Evacuating means

Industry

CPC
H01J2237/1825

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1825Evacuating means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High density carbon films for patterning applications
- Patent number 11,842,897
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for evacuating a chamber
- Patent number 11,830,701
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Fangfu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,710,623
- Issue date Jul 25, 2023
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter toxic gas delivery system
- Patent number 11,527,380
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced electron beam generation
- Patent number 11,517,975
- Issue date Dec 6, 2022
- Arcam AB
- Mattias Fager
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma processing apparatus
- Patent number 11,387,083
- Issue date Jul 12, 2022
- Shibaura Mechatronics Corporation
- Hidehito Azumano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,380,515
- Issue date Jul 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hosobuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma polymerization apparatus and plasma polymerization method us...
- Patent number 11,133,159
- Issue date Sep 28, 2021
- Ming Chi University of Technology
- Jang-Hsing Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum cooling apparatus and ion milling apparatus
- Patent number 11,043,355
- Issue date Jun 22, 2021
- Jeol Ltd.
- Tsutomu Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,031,215
- Issue date Jun 8, 2021
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for evacuating a chamber
- Patent number 10,943,761
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Fangfu Li
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 10,886,110
- Issue date Jan 5, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pump assembly for creating vacuum in wafer processing chamber
- Patent number 10,879,054
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shian-Hung Su
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,872,779
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Nobuya Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus and charged particle beam writing apparatus
- Patent number 10,867,769
- Issue date Dec 15, 2020
- NuFlare Technology, Inc.
- Keita Ideno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus and method for operating a particle beam ap...
- Patent number 10,814,361
- Issue date Oct 27, 2020
- VISTEC ELECTRON BEAM GMBH
- Christian Borschel
- B08 - CLEANING
Information Patent Grant
Vacuum apparatus
- Patent number 10,804,084
- Issue date Oct 13, 2020
- HITACHI HIGH-TECH CORPORATION
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Nozzle-type electron beam irradiation device, and electron beam ste...
- Patent number 10,568,980
- Issue date Feb 25, 2020
- Hitachi Zosen Corporation
- Takeshi Noda
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ion milling device and processing method using the ion milling device
- Patent number 10,515,777
- Issue date Dec 24, 2019
- Hitachi High-Technologies Corporation
- Atsushi Kamino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN
- Publication number 20240412940
- Publication date Dec 12, 2024
- AIRSEM TECHNOLOGIES LTD.
- Jenny SHKLOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR
- Publication number 20240266168
- Publication date Aug 8, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...
- Publication number 20240212971
- Publication date Jun 27, 2024
- National Institute for Materials Science
- Han ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240203694
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Takuji SAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240175125
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Sung Duk SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Treatment Apparatus and Vacuum Treatment Method
- Publication number 20230402248
- Publication date Dec 14, 2023
- Hitachi High-Tech Corporation
- Akito TANOKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF H...
- Publication number 20230323529
- Publication date Oct 12, 2023
- RHEINISCH-WESTFÄLISCHE TECHNISCHE HOCHSCHULE (RWTH) AACHEN KÖRPERSCHAFT DES Ö...
- Montgomery JARITZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20230317437
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARRIER FOR END EFFECTOR, TRANSPORTATION APPARATUS INCLUDING THE SA...
- Publication number 20230317434
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Jae Won SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20230307205
- Publication date Sep 28, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20230298884
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20230260738
- Publication date Aug 17, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERMITTENT STAGNANT FLOW
- Publication number 20230230820
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Douglas L. KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR ELECTRON CRYOMICROSCOPY
- Publication number 20230135352
- Publication date May 4, 2023
- United Kingdom Research and Innovation
- Greg MCMULLAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...
- Publication number 20230018842
- Publication date Jan 19, 2023
- Nordson Corporation
- Zhao JIANGANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD, AND GAS CLUSTER GENERAT...
- Publication number 20220384152
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECOMPRESSION PROCESSING METHOD FOR SUBSTRATE PROCESSING APPARATUS...
- Publication number 20220351943
- Publication date Nov 3, 2022
- TOKYO ELECTRON LIMITED
- Wataru SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION
- Publication number 20220328292
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20220285122
- Publication date Sep 8, 2022
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION IMPLANTER TOXIC GAS DELIVERY SYSTEM
- Publication number 20210313144
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA POLYMERIZATION APPARATUS AND PLASMA POLYMERIZATION METHOD US...
- Publication number 20210305026
- Publication date Sep 30, 2021
- Ming Chi University of Technology
- Jang-Hsing HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20210257195
- Publication date Aug 19, 2021
- LAM RESEARCH CORPORATION
- John Stephen DREWERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR EVACUATING A CHAMBER
- Publication number 20210217579
- Publication date Jul 15, 2021
- ASML Netherlands B.V.
- Fangfu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...
- Publication number 20210082673
- Publication date Mar 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged Particle Beam Device
- Publication number 20210066025
- Publication date Mar 4, 2021
- HITACHI HIGH-TECH CORPORATION
- Keiichiro HOSOBUCHI
- H01 - BASIC ELECTRIC ELEMENTS

Evacuating means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Refillable ion chamber with automated purging system

Vacuum pump protection against deposition byproduct buildup

Plasma processing apparatus and prediction method of the condition...

Vacuum chamber arrangement for charged particle beam generator

High density carbon films for patterning applications

System for evacuating a chamber

Processing apparatus and processing method, and gas cluster generat...

Vacuum pump protection against deposition byproduct buildup

Vacuum chamber arrangement for charged particle beam generator

Refillable ion chamber with automated purging system

Plasma processing apparatus

Ion implanter toxic gas delivery system

Enhanced electron beam generation

Plasma processing apparatus

Charged particle beam device

Aberration correction in charged particle system

Plasma polymerization apparatus and plasma polymerization method us...

Vacuum chamber arrangement for charged particle beam generator

Vacuum cooling apparatus and ion milling apparatus

Vacuum pump protection against deposition byproduct buildup

System for evacuating a chamber

Plasma processing apparatus and prediction method of the condition...

Pump assembly for creating vacuum in wafer processing chamber

Plasma etching method and plasma etching apparatus

Vacuum apparatus and charged particle beam writing apparatus

Particle beam apparatus and method for operating a particle beam ap...

Vacuum apparatus

Vacuum chamber arrangement for charged particle beam generator

Nozzle-type electron beam irradiation device, and electron beam ste...

Ion milling device and processing method using the ion milling device

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN

PLASMA PROCESSING METHOD AND APPARATUS

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR

ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Vacuum Treatment Apparatus and Vacuum Treatment Method

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF H...

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

CARRIER FOR END EFFECTOR, TRANSPORTATION APPARATUS INCLUDING THE SA...

FOCUSED ION BEAM SYSTEM

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

INTERMITTENT STAGNANT FLOW

SYSTEM AND METHOD FOR ELECTRON CRYOMICROSCOPY

WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...

PROCESSING APPARATUS AND PROCESSING METHOD, AND GAS CLUSTER GENERAT...

DECOMPRESSION PROCESSING METHOD FOR SUBSTRATE PROCESSING APPARATUS...

REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ION IMPLANTER TOXIC GAS DELIVERY SYSTEM

PLASMA POLYMERIZATION APPARATUS AND PLASMA POLYMERIZATION METHOD US...

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

SYSTEM FOR EVACUATING A CHAMBER

PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...

Charged Particle Beam Device