electrostatic

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CPC
H01J2237/0262

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0262electrostatic

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus
- Patent number 11,996,263
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,869,748
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Stage apparatus
- Patent number 11,694,870
- Issue date Jul 4, 2023
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Remote capacitively coupled plasma source with improved ion blocker
- Patent number 11,069,514
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Vivek B Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,832,889
- Issue date Nov 10, 2020
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling apparatus and sample holder
- Patent number 10,832,888
- Issue date Nov 10, 2020
- Jeol Ltd.
- Shogo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture set for multi-beam
- Patent number 10,658,158
- Issue date May 19, 2020
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced FIB-SEM systems for large-volume 3D imaging
- Patent number 10,600,615
- Issue date Mar 24, 2020
- Howard Hughes Medical Institute
- C. Shan Xu
- G01 - MEASURING TESTING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion milling system
- Patent number 10,361,065
- Issue date Jul 23, 2019
- Hitachi High-Technologies Corporation
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive interface system between vacuum chambers in a charged pa...
- Patent number 10,290,522
- Issue date May 14, 2019
- Hitachi High-Technologies Corporation
- Masashi Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 10,269,531
- Issue date Apr 23, 2019
- Jeol Ltd.
- Tatsuru Kuramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage shielding and cooling in a charged particle beam gener...
- Patent number 10,037,864
- Issue date Jul 31, 2018
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system and beam generator
- Patent number 9,653,261
- Issue date May 16, 2017
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nano-patterned system and magnetic-field applying device thereof
- Patent number 9,640,363
- Issue date May 2, 2017
- Institute of Physics, Chinese Academy of Sciences
- Guoqiang Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-patterned system and magnetic-field applying device thereof
- Patent number 9,484,138
- Issue date Nov 1, 2016
- Institute of Physics, Chinese Academy of Sciences
- Guoqiang Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling charge-up in an electron beam app...
- Patent number 9,000,370
- Issue date Apr 7, 2015
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle multi-beamlet lithography system, modulation devic...
- Patent number 8,987,677
- Issue date Mar 24, 2015
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Modulation device and charged particle multi-beamlet lithography sy...
- Patent number 8,841,636
- Issue date Sep 23, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,759,787
- Issue date Jun 24, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,492,731
- Issue date Jul 23, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion source arc chamber seal
- Patent number 7,655,930
- Issue date Feb 2, 2010
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle generator and accelerator
- Patent number 7,550,753
- Issue date Jun 23, 2009
- Kyoto Institute of Technology
- Nishino Shigehiro
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle beam system and a method for inspecting a sample
- Patent number 7,525,091
- Issue date Apr 28, 2009
- Applied Materials, Israel, Ltd.
- Igor Petrov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
STAGE APPARATUS
- Publication number 20230360879
- Publication date Nov 9, 2023
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis VAN DER TOORN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20230207280
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Sun Joo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MAN...
- Publication number 20230125679
- Publication date Apr 27, 2023
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20220223366
- Publication date Jul 14, 2022
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
STAGE APPARATUS
- Publication number 20210375580
- Publication date Dec 2, 2021
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis VAN DER TOORN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Remote Capacitively Coupled Plasma Source with Improved Ion Blocker
- Publication number 20210351020
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Method of Manufacturing Semicond...
- Publication number 20200402774
- Publication date Dec 24, 2020
- Kokusai Electric Corporation
- Takeshi YASUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AN APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20200203114
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Remote Capacitively Coupled Plasma Source With Improved Ion Blocker
- Publication number 20200035467
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYER FOR SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE
- Publication number 20190333743
- Publication date Oct 31, 2019
- Jusung Engineering Co., Ltd.
- Ho Bin YOON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20190272973
- Publication date Sep 5, 2019
- Hitachi High-Technologies Corporation
- Asako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS
- Publication number 20190115246
- Publication date Apr 18, 2019
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS EXHAUST PLATE AND PLASMA PROCESSING APPARATUS
- Publication number 20180374720
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING SYSTEM
- Publication number 20180286633
- Publication date Oct 4, 2018
- Hitachi High-Technologies Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20180261422
- Publication date Sep 13, 2018
- JEOL Ltd.
- Tatsuru Kuramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PRODUCING APPARATUS
- Publication number 20160240351
- Publication date Aug 18, 2016
- SPTS TECHNOLOGIES LIMITED
- STEPHEN R. BURGESS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Controlling Charge-up in an Electron Beam App...
- Publication number 20150060665
- Publication date Mar 5, 2015
- HERMES MICROVISION INC.
- WEIMING REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Controlling Charge-up in an Electron Beam App...
- Publication number 20140151554
- Publication date Jun 5, 2014
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20140014850
- Publication date Jan 16, 2014
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system, modulation devic...
- Publication number 20110266418
- Publication date Nov 3, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Modulation device and charged particle multi-beamlet lithography sy...
- Publication number 20110261340
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20110260040
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

electrostatic

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus using multiple beams of charged particles

Stage apparatus

Vacuum chamber arrangement for charged particle beam generator

Substrate processing apparatus and method of manufacturing semicond...

Apparatus using multiple beams of charged particles

Vacuum chamber arrangement for charged particle beam generator

Stage apparatus

Apparatus using multiple beams of charged particles

Vacuum chamber arrangement for charged particle beam generator

Remote capacitively coupled plasma source with improved ion blocker

Charged particle beam device

Ion milling apparatus and sample holder

Aperture set for multi-beam

Enhanced FIB-SEM systems for large-volume 3D imaging

Vacuum chamber arrangement for charged particle beam generator

Ion milling system

Conductive interface system between vacuum chambers in a charged pa...

Scanning electron microscope

High voltage shielding and cooling in a charged particle beam gener...

Charged particle lithography system and beam generator

Nano-patterned system and magnetic-field applying device thereof

Nano-patterned system and magnetic-field applying device thereof

System and method for controlling charge-up in an electron beam app...

Charged particle multi-beamlet lithography system, modulation devic...

Modulation device and charged particle multi-beamlet lithography sy...

Charged particle multi-beamlet lithography system with modulation d...

Charged particle multi-beamlet lithography system with modulation d...

Ion source arc chamber seal

Charged particle generator and accelerator

Charged particle beam system and a method for inspecting a sample

Patents Applicationslast 30 patents

CHARGED PARTICLE APPARATUS AND METHOD

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

STAGE APPARATUS

SUBSTRATE TREATING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MAN...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

STAGE APPARATUS

Remote Capacitively Coupled Plasma Source with Improved Ion Blocker

Substrate Processing Apparatus and Method of Manufacturing Semicond...

AN APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

Remote Capacitively Coupled Plasma Source With Improved Ion Blocker

GAS SPRAYER FOR SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE

CHARGED PARTICLE BEAM DEVICE

METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS

GAS EXHAUST PLATE AND PLASMA PROCESSING APPARATUS

ION MILLING SYSTEM

Scanning Electron Microscope

PLASMA PRODUCING APPARATUS

System and Method for Controlling Charge-up in an Electron Beam App...

System and Method for Controlling Charge-up in an Electron Beam App...

Charged particle multi-beamlet lithography system with modulation d...

Charged particle multi-beamlet lithography system, modulation devic...

Modulation device and charged particle multi-beamlet lithography sy...

Charged particle multi-beamlet lithography system with modulation d...