Electron or ion beam tubes for processing objects

Industry

CPC
H01J2237/30

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30Electron or ion beam tubes for processing objects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Devices, systems, and methods for using an imaging device to calibr...
- Patent number 11,925,983
- Issue date Mar 12, 2024
- Arcam AB
- Anders Snis
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and model generation method
- Patent number 11,823,863
- Issue date Nov 21, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
X-ray calibration standard object
- Patent number 11,806,800
- Issue date Nov 7, 2023
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Charged particle beam device
- Patent number 11,798,780
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data generation method and charged particle beam irradiation device
- Patent number 11,749,499
- Issue date Sep 5, 2023
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 11,742,177
- Issue date Aug 29, 2023
- Hitachi High-Tech Science Corporation
- Ayana Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Verification plates with automated evaluation of melt performance
- Patent number 11,733,187
- Issue date Aug 22, 2023
- Arcam AB
- David Svensson
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam drawing device and method of controlling char...
- Patent number 11,694,875
- Issue date Jul 4, 2023
- Jeol Ltd.
- Masakazu Iwanaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Operating a particle beam apparatus with an object holder
- Patent number 11,688,583
- Issue date Jun 27, 2023
- Carl Zeiss Microscopy GmbH
- Alexander Orchowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam cutting calibration system and method
- Patent number 11,658,001
- Issue date May 23, 2023
- INSTITUTE OF GEOLOGY AND GEOPHYSICS, CHINESE ACADEMY OF SCIENCES
- Zhongming Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of optical device fabrication using an ion beam source
- Patent number 11,640,898
- Issue date May 2, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion focusing device
- Patent number 11,605,531
- Issue date Mar 14, 2023
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of preparing integrated circuits for backside pro...
- Patent number 11,605,525
- Issue date Mar 14, 2023
- FEI Company
- James Vickers
- G01 - MEASURING TESTING
Information Patent Grant
Multibeam scanning apparatus and multibeam scanning method
- Patent number 11,569,061
- Issue date Jan 31, 2023
- Kioxia Corporation
- Osamu Nagano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle yield via beam-line pressure control
- Patent number 11,562,885
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and model generation method
- Patent number 11,527,381
- Issue date Dec 13, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for raster scanning a surface of an object usin...
- Patent number 11,504,798
- Issue date Nov 22, 2022
- Carl Zeiss Microscopy GmbH
- Josef Biberger
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE
- Publication number 20240297012
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...
- Publication number 20240212967
- Publication date Jun 27, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...
- Publication number 20240186109
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMAGING SYSTEM
- Publication number 20240186104
- Publication date Jun 6, 2024
- Frederick A. Flitsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam Apparatus
- Publication number 20240071718
- Publication date Feb 29, 2024
- JEOL Ltd.
- Yusuke Kagaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOSED LOOP FARADAY CORRECTION OF A HORIZONTAL BEAM CURRENT PROFILE...
- Publication number 20240071719
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE AND INSPECTION METHOD
- Publication number 20240055223
- Publication date Feb 15, 2024
- KIOXIA Corporation
- Chihiro IDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...
- Publication number 20230369014
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Pradeep Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
END POINT DETERMINATION BY MEANS OF CONTRAST GAS
- Publication number 20230341766
- Publication date Oct 26, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINTING WITH DETERMINATION OF REMAINING DISTANCE
- Publication number 20230307209
- Publication date Sep 28, 2023
- FEI Company
- Zoltán Orémus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230274907
- Publication date Aug 31, 2023
- HITACHI HIGH-TECH CORPORATION
- Teruo KOHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...
- Publication number 20230260749
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...
- Publication number 20230230794
- Publication date Jul 20, 2023
- PHOTO ELECTRON SOUL INC.
- Tomohiro Nishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System and Method of Correcting Deviation of Field...
- Publication number 20230230801
- Publication date Jul 20, 2023
- JEOL Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Automatic Detection of Required Peak for Sample Machining...
- Publication number 20230215689
- Publication date Jul 6, 2023
- TESCAN Brno, s.r.o.
- Sharang Sharang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Milling Sample
- Publication number 20230197401
- Publication date Jun 22, 2023
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY
- Publication number 20230197403
- Publication date Jun 22, 2023
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM
- Publication number 20230139375
- Publication date May 4, 2023
- BÜHLER ALZENAU GMBH
- Steffen GUERTLER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20230081844
- Publication date Mar 16, 2023
- Carl Zeiss SMT GMBH
- Thorsten Hofmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...
- Publication number 20230078311
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS

Electron or ion beam tubes for processing objects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Automated ion-beam alignment for dual-beam instrument

Ion beam device

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Wafer positioning method and apparatus

Vacuum chamber arrangement for charged particle beam generator

Devices, systems, and methods for using an imaging device to calibr...

Multi-beam writing method and multi-beam writing apparatus

Specimen machining device and information provision method

Ion implanter and model generation method

Ion beam source for optical device fabrication using a segmented io...

X-ray calibration standard object

Charged particle beam device

Data generation method and charged particle beam irradiation device

Charged particle beam apparatus and control method thereof

Verification plates with automated evaluation of melt performance

Lithography system, sensor and measuring method

Vacuum chamber arrangement for charged particle beam generator

Charged particle beam drawing device and method of controlling char...

Operating a particle beam apparatus with an object holder

Ion beam cutting calibration system and method

Methods of optical device fabrication using an ion beam source

Ion focusing device

System and method of preparing integrated circuits for backside pro...

Multibeam scanning apparatus and multibeam scanning method

Particle yield via beam-line pressure control

Multi-charged particle beam writing apparatus, and multi-charged pa...

Ion implanter and model generation method

Multi-charged particle beam writing apparatus, and multi-charged pa...

Methods and systems for raster scanning a surface of an object usin...

Patents Applicationslast 30 patents

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

COMPENSATION RASTER SCANNING

Device and Method for Calibrating a Charged-Particle Beam

CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...

WAFER POSITIONING METHOD AND APPARATUS

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...

METHOD AND APPARATUS FOR AN IMAGING SYSTEM

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

Focused Ion Beam Apparatus

CLOSED LOOP FARADAY CORRECTION OF A HORIZONTAL BEAM CURRENT PROFILE...

Charged Particle Beam Device

INSPECTION DEVICE AND INSPECTION METHOD

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...

END POINT DETERMINATION BY MEANS OF CONTRAST GAS

ENDPOINTING WITH DETERMINATION OF REMAINING DISTANCE

CHARGED PARTICLE BEAM DEVICE

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...

ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...

Focused Ion Beam System and Method of Correcting Deviation of Field...

Method of Automatic Detection of Required Peak for Sample Machining...

Apparatus and Method for Milling Sample

MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY

IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...