Exhausting

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CPC
H01J37/32834

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32834Exhausting

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film forming apparatus
- Patent number 12,365,976
- Issue date Jul 22, 2025
- Shibaura Mechatronics Corporation
- Shigeki Matsunaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,354,855
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,341,001
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Wakako Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support gap pumping to prevent glow discharge and light-up
- Patent number 12,334,383
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- James David Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma preclean system for cluster tool
- Patent number 12,334,318
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Songjae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust device, processing apparatus, and exhausting method
- Patent number 12,322,578
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,308,219
- Issue date May 20, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, purge gas control method, and vacuu...
- Patent number 12,285,786
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Norihiko Amikura
- B08 - CLEANING
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,224,158
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yoshinori Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and plasma processing method
- Patent number 12,217,941
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus
- Patent number 12,211,674
- Issue date Jan 28, 2025
- HITACHI HIGH-TECH CORPORATION
- Shunsuke Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate and method for treating a substrate
- Patent number 12,211,675
- Issue date Jan 28, 2025
- Semes Co., Ltd.
- Ji Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pressure-induced temperature modification during atomic scale proce...
- Patent number 12,205,803
- Issue date Jan 21, 2025
- Kurt J. Lesker Company
- Gilbert Bruce Rayner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and gas switching method for substra...
- Patent number 12,191,119
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and film forming appar...
- Patent number 12,191,193
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250232961
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Kazuya TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20250226189
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226259
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD
- Publication number 20250218732
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Seong Gil LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PROCESSING A SUBSTRATE AND METHOD OF PROCESSING A SUBS...
- Publication number 20250218749
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Ki Hoon CHOI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20250207249
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250201533
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250201551
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CROSS FLOW GAS DELIVERY FOR PARTICLE REDUCTION
- Publication number 20250191897
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Dhritiman Subha Kashyap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250188604
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Kazuki GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250174443
- Publication date May 29, 2025
- Samsung Electronics Co., Ltd.
- Seungbin Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250154645
- Publication date May 15, 2025
- Tokyo Electron Limited
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149291
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149292
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149313
- Publication date May 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Shunsuke TASHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
- Publication number 20250140536
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Changheon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250125128
- Publication date Apr 17, 2025
- NGK Insulators, Ltd.
- Shingo AMANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER DEPOSITION CONFINEMENT
- Publication number 20250125129
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250104979
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE PUMPING LINER
- Publication number 20250087471
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20250087466
- Publication date Mar 13, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS
- Publication number 20250079126
- Publication date Mar 6, 2025
- SHIBAURA MACHINE CO., LTD.
- Rintaro SUEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD
- Publication number 20250069867
- Publication date Feb 27, 2025
- Hitachi High-Tech Corporation
- Tzu Wei TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PORT CROSS FLOW SYSTEM
- Publication number 20250037980
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Rupankar Choudhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY
- Publication number 20250022697
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...
- Publication number 20250014892
- Publication date Jan 9, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film forming apparatus

Ion beam etching chamber with etching by-product redistributor

Process kits and related methods for processing chambers to facilit...

Ultrathin atomic layer deposition film accuracy thickness control

Substrate processing apparatus, substrate processing method, method...

Method and apparatus for treating substrate

Cleaning method and plasma processing apparatus

Substrate support gap pumping to prevent glow discharge and light-up

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Plasma preclean system for cluster tool

Exhaust device, processing apparatus, and exhausting method

Substrate treating method and substrate treating apparatus

Apparatus for preventing contamination of self-plasma chamber

Throughput improvement with interval conditioning purging

Methods for depositing gap filling fluids and related systems and d...

Substrate processing apparatus, purge gas control method, and vacuu...

Film deposition apparatus for fine pattern forming

Multiple process semiconductor processing system

Substrate processing apparatus, method of manufacturing semiconduct...

Etching method and etching apparatus

Plasma processing apparatus

Plasma processing apparatus, and plasma processing method

Plasma processing apparatus

Stage, film-forming apparatus, and film-processing apparatus

Apparatus for treating substrate and method for treating a substrate

Processing chamber deposition confinement

Pressure-induced temperature modification during atomic scale proce...

Substrate processing apparatus and gas switching method for substra...

Method of manufacturing semiconductor device and film forming appar...

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE TREATMENT SYSTEM

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND METHOD

APPARATUS OF PROCESSING A SUBSTRATE AND METHOD OF PROCESSING A SUBS...

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

CROSS FLOW GAS DELIVERY FOR PARTICLE REDUCTION

BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

CERAMIC SUSCEPTOR

PROCESSING CHAMBER DEPOSITION CONFINEMENT

SUBSTRATE PROCESSING SYSTEM

MULTI-STAGE PUMPING LINER

PROCESSING APPARATUS AND PROCESSING METHOD

SURFACE TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD

MULTI-PORT CROSS FLOW SYSTEM

PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...