Etching

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CPC
H01J2237/3151

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3151Etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,020,892
- Issue date Jun 25, 2024
- Kioxia Corporation
- Yusuke Goki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid structures of ion beam etching (IBE) systems
- Patent number 11,961,706
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for the surface treatment of substrates
- Patent number 11,901,172
- Issue date Feb 13, 2024
- EV Group E. Thallner GmbH
- Nasser Razek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Angle control for neutral reactive species generated in a plasma
- Patent number 11,881,378
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material recovery systems for optical components
- Patent number 11,715,622
- Issue date Aug 1, 2023
- KLA Corporation
- Gildardo Delgado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled/electrically biased wafer surround
- Patent number 11,664,193
- Issue date May 30, 2023
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling etch angles by substrate rotation in angled etch tools
- Patent number 11,397,289
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Rutger Meyer Timmerman Thijssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining plasma abnormality, method of manufacturing s...
- Patent number 11,295,959
- Issue date Apr 5, 2022
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for real time monitoring semiconductor fabrication process
- Patent number 11,183,391
- Issue date Nov 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lee-Chuan Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for determining, using, and indicating ion be...
- Patent number 11,004,656
- Issue date May 11, 2021
- Gatan, Inc.
- John Andrew Hunt
- G01 - MEASURING TESTING
Information Patent Grant
Planarization, densification, and exfoliation of porous materials b...
- Patent number 10,896,804
- Issue date Jan 19, 2021
- Lawrence Livermore National Security, LLC
- Sergei Kucheyev
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,879,040
- Issue date Dec 29, 2020
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Method and device for the surface treatment of substrates
- Patent number 10,867,783
- Issue date Dec 15, 2020
- EV Group E. Thallner GmbH
- Nasser Razek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing technique
- Patent number 10,847,372
- Issue date Nov 24, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for electron beam etching process
- Patent number 10,790,153
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam sample preparation and coating apparatus and methods
- Patent number 10,731,246
- Issue date Aug 4, 2020
- Gatan, Inc.
- John Andrew Hunt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistor with trench gate insulator having varying thick...
- Patent number 10,679,857
- Issue date Jun 9, 2020
- Infineon Technologies AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for employing an accelerated neutral beam for...
- Patent number 10,627,352
- Issue date Apr 21, 2020
- Exogenesis Corporation
- Sean R. Kirkpatrick
- G01 - MEASURING TESTING
Information Patent Grant
Enhanced FIB-SEM systems for large-volume 3D imaging
- Patent number 10,600,615
- Issue date Mar 24, 2020
- Howard Hughes Medical Institute
- C. Shan Xu
- G01 - MEASURING TESTING
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,573,499
- Issue date Feb 25, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,529,546
- Issue date Jan 7, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of ion beam etching to generate gate-all-around structure
- Patent number 10,483,085
- Issue date Nov 19, 2019
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,483,095
- Issue date Nov 19, 2019
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,438,780
- Issue date Oct 8, 2019
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder unit and sample observation apparatus
- Patent number 10,381,191
- Issue date Aug 13, 2019
- Jeol Ltd.
- Shogo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and ion milling method
- Patent number 10,332,722
- Issue date Jun 25, 2019
- Hitachi High-Technologies Corporation
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 10,290,470
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,224,179
- Issue date Mar 5, 2019
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Grid Structures Of Ion Beam Etching (IBE) Systems
- Publication number 20240222071
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS
- Publication number 20240203708
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Kazuhiro UEDA
- B08 - CLEANING
Information Patent Application
ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA
- Publication number 20230369013
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMS PLATFORM FOR THIN FILM NANOMECHANICS CHARACTERIZATION
- Publication number 20230187167
- Publication date Jun 15, 2023
- Carnegie Mellon University
- Maarten de Boer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ETCHING APPARATUS
- Publication number 20230162996
- Publication date May 25, 2023
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRID STRUCTURES OF ION BEAM ETCHING (IBE) SYSTEMS
- Publication number 20220351939
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
Temperature Controlled/Electrically Biased Wafer Surround
- Publication number 20220246397
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220115215
- Publication date Apr 14, 2022
- KELK LTD.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES
- Publication number 20210125821
- Publication date Apr 29, 2021
- EV GROUP E. THALLNER GMBH
- Nasser RAZEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REAL TIME MONITORING SEMICONDUCTOR FABRICATION PROCESS
- Publication number 20210125835
- Publication date Apr 29, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lee-Chuan TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20210082656
- Publication date Mar 18, 2021
- KIOXIA Corporation
- Yusuke GOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200279753
- Publication date Sep 3, 2020
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING PLASMA ABNORMALITY, METHOD OF MANUFACTURING S...
- Publication number 20200176261
- Publication date Jun 4, 2020
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20190393053
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING A SURFACE BY MEANS OF A PARTICLE BEAM
- Publication number 20190244784
- Publication date Aug 8, 2019
- SCIA SYSTEMS GMBH
- Thoralf Dunger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20190108973
- Publication date Apr 11, 2019
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
PLANARIZATION, DENSIFICATION, AND EXFOLIATION OF POROUS MATERIALS B...
- Publication number 20190035602
- Publication date Jan 31, 2019
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Sergei KUCHEYEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the Fabrication of a Reduced Reflectance Metal Mesh
- Publication number 20180215660
- Publication date Aug 2, 2018
- 2M Technology, LLC
- Zhihong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES
- Publication number 20180204717
- Publication date Jul 19, 2018
- EV GROUP E. THALLNER GMBH
- Nasser RAZEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Electron Temperature Etch Chamber with Independent Control Over...
- Publication number 20180053631
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES
- Publication number 20170069483
- Publication date Mar 9, 2017
- EV GROUP E. THALLNER GMBH
- Nasser RAZEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSIT...
- Publication number 20170044661
- Publication date Feb 16, 2017
- UChicago Argonne, LLC
- Raymond P. Conley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REDUCING THE THICKNESS OF A TARGET SAMPLE
- Publication number 20160093468
- Publication date Mar 31, 2016
- OXFORD INSTRUMENTS NANOTCHNOLOGY TOOLS LIMITED
- Christian LANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Precursor for Planar Deprocessing of Semiconductor Devices using a...
- Publication number 20140357088
- Publication date Dec 4, 2014
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM IRRADIATION APPARATUS
- Publication number 20140353151
- Publication date Dec 4, 2014
- Hitachi High-Technologies Corporation
- Asako Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR A NON-CONTACT EDGE POLISHING MODULE USING...
- Publication number 20140308813
- Publication date Oct 16, 2014
- Applied Materials, Inc.
- Samuel Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLID SURFACE SMOOTHING METHOD
- Publication number 20140299465
- Publication date Oct 9, 2014
- Akinobu SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR EMPLOYING AN ACCELERATED NEUTRAL BEAM FOR...
- Publication number 20130213933
- Publication date Aug 22, 2013
- Exogenesis Corporation
- Sean R. Kirkpatrick
- G01 - MEASURING TESTING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion beam processing apparatus, electrode assembly, and method of cl...

Etching apparatus and etching method

Grid structures of ion beam etching (IBE) systems

Method and device for the surface treatment of substrates

Angle control for neutral reactive species generated in a plasma

Material recovery systems for optical components

Temperature controlled/electrically biased wafer surround

Controlling etch angles by substrate rotation in angled etch tools

Ion beam processing apparatus, electrode assembly, and method of cl...

Method of determining plasma abnormality, method of manufacturing s...

Method for real time monitoring semiconductor fabrication process

Methods and apparatus for determining, using, and indicating ion be...

Planarization, densification, and exfoliation of porous materials b...

Ion beam processing apparatus, electrode assembly, and method of cl...

Method and device for the surface treatment of substrates

Workpiece processing technique

Methods and apparatus for electron beam etching process

Ion beam sample preparation and coating apparatus and methods

Vertical transistor with trench gate insulator having varying thick...

Methods and apparatus for employing an accelerated neutral beam for...

Enhanced FIB-SEM systems for large-volume 3D imaging

Method of extracting and accelerating ions

Method of extracting and accelerating ions

Use of ion beam etching to generate gate-all-around structure

Method of extracting and accelerating ions

Method of extracting and accelerating ions

Sample holder unit and sample observation apparatus

Ion milling device and ion milling method

Negative ribbon ion beams from pulsed plasmas

Ion beam processing apparatus, electrode assembly, and method of cl...

Patents Applicationslast 30 patents

Grid Structures Of Ion Beam Etching (IBE) Systems

CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS

ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA

MEMS PLATFORM FOR THIN FILM NANOMECHANICS CHARACTERIZATION

ETCHING APPARATUS

GRID STRUCTURES OF ION BEAM ETCHING (IBE) SYSTEMS

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

Temperature Controlled/Electrically Biased Wafer Surround

SUBSTRATE PROCESSING APPARATUS

METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES

METHOD FOR REAL TIME MONITORING SEMICONDUCTOR FABRICATION PROCESS

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

ETCHING APPARATUS AND ETCHING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF DETERMINING PLASMA ABNORMALITY, METHOD OF MANUFACTURING S...

ETCHING APPARATUS

METHOD OF PROCESSING A SURFACE BY MEANS OF A PARTICLE BEAM

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

PLANARIZATION, DENSIFICATION, AND EXFOLIATION OF POROUS MATERIALS B...

Method for the Fabrication of a Reduced Reflectance Metal Mesh

METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES

Low Electron Temperature Etch Chamber with Independent Control Over...

METHOD AND DEVICE FOR THE SURFACE TREATMENT OF SUBSTRATES

DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSIT...

METHOD OF REDUCING THE THICKNESS OF A TARGET SAMPLE

Precursor for Planar Deprocessing of Semiconductor Devices using a...

CHARGED PARTICLE BEAM IRRADIATION APPARATUS

METHODS AND APPARATUS FOR A NON-CONTACT EDGE POLISHING MODULE USING...

SOLID SURFACE SMOOTHING METHOD

METHODS AND APPARATUS FOR EMPLOYING AN ACCELERATED NEUTRAL BEAM FOR...