Electron-optical or ion-optical arrangements for the correction of image defects

Industry

CPC
H01J37/153

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for adjusting angle of incidence on charged particle beam...
- Patent number 12,119,202
- Issue date Oct 15, 2024
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning charged-particle-beam microscopy with energy-dispersive x-...
- Patent number 12,094,684
- Issue date Sep 17, 2024
- Mochii, Inc.
- Christopher Su-Yan Own
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflection device, aberration corrector, monochromator, and ch...
- Patent number 12,062,519
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for aligning a multi-beam system
- Patent number 12,057,287
- Issue date Aug 6, 2024
- Jan Stopka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optically-addressed phase modulator for electron beams
- Patent number 12,033,829
- Issue date Jul 9, 2024
- The Board of Trustees of the Leland Stanford Junior University
- Stewart A. Koppell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,033,830
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement and correction of optical aberrations in charged partic...
- Patent number 11,990,315
- Issue date May 21, 2024
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,967,482
- Issue date Apr 23, 2024
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Machine learning on wafer defect review
- Patent number 11,935,722
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Pin Chou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam application apparatus
- Patent number 11,915,903
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conduction inspection method for multipole aberration corrector, an...
- Patent number 11,915,902
- Issue date Feb 27, 2024
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of thermal magnetic field noise in TEM corrector systems
- Patent number 11,915,904
- Issue date Feb 27, 2024
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimation model generation method and electron microscope
- Patent number 11,842,880
- Issue date Dec 12, 2023
- Jeol Ltd.
- Ryusuke Sagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 11,817,290
- Issue date Nov 14, 2023
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,817,289
- Issue date Nov 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining aberrations of a charged particle beam, and...
- Patent number 11,810,753
- Issue date Nov 7, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dominik Ehberger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron optical module for providing an off-axial electron beam wi...
- Patent number 11,804,357
- Issue date Oct 31, 2023
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,798,776
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,791,124
- Issue date Oct 17, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam observation device, electron beam observation system,...
- Patent number 11,791,130
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Koichi Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector
- Patent number 11,791,125
- Issue date Oct 17, 2023
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,784,023
- Issue date Oct 10, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multistage-connected multipole, multistage multipole unit, and char...
- Patent number 11,769,650
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideto Dohi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240420915
- Publication date Dec 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Mihiro TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM
- Publication number 20240371597
- Publication date Nov 7, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...
- Publication number 20240355576
- Publication date Oct 24, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Florian Lampersberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope, Aberration Correction Method, And Imaging Method
- Publication number 20240274402
- Publication date Aug 15, 2024
- JEOL Ltd.
- Motofumi Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...
- Publication number 20240274398
- Publication date Aug 15, 2024
- Carl Zeiss MultiSEM GmbH
- Christof Riedesel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope
- Publication number 20240242923
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Michiko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240242924
- Publication date Jul 18, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242920
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processor System, Correction Method, and Correction Program
- Publication number 20240222064
- Publication date Jul 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Mayuka OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM COLUMN, CHARGED PARTICLE BEAM CHROMATIC ABERR...
- Publication number 20240222063
- Publication date Jul 4, 2024
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterpüftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...
- Publication number 20240186109
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transmission Electron Microscope
- Publication number 20240186103
- Publication date Jun 6, 2024
- Hitachi High-Tech Corporation
- Akinari HANAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM MODULATION DEVICE AND ELECTRON BEAM MODULATION METHOD
- Publication number 20240177961
- Publication date May 30, 2024
- Tohoku University
- Yuuki UESUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...
- Publication number 20240170249
- Publication date May 23, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pieter Kruit
- G01 - MEASURING TESTING
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope, Multipole Element for Use Therein, and Control...
- Publication number 20240145210
- Publication date May 2, 2024
- JEOL Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Adjusting Charged Particle Optical System and Charged Par...
- Publication number 20240145211
- Publication date May 2, 2024
- JEOL Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION REDUCTION IN A MULTI-BEAM IMAGING SYSTEM
- Publication number 20240112884
- Publication date Apr 4, 2024
- KLA Corporation
- Michael I. Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF COMPENSATING FOR AN EFFECT OF ELECTRODE DISTORTION, ASSES...
- Publication number 20240105416
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS

Electron-optical or ion-optical arrangements for the correction of image defects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system of image-forming multi-electron beams

Mechanism for adjusting angle of incidence on charged particle beam...

Method to correct first order astigmatism and first order distortio...

Scanning charged-particle-beam microscopy with energy-dispersive x-...

Beam deflection device, aberration corrector, monochromator, and ch...

Methods and systems for aligning a multi-beam system

Charged particle beam device and inspection method

Optically-addressed phase modulator for electron beams

Multiple charged-particle beam apparatus with low crosstalk

Measurement and correction of optical aberrations in charged partic...

Charged particle assessment tool, inspection method

Charged particle beam device

Charged particle beam writing apparatus, charged particle beam writ...

Apparatus using charged particle beams

Machine learning on wafer defect review

Electron beam application apparatus

Conduction inspection method for multipole aberration corrector, an...

Reduction of thermal magnetic field noise in TEM corrector systems

Estimation model generation method and electron microscope

Method, device and system for reducing off-axial aberration in elec...

Charged particle beam device

Methods of determining aberrations of a charged particle beam, and...

Electron optical module for providing an off-axial electron beam wi...

Charged particle beam apparatus

Charged particle assessment tool, inspection method

Charged particle beam apparatus

Electron beam observation device, electron beam observation system,...

Aberration corrector

Charged particle beam apparatus

Multistage-connected multipole, multistage multipole unit, and char...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM

ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Method for Determining Focal Properties in a Target Beam Field of a...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

Electron Microscope, Aberration Correction Method, And Imaging Method

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

Electron Microscope

FOCUSED ION BEAM SYSTEM

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

Processor System, Correction Method, and Correction Program

CHARGED PARTICLE BEAM COLUMN, CHARGED PARTICLE BEAM CHROMATIC ABERR...

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...

Transmission Electron Microscope

ELECTRON BEAM MODULATION DEVICE AND ELECTRON BEAM MODULATION METHOD

CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

Electron Microscope, Multipole Element for Use Therein, and Control...

Method of Adjusting Charged Particle Optical System and Charged Par...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

DISTORTION REDUCTION IN A MULTI-BEAM IMAGING SYSTEM

METHOD OF COMPENSATING FOR AN EFFECT OF ELECTRODE DISTORTION, ASSES...

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS