rachel A. Segalman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
P-type diffusion layer forming composition
- Patent number 10,312,402
- Issue date Jun 4, 2019
- Hitachi Chemical Company, Ltd.
- Youichi Machii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity diffusion agent composition and method for manufacturing s...
- Patent number 10,242,875
- Issue date Mar 26, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Integrated circuit fabrication with boron etch-stop layer
- Patent number 10,224,418
- Issue date Mar 5, 2019
- GLOBALFOUNDRIES Inc.
- Chengwen Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a fin at a side of a semiconductor body
- Patent number 10,205,019
- Issue date Feb 12, 2019
- Infineon Technologies Austria AG
- Andreas Meiser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,147,600
- Issue date Dec 4, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping media for the local doping of silicon wafers
- Patent number 10,134,942
- Issue date Nov 20, 2018
- Merck Patent GmbH
- Ingo Koehler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 10,056,249
- Issue date Aug 21, 2018
- ASM International N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 10,043,718
- Issue date Aug 7, 2018
- United Microelectronics Corp.
- Kuan-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 9,997,357
- Issue date Jun 12, 2018
- Lam Research Corporation
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of doping substrate
- Patent number 9,972,492
- Issue date May 15, 2018
- Electronics and Telecommunications Research Institute
- Moon Youn Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-step epitaxial growth S/D regions for NMOS FinFET
- Patent number 9,966,433
- Issue date May 8, 2018
- GLOBALFOUNDRIES Inc.
- Zhiqing Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High concentration doping in silicon
- Patent number 9,947,821
- Issue date Apr 17, 2018
- Newsouth Innovations Pty Limited
- Brett Jason Hallam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PRODUCING P-TYPE NITRIDE SEMICONDUCTOR
- Publication number 20240379362
- Publication date Nov 14, 2024
- Sumitomo Electric Industries, Ltd.
- Kei FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N-DIPOLE MATERIAL FOR STACKED TRANSISTORS
- Publication number 20240249943
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ming LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230387218
- Publication date Nov 30, 2023
- Mitsubishi Electric Corporation
- Taiki HOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFAC...
- Publication number 20230011185
- Publication date Jan 12, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Keisuke KUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220310396
- Publication date Sep 29, 2022
- Mitsubishi Electric Corporation
- Koichi NISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200388487
- Publication date Dec 10, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20200373162
- Publication date Nov 26, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Keisuke KUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200185218
- Publication date Jun 11, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED DISCRETE NANOSCALE DOPING OF SEMICONDUCTORS, METHODS OF M...
- Publication number 20200020538
- Publication date Jan 16, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Yuanyi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20190385850
- Publication date Dec 19, 2019
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20190172708
- Publication date Jun 6, 2019
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20190103266
- Publication date Apr 4, 2019
- ASM INTERNATIONAL N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20180269061
- Publication date Sep 20, 2018
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PASTE COMPOSITION
- Publication number 20180218801
- Publication date Aug 2, 2018
- TOYO ALUMINIUM KABUSHIKI KAISHA
- Marwan Dhamrin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20180211834
- Publication date Jul 26, 2018
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DEPOSITING A MONOLAYER ON A THREE DIMENSIO...
- Publication number 20180182627
- Publication date Jun 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Thomas R. Omstead
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING S...
- Publication number 20180182624
- Publication date Jun 28, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro SAWADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
INTEGRATED CIRCUIT FABRICATION WITH BORON ETCH-STOP LAYER
- Publication number 20180061969
- Publication date Mar 1, 2018
- GLOBALFOUNDRIES INC.
- Chengwen Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sol-gel-based printable doping media which inhibit parasitic diffus...
- Publication number 20180062022
- Publication date Mar 1, 2018
- Merck Patent GmbH
- Oliver DOLL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for the production of solar cells using printable doping me...
- Publication number 20180053873
- Publication date Feb 22, 2018
- Merck Patent GmbH
- Oliver DOLL
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTIPLE-STEP EPITAXIAL GROWTH S/D REGIONS FOR NMOS FINFET
- Publication number 20180040696
- Publication date Feb 8, 2018
- GLOBALFOUNDRIES INC.
- Zhiqing LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING SEMICONDUCTORS
- Publication number 20170372903
- Publication date Dec 28, 2017
- Merck Patent GmbH
- Oliver DOLL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT FABRICATION WITH BORON ETCH-STOP LAYER
- Publication number 20170338329
- Publication date Nov 23, 2017
- GLOBALFOUNDRIES INC.
- Chengwen Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20170338111
- Publication date Nov 23, 2017
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ENHANCED LIFETIME AND PERFORMANCE OF ION S...
- Publication number 20170330756
- Publication date Nov 16, 2017
- Entegris, Inc.
- Robert Kaim
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
Method of Manufacturing a Semiconductor Device Having a Trench at L...
- Publication number 20170148887
- Publication date May 25, 2017
- Infineon Technologies Austria AG
- Anton Mauder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20170140918
- Publication date May 18, 2017
- ASM INTERNATIONAL N.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND RELATED MANUFACTURING METHOD
- Publication number 20170092498
- Publication date Mar 30, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Yong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20160379826
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Diffusion sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Methods for forming doped silicon oxide thin films

Diffusing agent composition and method of manufacturing semiconduct...

Method and apparatus for depositing a monolayer on a three dimensio...

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Semiconductor device having metallic source and drain regions

Methods for forming doped silicon oxide thin films

Inverted organic photosensitive devices

Atomic layer deposition of antimony oxide films

Impurity adding apparatus, impurity adding method, and semiconducto...

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Diffusing agent composition and method of manufacturing semiconduct...

Purification method for purifying liquid, purification method for p...

Methods for forming doped silicon oxide thin films

Impurity diffusion agent composition and method for manufacturing s...

Semiconductor device and semiconductor device manufacturing method

Paste composition

Doping of a substrate via a dopant containing polymer film

P-type diffusion layer forming composition

Impurity diffusion agent composition and method for manufacturing s...

Integrated circuit fabrication with boron etch-stop layer

Semiconductor device having a fin at a side of a semiconductor body

Methods for forming doped silicon oxide thin films

Doping media for the local doping of silicon wafers

Atomic layer deposition of antimony oxide films

Method of fabricating semiconductor device

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Method of doping substrate

Multiple-step epitaxial growth S/D regions for NMOS FinFET

High concentration doping in silicon

Patents Applicationslast 30 patents

METHOD OF PRODUCING P-TYPE NITRIDE SEMICONDUCTOR

N-DIPOLE MATERIAL FOR STACKED TRANSISTORS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFAC...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCT...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

PATTERNED DISCRETE NANOSCALE DOPING OF SEMICONDUCTORS, METHODS OF M...

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

PASTE COMPOSITION

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD AND APPARATUS FOR DEPOSITING A MONOLAYER ON A THREE DIMENSIO...

IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING S...

INTEGRATED CIRCUIT FABRICATION WITH BORON ETCH-STOP LAYER

Sol-gel-based printable doping media which inhibit parasitic diffus...

Process for the production of solar cells using printable doping me...

MULTIPLE-STEP EPITAXIAL GROWTH S/D REGIONS FOR NMOS FINFET

METHOD FOR DOPING SEMICONDUCTORS

INTEGRATED CIRCUIT FABRICATION WITH BORON ETCH-STOP LAYER

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD AND APPARATUS FOR ENHANCED LIFETIME AND PERFORMANCE OF ION S...

Method of Manufacturing a Semiconductor Device Having a Trench at L...

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

SEMICONDUCTOR DEVICE AND RELATED MANUFACTURING METHOD

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...