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CPC
H01J37/32834

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32834Exhausting

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device and film forming appar...
- Patent number 12,191,193
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and gas switching method for substra...
- Patent number 12,191,119
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device
- Patent number 12,173,400
- Issue date Dec 24, 2024
- ASM IP Holding B.V.
- JaeMin Roh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,163,220
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yu Komai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process stop loss reduction system through rapid replacement of app...
- Patent number 12,139,789
- Issue date Nov 12, 2024
- MILAEBO CO., LTD.
- Yeon Ju Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Operating method of etching device
- Patent number 12,131,892
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Feng-Ju Tsai
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,131,964
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber and exhaust liner system therefor
- Patent number 12,110,585
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Naman Apurva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,112,921
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Hiroyuki Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Turbomolecular pump and cathode assembly for etching reactor
- Patent number 12,106,946
- Issue date Oct 1, 2024
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for stabilizing reaction chamber pressure
- Patent number 12,098,460
- Issue date Sep 24, 2024
- ASM IP Holding B.V.
- Eiichiro Shiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing devices having multi-port valve assemblies
- Patent number 12,100,575
- Issue date Sep 24, 2024
- Lam Research Corporation
- Daniel A. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetrical sealing and gas flow control device
- Patent number 12,094,730
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- June Hee Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for disinfection of healthcare personal protectiv...
- Patent number 12,090,240
- Issue date Sep 17, 2024
- MagPlasma, Inc.
- Martin E. Toomajian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidative conversion in atomic layer deposition processes
- Patent number 12,087,574
- Issue date Sep 10, 2024
- Lam Research Corporation
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber
- Patent number 12,080,524
- Issue date Sep 3, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Yan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,071,687
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition apparatus
- Patent number 12,065,735
- Issue date Aug 20, 2024
- Samsung Display Co., Ltd.
- Choel-Min Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-stage pumping liner
- Patent number 12,068,144
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of simultaneous silicidation on source and drain of NMOS and...
- Patent number 12,062,579
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Xuebin Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Baffle unit and substrate processing apparatus
- Patent number 12,062,527
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Jun Young Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actively cooled foreline trap to reduce throttle valve drift
- Patent number 12,060,637
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Gaosheng Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber body design architecture for next generation advanced plasm...
- Patent number 12,049,961
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of driving relay member
- Patent number 12,027,346
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...
- Publication number 20250014892
- Publication date Jan 9, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES
- Publication number 20250006466
- Publication date Jan 2, 2025
- Advanced Energy Industries, Inc.
- Scott Polak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYSIS DEVICE AND CONTROL METHOD
- Publication number 20250006476
- Publication date Jan 2, 2025
- ATONARP INC.
- Hirofumi NAGAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT APPARATUS
- Publication number 20250006472
- Publication date Jan 2, 2025
- Ushio Denki Kabushiki Kaisha
- Takashi SAWADA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240429033
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404801
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CANTILEVER WITH ETCH CHAMBER FLOW DESIGN
- Publication number 20240387147
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND...
- Publication number 20240387290
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Xuebin LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR
- Publication number 20240355596
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGENERATOR FOR FORELINE HEATING
- Publication number 20240337449
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Santosh S. Nesarkar
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
APPARATUS FOR PLASMA SURFACE TREATMENT
- Publication number 20240331983
- Publication date Oct 3, 2024
- PLASMAPP CO., LTD.
- You Bong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240321563
- Publication date Sep 26, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Shigeki MATSUNAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARA...
- Publication number 20240304427
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Sang Ki NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20240297050
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297021
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Yoshinori YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20240266150
- Publication date Aug 8, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yan LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR
- Publication number 20240266168
- Publication date Aug 8, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN...
- Publication number 20240258123
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-chun YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHARED EXHAUST UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SH...
- Publication number 20240258085
- Publication date Aug 1, 2024
- ASM IP HOLDING B.V.
- Koei Aida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20240258086
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
- Publication number 20240249923
- Publication date Jul 25, 2024
- Kokusai Electric Corporation
- Akihiro SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222096
- Publication date Jul 4, 2024
- Hitachi High-Tech Corporation
- Shunsuke TASHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...
- Publication number 20240212987
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20240203707
- Publication date Jun 20, 2024
- KIOXIA Corporation
- Seiwa NISHIO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Light Source with Direct Gas Injection
- Publication number 20240194454
- Publication date Jun 13, 2024
- Hamamatsu Photonics K. K.
- Donald K. Smith
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device and film forming appar...

Substrate processing apparatus and gas switching method for substra...

Plasma processing apparatus and plasma processing method

Substrate processing device

Deposition method and deposition apparatus

Plasma processing apparatus and plasma processing method

Process stop loss reduction system through rapid replacement of app...

Operating method of etching device

Plasma processing apparatus and plasma processing method

Process chamber and exhaust liner system therefor

Plasma processing method and plasma processing apparatus

Substrate processing apparatus and method

Turbomolecular pump and cathode assembly for etching reactor

High conductance inner shield for process chamber

Systems and methods for stabilizing reaction chamber pressure

Plasma processing devices having multi-port valve assemblies

Asymmetrical sealing and gas flow control device

Method and device for disinfection of healthcare personal protectiv...

Method and system for cleaning a process chamber

Vacuum pump protection against deposition byproduct buildup

Oxidative conversion in atomic layer deposition processes

Semiconductor processing chamber

Plasma processing method and plasma processing apparatus

Vapor deposition apparatus

Multi-stage pumping liner

Method of simultaneous silicidation on source and drain of NMOS and...

Baffle unit and substrate processing apparatus

Actively cooled foreline trap to reduce throttle valve drift

Chamber body design architecture for next generation advanced plasm...

Substrate processing apparatus and method of driving relay member

Patents Applicationslast 30 patents

LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...

GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES

GAS ANALYSIS DEVICE AND CONTROL METHOD

TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA TREATMENT APPARATUS

PLASMA TREATMENT APPARATUS

CANTILEVER WITH ETCH CHAMBER FLOW DESIGN

METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND...

TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR

REGENERATOR FOR FORELINE HEATING

APPARATUS FOR PLASMA SURFACE TREATMENT

FILM FORMING APPARATUS

INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARA...

METHOD FOR ETCHING AN ETCH LAYER

PLASMA PROCESSING APPARATUS

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

SEMICONDUCTOR PROCESSING CHAMBER

METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR

GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN...

SHARED EXHAUST UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SH...

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

PLASMA PROCESSING APPARATUS

GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...

PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCT...

Inductively Coupled Plasma Light Source with Direct Gas Injection