TREA

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  • CPC
  • H01J37/32834
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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32834Exhausting
Industries

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    CROSS FLOW GAS DELIVERY FOR PARTICLE REDUCTION
    • Publication number 20250191897
    • Publication date Jun 12, 2025
    • Applied Materials, Inc.
    • Dhritiman Subha Kashyap
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS
    • Publication number 20250188604
    • Publication date Jun 12, 2025
    • TOKYO ELECTRON LIMITED
    • Kazuki GOTO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS
    • Publication number 20250174443
    • Publication date May 29, 2025
    • Samsung Electronics Co., Ltd.
    • Seungbin Ahn
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
    • Publication number 20250166976
    • Publication date May 22, 2025
    • TOKYO ELECTRON LIMITED
    • Yuta NAKANE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILM FORMING METHOD AND FILM FORMING APPARATUS
    • Publication number 20250154645
    • Publication date May 15, 2025
    • Tokyo Electron Limited
    • Tadashi MITSUNARI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20250149291
    • Publication date May 8, 2025
    • TOKYO ELECTRON LIMITED
    • Hiroyuki MATSUURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20250149292
    • Publication date May 8, 2025
    • TOKYO ELECTRON LIMITED
    • Hiroyuki Matsuura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20250149313
    • Publication date May 8, 2025
    • HITACHI HIGH-TECH CORPORATION
    • Shunsuke TASHIRO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
    • Publication number 20250140536
    • Publication date May 1, 2025
    • Samsung Electronics Co., Ltd.
    • Changheon LEE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CERAMIC SUSCEPTOR
    • Publication number 20250125128
    • Publication date Apr 17, 2025
    • NGK Insulators, Ltd.
    • Shingo AMANO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PROCESSING CHAMBER DEPOSITION CONFINEMENT
    • Publication number 20250125129
    • Publication date Apr 17, 2025
    • Applied Materials, Inc.
    • Sarah Michelle Bobek
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING SYSTEM
    • Publication number 20250104979
    • Publication date Mar 27, 2025
    • TOKYO ELECTRON LIMITED
    • Toshiki AKAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MULTI-STAGE PUMPING LINER
    • Publication number 20250087471
    • Publication date Mar 13, 2025
    • Applied Materials, Inc.
    • Mingle Tong
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PROCESSING APPARATUS AND PROCESSING METHOD
    • Publication number 20250087466
    • Publication date Mar 13, 2025
    • United Semiconductor (Xiamen) Co., Ltd.
    • Ching-Shu Lo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SURFACE TREATMENT APPARATUS
    • Publication number 20250079126
    • Publication date Mar 6, 2025
    • SHIBAURA MACHINE CO., LTD.
    • Rintaro SUEKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD
    • Publication number 20250069867
    • Publication date Feb 27, 2025
    • Hitachi High-Tech Corporation
    • Tzu Wei TSENG
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MULTI-PORT CROSS FLOW SYSTEM
    • Publication number 20250037980
    • Publication date Jan 30, 2025
    • Applied Materials, Inc.
    • Rupankar Choudhury
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY
    • Publication number 20250022697
    • Publication date Jan 16, 2025
    • Applied Materials, Inc.
    • Costel BILOIU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
    • Publication number 20250022694
    • Publication date Jan 16, 2025
    • Applied Materials, Inc.
    • Pranav Vijay Gadre
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...
    • Publication number 20250014892
    • Publication date Jan 9, 2025
    • Beijing E-Town Semiconductor Technology Co., Ltd.
    • Jianmin JI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES
    • Publication number 20250006466
    • Publication date Jan 2, 2025
    • Advanced Energy Industries, Inc.
    • Scott Polak
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    GAS ANALYSIS DEVICE AND CONTROL METHOD
    • Publication number 20250006476
    • Publication date Jan 2, 2025
    • ATONARP INC.
    • Hirofumi NAGAO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    TREATMENT APPARATUS
    • Publication number 20250006472
    • Publication date Jan 2, 2025
    • Ushio Denki Kabushiki Kaisha
    • Takashi SAWADA
    • B08 - CLEANING
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20240429033
    • Publication date Dec 26, 2024
    • TOKYO ELECTRON LIMITED
    • Chishio Koshimizu
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
    • Publication number 20240412951
    • Publication date Dec 12, 2024
    • SEMES CO., LTD.
    • DONG-HUN KIM
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND APPARATUS
    • Publication number 20240404794
    • Publication date Dec 5, 2024
    • TOKYO ELECTRON LIMITED
    • Derek William Bassett
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA TREATMENT APPARATUS
    • Publication number 20240404801
    • Publication date Dec 5, 2024
    • Plasma Ion Assist Co., Ltd.
    • Masanori WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA TREATMENT APPARATUS
    • Publication number 20240404800
    • Publication date Dec 5, 2024
    • Plasma Ion Assist Co., Ltd.
    • Masanori WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CANTILEVER WITH ETCH CHAMBER FLOW DESIGN
    • Publication number 20240387147
    • Publication date Nov 21, 2024
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chien-Liang Chen
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND...
    • Publication number 20240387290
    • Publication date Nov 21, 2024
    • Applied Materials, Inc.
    • Xuebin LI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...