Extinguishing, preventing or controlling unwanted discharges

Industry

CPC
H01J2237/0206

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0206Extinguishing, preventing or controlling unwanted discharges

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, and apparatus for treating substrate with the same
- Patent number 12,062,525
- Issue date Aug 13, 2024
- PSK, Inc.
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus suitable for a particle beam apparatus
- Patent number 11,908,656
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Han Willem Hendrik Severt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and charge neutralization method for...
- Patent number 11,862,439
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Takahiro Kawawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing equipment
- Patent number 11,804,367
- Issue date Oct 31, 2023
- Samsung Electronics Co., Ltd.
- Seok Hwan Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for photomask processing
- Patent number 11,803,118
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 11,532,418
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator and information processing method
- Patent number 11,412,606
- Issue date Aug 9, 2022
- FUJI CORPORATION
- Shinji Takikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam generator and charged particle beam apparatus
- Patent number 11,139,139
- Issue date Oct 5, 2021
- Hitaclii High-Tech Corporation
- Hiroshi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive manufacturing of three-dimensional articles
- Patent number 10,987,752
- Issue date Apr 27, 2021
- Arcam AB
- Christian Ekberg
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma diagnostic system and method
- Patent number 10,964,515
- Issue date Mar 30, 2021
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenated isotopically enriched boront trifluoride dopant source...
- Patent number 10,920,087
- Issue date Feb 16, 2021
- Entegris, Inc.
- Steven Bishop
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 10,886,053
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for proactive mitigation of coronal discharge and flash-over...
- Patent number 10,842,007
- Issue date Nov 17, 2020
- VISURAY INTECH LTD (BVI)
- Philip Teague
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method to monitor glitch energy
- Patent number 10,770,261
- Issue date Sep 8, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Low conductance self-shielding insulator for ion implantation systems
- Patent number 10,679,818
- Issue date Jun 9, 2020
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering system and method including an arc detection
- Patent number 10,607,821
- Issue date Mar 31, 2020
- MKS Insturments, Inc.
- Jesse N. Klein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of arc detection using dynamic threshold
- Patent number 10,515,780
- Issue date Dec 24, 2019
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 10,304,607
- Issue date May 28, 2019
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam-induced etching
- Patent number 10,304,658
- Issue date May 28, 2019
- FEI Company
- Aiden Martin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treating arcs in a plasma process
- Patent number 10,297,431
- Issue date May 21, 2019
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and method f...
- Patent number 10,181,406
- Issue date Jan 15, 2019
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,147,584
- Issue date Dec 4, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 10,079,133
- Issue date Sep 18, 2018
- Ulvac, Inc.
- Takahide Murayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low conductance self-shielding insulator for ion implantation systems
- Patent number 10,074,508
- Issue date Sep 11, 2018
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 10,056,235
- Issue date Aug 21, 2018
- Renesas Electronics Corporation
- Kotaro Horikoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and method of controlling ion implantati...
- Patent number 9,837,248
- Issue date Dec 5, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Masahide Ooura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal split faraday shield for a plasma source
- Patent number 9,818,584
- Issue date Nov 14, 2017
- FEI Company
- Thomas G. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 9,761,365
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SPRAY-COATED ELECTROSTATIC CHUCK DESIGN
- Publication number 20240258076
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Tuck Foong KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PHOTOMASK PROCESSING
- Publication number 20240027894
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Banqiu WU
- B08 - CLEANING
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOL FOR PREVENTING OR SUPPRESSING ARCING
- Publication number 20230416922
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Yukinori SAKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT UNIT, AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME
- Publication number 20230145538
- Publication date May 11, 2023
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MAN...
- Publication number 20230125679
- Publication date Apr 27, 2023
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT, HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...
- Publication number 20230029721
- Publication date Feb 2, 2023
- SEMES CO., LTD.
- Chung Woo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DETECTING ARCING IN POWER DELIVERY SYSTEMS FOR PROCESS...
- Publication number 20220406581
- Publication date Dec 22, 2022
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABNORMALITY DETERMINATION SYSTEM AND ABNORMALITY DETERMINATION METH...
- Publication number 20220336196
- Publication date Oct 20, 2022
- Panasonic Intellectual Property Management Co., Ltd.
- Masaru NONOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PHOTOMASK PROCESSING
- Publication number 20220326607
- Publication date Oct 13, 2022
- Banqiu WU
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND MONITORING DEVICE
- Publication number 20220254617
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Ken HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING EQUIPMENT
- Publication number 20220068613
- Publication date Mar 3, 2022
- Samsung Electronics Co., Ltd.
- Seok Hwan BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS
- Publication number 20220028648
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Han Willem Hendrik SEVERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20210225619
- Publication date Jul 22, 2021
- HOKURIKU SEIKEI INDUSTRIAL CO., LTD.
- Tomohisa SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20210090777
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATOR AND INFORMATION PROCESSING METHOD
- Publication number 20210051791
- Publication date Feb 18, 2021
- FUJI CORPORATION
- Shinji TAKIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CHARGE NEUTRALIZATION METHOD FOR...
- Publication number 20200312636
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Takahiro KAWAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND MEASURING DEVICE
- Publication number 20200211816
- Publication date Jul 2, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL VAPOR DEPOSITION TOOL FOR PREVENTING OR SUPPRESSING ARCING
- Publication number 20200048770
- Publication date Feb 13, 2020
- LAM RESEARCH CORPORATION
- Yukinori SAKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20190198217
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20190189328
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System And Method To Monitor Glitch Energy
- Publication number 20190189390
- Publication date Jun 20, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190074166
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20190051493
- Publication date Feb 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS
- Publication number 20180350553
- Publication date Dec 6, 2018
- Axcells Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20180269033
- Publication date Sep 20, 2018
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS
- Publication number 20180138006
- Publication date May 17, 2018
- Axcelis Technologies, Inc.
- John Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS
- Publication number 20180044780
- Publication date Feb 15, 2018
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20170372876
- Publication date Dec 28, 2017
- RENESAS ELECTRONICS CORPORATION
- Kotaro HORIKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating Arcs in a Plasma Process
- Publication number 20170330737
- Publication date Nov 16, 2017
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- G01 - MEASURING TESTING

Extinguishing, preventing or controlling unwanted discharges

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and monitoring device

Support unit, and apparatus for treating substrate with the same

Stage apparatus suitable for a particle beam apparatus

Substrate processing apparatus and charge neutralization method for...

Plasma processing equipment

Methods and apparatus for photomask processing

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Plasma generator and information processing method

Plasma probe device and plasma processing apparatus

Charged particle beam generator and charged particle beam apparatus

Additive manufacturing of three-dimensional articles

Plasma diagnostic system and method

Hydrogenated isotopically enriched boront trifluoride dopant source...

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Method for proactive mitigation of coronal discharge and flash-over...

System and method to monitor glitch energy

Low conductance self-shielding insulator for ion implantation systems

Sputtering system and method including an arc detection

System and method of arc detection using dynamic threshold

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Electron beam-induced etching

Treating arcs in a plasma process

Plasma processing apparatus, plasma processing method, and method f...

Apparatus and techniques for decelerated ion beam with no energy co...

Plasma processing device

Low conductance self-shielding insulator for ion implantation systems

Manufacturing method of semiconductor device

Ion implantation apparatus and method of controlling ion implantati...

Internal split faraday shield for a plasma source

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Patents Applicationslast 30 patents

SPRAY-COATED ELECTROSTATIC CHUCK DESIGN

METHODS AND APPARATUS FOR PHOTOMASK PROCESSING

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

TOOL FOR PREVENTING OR SUPPRESSING ARCING

SUPPORT UNIT, AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MAN...

SUPPORT UNIT, HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...

METHODS FOR DETECTING ARCING IN POWER DELIVERY SYSTEMS FOR PROCESS...

ABNORMALITY DETERMINATION SYSTEM AND ABNORMALITY DETERMINATION METH...

METHODS AND APPARATUS FOR PHOTOMASK PROCESSING

PLASMA PROCESSING APPARATUS AND MONITORING DEVICE

PLASMA PROCESSING EQUIPMENT

STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS

ELECTROSTATIC CHUCK

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

PLASMA GENERATOR AND INFORMATION PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND CHARGE NEUTRALIZATION METHOD FOR...

ION IMPLANTER AND MEASURING DEVICE

CHEMICAL VAPOR DEPOSITION TOOL FOR PREVENTING OR SUPPRESSING ARCING

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

System And Method To Monitor Glitch Energy

PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...

LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...

LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Treating Arcs in a Plasma Process