Electron-beam or ion-beam tubes for localised treatment of objects

Industry

CPC
H01J37/30

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for detecting discharge site
- Patent number 12,288,669
- Issue date Apr 29, 2025
- NuFlare Technology, Inc.
- Toru Ariizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,278,131
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Naoki Sugawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,278,087
- Issue date Apr 15, 2025
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
3D metrology from 3D datacube created from stack of registered imag...
- Patent number 12,272,518
- Issue date Apr 8, 2025
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample milling apparatus and method of adjustment therefor
- Patent number 12,266,502
- Issue date Apr 1, 2025
- Jeol Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial guided cross-sectioning and lamella preparation with tomog...
- Patent number 12,255,044
- Issue date Mar 18, 2025
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Microscopy feedback for improved milling accuracy
- Patent number 12,249,482
- Issue date Mar 11, 2025
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 12,249,483
- Issue date Mar 11, 2025
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlled ion implantation
- Patent number 12,247,283
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-breakdown ion source discharge apparatus
- Patent number 12,243,713
- Issue date Mar 4, 2025
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broad ion beam (BIB) systems for more efficient processing of multi...
- Patent number 12,228,484
- Issue date Feb 18, 2025
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,224,155
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam bending snout for mobile electron accelerators
- Patent number 12,172,367
- Issue date Dec 24, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
- Publication number 20250140512
- Publication date May 1, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Huaidong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20250140517
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION NEUTRALIZATION MODULE
- Publication number 20250140509
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Dongwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140513
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Satoshi TOMIMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140518
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Toshiyuki NAGAMINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
- Publication number 20250140520
- Publication date May 1, 2025
- Axcelis Technologies, Inc.
- Michael Cristoforo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...
- Publication number 20250140523
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGE...
- Publication number 20250140519
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Michihiko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20250118529
- Publication date Apr 10, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION
- Publication number 20250112026
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System
- Publication number 20250109481
- Publication date Apr 3, 2025
- JEOL Ltd.
- Noriaki Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BEAM ANGLE ROTATION AND SAMPLE ROTATION
- Publication number 20250104963
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Thomas Korb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...
- Publication number 20250104964
- Publication date Mar 27, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...
- Publication number 20250095952
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Ori Noked
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...
- Publication number 20250095957
- Publication date Mar 20, 2025
- SHINE Technologies, LLC
- Ross Radel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYERING APPARATUS AND METHODS
- Publication number 20250095959
- Publication date Mar 20, 2025
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087454
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20250087452
- Publication date Mar 13, 2025
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSCALE FAILURE ANALYSIS METHOD
- Publication number 20250087453
- Publication date Mar 13, 2025
- Shanghai Huali Microeloctronics Corporation
- Yunong Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087455
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...
- Publication number 20250083381
- Publication date Mar 13, 2025
- FERMI RESEARCH ALLIANCE, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...
- Publication number 20250079120
- Publication date Mar 6, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRIT...
- Publication number 20250079119
- Publication date Mar 6, 2025
- NuFlare Technology, Inc.
- Shinji SAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM INSPECTION AND REPAIR WITH INCREASED SECONDARY ELECTRON YIELD
- Publication number 20250069956
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Brett Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS

Electron-beam or ion-beam tubes for localised treatment of objects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for detecting discharge site

Closed loop faraday correction of a horizontal beam current profile...

Stage and plasma processing apparatus

Systems and methods for performing sample lift-out for highly react...

Apparatus and method for forming a three-dimensional article

3D metrology from 3D datacube created from stack of registered imag...

Sample milling apparatus and method of adjustment therefor

Plasma treatment apparatus, lower electrode assembly and forming me...

Fiducial guided cross-sectioning and lamella preparation with tomog...

Microscopy feedback for improved milling accuracy

Charged particle beam writing method and charged particle beam writ...

Method and apparatus for controlled ion implantation

Method and system for determining a charged particle beam exposure...

Anti-breakdown ion source discharge apparatus

Broad ion beam (BIB) systems for more efficient processing of multi...

Ion milling device

Effective temperature calculation method for multi-charged particle...

Ion milling device

Ion beam source, substrate process apparatus including the same, an...

Localized stress modulation by implant to back of wafer

Charge carrier generation source

Method and apparatus for anisotropic pattern etching and treatment

Charged particle beam writing apparatus, charged particle beam writ...

Method for reducing line-end space in integrated circuit patterning

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Systems and methods for optimizing full horizontal scanned beam dis...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Semiconductor manufacturing apparatus, semiconductor device and man...

Beam bending snout for mobile electron accelerators

Method for producing lamella, analysis system and method for analyz...

Patents Applicationslast 30 patents

ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

ION NEUTRALIZATION MODULE

CHARGED PARTICLE BEAM DEVICE

MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE

APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGE...

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION

Focused Ion Beam System

BEAM ANGLE ROTATION AND SAMPLE ROTATION

METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...

CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...

ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

DELAYERING APPARATUS AND METHODS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

NANOSCALE FAILURE ANALYSIS METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...

MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...

METHOD FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRIT...

ION BEAM INSPECTION AND REPAIR WITH INCREASED SECONDARY ELECTRON YIELD

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...