End-point detection

Industry

CPC
H01J37/32963

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32963End-point detection

Industries

Patents Grantslast 30 patents

Information Patent Grant
Surface processing equipment and surface processing method
- Patent number 12,154,768
- Issue date Nov 26, 2024
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,131,964
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low open area and coupon endpoint detection
- Patent number 12,080,574
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method and plasma processing apparatus
- Patent number 12,051,574
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,051,575
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection in low open area and/or high aspect ratio etch a...
- Patent number 12,046,522
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Lei Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual metrology model based seasoning optimization
- Patent number 12,032,355
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant frequency shift as etch stop of gate oxide of MOSFET trans...
- Patent number 12,020,915
- Issue date Jun 25, 2024
- KING FAISAL UNIVERSITY
- Hesham Mohammed Enshasy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film, in-situ measurement through transparent crystal and tran...
- Patent number 12,009,191
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive predictive control system
- Patent number 11,990,324
- Issue date May 21, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,942,312
- Issue date Mar 26, 2024
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,875,978
- Issue date Jan 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable fastening device for plasma gas injectors
- Patent number 11,854,769
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Shun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma detecting device
- Patent number 11,854,774
- Issue date Dec 26, 2023
- PSK HOLDINGS INC.
- Nam Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical absorption sensor for semiconductor processing
- Patent number 11,848,178
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ashing for coated devices
- Patent number 11,849,543
- Issue date Dec 19, 2023
- Sean Clancy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ etch material selectivity detection system
- Patent number 11,830,779
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Keith Berding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection of deposition cleaning in a pumping line and a p...
- Patent number 11,745,229
- Issue date Sep 5, 2023
- MKS Instruments, Inc.
- Gordon Hill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma observation system and plasma observation method
- Patent number 11,749,511
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Ryoji Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air cooled faraday shield and methods for using the same
- Patent number 11,692,732
- Issue date Jul 4, 2023
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, switching timing creation support devi...
- Patent number 11,587,763
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,557,469
- Issue date Jan 17, 2023
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma spectrometric system and inductively cou...
- Patent number 11,538,672
- Issue date Dec 27, 2022
- National Institute of Advanced Industrial Science and Technology
- Yoshiyuki Teramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 11,538,723
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 11,538,722
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for remote sensing a plasma
- Patent number 11,476,098
- Issue date Oct 18, 2022
- Dublin City University
- Patrick J. McNally
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma ashing apparatus
- Patent number 11,456,183
- Issue date Sep 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20240379469
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced OES Characterization
- Publication number 20240339309
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240297027
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...
- Publication number 20240290592
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20240266155
- Publication date Aug 8, 2024
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL SEMICONDUCTOR COMPONENT AND METHOD FOR GENERATING AN ABRUP...
- Publication number 20240234220
- Publication date Jul 11, 2024
- ROBERT BOSCH GmbH
- Christian Huber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20240222100
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Shan HU
- G01 - MEASURING TESTING
Information Patent Application
DIAGNOSIS DEVICE, DIAGNOSIS METHOD, PLASMA PROCESSING APPARATUS, AN...
- Publication number 20240213003
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Shota UMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL SEMICONDUCTOR COMPONENT AND METHOD FOR GENERATING AN ABRUP...
- Publication number 20240136236
- Publication date Apr 25, 2024
- ROBERT BOSCH GmbH
- Christian Huber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ETCH MATERIAL SELECTIVITY DETECTION SYSTEM
- Publication number 20240096715
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Keith Berding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
END POINT DETECTION METHOD AND APPARATUS FOR ANISOTROPIC ETCHING US...
- Publication number 20240087860
- Publication date Mar 14, 2024
- SANDISK TECHNOLOGIES LLC
- Shoichi MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING
- Publication number 20240079220
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR DETECTING END POINT
- Publication number 20240063002
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR ENDPOINT DETECTION IN FORELINE OF CHAMBER C...
- Publication number 20240063001
- Publication date Feb 22, 2024
- MKS Instruments, Inc.
- Hongke Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR DETECTING ENDPOINT IN PLASMA PROCESSING
- Publication number 20230352283
- Publication date Nov 2, 2023
- FORTH-RITE TECHNOLOGIES, LLC
- Terry R. Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL
- Publication number 20230352282
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA FUSION OF MULTIPLE SENSORS
- Publication number 20230317483
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Masaki KITSUNEZUKA
- G05 - CONTROLLING REGULATING
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20230268235
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL KNOB ESTIMATION
- Publication number 20230260767
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Jeong Jin Hong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR REMOTE SENSING A PLASMA
- Publication number 20230230821
- Publication date Jul 20, 2023
- Dublin City University
- Patrick J. McNally
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230207293
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Chang Mok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20230187190
- Publication date Jun 15, 2023
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING RADICAL SENSOR USABLE FOR MODEL TRAINING
- Publication number 20230178346
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Stephen Moffatt
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, APPARATUS, SERVER AND COMPUTER-READABLE STORAGE MEDIUM FOR...
- Publication number 20230170193
- Publication date Jun 1, 2023
- HANGZHOU FULLSEMI SEMICONDUCTOR CO., LTD.
- Zhiqin Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MONITORING SEMICONDUCTOR PROCESSES
- Publication number 20230135167
- Publication date May 4, 2023
- Inficon Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230118576
- Publication date Apr 20, 2023
- Hitachi High-Tech Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DIAGNOSTICS OF SEMICONDUCTOR PROCESS USING HYPERSPECTRAL IM...
- Publication number 20230097892
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230096723
- Publication date Mar 30, 2023
- Hitachi High-Tech Corporation
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECTROSCOPIC ANALYSIS METHOD, METHOD FOR FABRICATING SEMICONDUCTOR...
- Publication number 20230066724
- Publication date Mar 2, 2023
- Samsung Electronics Co., Ltd.
- Se Jin OH
- H01 - BASIC ELECTRIC ELEMENTS

