Energy or mass filtering

Industry

CPC
H01J2237/057

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/057Energy or mass filtering

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 11,961,704
- Issue date Apr 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Naoki Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,942,312
- Issue date Mar 26, 2024
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number RE49784
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Weiming Ren
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,756,761
- Issue date Sep 12, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,705,300
- Issue date Jul 18, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam system
- Patent number 11,562,881
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,557,469
- Issue date Jan 17, 2023
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Ion implant apparatus and method of controlling the ion implant app...
- Patent number 11,462,382
- Issue date Oct 4, 2022
- NANYA TECHNOLOGY CORPORATION
- Hsun-Po Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for continuously supplying negative ions using...
- Patent number 11,337,296
- Issue date May 17, 2022
- Korea Atomic Energy Research Institute
- Sungryul Huh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generating three dimensional information regarding structural eleme...
- Patent number 11,264,202
- Issue date Mar 1, 2022
- Applied Materials Israel Ltd.
- Konstantin Chirko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,239,044
- Issue date Feb 1, 2022
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic filter tube
- Patent number 11,189,468
- Issue date Nov 30, 2021
- Beijing Normal University
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,189,457
- Issue date Nov 30, 2021
- HITACHI HIGH-TECH CORPORATION
- Hideo Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,183,358
- Issue date Nov 23, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam system
- Patent number 11,164,715
- Issue date Nov 2, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle microscope
- Patent number 11,158,482
- Issue date Oct 26, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charged particle microscopy with improved ima...
- Patent number 11,120,969
- Issue date Sep 14, 2021
- KLA Corporation
- Doug K. Masnaghetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning magnet design with enhanced efficiency
- Patent number 11,114,270
- Issue date Sep 7, 2021
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monochromator and charged particle beam system
- Patent number 11,094,498
- Issue date Aug 17, 2021
- Jeol Ltd.
- Masaki Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wien filter with integrated vacuum pump
- Patent number 11,056,313
- Issue date Jul 6, 2021
- Jefferson Science Associates, LLC
- Bernard Matthew Poelker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter and charged particle beam apparatus
- Patent number 11,043,353
- Issue date Jun 22, 2021
- Jeol Ltd.
- Kazuya Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Ion source
- Patent number 11,017,974
- Issue date May 25, 2021
- Nissin Ion Equipment Co., Ltd.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS OF ELECTRON DIFFRACTION
- Publication number 20250112022
- Publication date Apr 3, 2025
- FEI Company
- Jakub HOLZER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER-BASED CONTRAST CONTROL IN TRANSMISSION ELECTRON MICROSCOPY
- Publication number 20250062099
- Publication date Feb 20, 2025
- Yeda Research and Development Co. Ltd.
- Osip SCHWARTZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20240266155
- Publication date Aug 8, 2024
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Method for the Simulation of an Energy-Filtered Ion Implantation...
- Publication number 20240232470
- Publication date Jul 11, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A Method for the Simulation of an Energy-Filtered Ion Implantation...
- Publication number 20240135066
- Publication date Apr 25, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter Assembly for Ion Implantation System with at least on...
- Publication number 20240047168
- Publication date Feb 8, 2024
- mi2-factory GmbH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETECTING EXCURSION IN PLASMA PROCESSING
- Publication number 20230352284
- Publication date Nov 2, 2023
- FORTH-RITE TECHNOLOGIES, LLC
- Terry R. Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER
- Publication number 20230282439
- Publication date Sep 7, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTATION DEVICE WITH ENERGY FILTER HAVING ADDITIONAL THERMA...
- Publication number 20230197404
- Publication date Jun 22, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20230187190
- Publication date Jun 15, 2023
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM
- Publication number 20230170177
- Publication date Jun 1, 2023
- Friedrich-Alexander-Universitat Erlangen-Nurnberg
- Robert ZIMMERMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230170182
- Publication date Jun 1, 2023
- Hitachi High-Tech Corporation
- Kazufumi YACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIEN FILTER AND MULTIPLE ELECTRON BEAM INSPECTION APPARATUS
- Publication number 20230136198
- Publication date May 4, 2023
- NuFlare Technology, Inc.
- Toshikatsu AKIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION
- Publication number 20230137186
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- G01 - MEASURING TESTING
Information Patent Application
ENERGY BAND-PASS FILTERING FOR IMPROVED HIGH LANDING ENERGY BACKSCA...
- Publication number 20230109695
- Publication date Apr 13, 2023
- ASML NETHERLANDS B.V.
- Xuechen ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANT APPARATUS AND METHOD OF CONTROLLING THE ION IMPLANT APP...
- Publication number 20220270846
- Publication date Aug 25, 2022
- NANYA TECHNOLOGY CORPORATION
- Hsun-Po WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20220223372
- Publication date Jul 14, 2022
- Hitachi High-Tech Corporation
- Naoki AKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR IMPLANTING PARTICLES INTO A SUBSTRATE
- Publication number 20220199362
- Publication date Jun 23, 2022
- mi2-factory GmbH
- Constantin CSATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIEN FILTER AND CHARGED PARTICLE BEAM IMAGING APPARATUS
- Publication number 20220157556
- Publication date May 19, 2022
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang MENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20220108864
- Publication date Apr 7, 2022
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION SELECTION METHOD
- Publication number 20220068588
- Publication date Mar 3, 2022
- Sony Semiconductor Solutions Corporation
- HISAHIRO ANSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20220044919
- Publication date Feb 10, 2022
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20220020556
- Publication date Jan 20, 2022
- mi2-factory GmbH
- Florian KRIPPENDORF
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
GENERATING THREE DIMENSIONAL INFORMATION REGARDING STRUCTURAL ELEME...
- Publication number 20210358712
- Publication date Nov 18, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Konstantin Chirko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS
- Publication number 20210296075
- Publication date Sep 23, 2021
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS

