Elongated nozzles, tubes with holes

Industry

CPC
C23C16/45578

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45578Elongated nozzles, tubes with holes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,139,792
- Issue date Nov 12, 2024
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for cleaning reaction vessel for processing su...
- Patent number 12,139,787
- Issue date Nov 12, 2024
- Kokusai Electric Corporation
- Shinya Ebata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,116,666
- Issue date Oct 15, 2024
- Kokusai Electric Corporation
- Daigi Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method
- Patent number 12,084,765
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Reita Igarashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device, manufacturing method for semiconductor...
- Patent number 12,062,546
- Issue date Aug 13, 2024
- Kokusai Electric Corporation
- Hidenari Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,054,828
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas tube, gas supply system and manufacturing method of semiconduct...
- Patent number 12,037,687
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and cleaning method
- Patent number 12,018,366
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Shingo Hishiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas nozzle, substrate processing apparatus, and substrate processin...
- Patent number 11,993,848
- Issue date May 28, 2024
- Tokyo Electron Limited
- Kuniyasu Sakashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Injector
- Patent number 11,993,847
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Chris G. M. de Ridder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nozzle exit contours for pattern composition
- Patent number 11,981,987
- Issue date May 14, 2024
- Universal Display Corporation
- Edwin van den Tillaart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method for manufacturing semicon...
- Patent number 11,976,362
- Issue date May 7, 2024
- Kioxia Corporation
- Takashi Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizer, substrate processing apparatus and method for manufactur...
- Patent number 11,970,771
- Issue date Apr 30, 2024
- Kokusai Electric Corporation
- Atsushi Morikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,967,501
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Hiroaki Hiramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,952,664
- Issue date Apr 9, 2024
- Kokusai Electric Corporation
- Hidenari Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid handling structure and method for a gas phase deposition appa...
- Patent number 11,920,241
- Issue date Mar 5, 2024
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Ruud Olieslagers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 11,913,114
- Issue date Feb 27, 2024
- Samsung Electronics Co., Ltd.
- Jae Hyun Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,913,115
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Yoshitaka Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Injector configured for arrangement within a reaction chamber of a...
- Patent number 11,891,696
- Issue date Feb 6, 2024
- ASM IP Holding B.V.
- Lucian C. Jdira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method
- Patent number 11,859,285
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Injector and substrate processing apparatus using the same, and sub...
- Patent number 11,846,023
- Issue date Dec 19, 2023
- Tokyo Electron Limited
- Tomoyuki Nagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for applying a carbon layer to a substrate comprising introd...
- Patent number 11,746,415
- Issue date Sep 5, 2023
- CARBONCOMPETENCE GMBH
- Doris Steinmuller-Nethl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas hub for plasma reactor
- Patent number 11,728,141
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,725,284
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Eiji Kikama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nozzle and nozzle head
- Patent number 11,702,745
- Issue date Jul 18, 2023
- Beneq Oy
- Pekka Soininen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition system
- Patent number 11,655,542
- Issue date May 23, 2023
- Daniel Beane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Half-angle nozzle
- Patent number 11,634,813
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, method of processing...
- Patent number 11,591,694
- Issue date Feb 28, 2023
- Kokusai Electric Corporation
- Hiroaki Hiramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,560,628
- Issue date Jan 24, 2023
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,555,246
- Issue date Jan 17, 2023
- Kokusai Electric Corporation
- Hironori Shimada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20240327985
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240318306
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Keigo NISHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240309508
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Tomoyuki NAGATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240295024
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Makoto TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANIC ELECTROLUMINESCENT DEVICES
- Publication number 20240279789
- Publication date Aug 22, 2024
- UNIVERSAL DISPLAY CORPORATION
- Edwin van den Tillaart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOURCE GAS NOZZLE AND SEMICONDUCTOR WAFER PROCESSING APPARATUS INCL...
- Publication number 20240271282
- Publication date Aug 15, 2024
- SUMSUNG ELECTRONICS CO., LTD.
- Sang Yup Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INJECTOR CONFIGURED FOR ARRANGEMENT WITHIN A REACTION CHAMBER OF A...
- Publication number 20240167158
- Publication date May 23, 2024
- ASM IP HOLDING B.V.
- Lucian C. Jdira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL GROWTH APPARATUS AND GAS SUPPLY CONTROL MODULE USED THEREFOR
- Publication number 20240167196
- Publication date May 23, 2024
- PJP TECH INC
- Bum Ho CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240141490
- Publication date May 2, 2024
- Kokusai Electric Corporation
- Mika Urushihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION
- Publication number 20240141479
- Publication date May 2, 2024
- RTX Corporation
- JinQuan Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SOURCE AND DEPOSITION APPARATUS INCLUDING THE SAME
- Publication number 20240141489
- Publication date May 2, 2024
- SAMSUNG DISPLAY CO., LTD.
- JAEWAN SEOL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLIER PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20240102165
- Publication date Mar 28, 2024
- Kojusai Electric Corporation
- Shuhei Saido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240084451
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- JEONGHYEONG LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240018657
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Jae Hyun YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230416917
- Publication date Dec 28, 2023
- WONIK IPS CO., LTD.
- Kee Jun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230395378
- Publication date Dec 7, 2023
- Kokusai Electric Corporation
- Takumi ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR DIFFUSING A PRECURSOR WITH A CONTAINER HAVING AT LEAST O...
- Publication number 20230332289
- Publication date Oct 19, 2023
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Hicham MASKROT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND SUBSTRATE TREATMENT METHO...
- Publication number 20230272532
- Publication date Aug 31, 2023
- Samsung Electronics Co., LTD
- Jae Hyun YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD FOR MANU...
- Publication number 20230212749
- Publication date Jul 6, 2023
- Samsung Electronics Co., Ltd.
- Jung Min PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTANT VAPOR DELIVERY SYSTEMS FOR SEMICONDUCTOR PROCESSING TOOLS...
- Publication number 20230175126
- Publication date Jun 8, 2023
- ASM IP HOLDING B.V.
- Jianqiu Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY ASSEMBLY, SUBSTRATE PROCESSING APPARATUS, NOZZLE, METHOD...
- Publication number 20230160066
- Publication date May 25, 2023
- Kokusai Electric Corporation
- Yoshitaka ABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20230119730
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20230118483
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR FOR A VERTICAL FURNACE
- Publication number 20230111229
- Publication date Apr 13, 2023
- ASM IP HOLDING B.V.
- Theodorus G.M. Oosterlaken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230115403
- Publication date Apr 13, 2023
- Kokusai Electric Corporation
- Hiroaki HIRAMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...
- Publication number 20230112057
- Publication date Apr 13, 2023
- Kokusai Electric Corporation
- Hironori SHIMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20230109474
- Publication date Apr 6, 2023
- Hitachi Kokusai Electric Inc.
- Hidenari YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...
- Publication number 20230098570
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hung YEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...
- Publication number 20230073084
- Publication date Mar 9, 2023
- Kokusai Electric Corporation
- Naofumi OHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH TYPE SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURI...
- Publication number 20230054580
- Publication date Feb 23, 2023
- Samsung Electronics Co., Ltd.
- Sangyub IE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Elongated nozzles, tubes with holes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, method...

Apparatus and method for cleaning reaction vessel for processing su...

Substrate processing apparatus and method of manufacturing semicond...

Processing apparatus and processing method

Substrate processing device, manufacturing method for semiconductor...

Substrate processing method and substrate processing apparatus

Gas tube, gas supply system and manufacturing method of semiconduct...

Substrate processing apparatus and cleaning method

Gas nozzle, substrate processing apparatus, and substrate processin...

Injector

Nozzle exit contours for pattern composition

Substrate processing apparatus and method for manufacturing semicon...

Vaporizer, substrate processing apparatus and method for manufactur...

Substrate processing apparatus and method of manufacturing semicond...

Substrate processing apparatus and method of manufacturing semicond...

Fluid handling structure and method for a gas phase deposition appa...

Semiconductor manufacturing apparatus

Substrate processing apparatus and substrate processing method

Injector configured for arrangement within a reaction chamber of a...

Processing apparatus and processing method

Injector and substrate processing apparatus using the same, and sub...

Method for applying a carbon layer to a substrate comprising introd...

Gas hub for plasma reactor

Substrate processing apparatus and substrate processing method

Nozzle and nozzle head

Atomic layer deposition system

Half-angle nozzle

Method of manufacturing semiconductor device, method of processing...

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and method of manufacturing semicond...

Patents Applicationslast 30 patents

GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

ORGANIC ELECTROLUMINESCENT DEVICES

SOURCE GAS NOZZLE AND SEMICONDUCTOR WAFER PROCESSING APPARATUS INCL...

INJECTOR CONFIGURED FOR ARRANGEMENT WITHIN A REACTION CHAMBER OF A...

EPITAXIAL GROWTH APPARATUS AND GAS SUPPLY CONTROL MODULE USED THEREFOR

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION

DEPOSITION SOURCE AND DEPOSITION APPARATUS INCLUDING THE SAME

GAS SUPPLIER PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMI...

FILM FORMING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING APPARATUS

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

DEVICE FOR DIFFUSING A PRECURSOR WITH A CONTAINER HAVING AT LEAST O...

SEMICONDUCTOR MANUFACTURING APPARATUS AND SUBSTRATE TREATMENT METHO...

DEVICE FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD FOR MANU...

REACTANT VAPOR DELIVERY SYSTEMS FOR SEMICONDUCTOR PROCESSING TOOLS...

GAS SUPPLY ASSEMBLY, SUBSTRATE PROCESSING APPARATUS, NOZZLE, METHOD...

Substrate Processing Method and Substrate Processing Apparatus

Substrate Processing Method and Substrate Processing Apparatus

GAS INJECTOR FOR A VERTICAL FURNACE

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...

GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...

BATCH TYPE SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURI...