Electron beam

Industry

CPC
Y10S430/143

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/143Electron beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Dual exposure patterning of a photomask to print a contact, a via o...
- Patent number 9,927,698
- Issue date Mar 27, 2018
- GLOBALFOUNDRIES Inc.
- Jed H. Rankin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,625,809
- Issue date Apr 18, 2017
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,465,297
- Issue date Oct 11, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fracturing and forming a pattern using shaped beam charg...
- Patent number 9,448,473
- Issue date Sep 20, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,372,391
- Issue date Jun 21, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam data storage system and method for high volume manufa...
- Patent number 9,336,986
- Issue date May 10, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,312,101
- Issue date Apr 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pre-patterned hard mask for ultrafast lithographic imaging
- Patent number 9,285,682
- Issue date Mar 15, 2016
- Intel Corporation
- Robert L. Bristol
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for design of a reticle to be manufactured using...
- Patent number 9,274,412
- Issue date Mar 1, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming circular patterns on a surface
- Patent number 9,268,214
- Issue date Feb 23, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Large-mesh cell-projection electron-beam lithography method
- Patent number 9,235,132
- Issue date Jan 12, 2016
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Serdar Manakli
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,076,564
- Issue date Jul 7, 2015
- Nuflare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus for forming a reticle
- Patent number 9,058,956
- Issue date Jun 16, 2015
- Samsung Electronics Co., Ltd.
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,040,212
- Issue date May 26, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition and pattern forming method using the same
- Patent number 9,034,560
- Issue date May 19, 2015
- FUJIFILM Corporation
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,034,542
- Issue date May 19, 2015
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,017,924
- Issue date Apr 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pre-patterned hard mask for ultrafast lithographic imaging
- Patent number 9,005,875
- Issue date Apr 14, 2015
- Intel Corporation
- Robert L. Bristol
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Matched multiple charged particle beam systems for lithographic pat...
- Patent number 8,999,627
- Issue date Apr 7, 2015
- Multibeam Corporation
- David K. Lam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automatic optimization of etch process for accelerated yield ramp w...
- Patent number 8,999,628
- Issue date Apr 7, 2015
- Multibeam Corporation
- David K. Lam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography mask repairing process
- Patent number 8,999,610
- Issue date Apr 7, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsing Lu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist protective film-forming composition and patterning process
- Patent number 8,951,712
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Smart subfield method for E-beam lithography
- Patent number 8,945,803
- Issue date Feb 3, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning transmission electron microscopy for imaging extended areas
- Patent number 8,927,932
- Issue date Jan 6, 2015
- Mochii, Inc.
- Christopher Su-Yan Own
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Method for fracturing and forming a pattern using shaped beam charg...
- Patent number 8,916,315
- Issue date Dec 23, 2014
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Developer and patterning process
- Patent number 8,911,929
- Issue date Dec 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming circular patterns on a surface
- Patent number 8,900,778
- Issue date Dec 2, 2014
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern using charged particle beam...
- Patent number 8,895,212
- Issue date Nov 25, 2014
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist pattern forming method, resist pattern, crosslinkable negati...
- Patent number 8,889,339
- Issue date Nov 18, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and system for forming a pattern using charged particle beam...
- Patent number 8,883,375
- Issue date Nov 11, 2014
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...
- Publication number 20140272675
- Publication date Sep 18, 2014
- D2S, INC.
- Etienne Jacques
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PRE-PATTERNED HARD MASK FOR ULTRAFAST LITHOGRAPHIC IMAGING
- Publication number 20140272711
- Publication date Sep 18, 2014
- ROBERT L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20140255853
- Publication date Sep 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint Detection for Photolithography Mask Repair
- Publication number 20140255826
- Publication date Sep 11, 2014
- Chien-Lin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20140227642
- Publication date Aug 14, 2014
- FUJIFILM CORPORATION
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20140229904
- Publication date Aug 14, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20140225008
- Publication date Aug 14, 2014
- NuFlare Technology, Inc.
- Ryoichi YOSHIKAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS FOR FORMING A RETICLE
- Publication number 20140218710
- Publication date Aug 7, 2014
- Samsung Electronics Co., Ltd.
- Jin CHOI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography Mask Repairing Process
- Publication number 20140186750
- Publication date Jul 3, 2014
- Chien-Hsing Lu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20140175302
- Publication date Jun 26, 2014
- NuFlare Technology, Inc.
- Takanao TOUYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...
- Publication number 20140146298
- Publication date May 29, 2014
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEVELOPER AND PATTERNING PROCESS
- Publication number 20140141377
- Publication date May 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for Forming Circular Patterns on a Surface
- Publication number 20140134523
- Publication date May 15, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Smart Subfield Method For E-Beam Lithographny
- Publication number 20140099582
- Publication date Apr 10, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
- Publication number 20140080064
- Publication date Mar 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Scanning Transmission Electron Microscopy for Imaging Extended Areas
- Publication number 20140054458
- Publication date Feb 27, 2014
- MOCHII, INC. (D/B/A VOXA)
- Christopher Su-Yan Own
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...
- Publication number 20140030640
- Publication date Jan 30, 2014
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
MANUFACTURING METHOD OF PHOTOMASK, METHOD FOR OPTICAL PROXIMITY COR...
- Publication number 20140030657
- Publication date Jan 30, 2014
- RENESAS ELECTRONICS CORPORATION
- Ayumi MINAMIDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Data Process for E-Beam Lithography
- Publication number 20140023972
- Publication date Jan 23, 2014
- Cheng-Hung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE-GRID EXPOSURE METHOD
- Publication number 20140004468
- Publication date Jan 2, 2014
- Wen-Chuan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and System for Design of a Reticle to be Manufactured Using...
- Publication number 20130337372
- Publication date Dec 19, 2013
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Lithography System and Method for Improving Throughput
- Publication number 20130330670
- Publication date Dec 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jaw-Jung Shin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Lithography System and Method For Improving Throughput
- Publication number 20130327962
- Publication date Dec 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jaw-Jung Shin
- B82 - NANO-TECHNOLOGY
Information Patent Application
SMART SUBFIELD METHOD FOR E-BEAM LITHOGRAPHY
- Publication number 20130323648
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICES AND METHODS FOR IMPROVED REFLECTIVE ELECTRON BEAM LITHOGRAPHY
- Publication number 20130320225
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hua Yu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Data Storage System and Method for High Volume Manufa...
- Publication number 20130316289
- Publication date Nov 28, 2013
- Taiwan Seminconductor Manufacturing Company, Ltd.
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method For Fracturing And Forming A Pattern Using Shaped Beam Charg...
- Publication number 20130316273
- Publication date Nov 28, 2013
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309608
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309610
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY

Electron beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dual exposure patterning of a photomask to print a contact, a via o...

Method and system for forming patterns using charged particle beam...

Method and system for forming patterns with charged particle beam l...

Method for fracturing and forming a pattern using shaped beam charg...

Method and system for forming patterns using charged particle beam...

Electron beam data storage system and method for high volume manufa...

Endpoint detection for photolithography mask repair

Pre-patterned hard mask for ultrafast lithographic imaging

Method and system for design of a reticle to be manufactured using...

Method for forming circular patterns on a surface

Large-mesh cell-projection electron-beam lithography method

Multi charged particle beam writing apparatus and multi charged par...

Exposure apparatus for forming a reticle

Endpoint detection for photolithography mask repair

Negative resist composition and pattern forming method using the same

Method and system for forming patterns with charged particle beam l...

Resist composition, method of forming resist pattern, polymeric com...

Pre-patterned hard mask for ultrafast lithographic imaging

Matched multiple charged particle beam systems for lithographic pat...

Automatic optimization of etch process for accelerated yield ramp w...

Lithography mask repairing process

Resist protective film-forming composition and patterning process

Smart subfield method for E-beam lithography

Scanning transmission electron microscopy for imaging extended areas

Method for fracturing and forming a pattern using shaped beam charg...

Developer and patterning process

Method for forming circular patterns on a surface

Method and system for forming a pattern using charged particle beam...

Resist pattern forming method, resist pattern, crosslinkable negati...

Method and system for forming a pattern using charged particle beam...

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...

PRE-PATTERNED HARD MASK FOR ULTRAFAST LITHOGRAPHIC IMAGING

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

Endpoint Detection for Photolithography Mask Repair

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

EXPOSURE APPARATUS FOR FORMING A RETICLE

Lithography Mask Repairing Process

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...

DEVELOPER AND PATTERNING PROCESS

Method for Forming Circular Patterns on a Surface

Smart Subfield Method For E-Beam Lithographny

RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS

Scanning Transmission Electron Microscopy for Imaging Extended Areas

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...

MANUFACTURING METHOD OF PHOTOMASK, METHOD FOR OPTICAL PROXIMITY COR...

Data Process for E-Beam Lithography

MULTIPLE-GRID EXPOSURE METHOD

Method and System for Design of a Reticle to be Manufactured Using...

Electron Beam Lithography System and Method for Improving Throughput

Electron Beam Lithography System and Method For Improving Throughput

SMART SUBFIELD METHOD FOR E-BEAM LITHOGRAPHY

DEVICES AND METHODS FOR IMPROVED REFLECTIVE ELECTRON BEAM LITHOGRAPHY

Electron Beam Data Storage System and Method for High Volume Manufa...

Method For Fracturing And Forming A Pattern Using Shaped Beam Charg...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...