End-point detection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Surface processing equipment and surface processing method

Plasma processing apparatus and plasma processing method

Low open area and coupon endpoint detection

Plasma processing apparatus and plasma processing method

Wafer processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Endpoint detection in low open area and/or high aspect ratio etch a...

Virtual metrology model based seasoning optimization

Resonant frequency shift as etch stop of gate oxide of MOSFET trans...

Etch processing system having reflective endpoint detection

Thin film, in-situ measurement through transparent crystal and tran...

Adaptive predictive control system

Normal-incidence in-situ process monitor sensor

Gas analyzer apparatus

Plasma processing apparatus and plasma processing method

Adjustable fastening device for plasma gas injectors

Plasma detecting device

Optical absorption sensor for semiconductor processing

Plasma ashing for coated devices

In-situ etch material selectivity detection system

Endpoint detection of deposition cleaning in a pumping line and a p...

Plasma observation system and plasma observation method

Air cooled faraday shield and methods for using the same

Substrate processing system, switching timing creation support devi...

Gas analyzer apparatus

Inductively coupled plasma spectrometric system and inductively cou...

Optical diagnostics of semiconductor process using hyperspectral im...

Optical diagnostics of semiconductor process using hyperspectral im...

System and method for remote sensing a plasma

Plasma processing method and plasma ashing apparatus

Patents Applicationslast 30 patents

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

Advanced OES Characterization

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...

GAS ANALYZER APPARATUS

VERTICAL SEMICONDUCTOR COMPONENT AND METHOD FOR GENERATING AN ABRUP...

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

DIAGNOSIS DEVICE, DIAGNOSIS METHOD, PLASMA PROCESSING APPARATUS, AN...

VERTICAL SEMICONDUCTOR COMPONENT AND METHOD FOR GENERATING AN ABRUP...

IN-SITU ETCH MATERIAL SELECTIVITY DETECTION SYSTEM

END POINT DETECTION METHOD AND APPARATUS FOR ANISOTROPIC ETCHING US...

OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING

PLASMA PROCESSING APPARATUS AND METHOD FOR DETECTING END POINT

METHODS AND SYSTEMS FOR ENDPOINT DETECTION IN FORELINE OF CHAMBER C...

SYSTEM AND METHOD FOR DETECTING ENDPOINT IN PLASMA PROCESSING

AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL

DATA FUSION OF MULTIPLE SENSORS

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

PROCESS CONTROL KNOB ESTIMATION

SYSTEM AND METHOD FOR REMOTE SENSING A PLASMA

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

GAS ANALYZER APPARATUS

SCANNING RADICAL SENSOR USABLE FOR MODEL TRAINING

METHOD, APPARATUS, SERVER AND COMPUTER-READABLE STORAGE MEDIUM FOR...

SYSTEM AND METHOD FOR MONITORING SEMICONDUCTOR PROCESSES

WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

OPTICAL DIAGNOSTICS OF SEMICONDUCTOR PROCESS USING HYPERSPECTRAL IM...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SPECTROSCOPIC ANALYSIS METHOD, METHOD FOR FABRICATING SEMICONDUCTOR...