Electrostatic means

Industry

CPC
H01J2237/151

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/151Electrostatic means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflection device, aberration corrector, monochromator, and ch...
- Patent number 12,062,519
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduction of thermal magnetic field noise in TEM corrector systems
- Patent number 11,915,904
- Issue date Feb 27, 2024
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 11,817,290
- Issue date Nov 14, 2023
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,756,761
- Issue date Sep 12, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,721,521
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,705,300
- Issue date Jul 18, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam manipulation device and method for manipulati...
- Patent number 11,705,301
- Issue date Jul 18, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 11,587,759
- Issue date Feb 21, 2023
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of influencing a charged particle beam, multipole device, an...
- Patent number 11,501,946
- Issue date Nov 15, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, multi-beamlet assembly, and method...
- Patent number 11,495,433
- Issue date Nov 8, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of thermal magnetic field noise in TEM corrector systems
- Patent number 11,437,216
- Issue date Sep 6, 2022
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam irradiation apparatus and multi-charged...
- Patent number 11,417,495
- Issue date Aug 16, 2022
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for compensating dispersion of a beam separator...
- Patent number 11,328,894
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,282,675
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,251,012
- Issue date Feb 15, 2022
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,239,044
- Issue date Feb 1, 2022
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, apparatus and method for bunched ribbon ion beam
- Patent number 11,217,427
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM POSITION DETECTION AND REPOSITIONING
- Publication number 20240429017
- Publication date Dec 26, 2024
- KLA Corporation
- Henning Stoschus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...
- Publication number 20240355576
- Publication date Oct 24, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Florian Lampersberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY
- Publication number 20240347314
- Publication date Oct 17, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...
- Publication number 20240170249
- Publication date May 23, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pieter Kruit
- G01 - MEASURING TESTING
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR ELECTROSTATIC DEFLECTOR AND ELECTROSTATIC...
- Publication number 20240153731
- Publication date May 9, 2024
- KYOCERA CORPORATION
- Takeshi MUNEISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Adjusting Charged Particle Optical System and Charged Par...
- Publication number 20240145211
- Publication date May 2, 2024
- JEOL Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
- Publication number 20240096587
- Publication date Mar 21, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND MULTI-ELECTRON BE...
- Publication number 20240079200
- Publication date Mar 7, 2024
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simple Spherical Aberration Corrector for SEM
- Publication number 20240047170
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle optics components and their fabrication
- Publication number 20240047171
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20240038485
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20240029993
- Publication date Jan 25, 2024
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Shunting Device
- Publication number 20230360878
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER
- Publication number 20230282439
- Publication date Sep 7, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20230223231
- Publication date Jul 13, 2023
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS
- Publication number 20230215682
- Publication date Jul 6, 2023
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM
- Publication number 20230170177
- Publication date Jun 1, 2023
- Friedrich-Alexander-Universitat Erlangen-Nurnberg
- Robert ZIMMERMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...
- Publication number 20230154723
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS

Electrostatic means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method, device and system for reducing off-axial aberration in elec...

Method and system of image-forming multi-electron beams

Beam pattern device having beam absorber structure

Apparatus of plural charged-particle beams

Beam deflection device, aberration corrector, monochromator, and ch...

Systems and methods for real time stereo imaging using multiple ele...

Semiconductor wafer

Reduction of thermal magnetic field noise in TEM corrector systems

Scanning electron microscope device and electron beam inspection ap...

Apparatus of plural charged-particle beams

Method, device and system for reducing off-axial aberration in elec...

Wien filter and charged particle beam imaging apparatus

Multi-beam inspection apparatus with improved detection performance...

Method and device for implanting ions in wafers

Charged particle beam manipulation device and method for manipulati...

Apparatus of plural charged-particle beams

Method, device and system for reducing off-axial aberration in elec...

Method of influencing a charged particle beam, multipole device, an...

Charged particle beam apparatus, multi-beamlet assembly, and method...

Reduction of thermal magnetic field noise in TEM corrector systems

Multi-charged particle beam irradiation apparatus and multi-charged...

Systems and methods for compensating dispersion of a beam separator...

Multi-beam inspection apparatus with improved detection performance...

Charged particle beam writing apparatus and charged particle beam w...

Wien filter and charged particle beam imaging apparatus

Apparatus of plural charged-particle beams

System, apparatus and method for bunched ribbon ion beam

Apparatus of plural charged-particle beams

Method and device for implanting ions in wafers

High-current ion implanter and method for controlling ion beam usin...

Patents Applicationslast 30 patents

ELECTRON BEAM POSITION DETECTION AND REPOSITIONING

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...

TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY

SEMICONDUCTOR DEVICE

Method for Determining Focal Properties in a Target Beam Field of a...

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

MANUFACTURING METHOD FOR ELECTROSTATIC DEFLECTOR AND ELECTROSTATIC...

Method of Adjusting Charged Particle Optical System and Charged Par...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM

CHARGED PARTICLE DEVICE AND METHOD

MULTI-ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND MULTI-ELECTRON BE...

Simple Spherical Aberration Corrector for SEM

Charged particle optics components and their fabrication

ELECTRON-OPTICAL DEVICE

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

Multi-Beam Pattern Definition Device

Adjustable Permanent Magnetic Lens Having Shunting Device

SEMICONDUCTOR WAFER

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS

ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM

SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...