Fluorine

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CPC
C08F12/20

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CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F12/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring

Current Industry

C08F12/20Fluorine

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Particles suitable for catalyzing oxygen reduction or hydrogen oxid...
- Patent number 11,390,702
- Issue date Jul 19, 2022
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Pierrick Buvat
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Polymer compound for conductive polymer and method for producing same
- Patent number 11,208,509
- Issue date Dec 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 10,948,822
- Issue date Mar 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer compound for conductive polymer and method for producing same
- Patent number 10,851,188
- Issue date Dec 1, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the preparation of nitrated styrenic fluoropolymers
- Patent number 10,556,973
- Issue date Feb 11, 2020
- Akron Polymer Systems, Inc.
- Lang Hu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluoropolymers and membranes comprising fluoropolymers (I)
- Patent number 10,471,396
- Issue date Nov 12, 2019
- Pall Corporation
- Frank Okezie Onyemauwa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, negative resist composition, and pattern forming process
- Patent number 10,377,842
- Issue date Aug 13, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluoropolymers and membranes comprising fluoropolymers (I)
- Patent number 10,343,122
- Issue date Jul 9, 2019
- Pall Corporation
- Frank Okezie Onyemauwa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Block copolymer
- Patent number 10,253,130
- Issue date Apr 9, 2019
- LG Chem, Ltd.
- Jeong Kyu Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,239,980
- Issue date Mar 26, 2019
- LG Chem, Ltd.
- Je Gwon Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Conductive polymer composite and substrate
- Patent number 10,240,061
- Issue date Mar 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Block copolymer
- Patent number 10,227,438
- Issue date Mar 12, 2019
- LG Chem, Ltd.
- Je Gwon Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,227,436
- Issue date Mar 12, 2019
- LG Chem, Ltd.
- Mi Sook Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,227,437
- Issue date Mar 12, 2019
- LG Chem, Ltd.
- Jung Keun Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,202,480
- Issue date Feb 12, 2019
- LG Chem, Ltd.
- Je Gwon Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,196,475
- Issue date Feb 5, 2019
- LG Chem, Ltd.
- Jung Keun Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polymer, positive resist composition, and pattern forming process
- Patent number 10,191,372
- Issue date Jan 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Monomer and block copolymer
- Patent number 10,160,822
- Issue date Dec 25, 2018
- LG Chem, Ltd.
- Jung Keun Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,150,832
- Issue date Dec 11, 2018
- LG Chem, Ltd.
- Mi Sook Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer and method of manufacturing integrated circuit devi...
- Patent number 10,138,318
- Issue date Nov 27, 2018
- KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Seungchul Kwon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer optical compensation film having reversed wavelength dis...
- Patent number 10,126,479
- Issue date Nov 13, 2018
- Akron Polymer Systems, Inc.
- Bin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer compound for a conductive polymer and method for producing...
- Patent number 10,125,202
- Issue date Nov 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluoropolymer-based polymer blends, polymer films, and polarizer pr...
- Patent number 10,088,615
- Issue date Oct 2, 2018
- Akron Polymer Systems, Inc.
- Xiaoliang Zheng
- G02 - OPTICS
Information Patent Grant
Block copolymer
- Patent number 10,087,276
- Issue date Oct 2, 2018
- LG Chem, Ltd.
- No Jin Park
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fluorinated aromatic compound, method for its production, curable m...
- Patent number 10,087,128
- Issue date Oct 2, 2018
- AGC Inc.
- Hiromasa Yamamoto
- G02 - OPTICS
Information Patent Grant
Block copolymer
- Patent number 10,081,698
- Issue date Sep 25, 2018
- LG Chem, Ltd.
- Mi Sook Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Additives for orientation control of block copolymers
- Patent number 10,066,040
- Issue date Sep 4, 2018
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Conductive material and substrate
- Patent number 10,053,588
- Issue date Aug 21, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive material and substrate
- Patent number 10,047,237
- Issue date Aug 14, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluoro-alcohol additives for orientation control of block copolymers
- Patent number 10,040,879
- Issue date Aug 7, 2018
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240255852
- Publication date Aug 1, 2024
- JSR Corporation
- Hiroyuki KOMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTA...
- Publication number 20240124619
- Publication date Apr 18, 2024
- OCHANOMIZU UNIVERSITY
- Tadashi Kanbara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SIC SEPARATOR AND SIC CELL
- Publication number 20200274124
- Publication date Aug 27, 2020
- ROBERT BOSCH GmbH
- Joerg Thielen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...
- Publication number 20190194365
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PREPARING PARTICLES SUITABLE FOR CATALYSING OXYGEN REDUC...
- Publication number 20190177461
- Publication date Jun 13, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Pierrick Buvat
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR THE PREPARATION OF NITRATED STYRENIC FLUOROPOLYMERS
- Publication number 20180044447
- Publication date Feb 15, 2018
- AKRON POLYMER SYSTEMS, INC.
- Lang Hu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170349686
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20140295332
- Publication date Oct 2, 2014
- FUJIFILM CORPORATION
- Shuji HIRANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20140193749
- Publication date Jul 10, 2014
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL COMPOUND BEING USED FOR FORMING A RANDOM WRINKLE STRUCTURE...
- Publication number 20140029267
- Publication date Jan 30, 2014
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Jaehyun MOON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR THE PREPARATION OF STYRENIC FLUOROPOLYMERS
- Publication number 20130211025
- Publication date Aug 15, 2013
- XIAOLIANG ZHENG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130130178
- Publication date May 23, 2013
- FUJIFILM Corporation
- Yusuke Iizuka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUPERACID FUNCTIONAL COMPOUNDS
- Publication number 20130131201
- Publication date May 23, 2013
- Arkema Inc.
- James T. Goldbach
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20130115557
- Publication date May 9, 2013
- FUJIFILM Corporation
- Shuhei Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130095429
- Publication date Apr 18, 2013
- FUJIFILM Corporation
- Yusuke Iizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20130045445
- Publication date Feb 21, 2013
- FUJIFILM CORPORATION
- Toshiya TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...
- Publication number 20130029254
- Publication date Jan 31, 2013
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCESS FOR THE PREPARATION OF AN UNSUPPORTED, SOLID METALLOCENE CA...
- Publication number 20120309913
- Publication date Dec 6, 2012
- Nicolas Ronan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUC...
- Publication number 20120237876
- Publication date Sep 20, 2012
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTO-CROSSLINKABLE MATERIAL FOR ORGANIC THIN FILM TRANSISTOR INSUL...
- Publication number 20120235148
- Publication date Sep 20, 2012
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Isao Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...
- Publication number 20120164581
- Publication date Jun 28, 2012
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120077125
- Publication date Mar 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20120058429
- Publication date Mar 8, 2012
- JSR Corporation
- Kota Nishino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120003590
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONDUCTIVE POLYMER, CONDUCTIVE POLYMER COMPOSITION, CONDUCTIVE POLY...
- Publication number 20110253946
- Publication date Oct 20, 2011
- Dal-Ho Huh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, GATE INSULATING LAYER, AND ORGANIC THIN FILM TRA...
- Publication number 20110193071
- Publication date Aug 11, 2011
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Isao Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOS...
- Publication number 20110159433
- Publication date Jun 30, 2011
- FUJIFILM CORPORATION
- Hidenori Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED POLYMERS AND ASSOCIATED METHODS
- Publication number 20110129424
- Publication date Jun 2, 2011
- Cory Berkland
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20100248149
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF USE
- Publication number 20100203450
- Publication date Aug 12, 2010
- International Business Machines Corporation
- Masaki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particles suitable for catalyzing oxygen reduction or hydrogen oxid...

