Electron or ion-optical systems

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CPC
H01J37/3007

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3007Electron or ion-optical systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 12,068,130
- Issue date Aug 20, 2024
- NexGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Angle control for neutral reactive species generated in a plasma
- Patent number 11,881,378
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Height measuring device, charged particle beam apparatus, and heigh...
- Patent number 11,754,388
- Issue date Sep 12, 2023
- Jeol Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,721,521
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resonator coil having an asymmetrical profile
- Patent number 11,710,617
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 11,699,568
- Issue date Jul 11, 2023
- NextGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation apparatus and electron beam irradiation m...
- Patent number 11,664,191
- Issue date May 30, 2023
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal plating of grids for ion beam sputtering
- Patent number 11,581,164
- Issue date Feb 14, 2023
- Excelitas Technologies Corp.
- Eric Baltz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual XY variable aperture in an ion implantation system
- Patent number 11,574,796
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin pellicle material for protection of solid-state electron detec...
- Patent number 11,443,916
- Issue date Sep 13, 2022
- KLA Corporation
- William G. Schultz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic filter providing reduced particle generation
- Patent number 11,437,215
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 11,335,537
- Issue date May 17, 2022
- NexGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle multi-beam device
- Patent number 11,322,335
- Issue date May 3, 2022
- Ebara Corporation
- Shinichi Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,315,793
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for generating bunched ion beam
- Patent number 11,295,931
- Issue date Apr 5, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,282,675
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System, apparatus and method for bunched ribbon ion beam
- Patent number 11,217,427
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,133,153
- Issue date Sep 28, 2021
- HITACHI HIGH-TECH CORPORATION
- Toru Iwaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and method of controlling same
- Patent number 11,133,151
- Issue date Sep 28, 2021
- Jeol Ltd.
- Hirofumi Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Resonator coil having an asymmetrical profile
- Patent number 11,094,504
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source device
- Patent number 11,004,649
- Issue date May 11, 2021
- Luxembourg Institute of Science and Technology (LIST)
- Olivier De Castro
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
- Publication number 20240420919
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Aaron P. WEBB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...
- Publication number 20240212970
- Publication date Jun 27, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING
- Publication number 20240112882
- Publication date Apr 4, 2024
- NEXGEN SEMI HOLDING, INC.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam Apparatus
- Publication number 20240071718
- Publication date Feb 29, 2024
- JEOL Ltd.
- Yusuke Kagaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240055218
- Publication date Feb 15, 2024
- NuFlare Technology, Inc.
- Yasuo SENGOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation device with an energy filter and a support element...
- Publication number 20240038491
- Publication date Feb 1, 2024
- mi2-factory GmbH
- Constantin Csato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM
- Publication number 20240029997
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Paul J. Murphy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA
- Publication number 20230369013
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20230307205
- Publication date Sep 28, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS
- Publication number 20230207260
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL PUMPING APPARATUS AND FOCUSED ENERGY BEAM SYSTEM
- Publication number 20230178335
- Publication date Jun 8, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS INCLUDING STAGE...
- Publication number 20230143197
- Publication date May 11, 2023
- HITACHI HIGH-TECH CORPORATION
- Akira NISHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual XY Variable Aperture In An Ion Implantation System
- Publication number 20230021619
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Data Processing For Programmable Direct-Write Apparatus
- Publication number 20220384143
- Publication date Dec 1, 2022
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM INSPECTION APPARATUS WITH IMPROVED DETECTION PERFORMANCE...
- Publication number 20220319808
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20220285126
- Publication date Sep 8, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING
- Publication number 20220254603
- Publication date Aug 11, 2022
- NEXGEN SEMI HOLDING, INC.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SYSTEM
- Publication number 20220223427
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION M...
- Publication number 20220189734
- Publication date Jun 16, 2022
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING
- Publication number 20220059319
- Publication date Feb 24, 2022
- NEXGEN SEMI HOLDING, INC.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVE MOLECULAR ION DEPOSITION
- Publication number 20210351003
- Publication date Nov 11, 2021
- Battelle Memorial Institute
- Sandilya V.B. Garimella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE
- Publication number 20210343500
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR PARALLEL ELECTRON LITHOGRAPHY
- Publication number 20210335572
- Publication date Oct 28, 2021
- John Bennett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin Pellicle Material for Protection of Solid-State Electron Detec...
- Publication number 20210327676
- Publication date Oct 21, 2021
- KLA Corporation
- William G. Schultz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE
- Publication number 20210210307
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS

Electron or ion-optical systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and system

Method and device for spatial charged particle bunching

Pattern data processing for programmable direct-write apparatus

Beam grid layout

Vacuum chamber arrangement for charged particle beam generator

Angle control for neutral reactive species generated in a plasma

Height measuring device, charged particle beam apparatus, and heigh...

Multi-beam inspection apparatus with improved detection performance...

Resonator coil having an asymmetrical profile

Vacuum chamber arrangement for charged particle beam generator

Method and device for spatial charged particle bunching

Electron beam irradiation apparatus and electron beam irradiation m...

Charged particle beam lithography system

Metal plating of grids for ion beam sputtering

Fill pattern to enhance ebeam process margin

Dual XY variable aperture in an ion implantation system

Thin pellicle material for protection of solid-state electron detec...

Electrostatic filter providing reduced particle generation

Method and device for spatial charged particle bunching

Charged particle multi-beam device

Etching method and plasma processing apparatus

Apparatus and techniques for generating bunched ion beam

Multi-beam inspection apparatus with improved detection performance...

System, apparatus and method for bunched ribbon ion beam

Ion milling device

Transmission electron microscope and method of controlling same

Fill pattern to enhance e-beam process margin

Vacuum chamber arrangement for charged particle beam generator

Resonator coil having an asymmetrical profile

Ion source device

Patents Applicationslast 30 patents

METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING

Focused Ion Beam Apparatus

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Ion implantation device with an energy filter and a support element...

APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA

FOCUSED ION BEAM SYSTEM

ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS

DIFFERENTIAL PUMPING APPARATUS AND FOCUSED ENERGY BEAM SYSTEM

STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS INCLUDING STAGE...

Dual XY Variable Aperture In An Ion Implantation System

Pattern Data Processing For Programmable Direct-Write Apparatus

MULTI-BEAM INSPECTION APPARATUS WITH IMPROVED DETECTION PERFORMANCE...

ION IMPLANTER AND ION IMPLANTATION METHOD

METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING

PLASMA PROCESSING APPARATUS AND SYSTEM

ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION M...

METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

SYSTEMS AND METHODS FOR SELECTIVE MOLECULAR ION DEPOSITION

RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE

MODULAR PARALLEL ELECTRON LITHOGRAPHY

Thin Pellicle Material for Protection of Solid-State Electron Detec...

RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE