Electromagnetic lenses

Industry

CPC
H01J37/141

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/141Electromagnetic lenses

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and axis adjustment method thereof
- Patent number 12,027,342
- Issue date Jul 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for adjusting beam condition of charged par...
- Patent number 11,948,772
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,658
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens system for fast scanning large FOV
- Patent number 11,837,431
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,823,861
- Issue date Nov 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multistage-connected multipole, multistage multipole unit, and char...
- Patent number 11,769,650
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideto Dohi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multipole unit and charged particle beam device
- Patent number 11,769,649
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Masanori Mita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and axis adjustment method thereof
- Patent number 11,764,028
- Issue date Sep 19, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of cooling objective lens of a charged-particle...
- Patent number 11,764,027
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,640,897
- Issue date May 2, 2023
- Hitachi High-Technologies Corporation
- Ryo Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method of charged parti...
- Patent number 11,640,894
- Issue date May 2, 2023
- Jeol Ltd.
- Toshikatsu Kaneyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic immersion electron gun
- Patent number 11,636,996
- Issue date Apr 25, 2023
- KLA Corporation
- Nikolai N. Chubun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical system and multi-beam image acquiring apparatus
- Patent number 11,621,144
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- John Hartley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,605,523
- Issue date Mar 14, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,574,793
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for adjusting beam condition of charged par...
- Patent number 11,569,060
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current source apparatus and method
- Patent number 11,562,884
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 11,527,379
- Issue date Dec 13, 2022
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam column for three-dimensional printing device, three-d...
- Patent number 11,458,561
- Issue date Oct 4, 2022
- Advantest Corporation
- Shinichi Hamaguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,430,630
- Issue date Aug 30, 2022
- Hitachi High-Technologies Corporation
- Ryo Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,398,368
- Issue date Jul 26, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ angle measurement using channeling
- Patent number 11,387,073
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS
- Publication number 20250046563
- Publication date Feb 6, 2025
- Axcelis Technologies, Inc.
- Wilhelm Peter Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC VECTOR POTENTIAL-BASED LENS
- Publication number 20240429016
- Publication date Dec 26, 2024
- OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION
- Makoto Tokoro SCHREIBER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20240373591
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Daesung Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM
- Publication number 20240371597
- Publication date Nov 7, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR DEMAGNETIZING MAGNETIC...
- Publication number 20240274395
- Publication date Aug 15, 2024
- Hitachi High-Tech Corporatiom
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242933
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242919
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240234081
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL SYSTEM AND CHARGED PARTICLE APPARATUS
- Publication number 20240212969
- Publication date Jun 27, 2024
- Nikon Corporation
- Takakuni GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS FOR A CHARGED PARTICLE BEAM APPARATUS, CHARGED PARTICLE BEAM A...
- Publication number 20240212968
- Publication date Jun 27, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SENSORS INCLUDING WIDE BANDGAP MATERIALS
- Publication number 20240194442
- Publication date Jun 13, 2024
- FEI Company
- Branislav Straka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240145208
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV
- Publication number 20240145209
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240136147
- Publication date Apr 25, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF POWER CONSUMPTION FOR A CHARGED PARTICLE SYSTEM
- Publication number 20240120171
- Publication date Apr 11, 2024
- FEI Company
- Casper Smit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE MICROSCOPE HAVING VACUUM IN SPECIMEN CHAMBER
- Publication number 20240112878
- Publication date Apr 4, 2024
- FEI Company
- Pleun Dona
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Thermal Control Device
- Publication number 20240021403
- Publication date Jan 18, 2024
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIATURE ELECTRON OPTICAL COLUMN WITH A LARGE FIELD OF VIEW
- Publication number 20240014000
- Publication date Jan 11, 2024
- Alan D. Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR AND ELECTRON MICROSCOPE
- Publication number 20240006148
- Publication date Jan 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Hirokazu TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Shunting Device
- Publication number 20230360878
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC LENS AND ELECTRON SOURCE MECHANISM
- Publication number 20230335368
- Publication date Oct 19, 2023
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIATURE HYBRID ELECTRON BEAM COLUMN
- Publication number 20230326704
- Publication date Oct 12, 2023
- KLA Corporation
- Lawrence Muray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compact 2D Scanner Magnet with Double-Helix Coils
- Publication number 20230238206
- Publication date Jul 27, 2023
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...
- Publication number 20230230796
- Publication date Jul 20, 2023
- HITACHI HIGH-TECH CORPORATION
- Tomohito NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...
- Publication number 20230178333
- Publication date Jun 8, 2023
- CARL ZEISS MICROSCOPY GMBH
- Bruno Linn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR ADJUSTING BEAM CONDITION OF CHARGED PAR...
- Publication number 20230170180
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Xuedong LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...
- Publication number 20230113759
- Publication date Apr 13, 2023
- Hitachi High-Tech Corporation
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...
- Publication number 20230102715
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM INSPECTION APPARATUS, MULTIPOLE ARRAY CONTROL M...
- Publication number 20230091222
- Publication date Mar 23, 2023
- NuFlare Technology, Inc.
- Yuichi MAEKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, AND MULTI-ELECTRON...
- Publication number 20230077403
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS

Electromagnetic lenses

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Automated ion-beam alignment for dual-beam instrument

Multi-source charged particle illumination apparatus

Multi-charged particle beam writing apparatus, and multi-charged pa...

Charged particle beam device and axis adjustment method thereof

Methods and apparatuses for adjusting beam condition of charged par...

Scanning electron microscope device and electron beam inspection ap...

Scanning electron microscope device and electron beam inspection ap...

Objective lens system for fast scanning large FOV

Charged particle beam device

Multistage-connected multipole, multistage multipole unit, and char...

Multipole unit and charged particle beam device

Charged particle beam device and axis adjustment method thereof

Systems and methods of cooling objective lens of a charged-particle...

Charged particle beam device

Charged particle beam apparatus and control method of charged parti...

Magnetic immersion electron gun

Electron optical system and multi-beam image acquiring apparatus

Charged particle beam lithography system

Aberration corrector and multiple electron beam irradiation apparatus

Aberration corrector and multiple electron beam irradiation apparatus

Methods and apparatuses for adjusting beam condition of charged par...

Current source apparatus and method

Multi-charged particle beam writing apparatus, and multi-charged pa...

Objective lens arrangement usable in particle-optical systems

Multi-charged particle beam writing apparatus, and multi-charged pa...

Electron beam column for three-dimensional printing device, three-d...

Charged particle beam apparatus

Apparatus of plural charged-particle beams

In situ angle measurement using channeling

Patents Applicationslast 30 patents

MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS

MAGNETIC VECTOR POTENTIAL-BASED LENS

TRANSMISSION ELECTRON MICROSCOPE

MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR DEMAGNETIZING MAGNETIC...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE OPTICAL SYSTEM AND CHARGED PARTICLE APPARATUS

LENS FOR A CHARGED PARTICLE BEAM APPARATUS, CHARGED PARTICLE BEAM A...

CHARGED PARTICLE SENSORS INCLUDING WIDE BANDGAP MATERIALS

CHARGED PARTICLE APPARATUS AND METHOD

OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV

CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD

REDUCTION OF POWER CONSUMPTION FOR A CHARGED PARTICLE SYSTEM

CHARGED PARTICLE MICROSCOPE HAVING VACUUM IN SPECIMEN CHAMBER

Adjustable Permanent Magnetic Lens Having Thermal Control Device

MINIATURE ELECTRON OPTICAL COLUMN WITH A LARGE FIELD OF VIEW

ABERRATION CORRECTOR AND ELECTRON MICROSCOPE

Adjustable Permanent Magnetic Lens Having Shunting Device

ELECTROMAGNETIC LENS AND ELECTRON SOURCE MECHANISM

MINIATURE HYBRID ELECTRON BEAM COLUMN

Compact 2D Scanner Magnet with Double-Helix Coils

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...

ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...

METHODS AND APPARATUSES FOR ADJUSTING BEAM CONDITION OF CHARGED PAR...

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...

MULTI-ELECTRON BEAM INSPECTION APPARATUS, MULTIPOLE ARRAY CONTROL M...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, AND MULTI-ELECTRON...