Electron-beam or ion-beam tubes for localised treatment of objects

Industry

CPC
H01J37/30

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam bending snout for mobile electron accelerators
- Patent number 12,172,367
- Issue date Dec 24, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam delayering system and method, topographically enhanced del...
- Patent number 12,165,840
- Issue date Dec 10, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for electron beam focusing in electron beam add...
- Patent number 12,148,592
- Issue date Nov 19, 2024
- General Electric Company
- John Scott Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 12,119,232
- Issue date Oct 15, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Systems and methods for pre-aligning samples for more efficient pro...
- Patent number 12,106,931
- Issue date Oct 1, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 12,094,685
- Issue date Sep 17, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 12,068,130
- Issue date Aug 20, 2024
- NexGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Perimeter trench formation and delineation etch delayering
- Patent number 12,040,196
- Issue date Jul 16, 2024
- FEI Company
- James Clarke
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPAR...
- Publication number 20250037960
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM
- Publication number 20250014859
- Publication date Jan 9, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Ayana MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTER
- Publication number 20250014860
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi MATSUSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Sample Milling System and Apparatus and Method for Image Generation
- Publication number 20250006458
- Publication date Jan 2, 2025
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
- Publication number 20240420919
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Aaron P. WEBB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404785
- Publication date Dec 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...
- Publication number 20240404786
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Ivo IHRKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES
- Publication number 20240387142
- Publication date Nov 21, 2024
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20240385526
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FASTENER FOR SECURING FACEPLATE TO ION SOURCE
- Publication number 20240379319
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- John Alexander Walder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...
- Publication number 20240363304
- Publication date Oct 31, 2024
- FEI Company
- Jaroslav Velcovský
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS
- Publication number 20240339289
- Publication date Oct 10, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adar Sonn-Segev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...
- Publication number 20240331969
- Publication date Oct 3, 2024
- FEI Company
- Chad Rue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICOND...
- Publication number 20240319591
- Publication date Sep 26, 2024
- International Business Machines Corporation
- Steven Holmes
- H01 - BASIC ELECTRIC ELEMENTS

Electron-beam or ion-beam tubes for localised treatment of objects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charge carrier generation source

Method and apparatus for anisotropic pattern etching and treatment

Charged particle beam writing apparatus, charged particle beam writ...

Method for reducing line-end space in integrated circuit patterning

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Systems and methods for optimizing full horizontal scanned beam dis...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Semiconductor manufacturing apparatus, semiconductor device and man...

Beam bending snout for mobile electron accelerators

Method for producing lamella, analysis system and method for analyz...

System and methods for automated processing of multiple samples in...

Ion beam delayering system and method, topographically enhanced del...

Automated ion-beam alignment for dual-beam instrument

Systems and methods for electron beam focusing in electron beam add...

Devices and methods for examining and/or processing an element for...

Particle beam system and the use thereof for flexibly setting the c...

Etching isolation features and dense features within a substrate

Ion beam processing apparatus, electrode assembly, and method of cl...

Systems and methods for pre-aligning samples for more efficient pro...

Modulation of rolling k vectors of angled gratings

Scanned angled etching apparatus and techniques providing separate...

Liner, reaction chamber and semiconductor processing equipment

Ion implanter and ion implantation method

Plasma processing apparatus and system

Multi-charged particle beam writing apparatus, and multi-charged pa...

Atomic layer etch and ion beam etch patterning

Method and device for spatial charged particle bunching

Method for operating a multiple particle beam system while altering...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Perimeter trench formation and delineation etch delayering

Patents Applicationslast 30 patents

BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPAR...

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM

ION IMPLANTATION METHOD AND ION IMPLANTER

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

Sample Milling System and Apparatus and Method for Image Generation

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

SEMICONDUCTOR PROCESSING APPARATUS

ION IMPLANTER AND ION IMPLANTATION METHOD

METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...

COMPENSATION RASTER SCANNING

INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES

Method for Reducing Line-End Space in Integrated Circuit Patterning

FASTENER FOR SECURING FACEPLATE TO ION SOURCE

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...

FOCUSED ION BEAM DEVICE

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...

Actively Cooled Gas Line For Ion Source

GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICOND...