Electric or electronic means

Industry

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H01J2237/2485

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2485Electric or electronic means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 12,131,882
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Shuntaro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of controlling the same, and...
- Patent number 12,001,194
- Issue date Jun 4, 2024
- Semes Co., Ltd.
- Seung Yeon Kim
- G05 - CONTROLLING REGULATING
Information Patent Grant
Charged particle beam device and power supply device
- Patent number 11,810,752
- Issue date Nov 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of generating a waveform
- Patent number 11,658,007
- Issue date May 23, 2023
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,658,011
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage resistive output stage circuit
- Patent number 11,631,573
- Issue date Apr 18, 2023
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of generating a waveform
- Patent number 11,387,076
- Issue date Jul 12, 2022
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 11,049,702
- Issue date Jun 29, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 10,910,203
- Issue date Feb 2, 2021
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage resistive output stage circuit
- Patent number 10,847,346
- Issue date Nov 24, 2020
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Arbitrary waveform generation using digital pulses
- Patent number 10,777,388
- Issue date Sep 15, 2020
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 10,679,831
- Issue date Jun 9, 2020
- KOKUSIA ELECTRIC CORPORATION
- Tsuyoshi Takeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,600,619
- Issue date Mar 24, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of arc detection using dynamic threshold
- Patent number 10,515,780
- Issue date Dec 24, 2019
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage resistive output stage circuit
- Patent number 10,483,089
- Issue date Nov 19, 2019
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
High voltage resistive output stage circuit
- Patent number 10,460,911
- Issue date Oct 29, 2019
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage resistive output stage circuit
- Patent number 10,460,910
- Issue date Oct 29, 2019
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron probe microanalyzer and storage medium
- Patent number 10,410,825
- Issue date Sep 10, 2019
- Shimadzu Corporation
- Hiroshi Sakamae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition tool for combinatorial thin film material libraries
- Patent number 10,363,537
- Issue date Jul 30, 2019
- Universiteit Gent
- Christophe Detavernier
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Scanning microscope with controlled variable measurement parameters
- Patent number 10,338,367
- Issue date Jul 2, 2019
- Hitachi, Ltd.
- Ryoko Araki
- G02 - OPTICS
Information Patent Grant
Safety dose interlock for charged particle beams
- Patent number 10,300,304
- Issue date May 28, 2019
- Pyramid Technical Consultants Inc.
- William P. Nett
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Arbitarary waveform generation using nanosecond pulses
- Patent number 10,304,661
- Issue date May 28, 2019
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of measuring patterns and methods of manufacturing semicond...
- Patent number 10,254,236
- Issue date Apr 9, 2019
- Samsung Electronics Co., Ltd.
- Sung-Bo Shim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection device
- Patent number 10,157,722
- Issue date Dec 18, 2018
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 9,953,800
- Issue date Apr 24, 2018
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 9,812,305
- Issue date Nov 7, 2017
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam drawing apparatus and charged particle beam d...
- Patent number 9,812,284
- Issue date Nov 7, 2017
- NuFlare Technology, Inc.
- Hideki Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation device and power supply arrangement
- Patent number 9,455,122
- Issue date Sep 27, 2016
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography methods including time division multiplex...
- Patent number 9,378,926
- Issue date Jun 28, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Zhang Kuo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Magnetron Sputtering
- Publication number 20240404806
- Publication date Dec 5, 2024
- Melec GmbH
- Günter Mark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING AN ELECTRON BEAM SYSTEM
- Publication number 20240379326
- Publication date Nov 14, 2024
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Measuring Method and Plasma Processing Apparatus
- Publication number 20240290589
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsutoshi Ashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER ADJUSTMENT METHOD OF UPPER ELECTRODE POWER SUPPLY AND SEMICON...
- Publication number 20240194441
- Publication date Jun 13, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jing WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method of Generating a Waveform
- Publication number 20240055227
- Publication date Feb 15, 2024
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Gun, Electron Beam Applicator, and Method for Controlling...
- Publication number 20230131413
- Publication date Apr 27, 2023
- PHOTO ELECTRON SOUL INC.
- Atsushi KOIZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method of Generating a Waveform
- Publication number 20220399188
- Publication date Dec 15, 2022
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20220230840
- Publication date Jul 21, 2022
- Hitachi High-Tech Corporation
- Shuntaro ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220130642
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND POWER SUPPLY DEVICE
- Publication number 20220068595
- Publication date Mar 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Dual Reverse Pulse Sputtering System
- Publication number 20210287888
- Publication date Sep 16, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RATE ENHANCED PULSED DC SPUTTERING SYSTEM
- Publication number 20210111010
- Publication date Apr 15, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT
- Publication number 20210066042
- Publication date Mar 4, 2021
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Apparatus and Method of Generating a Waveform
- Publication number 20210027990
- Publication date Jan 28, 2021
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITARARY WAVEFORM GENERATION USING NANOSECOND PULSES
- Publication number 20200168436
- Publication date May 28, 2020
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200161092
- Publication date May 21, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT
- Publication number 20200043702
- Publication date Feb 6, 2020
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT
- Publication number 20190157044
- Publication date May 23, 2019
- Timothy M. Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ARBITARARY WAVEFORM GENERATION USING NANOSECOND PULSES
- Publication number 20190131110
- Publication date May 2, 2019
- Eagle Harbor Technologies, Inc.
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT
- Publication number 20190080884
- Publication date Mar 14, 2019
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON PROBE MICROANALYZER AND STORAGE MEDIUM
- Publication number 20190006146
- Publication date Jan 3, 2019
- Shimadzu Corporation
- Hiroshi SAKAMAE
- G01 - MEASURING TESTING
Information Patent Application
Safety Dose Interlock for Charged Particle Beams
- Publication number 20180289984
- Publication date Oct 11, 2018
- Pyramid Technical Consultants Inc.
- William P. Nett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT
- Publication number 20180286636
- Publication date Oct 4, 2018
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20180182601
- Publication date Jun 28, 2018
- Hitachi Kokusai Electric Inc.
- Tsuyoshi Takeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rate Enhanced Pulsed DC Sputtering System
- Publication number 20180130648
- Publication date May 10, 2018
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RATE ENHANCED PULSED DC SPUTTERING SYSTEM
- Publication number 20180108520
- Publication date Apr 19, 2018
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF MEASURING PATTERNS AND METHODS OF MANUFACTURING SEMICOND...
- Publication number 20180088060
- Publication date Mar 29, 2018
- SUNG-BO SHIM
- G01 - MEASURING TESTING
Information Patent Application
TRIPLE MODE ELECTROSTATIC COLLIMATOR
- Publication number 20160379799
- Publication date Dec 29, 2016
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20160343535
- Publication date Nov 24, 2016
- NuFlare Technology, Inc.
- Hideki MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rate Enhanced Pulsed DC Sputtering System
- Publication number 20160314946
- Publication date Oct 27, 2016
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Electric or electronic means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam device

Dual reverse pulse sputtering system

Substrate processing apparatus, method of controlling the same, and...

Charged particle beam device and power supply device

Apparatus and method of generating a waveform

Plasma processing apparatus

High voltage resistive output stage circuit

Apparatus and method of generating a waveform

Rate enhanced pulsed DC sputtering system

Rate enhanced pulsed DC sputtering system

High voltage resistive output stage circuit

Arbitrary waveform generation using digital pulses

Substrate processing apparatus, method of manufacturing semiconduct...

Plasma processing apparatus

System and method of arc detection using dynamic threshold

High voltage resistive output stage circuit

High voltage resistive output stage circuit

High voltage resistive output stage circuit

Electron probe microanalyzer and storage medium

Deposition tool for combinatorial thin film material libraries

Scanning microscope with controlled variable measurement parameters

Safety dose interlock for charged particle beams

Arbitarary waveform generation using nanosecond pulses

Methods of measuring patterns and methods of manufacturing semicond...

Inspection device

Multi-charged particle beam writing apparatus and multi-charged par...

Rate enhanced pulsed DC sputtering system

Charged particle beam drawing apparatus and charged particle beam d...

Modulation device and power supply arrangement

Electron beam lithography methods including time division multiplex...

Patents Applicationslast 30 patents

Method for Magnetron Sputtering

METHOD FOR OPERATING AN ELECTRON BEAM SYSTEM

Plasma Measuring Method and Plasma Processing Apparatus

POWER ADJUSTMENT METHOD OF UPPER ELECTRODE POWER SUPPLY AND SEMICON...

Apparatus and Method of Generating a Waveform

Electron Gun, Electron Beam Applicator, and Method for Controlling...

Apparatus and Method of Generating a Waveform

Charged Particle Beam Device

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

CHARGED PARTICLE BEAM DEVICE AND POWER SUPPLY DEVICE

Dual Reverse Pulse Sputtering System

RATE ENHANCED PULSED DC SPUTTERING SYSTEM

HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT

Apparatus and Method of Generating a Waveform

ARBITARARY WAVEFORM GENERATION USING NANOSECOND PULSES

PLASMA PROCESSING APPARATUS

HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT

HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT

ARBITARARY WAVEFORM GENERATION USING NANOSECOND PULSES

HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT

ELECTRON PROBE MICROANALYZER AND STORAGE MEDIUM

Safety Dose Interlock for Charged Particle Beams

HIGH VOLTAGE RESISTIVE OUTPUT STAGE CIRCUIT

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

Rate Enhanced Pulsed DC Sputtering System

RATE ENHANCED PULSED DC SPUTTERING SYSTEM

METHODS OF MEASURING PATTERNS AND METHODS OF MANUFACTURING SEMICOND...

TRIPLE MODE ELECTROSTATIC COLLIMATOR

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

Rate Enhanced Pulsed DC Sputtering System