electrostatic

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CPC
H01J37/1477

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/1477electrostatic

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-beam inspection apparatus
- Patent number 12,142,453
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflection device, aberration corrector, monochromator, and ch...
- Patent number 12,062,519
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for event modulated electron microscopy
- Patent number 11,848,173
- Issue date Dec 19, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Bryan Walter Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens system for fast scanning large FOV
- Patent number 11,837,431
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,756,761
- Issue date Sep 12, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,705,300
- Issue date Jul 18, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device
- Patent number 11,676,796
- Issue date Jun 13, 2023
- Jeol Ltd.
- Kazuki Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of influencing a charged particle beam, multipole device, an...
- Patent number 11,501,946
- Issue date Nov 15, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, multi-beamlet assembly, and method...
- Patent number 11,495,433
- Issue date Nov 8, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam irradiation apparatus and multi-charged...
- Patent number 11,417,495
- Issue date Aug 16, 2022
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus, and control method for focused ion beam...
- Patent number 11,257,655
- Issue date Feb 22, 2022
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,251,018
- Issue date Feb 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,239,044
- Issue date Feb 1, 2022
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 11,232,928
- Issue date Jan 25, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated transmission electron microscope
- Patent number 11,081,314
- Issue date Aug 3, 2021
- National Technology & Engineering Solutions of Sandia, LLC
- Katherine L. Jungjohann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device and optical-axis adjusting method thereof
- Patent number 10,910,194
- Issue date Feb 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Shuhei Yabu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,879,031
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source and method for cleaning a charged-particle...
- Patent number 10,840,054
- Issue date Nov 17, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,818,470
- Issue date Oct 27, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuki Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low voltage scanning electron microscope and method for specimen ob...
- Patent number 10,777,382
- Issue date Sep 15, 2020
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...
- Publication number 20240371596
- Publication date Nov 7, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY
- Publication number 20240355581
- Publication date Oct 24, 2024
- Integrated Dynamic Electron Solutions, Inc.
- Bryan Walter REED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNING A DISTORTED IMAGE
- Publication number 20240297013
- Publication date Sep 5, 2024
- ASML NETHERLANDS B.V.
- Jasper Frans Mathijs VAN RENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV
- Publication number 20240145209
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...
- Publication number 20240128045
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
- Publication number 20240096587
- Publication date Mar 21, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF
- Publication number 20240021404
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System and Control Method Therefor
- Publication number 20230343550
- Publication date Oct 26, 2023
- JEOL Ltd.
- Takamitsu Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER
- Publication number 20230282439
- Publication date Sep 7, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC STRUCTURE AND ELECTROSTATIC DEFLECTOR
- Publication number 20230257307
- Publication date Aug 17, 2023
- KYOCERA CORPORATION
- Yuta IMAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUC...
- Publication number 20230260744
- Publication date Aug 17, 2023
- CARL ZEISS MICROSCOPY GMBH
- Heiko Stegmann
- G01 - MEASURING TESTING
Information Patent Application
A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...
- Publication number 20230238211
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS
- Publication number 20230215682
- Publication date Jul 6, 2023
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230125800
- Publication date Apr 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS
- Publication number 20230107989
- Publication date Apr 6, 2023
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM INSPECTION AP...
- Publication number 20230005704
- Publication date Jan 5, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20220392735
- Publication date Dec 8, 2022
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...
- Publication number 20220336183
- Publication date Oct 20, 2022
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, MULTI-BEAMLET ASSEMBLY, AND METHOD...
- Publication number 20220336186
- Publication date Oct 20, 2022
- lCT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INFLUENCING A CHARGED PARTICLE BEAM, MULTIPOLE DEVICE, AN...
- Publication number 20220277921
- Publication date Sep 1, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20220223366
- Publication date Jul 14, 2022
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM INSPECTION APPARATUS
- Publication number 20220216029
- Publication date Jul 7, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Deflection Device, Aberration Corrector, Monochromator, and Ch...
- Publication number 20220172920
- Publication date Jun 2, 2022
- Hitachi High-Tech Corporation
- Pieter KRUIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIEN FILTER AND CHARGED PARTICLE BEAM IMAGING APPARATUS
- Publication number 20220157556
- Publication date May 19, 2022
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang MENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20220148851
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20220084783
- Publication date Mar 17, 2022
- JEOL Ltd.
- Kazuki Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS
- Publication number 20210391139
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS

electrostatic

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-beam inspection apparatus

Apparatus of plural charged-particle beams

Beam deflection device, aberration corrector, monochromator, and ch...

Replaceable module for a charged particle apparatus

Semiconductor wafer

Scanning electron microscope device and electron beam inspection ap...

Apparatus of plural charged-particle beams

Methods and systems for event modulated electron microscopy

Objective lens system for fast scanning large FOV

Apparatus using multiple beams of charged particles

Wien filter and charged particle beam imaging apparatus

Method and device for implanting ions in wafers

Charged particle beam device

Apparatus of plural charged-particle beams

Method of influencing a charged particle beam, multipole device, an...

Charged particle beam apparatus, multi-beamlet assembly, and method...

Multi-charged particle beam irradiation apparatus and multi-charged...

Apparatus using multiple beams of charged particles

Focused ion beam apparatus, and control method for focused ion beam...

Scanning electron microscope

Wien filter and charged particle beam imaging apparatus

Multi-beam inspection apparatus

Apparatus of plural charged-particle beams

Integrated transmission electron microscope

Method and device for implanting ions in wafers

Charged particle beam device and optical-axis adjusting method thereof

Apparatus of plural charged-particle beams

Charged-particle source and method for cleaning a charged-particle...

Charged particle beam device

Low voltage scanning electron microscope and method for specimen ob...

Patents Applicationslast 30 patents

MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...

METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY

ALIGNING A DISTORTED IMAGE

OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...

DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF

Charged Particle Beam System and Control Method Therefor

SEMICONDUCTOR WAFER

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CERAMIC STRUCTURE AND ELECTROSTATIC DEFLECTOR

METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUC...

A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...

ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS

SCANNING ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM INSPECTION AP...

METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE

MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...

CHARGED PARTICLE BEAM APPARATUS, MULTI-BEAMLET ASSEMBLY, AND METHOD...

METHOD OF INFLUENCING A CHARGED PARTICLE BEAM, MULTIPOLE DEVICE, AN...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

MULTI-BEAM INSPECTION APPARATUS

Beam Deflection Device, Aberration Corrector, Monochromator, and Ch...

WIEN FILTER AND CHARGED PARTICLE BEAM IMAGING APPARATUS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Charged Particle Beam Device

REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS