Donor-acceptor complex photoconductor

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CPC
Y10S430/10

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/10Donor-acceptor complex photoconductor

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and photoresist compositions
- Patent number 9,983,477
- Issue date May 29, 2018
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,798,235
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,703,196
- Issue date Jul 11, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 9,650,451
- Issue date May 16, 2017
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,465,292
- Issue date Oct 11, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,316,912
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aromatic diamines containing three ether-linked-benzonitrile moieti...
- Patent number 9,139,696
- Issue date Sep 22, 2015
- The United States of America, as represented by the Secretary of the Air Force
- Loon-Seng Tan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 9,115,074
- Issue date Aug 25, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,034,558
- Issue date May 19, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 9,023,576
- Issue date May 5, 2015
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Film, method for manufacturing the film and masking method using th...
- Patent number 9,017,920
- Issue date Apr 28, 2015
- Shenzhen Futaihong Precision Industry Co., Ltd.
- Quan Zhou
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming resist underlayer film for EUV lithography
- Patent number 9,005,873
- Issue date Apr 14, 2015
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,622
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Aqueous base-developable negative-tone films based on functionalize...
- Patent number 8,986,923
- Issue date Mar 24, 2015
- Promerus, LLC
- Brian Knapp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,968,458
- Issue date Mar 3, 2015
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polyimides
- Patent number 8,932,801
- Issue date Jan 13, 2015
- Eternal Chemical Co., Ltd.
- Meng-Yen Chou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive composition, planographic printing plate precursor,...
- Patent number 8,927,195
- Issue date Jan 6, 2015
- FUJIFILM Corporation
- Yoshinori Taguchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,911,928
- Issue date Dec 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-type photosensitive resin composition, pattern forming met...
- Patent number 8,871,422
- Issue date Oct 28, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Tomonori Minegishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive modified polyimide resin composition and use thereof
- Patent number 8,859,170
- Issue date Oct 14, 2014
- PI R&D Co., Ltd
- Toshiyuki Goshima
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photoresist materials and photolithography processes
- Patent number 8,848,163
- Issue date Sep 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,846,292
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20170255098
- Publication date Sep 7, 2017
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140363773
- Publication date Dec 11, 2014
- JSR Corporation
- Atsushi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive Resin Composition for Color Filter and Color Filter...
- Publication number 20140183425
- Publication date Jul 3, 2014
- CHEIL INDUSTRIES INC.
- Kyung-Hee HYUNG
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...
- Publication number 20140171584
- Publication date Jun 19, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR,...
- Publication number 20140134540
- Publication date May 15, 2014
- FUJIFILM CORPORATION
- Yoshinori TAGUCHI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20140114080
- Publication date Apr 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20140099791
- Publication date Apr 10, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZE...
- Publication number 20140038112
- Publication date Feb 6, 2014
- PROMERUS, LLC
- Brian Knapp
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20130177850
- Publication date Jul 11, 2013
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive Photosensitive Resin Composition, and Display Device and O...
- Publication number 20130171564
- Publication date Jul 4, 2013
- CHEIL INDUSTRIES INC.
- Eun-Kyung YOON
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...
- Publication number 20130160939
- Publication date Jun 27, 2013
- FIH (HONG KONG) LIMITED
- QUAN ZHOU
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130115556
- Publication date May 9, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20130115557
- Publication date May 9, 2013
- FUJIFILM Corporation
- Shuhei Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS
- Publication number 20130029269
- Publication date Jan 31, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20130004740
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION
- Publication number 20130004896
- Publication date Jan 3, 2013
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120308928
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...
- Publication number 20120301826
- Publication date Nov 29, 2012
- Chan Hyo Park
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE
- Publication number 20120264057
- Publication date Oct 18, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMALLY IMAGEABLE DIELECTRIC LAYERS, THERMAL TRANSFER DONORS AND...
- Publication number 20120251802
- Publication date Oct 4, 2012
- E.I. du Pont de Nemours and Company
- Gerald Donald Andrews
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120231393
- Publication date Sep 13, 2012
- FUJIFILM CORPORATION
- Kana FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20120225383
- Publication date Sep 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20120226070
- Publication date Sep 6, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219898
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219906
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Donor-acceptor complex photoconductor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generators and lithographic resists comprising the same

Polymers and photoresist compositions

Radiation-sensitive composition

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Fluorine-containing compounds and their polymers useful for anti-re...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Sulfonium salt-containing polymer, resist composition, patterning p...

Aromatic diamines containing three ether-linked-benzonitrile moieti...

Fluorinated monomer, polymer, resist composition, and patterning pr...

Positive photosensitive composition and method of forming pattern u...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Resist composition and method of forming resist pattern

Positive resist composition for immersion exposure and pattern-form...

Film, method for manufacturing the film and masking method using th...

Composition for forming resist underlayer film for EUV lithography

Pattern forming method, chemical amplification resist composition a...

Pattern forming method, chemical amplification resist composition a...

Aqueous base-developable negative-tone films based on functionalize...

Positive resist composition and method of forming resist pattern

Composition for resist underlayer film and process for producing same

Photosensitive polyimides

Photosensitive composition, planographic printing plate precursor,...

Resist composition and method for producing resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Negative-type photosensitive resin composition, pattern forming met...

Photosensitive modified polyimide resin composition and use thereof

Photoresist materials and photolithography processes

Radiation-sensitive composition

Patents Applicationslast 30 patents

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

PATTERN-FORMING METHOD

Photoacid Generators And Lithographic Resists Comprising The Same

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

Photosensitive Resin Composition for Color Filter and Color Filter...

Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...

PHOTOSENSITIVE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR,...

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZE...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

Positive Photosensitive Resin Composition, and Display Device and O...

FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...

PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE

THERMALLY IMAGEABLE DIELECTRIC LAYERS, THERMAL TRANSFER DONORS AND...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN