Electron temperature measurement

Industry

CPC
H01J37/32954

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32954Electron temperature measurement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion generation device and ion generation method
- Patent number 11,978,608
- Issue date May 7, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,152,269
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching processing apparatus
- Patent number 11,017,987
- Issue date May 25, 2021
- SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Masanaga Fukasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for thermally calibrating reaction chambers
- Patent number 10,943,771
- Issue date Mar 9, 2021
- ASM IP Holding B.V.
- Hyeongeu Kim
- G01 - MEASURING TESTING
Information Patent Grant
Process condition sensing device and method for plasma chamber
- Patent number 10,777,393
- Issue date Sep 15, 2020
- KLA-Tencor Corporation
- Earl Jensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for thermally calibrating reaction chambers
- Patent number 10,643,826
- Issue date May 5, 2020
- ASM IP Holdings B.V.
- Hyeongeu Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for controlling plasma performance
- Patent number 10,510,512
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining the type, density and temperat...
- Patent number 9,930,766
- Issue date Mar 27, 2018
- Nanyang Technological University
- Chia Sern Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon selective removal
- Patent number 9,881,805
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of diagnosing plasma in plasma space
- Patent number 9,754,770
- Issue date Sep 5, 2017
- Samsung Electronics Co., Ltd.
- Kyung-Yub Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method, and program for predicting processing shape by plas...
- Patent number 9,620,338
- Issue date Apr 11, 2017
- MIZUHO INFORMATION & RESEARCH INSTITUTE, INC.
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for automatically characterizing a plasma
- Patent number 8,849,585
- Issue date Sep 30, 2014
- Lam Research Corporation
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for characterizing a plasma
- Patent number 8,660,805
- Issue date Feb 25, 2014
- Tokyo Electron Limited
- Ronald Victor Bravenec
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Sensor array for measuring plasma characteristics in plasma process...
- Patent number 8,545,669
- Issue date Oct 1, 2013
- KLA-Tencor Corporation
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma measurement device, plasma system, and method for measuring...
- Patent number 8,368,378
- Issue date Feb 5, 2013
- Lunghwa University of Science and Technology
- Ta-Lun Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma electron temperature measuring method and device
- Patent number 8,214,173
- Issue date Jul 3, 2012
- Mitsui Engineering & Shipbuilding Co., Ltd.
- Kazuki Takizawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma producing method and apparatus as well as plasma processing...
- Patent number 7,880,392
- Issue date Feb 1, 2011
- Nissin Electric Co., Ltd.
- Kenji Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling plasma processing using parameters derived through the...
- Patent number 7,413,672
- Issue date Aug 19, 2008
- Lam Research Corporation
- Douglas L. Keil
- G01 - MEASURING TESTING
Information Patent Grant
Device and control method for micro wave plasma processing
- Patent number 7,404,991
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for process monitoring and control
- Patent number 7,355,171
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sensor array for measuring plasma characteristics in plasma process...
- Patent number 6,902,646
- Issue date Jun 7, 2005
- Advanced Energy Industries, Inc.
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of detecting end point of plasma processing and apparatus fo...
- Patent number 5,928,532
- Issue date Jul 27, 1999
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring electron density of plasma
- Patent number 5,471,115
- Issue date Nov 28, 1995
- Fujitsu Limited
- Yukinobu Hikosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical mask filter capable of reducing the semiperiodic component...
- Patent number 5,059,784
- Issue date Oct 22, 1991
- Applied Materials, Inc.
- Ronnie Northrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring electron temperature
- Patent number 5,031,125
- Issue date Jul 9, 1991
- Rikagaku Kenkyusho
- Kazuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Measuring Method and Plasma Processing Apparatus
- Publication number 20240290589
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsutoshi Ashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HTCC ANTENNA FOR GENERATION OF MICROPLASMA
- Publication number 20240047178
- Publication date Feb 8, 2024
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Langmuir Probe Operating at Fixed Voltages
- Publication number 20220338337
- Publication date Oct 20, 2022
- Lockheed Martin Corporation
- Aaron Michael Schinder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20220005739
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TEMPERATURE CONTROL, AND PLASMA EQUIPMENT
- Publication number 20210375594
- Publication date Dec 2, 2021
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Songyu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATION DEVICE AND ION GENERATION METHOD
- Publication number 20210296078
- Publication date Sep 23, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035788
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING PROCESSING APPARATUS
- Publication number 20200373135
- Publication date Nov 26, 2020
- Sony Semiconductor Solutions Corporation
- MASANAGA FUKASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THERMALLY CALIBRATING REACTION CHAMBERS
- Publication number 20200227243
- Publication date Jul 16, 2020
- ASM IP HOLDING B.V.
- Hyeongeu Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE
- Publication number 20190228950
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER
- Publication number 20180114681
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Earl Jensen
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR THERMALLY CALIBRATING REACTION CHAMBERS
- Publication number 20180114680
- Publication date Apr 26, 2018
- ASM IP HOLDING B.V.
- Hyeongeu Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AN APPARATUS AND METHOD FOR DIAGNOSTICS OF NETURAL RADICALS IN PLASMA
- Publication number 20160198558
- Publication date Jul 7, 2016
- Chia Sern CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER
- Publication number 20150020972
- Publication date Jan 22, 2015
- KLA-Tencor Corporation
- Earl Jensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR AUTOMATICALLY CHARACTERIZING A PLASMA
- Publication number 20140367042
- Publication date Dec 18, 2014
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF DIAGNOSING PLASMA IN PLASMA SPACE
- Publication number 20140253092
- Publication date Sep 11, 2014
- Samsung Electronics Co., Ltd.
- Kyung-Yub JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20130192759
- Publication date Aug 1, 2013
- EMD CORPORATION
- Yuichi Setsuhara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130065399
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM, METHOD, AND PROGRAM FOR PREDICTING PROCESSING SHAPE BY PLAS...
- Publication number 20130013253
- Publication date Jan 10, 2013
- TOHOKU TECHNOARCH CO., LTD.
- Seiji Samukawa
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR CHARACTERIZING A PLASMA
- Publication number 20120084026
- Publication date Apr 5, 2012
- TOKYO ELECTRON LIMITED
- Ronald Victor BRAVENEC
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER
- Publication number 20110174777
- Publication date Jul 21, 2011
- KLA-Tencor Corporation
- Earl Jensen
- G01 - MEASURING TESTING
Information Patent Application
Plasma Measurement Device, Plasma System, and Method for Measuring...
- Publication number 20110001465
- Publication date Jan 6, 2011
- Chung-Ming Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...
- Publication number 20100279512
- Publication date Nov 4, 2010
- TOKYO ELECTRON LIMITED
- Hirokazu Udea
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ELECTRON TEMPERATURE MEASURING METHOD AND DEVICE
- Publication number 20100131226
- Publication date May 27, 2010
- MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
- Kazuki Takizawa
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR AUTOMATICALLY CHARACTERIZING A PLASMA
- Publication number 20090322342
- Publication date Dec 31, 2009
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080236748
- Publication date Oct 2, 2008
- HIROYUKI KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma producing method and apparatus as well as plasma processing...
- Publication number 20070095287
- Publication date May 3, 2007
- NISSIN ELECTRIC CO., LTD.
- Kenji Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for process monitoring and control
- Publication number 20060255260
- Publication date Nov 16, 2006
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sensor array for measuring plasma characteristics in plasma process...
- Publication number 20050151544
- Publication date Jul 14, 2005
- Advanced Energy Industries, Inc.
- Leonard J. Mahoney
- H01 - BASIC ELECTRIC ELEMENTS

Electron temperature measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and control method

Ion generation device and ion generation method

Plasma processing apparatus and control method

Plasma processing apparatus and control method

Etching method and etching processing apparatus

Methods for thermally calibrating reaction chambers

Process condition sensing device and method for plasma chamber

Methods for thermally calibrating reaction chambers

Methods and systems for controlling plasma performance

Apparatus and method for determining the type, density and temperat...

Silicon selective removal

Method and apparatus of diagnosing plasma in plasma space

System, method, and program for predicting processing shape by plas...

Methods for automatically characterizing a plasma

Method and system for characterizing a plasma

Sensor array for measuring plasma characteristics in plasma process...

Plasma measurement device, plasma system, and method for measuring...

Plasma electron temperature measuring method and device

Plasma producing method and apparatus as well as plasma processing...

Controlling plasma processing using parameters derived through the...

Device and control method for micro wave plasma processing

Method and apparatus for process monitoring and control

Sensor array for measuring plasma characteristics in plasma process...

Method of detecting end point of plasma processing and apparatus fo...

Method and apparatus for measuring electron density of plasma

Optical mask filter capable of reducing the semiperiodic component...

Apparatus for measuring electron temperature

Patents Applicationslast 30 patents

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

Plasma Measuring Method and Plasma Processing Apparatus

HTCC ANTENNA FOR GENERATION OF MICROPLASMA

Langmuir Probe Operating at Fixed Voltages

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

APPARATUS AND METHOD FOR TEMPERATURE CONTROL, AND PLASMA EQUIPMENT

ION GENERATION DEVICE AND ION GENERATION METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

ETCHING METHOD AND ETCHING PROCESSING APPARATUS

METHODS FOR THERMALLY CALIBRATING REACTION CHAMBERS

METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE

PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER

METHODS FOR THERMALLY CALIBRATING REACTION CHAMBERS

AN APPARATUS AND METHOD FOR DIAGNOSTICS OF NETURAL RADICALS IN PLASMA

PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER

SYSTEMS FOR AUTOMATICALLY CHARACTERIZING A PLASMA

METHOD AND APPARATUS OF DIAGNOSING PLASMA IN PLASMA SPACE

PLASMA PROCESSING DEVICE

PLASMA PROCESSING METHOD

SYSTEM, METHOD, AND PROGRAM FOR PREDICTING PROCESSING SHAPE BY PLAS...

METHOD AND SYSTEM FOR CHARACTERIZING A PLASMA

PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER

Plasma Measurement Device, Plasma System, and Method for Measuring...

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICO...

PLASMA ELECTRON TEMPERATURE MEASURING METHOD AND DEVICE

METHODS FOR AUTOMATICALLY CHARACTERIZING A PLASMA

PLASMA PROCESSING APPARATUS

Plasma producing method and apparatus as well as plasma processing...

Method and apparatus for process monitoring and control

Sensor array for measuring plasma characteristics in plasma process...