Polymer compound for conductive polymer and method for producing same

Resist composition and patterning process

Polymer compound for conductive polymer and method for producing same

Method for the preparation of nitrated styrenic fluoropolymers

Fluoropolymers and membranes comprising fluoropolymers (I)

Polymer, negative resist composition, and pattern forming process

Fluoropolymers and membranes comprising fluoropolymers (I)

Block copolymer

Block copolymer

Conductive polymer composite and substrate

Block copolymer

Block copolymer

Block copolymer

Block copolymer

Block copolymer

Polymer, positive resist composition, and pattern forming process

Monomer and block copolymer

Block copolymer

Block copolymer and method of manufacturing integrated circuit devi...

Multilayer optical compensation film having reversed wavelength dis...

Polymer compound for a conductive polymer and method for producing...

Fluoropolymer-based polymer blends, polymer films, and polarizer pr...

Block copolymer

Fluorinated aromatic compound, method for its production, curable m...

Block copolymer

Additives for orientation control of block copolymers

Conductive material and substrate

Conductive material and substrate

Fluoro-alcohol additives for orientation control of block copolymers

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTA...

SIC SEPARATOR AND SIC CELL

COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...

METHOD FOR PREPARING PARTICLES SUITABLE FOR CATALYSING OXYGEN REDUC...

METHOD FOR THE PREPARATION OF NITRATED STYRENIC FLUOROPOLYMERS

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

CHEMICAL COMPOUND BEING USED FOR FORMING A RANDOM WRINKLE STRUCTURE...

METHOD FOR THE PREPARATION OF STYRENIC FLUOROPOLYMERS

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

SUPERACID FUNCTIONAL COMPOUNDS

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...

PROCESS FOR THE PREPARATION OF AN UNSUPPORTED, SOLID METALLOCENE CA...

RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUC...

PHOTO-CROSSLINKABLE MATERIAL FOR ORGANIC THIN FILM TRANSISTOR INSUL...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

CONDUCTIVE POLYMER, CONDUCTIVE POLYMER COMPOSITION, CONDUCTIVE POLY...

RESIN COMPOSITION, GATE INSULATING LAYER, AND ORGANIC THIN FILM TRA...

PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOS...

FLUORINATED POLYMERS AND ASSOCIATED METHODS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

PHOTORESIST COMPOSITIONS AND METHODS OF USE