Electrolithographic processes

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CPC
H01L21/0277

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0277Electrolithographic processes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for reducing charging of semiconductor wafers
- Patent number 12,165,867
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing amide solvent
- Patent number 11,798,810
- Issue date Oct 24, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing charging of semiconductor wafers
- Patent number 11,769,662
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, patterning method, and method for manufacturing semicondu...
- Patent number 11,762,285
- Issue date Sep 19, 2023
- Kioxia Corporation
- Anupam Mitra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Field effect transistor and semiconductor device
- Patent number 11,749,622
- Issue date Sep 5, 2023
- SUMITOMO DEVICE INNOVATIONS, INC.
- Chihoko Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, template manufacturing method, and semiconductor device m...
- Patent number 11,669,011
- Issue date Jun 6, 2023
- Kioxia Corporation
- Jun Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition comprising carbonyl-cont...
- Patent number 11,592,747
- Issue date Feb 28, 2023
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a pattern and methods of fabricating a semicondu...
- Patent number 11,333,979
- Issue date May 17, 2022
- Samsung Electronics Co., Ltd.
- Byounghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeamlet charged particle device and method
- Patent number 11,309,163
- Issue date Apr 19, 2022
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film, resist underlayer f...
- Patent number 11,169,441
- Issue date Nov 9, 2021
- NISSAN CHEMICAL CORPORATION
- Daigo Saito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and system for fabricating unique chips using a charged part...
- Patent number 11,137,689
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus Van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Field effect transistor and semiconductor device
- Patent number 11,081,452
- Issue date Aug 3, 2021
- Sumitomo Electric Device Innovations, Inc.
- Chihoko Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Curing photo resist for improving etching selectivity
- Patent number 11,018,021
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Kuo Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mask simulation model for OPC and mask making
- Patent number 10,962,875
- Issue date Mar 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Arrays of high-aspect-ratio germanium nanostructures with nanoscale...
- Patent number 10,930,490
- Issue date Feb 23, 2021
- Wisconsin Alumni Research Foundation
- Max G. Lagally
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Self-aligned gallium nitride FinFET and method of fabricating the same
- Patent number 10,868,162
- Issue date Dec 15, 2020
- HRL Laboratories, LLC
- Joel C. Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of pattern data preparation and method of forming pattern in...
- Patent number 10,861,673
- Issue date Dec 8, 2020
- United Microelectronics Corp.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,811,225
- Issue date Oct 20, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-pass patterning using nonreflecting radiation lithography on...
- Patent number 10,678,137
- Issue date Jun 9, 2020
- Intel Corporation
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical sensors based on plasmon resonance in graphene
- Patent number 10,613,027
- Issue date Apr 7, 2020
- International Business Machines Corporation
- Phaedon Avouris
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring proximity effect on high density magnetic tunn...
- Patent number 10,607,902
- Issue date Mar 31, 2020
- Spin Memory, Inc.
- Thomas D. Boone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical sensors based on plasmon resonance in graphene
- Patent number 10,564,097
- Issue date Feb 18, 2020
- International Business Machines Corporation
- Phaedon Avouris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography patterning with a gas phase resist
- Patent number 10,514,610
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of mask simulation model for OPC and mask making
- Patent number 10,495,967
- Issue date Dec 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam irradiation apparatus and electron beam dynamic focus...
- Patent number 10,451,976
- Issue date Oct 22, 2019
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240105451
- Publication date Mar 28, 2024
- JSR Corporation
- Eiji YONEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20240006183
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS
- Publication number 20230386820
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Lin CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS
- Publication number 20220301849
- Publication date Sep 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Lin CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FABRICATING UNIQUE CHIPS USING A CHARGED PART...
- Publication number 20220026815
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEMPLATE, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20210294208
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Anupam MITRA
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...
- Publication number 20210294209
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Jun WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonlinear Scattering Lithography
- Publication number 20210240083
- Publication date Aug 5, 2021
- Vathys, Inc.
- Tapabrata GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRAYS OF HIGH-ASPECT-RATIO GERMANIUM NANOSTRUCTURES WITH NANOSCALE...
- Publication number 20210202240
- Publication date Jul 1, 2021
- Wisconsin Alumni Research Foundation
- Max G. Lagally
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTIBEAMLET CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20210142976
- Publication date May 13, 2021
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A PATTERN AND METHODS OF FABRICATING A SEMICONDU...
- Publication number 20210026245
- Publication date Jan 28, 2021
- Samsung Electronics Co., Ltd.
- Byounghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY-BASED PATTERN OPTIMIZATION
- Publication number 20200379344
- Publication date Dec 3, 2020
- Synopsys, Inc.
- Thomas CECIL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...
- Publication number 20200142310
- Publication date May 7, 2020
- NISSAN CHEMICAL CORPORATION
- Daigo SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Mask Simulation Model for OPC and Mask Making
- Publication number 20200103747
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsu-Ting Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERN DATA PREPARATION AND METHOD OF FORMING PATTERN IN...
- Publication number 20200083020
- Publication date Mar 12, 2020
- UNITED MICROELECTRONICS CORP.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20200027699
- Publication date Jan 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20190354018
- Publication date Nov 21, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Curing Photo Resist for Improving Etching Selectivity
- Publication number 20190333777
- Publication date Oct 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Kuo Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20190214227
- Publication date Jul 11, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING PROXIMITY EFFECT ON HIGH DENSITY MAGNETIC TUNN...
- Publication number 20190206749
- Publication date Jul 4, 2019
- Spin Memory, Inc.
- Thomas D. Boone
- G11 - INFORMATION STORAGE
Information Patent Application
EBEAM UNIVERSAL CUTTER
- Publication number 20190155160
- Publication date May 23, 2019
- Intel Corporation
- Yan A. BORODOVSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Mask Simulation Model for OPC and Mask Making
- Publication number 20190094680
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Patterning with a Gas Phase Resist
- Publication number 20180314167
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shu-Hao Chang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM DYNAMIC FOCUS...
- Publication number 20180284620
- Publication date Oct 4, 2018
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...
- Publication number 20170338105
- Publication date Nov 23, 2017
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20170269481
- Publication date Sep 21, 2017
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Patterning with a Gas Phase Resist
- Publication number 20170256418
- Publication date Sep 7, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- SHU-HAO CHANG
- H01 - BASIC ELECTRIC ELEMENTS

Electrolithographic processes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for reducing charging of semiconductor wafers

Multi-charged particle beam writing apparatus, and multi-charged pa...

Resist underlayer film-forming composition containing amide solvent

Method for reducing charging of semiconductor wafers

Template, patterning method, and method for manufacturing semicondu...

Field effect transistor and semiconductor device

Template, template manufacturing method, and semiconductor device m...

Resist underlayer film-forming composition comprising carbonyl-cont...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Methods of forming a pattern and methods of fabricating a semicondu...

Multibeamlet charged particle device and method

Composition for forming resist underlayer film, resist underlayer f...

Method and system for fabricating unique chips using a charged part...

Field effect transistor and semiconductor device

Curing photo resist for improving etching selectivity

Method of mask simulation model for OPC and mask making

Arrays of high-aspect-ratio germanium nanostructures with nanoscale...

Self-aligned gallium nitride FinFET and method of fabricating the same

Method of pattern data preparation and method of forming pattern in...

Method of fabricating an integrated circuit with a pattern density-...

Cross scan proximity correction with ebeam universal cutter

Multi-pass patterning using nonreflecting radiation lithography on...

Chemical sensors based on plasmon resonance in graphene

Method for measuring proximity effect on high density magnetic tunn...

Ebeam universal cutter

Chemical sensors based on plasmon resonance in graphene

Lithography patterning with a gas phase resist

Method of mask simulation model for OPC and mask making

Electron beam irradiation apparatus and electron beam dynamic focus...

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS

METHOD AND SYSTEM FOR FABRICATING UNIQUE CHIPS USING A CHARGED PART...

TEMPLATE, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDU...

TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...

Nonlinear Scattering Lithography

ARRAYS OF HIGH-ASPECT-RATIO GERMANIUM NANOSTRUCTURES WITH NANOSCALE...

MULTIBEAMLET CHARGED PARTICLE DEVICE AND METHOD

METHODS OF FORMING A PATTERN AND METHODS OF FABRICATING A SEMICONDU...

LITHOGRAPHY-BASED PATTERN OPTIMIZATION

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

Method of Mask Simulation Model for OPC and Mask Making

METHOD OF PATTERN DATA PREPARATION AND METHOD OF FORMING PATTERN IN...

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

Curing Photo Resist for Improving Etching Selectivity

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

METHOD FOR MEASURING PROXIMITY EFFECT ON HIGH DENSITY MAGNETIC TUNN...

EBEAM UNIVERSAL CUTTER

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

Method of Mask Simulation Model for OPC and Mask Making

Lithography Patterning with a Gas Phase Resist

ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM DYNAMIC FOCUS...

Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

Lithography Patterning with a Gas Phase Resist