Einzel lenses

Industry

CPC
H01J2237/1207

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1207Einzel lenses

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field curvature correction for multi-beam inspection systems
- Patent number 11,302,511
- Issue date Apr 12, 2022
- KLA Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Spectrometry method and spectrometer device
- Patent number 10,453,668
- Issue date Oct 22, 2019
- The Regents of the University of California
- Robert Continetti
- G01 - MEASURING TESTING
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,799,492
- Issue date Oct 24, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,437,397
- Issue date Sep 6, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam lens and exposure apparatus using the same
- Patent number 8,901,511
- Issue date Dec 2, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter provided with beam deflector and asymmetrical einzel...
- Patent number 8,405,052
- Issue date Mar 26, 2013
- Nissin Ion Equipment Co., Ltd.
- Dan Nicolaescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter for cold field emission electron beam apparatus
- Patent number 7,919,749
- Issue date Apr 5, 2011
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Fang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated sub-nanometer-scale electron beam systems
- Patent number 7,279,686
- Issue date Oct 9, 2007
- Biomed Solutions, LLC
- Conrad W. Schneiker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical unit
- Patent number 6,051,838
- Issue date Apr 18, 2000
- ACT Advanced Circuit Testing Gesellschaft fur Testsystementwicklung
- Jurgen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accelerator-decelerator electrostatic lens for variably focusing an...
- Patent number 5,780,863
- Issue date Jul 14, 1998
- Eaton Corporation
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detection of surface contaminations on silicon wafers
- Patent number 5,689,112
- Issue date Nov 18, 1997
- Harald A. Enge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing an electrostatic lens
- Patent number 5,535,508
- Issue date Jul 16, 1996
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic lens and method for producing the same
- Patent number 5,444,256
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam lithography
- Patent number 4,985,634
- Issue date Jan 15, 1991
- Oesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrica...
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
All electrostatic electron optical sub-system for variable electron...
- Patent number 4,683,366
- Issue date Jul 28, 1987
- Control Data Corporation
- Kenneth J. Harte
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT SYSTEM, METHOD OF ASSESSING
- Publication number 20240079205
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MICROSCOPE
- Publication number 20240006146
- Publication date Jan 4, 2024
- National University of Singapore
- Jeroen Anton VAN KAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386801
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD AND IMAGE
- Publication number 20230304949
- Publication date Sep 28, 2023
- ASML NETHERLANDS B.V.
- Roy Ramon VEENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Field Curvature Correction for Multi-Beam Inspection Systems
- Publication number 20170229279
- Publication date Aug 10, 2017
- KLA-Tencor Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Textured Silicon Liners In Substrate Processing Systems
- Publication number 20150001391
- Publication date Jan 1, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140197325
- Publication date Jul 17, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140166894
- Publication date Jun 19, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140151570
- Publication date Jun 5, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140151571
- Publication date Jun 5, 2014
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC LENS UNIT
- Publication number 20140077096
- Publication date Mar 20, 2014
- Takashi Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER PROVIDED WITH BEAM DEFLECTOR AND ASYMMETRICAL EINZEL...
- Publication number 20110220808
- Publication date Sep 15, 2011
- NISSIN ION EQUIPMENT CO., LTD.
- Dan NICOLAESCU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED PARTICLE BEAM GENERATOR
- Publication number 20100187433
- Publication date Jul 29, 2010
- NFAB LIMITED
- Derek Anthony Eastham
- B82 - NANO-TECHNOLOGY
Information Patent Application
ENERGY FILTER FOR COLD FIELD EMISSION ELECTRON BEAM APPARATUS
- Publication number 20090101819
- Publication date Apr 23, 2009
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- FANG ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated sub-nanometer-scale electron beam systems
- Publication number 20050092929
- Publication date May 5, 2005
- Conrad W. Schneiker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Einzel lenses

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum chamber arrangement for charged particle beam generator

Vacuum chamber arrangement for charged particle beam generator

Aberration correction in charged particle system

Field curvature correction for multi-beam inspection systems

Vacuum chamber arrangement for charged particle beam generator

Vacuum chamber arrangement for charged particle beam generator

Spectrometry method and spectrometer device

Textured silicon liners in substrate processing systems

Textured silicon liners in substrate processing systems

Charged particle beam lens and exposure apparatus using the same

Ion implanter provided with beam deflector and asymmetrical einzel...

Energy filter for cold field emission electron beam apparatus

Integrated sub-nanometer-scale electron beam systems

Optical unit

Accelerator-decelerator electrostatic lens for variably focusing an...

Apparatus for detection of surface contaminations on silicon wafers

Method for producing an electrostatic lens

Electrostatic lens and method for producing the same

Ion beam lithography

All electrostatic electron optical sub-system for variable electron...

Patents Applicationslast 30 patents

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

ASSESSMENT SYSTEM, METHOD OF ASSESSING

ION MICROSCOPE

PLASMA PROCESSING APPARATUS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD AND IMAGE

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

Field Curvature Correction for Multi-Beam Inspection Systems

Textured Silicon Liners In Substrate Processing Systems

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

ELECTROSTATIC LENS UNIT

ION IMPLANTER PROVIDED WITH BEAM DEFLECTOR AND ASYMMETRICAL EINZEL...

IMPROVED PARTICLE BEAM GENERATOR

ENERGY FILTER FOR COLD FIELD EMISSION ELECTRON BEAM APPARATUS

Integrated sub-nanometer-scale electron beam systems