Electron cyclotron resonance

Industry

CPC
H01J37/32678

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32678Electron cyclotron resonance

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,014,903
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Tetsuo Kawanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,002,655
- Issue date Jun 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple frequency electron cyclotron resonance thruster
- Patent number 11,699,575
- Issue date Jul 11, 2023
- The Regents of the University of Michigan
- Benjamin Alexander Jorns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...
- Patent number 11,640,900
- Issue date May 2, 2023
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,398,371
- Issue date Jul 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ECR ion source and method for operating an ECR ion source
- Patent number 11,094,510
- Issue date Aug 17, 2021
- Dreebit GmbH
- Alexandra Philipp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and ECR heig...
- Patent number 11,081,320
- Issue date Aug 3, 2021
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for producing an amorphous carbon layer by electron cyclotro...
- Patent number 11,075,061
- Issue date Jul 27, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Marc Delaunay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,062,884
- Issue date Jul 13, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshiyuki Hironaka
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Resonant structure for electron cyclotron resonant (ECR) plasma ion...
- Patent number 11,037,765
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Barton Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with local Lorentz force
- Patent number 11,037,764
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charge neutralizer and plasma generator
- Patent number 10,984,989
- Issue date Apr 20, 2021
- KASUGA DENKI, INC.
- Nobuo Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 10,658,188
- Issue date May 19, 2020
- ABLIC INC.
- Akihiro Kikuchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for implanting single or multiply charged ions into a surfac...
- Patent number 10,648,068
- Issue date May 12, 2020
- The Swatch Group Research and Development Ltd.
- Pierry Vuille
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclotronic plasma actuator with arc-magnet for active flow control
- Patent number 10,446,373
- Issue date Oct 15, 2019
- CU Aerospace, LLC
- Joseph W. Zimmerman
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
RF current drive for plasma electric generation system
- Patent number 10,395,778
- Issue date Aug 27, 2019
- The Regents of the University of California
- Norman Rostoker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Systems and methods for tailoring ion energy distribution function...
- Patent number 10,340,122
- Issue date Jul 2, 2019
- Lam Research Corporation
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclotronic plasma actuator with arc-magnet for active flow control
- Patent number 10,332,724
- Issue date Jun 25, 2019
- CU Aerospace, LLC
- Joseph W. Zimmerman
- B64 - AIRCRAFT AVIATION COSMONAUTICS
Information Patent Grant
Method and device for generating a plasma excited by a microwave en...
- Patent number 10,283,322
- Issue date May 7, 2019
- H.E.F.
- Patrick Choquet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation for ion implanter
- Patent number 10,163,609
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with gas feed and evacuation conduit
- Patent number 10,103,007
- Issue date Oct 16, 2018
- Hitachi High-Technologies Corporation
- Takumi Tandou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facility for microwave treatment of a load
- Patent number 9,860,941
- Issue date Jan 2, 2018
- SAIREM SOCIETE POUR L'APPLICATION
- Adrien Grandemenge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,659,754
- Issue date May 23, 2017
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for mass analyzed ion beam
- Patent number 9,536,712
- Issue date Jan 3, 2017
- Varian Semiconductor Equipment Associates, Inc.
- W. Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density microwave plasma generation apparatus, and magnetron s...
- Patent number 9,506,142
- Issue date Nov 29, 2016
- Sumitomo Riko Company Limited
- Kensuke Sasai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for generating plasma having a high range along an axis by e...
- Patent number 9,490,102
- Issue date Nov 8, 2016
- H.E.F.
- Beat Schmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid plasma source
- Patent number 9,215,789
- Issue date Dec 15, 2015
- King Abdulaziz City for Science and Technology
- Ahmed M. Hala
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF current drive for plasma electric generation system
- Patent number 9,123,512
- Issue date Sep 1, 2015
- The Regents of the Unviersity of California
- Norman Rostoker
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methods and apparatus for controlling photoresist line width roughness
- Patent number 9,039,910
- Issue date May 26, 2015
- Applied Materials, Inc.
- Banqiu Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW PRESSURE PLASMA ETCH PROCESS FOR PREFERENTIAL GENERATION OF OXI...
- Publication number 20240355629
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Tzu-Ging Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230282491
- Publication date Sep 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20230053083
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230033655
- Publication date Feb 2, 2023
- Hitachi High-Tech Corporation
- Shoji Akashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220415618
- Publication date Dec 29, 2022
- Hitachi High-Tech Corporation
- Tetsuo Kawanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359162
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220344132
- Publication date Oct 27, 2022
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) APPARATUS
- Publication number 20210348274
- Publication date Nov 11, 2021
- Evatec AG
- Jörg PATSCHEIDER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE
- Publication number 20210287882
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electron Cyclotron Rotation (ECR)-Enhanced Hollow Cathode Plasma So...
- Publication number 20210249234
- Publication date Aug 12, 2021
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE FREQUENCY ELECTRON CYCLOTRON RESONANCE THRUSTER
- Publication number 20210082670
- Publication date Mar 18, 2021
- The Regents of the University of Michigan
- Benjamin Alexander Jorns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ECR ION SOURCE AND METHOD FOR OPERATING AN ECR ION SOURCE
- Publication number 20200357614
- Publication date Nov 12, 2020
- Dreebit GmbH
- ALEXANDRA PHILIPP
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...
- Publication number 20200286715
- Publication date Sep 10, 2020
- Hitachi High-Technologies Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE NEUTRALIZER AND PLASMA GENERATOR
- Publication number 20200279722
- Publication date Sep 3, 2020
- KASUGA DENKI, INC.
- Nobuo NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONANT STRUCTURE FOR ELECTRON CYCLOTRON RESONANT (ECR) PLASMA ION...
- Publication number 20200013594
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190393021
- Publication date Dec 26, 2019
- Hitachi High-Technologies Corporation
- Yoshiyuki HIRONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPLANTING SINGLE OR MULTIPLY CHARGED IONS INTO A SURFAC...
- Publication number 20190352763
- Publication date Nov 21, 2019
- THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD
- Pierry VUILLE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190295823
- Publication date Sep 26, 2019
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPLANTING IONS ON A SURFACE OF AN OBJECT TO BE TREATED...
- Publication number 20190189394
- Publication date Jun 20, 2019
- THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD
- Csilla Miko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190088453
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Yasushi SONODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE
- Publication number 20180323043
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR PRODUCING AN AMORPHOUS CARBON LAYER BY ELECTRON CYCLOTRO...
- Publication number 20180315584
- Publication date Nov 1, 2018
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Marc DELAUNAY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...
- Publication number 20180301320
- Publication date Oct 18, 2018
- LAM RESEARCH CORPORATION
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLOTRONIC PLASMA ACTUATOR WITH ARC-MAGNET FOR ACTIVE FLOW CONTROL
- Publication number 20180286635
- Publication date Oct 4, 2018
- CU AEROSPACE, LLC
- Joseph W. Zimmerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION FOR ION IMPLANTER
- Publication number 20180174807
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING UNIT AND PLASMA PROCESSING APPARATUS
- Publication number 20180144945
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Tomoyuki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
- Publication number 20180047595
- Publication date Feb 15, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR GENERATING A PLASMA EXCITED BY A MICROWAVE EN...
- Publication number 20170032939
- Publication date Feb 2, 2017
- H.E.F.
- Patrick CHOQUET
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR MASS ANALYZED ION BEAM
- Publication number 20150357167
- Publication date Dec 10, 2015
- Varian Semiconductor Equipment Associates, Inc.
- W. Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID PLASMA SOURCE
- Publication number 20150342020
- Publication date Nov 26, 2015
- KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- Ahmed M. HALA
- H01 - BASIC ELECTRIC ELEMENTS

Electron cyclotron resonance

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Modular microwave source with local lorentz force

Multiple frequency electron cyclotron resonance thruster

Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...

Plasma processing apparatus

ECR ion source and method for operating an ECR ion source

Plasma processing apparatus, plasma processing method, and ECR heig...

Device for producing an amorphous carbon layer by electron cyclotro...

Plasma processing apparatus and plasma processing method

Resonant structure for electron cyclotron resonant (ECR) plasma ion...

Modular microwave source with local Lorentz force

Charge neutralizer and plasma generator

Method of manufacturing a semiconductor device

Method for implanting single or multiply charged ions into a surfac...

Cyclotronic plasma actuator with arc-magnet for active flow control

RF current drive for plasma electric generation system

Systems and methods for tailoring ion energy distribution function...

Cyclotronic plasma actuator with arc-magnet for active flow control

Method and device for generating a plasma excited by a microwave en...

Plasma generation for ion implanter

Plasma processing apparatus with gas feed and evacuation conduit

Facility for microwave treatment of a load

Plasma processing apparatus and plasma processing method

Apparatus and method for mass analyzed ion beam

High density microwave plasma generation apparatus, and magnetron s...

Device for generating plasma having a high range along an axis by e...

Hybrid plasma source

RF current drive for plasma electric generation system

Methods and apparatus for controlling photoresist line width roughness

Patents Applicationslast 30 patents

LOW PRESSURE PLASMA ETCH PROCESS FOR PREFERENTIAL GENERATION OF OXI...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) APPARATUS

MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE

Electron Cyclotron Rotation (ECR)-Enhanced Hollow Cathode Plasma So...

MULTIPLE FREQUENCY ELECTRON CYCLOTRON RESONANCE THRUSTER

ECR ION SOURCE AND METHOD FOR OPERATING AN ECR ION SOURCE

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ECR HEIG...

CHARGE NEUTRALIZER AND PLASMA GENERATOR

RESONANT STRUCTURE FOR ELECTRON CYCLOTRON RESONANT (ECR) PLASMA ION...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR IMPLANTING SINGLE OR MULTIPLY CHARGED IONS INTO A SURFAC...

PLASMA PROCESSING APPARATUS

METHOD FOR IMPLANTING IONS ON A SURFACE OF AN OBJECT TO BE TREATED...

PLASMA PROCESSING APPARATUS

MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE

DEVICE FOR PRODUCING AN AMORPHOUS CARBON LAYER BY ELECTRON CYCLOTRO...

SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...

CYCLOTRONIC PLASMA ACTUATOR WITH ARC-MAGNET FOR ACTIVE FLOW CONTROL

PLASMA GENERATION FOR ION IMPLANTER

PLACING UNIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME

METHOD AND DEVICE FOR GENERATING A PLASMA EXCITED BY A MICROWAVE EN...

APPARATUS AND METHOD FOR MASS ANALYZED ION BEAM

HYBRID PLASMA SOURCE