Energy or mass filtering

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Device and method for implanting particles into a substrate

Energy filter element for ion implantation systems for the use in t...

Charged particle beam system

Gas analyzer apparatus

Semiconductor wafer

Apparatus of plural charged-particle beams

Energy filter element for ion implantation systems for the use in t...

Wien filter and charged particle beam imaging apparatus

Method and device for implanting ions in wafers

Charged particle beam system

Gas analyzer apparatus

In-situ plasma cleaning of process chamber components

Ion implant apparatus and method of controlling the ion implant app...

Systems and methods for continuously supplying negative ions using...

Generating three dimensional information regarding structural eleme...

Wien filter and charged particle beam imaging apparatus

Magnetic filter tube

Scanning electron microscope

Energy filter element for ion implantation systems for the use in t...

Charged particle beam system

Multi-beam particle microscope

Method and system for charged particle microscopy with improved ima...

Scanning magnet design with enhanced efficiency

Monochromator and charged particle beam system

Method and device for implanting ions in wafers

Wien filter with integrated vacuum pump

Energy filter and charged particle beam apparatus

In-situ plasma cleaning of process chamber components

Ion source

High-current ion implanter and method for controlling ion beam usin...

Patents Applicationslast 30 patents

METHODS AND SYSTEMS OF ELECTRON DIFFRACTION

LASER-BASED CONTRAST CONTROL IN TRANSMISSION ELECTRON MICROSCOPY

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

GAS ANALYZER APPARATUS

A Method for the Simulation of an Energy-Filtered Ion Implantation...

A Method for the Simulation of an Energy-Filtered Ion Implantation...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

Energy Filter Assembly for Ion Implantation System with at least on...

SYSTEM AND METHOD FOR DETECTING EXCURSION IN PLASMA PROCESSING

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

SEMICONDUCTOR WAFER

ION IMPLANTATION DEVICE WITH ENERGY FILTER HAVING ADDITIONAL THERMA...

GAS ANALYZER APPARATUS

ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM

Charged Particle Beam Apparatus

WIEN FILTER AND MULTIPLE ELECTRON BEAM INSPECTION APPARATUS

SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION

ENERGY BAND-PASS FILTERING FOR IMPROVED HIGH LANDING ENERGY BACKSCA...

ION IMPLANT APPARATUS AND METHOD OF CONTROLLING THE ION IMPLANT APP...

Charged Particle Beam System

DEVICE AND METHOD FOR IMPLANTING PARTICLES INTO A SUBSTRATE

WIEN FILTER AND CHARGED PARTICLE BEAM IMAGING APPARATUS

Charged Particle Beam System

ION IMPLANTER AND ION SELECTION METHOD

GAS ANALYZER APPARATUS

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

GENERATING THREE DIMENSIONAL INFORMATION REGARDING STRUCTURAL ELEME...

METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS