Focus adjustment

Industry

CPC
H01J2237/21

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/21Focus adjustment

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for examining a beam of charged particles
- Patent number 11,961,705
- Issue date Apr 16, 2024
- Carl Zeiss SMT GmbH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus adjustment method for charged particle beam device and charge...
- Patent number 11,776,786
- Issue date Oct 3, 2023
- Jeol Ltd.
- Kazunori Tsukamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and method of adjusti...
- Patent number 11,740,546
- Issue date Aug 29, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of automatically focusing a charged particle beam on a surfa...
- Patent number 11,610,755
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Robert Trauner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Autofocus method for a scanning electron microscope
- Patent number 11,380,513
- Issue date Jul 5, 2022
- TASMIT, INC.
- Daisuke Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic microscope device
- Patent number 11,355,304
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam focusing
- Patent number 11,328,895
- Issue date May 10, 2022
- FEI Company
- Herman Carlo Floresca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field curvature correction for multi-beam inspection systems
- Patent number 11,302,511
- Issue date Apr 12, 2022
- KLA Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device
- Patent number 11,276,551
- Issue date Mar 15, 2022
- Hitachi, Ltd.
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,257,658
- Issue date Feb 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Noritsugu Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system, method for determining range for auto...
- Patent number 11,195,694
- Issue date Dec 7, 2021
- HITACHI HIGH-TECH CORPORATION
- Kosuke Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of automatically focusing a charged particle beam on a surfa...
- Patent number 11,195,691
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Robert Trauner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Focused ion beam apparatus
- Patent number 11,133,149
- Issue date Sep 28, 2021
- Hitachi High-Tech Science Corporation
- Toshihiro Mochizuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple charged particle beams
- Patent number 11,062,874
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rock sample preparation method by using focused ion beam for minimi...
- Patent number 10,948,429
- Issue date Mar 16, 2021
- Saudi Arabian Oil Company
- Dong kyu Cha
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus using focus evaluation values for p...
- Patent number 10,930,468
- Issue date Feb 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Hiroko Takeuchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multiple electron beam irradiation apparatus, multiple electron bea...
- Patent number 10,886,102
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for focus adjustment of a multi-beam scanning ele...
- Patent number 10,861,671
- Issue date Dec 8, 2020
- KLA Corporation
- Doug K. Masnaghetti
- G02 - OPTICS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,847,341
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for driving member and processing apparatus
- Patent number 10,825,662
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Rumiko Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 10,804,072
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,714,304
- Issue date Jul 14, 2020
- HITACHI HIGH-TECH CORPORATION
- Muneyuki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Displacement measuring apparatus, electron beam inspection apparatu...
- Patent number 10,655,956
- Issue date May 19, 2020
- NuFlare Technology, Inc.
- Riki Ogawa
- G01 - MEASURING TESTING
Information Patent Grant
Height detection apparatus and charged particle beam apparatus
- Patent number 10,641,607
- Issue date May 5, 2020
- Hitachi High-Technologies Corporation
- Yoshifumi Sekiguchi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and method for adjusting imaging co...
- Patent number 10,566,172
- Issue date Feb 18, 2020
- Hitachi High-Technologies Corporation
- Tomohito Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,497,539
- Issue date Dec 3, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeam-focus adjusting method, multibeam-focus measuring method,...
- Patent number 10,490,388
- Issue date Nov 26, 2019
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of verifying operation parameter of scanning electron micros...
- Patent number 10,446,365
- Issue date Oct 15, 2019
- NGR Inc.
- Koji Kaneko
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam system and methods
- Patent number 10,410,828
- Issue date Sep 10, 2019
- Carl Zeiss Microscopy, LLC
- Chuong Huynh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method and multi charged partic...
- Patent number RE47561
- Issue date Aug 6, 2019
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa

Patents Applicationslast 30 patents

Information Patent Application
AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
- Publication number 20240412944
- Publication date Dec 12, 2024
- KLA Corporation
- Weijie Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM AXIAL CALIBRATION
- Publication number 20240404783
- Publication date Dec 5, 2024
- Multibeam Corporation
- Jeffery Michael Dech
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...
- Publication number 20240371596
- Publication date Nov 7, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Method for Controlling Same
- Publication number 20240242928
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Koichi KURODA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS
- Publication number 20240071715
- Publication date Feb 29, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sissi Lachmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230411111
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Tetsuro KADOWAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20230317406
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuto KAWASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...
- Publication number 20230253177
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Kulpreet Singh VIRDI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...
- Publication number 20230245852
- Publication date Aug 3, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...
- Publication number 20230230796
- Publication date Jul 20, 2023
- HITACHI HIGH-TECH CORPORATION
- Tomohito NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Imaging And Milling A Sample
- Publication number 20230162945
- Publication date May 25, 2023
- FEI Company
- Jaroslav Velcovský
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Charged Particle Beam Device
- Publication number 20230105549
- Publication date Apr 6, 2023
- Hitachi High-Tech Corporation
- Mai YOSHIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, AND METHOD AND PROGRAM FOR CONTROLLING...
- Publication number 20230013805
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Yusuke SAITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...
- Publication number 20220299861
- Publication date Sep 22, 2022
- NuFlare Technology, Inc.
- Tsubasa NANAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF AUTOMATICALLY FOCUSING A CHARGED PARTICLE BEAM ON A SURFA...
- Publication number 20220044907
- Publication date Feb 10, 2022
- Applied Materials, Inc.
- Robert TRAUNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARTICLE BEAM FOCUSING
- Publication number 20220028647
- Publication date Jan 27, 2022
- FEI Company
- Herman Carlo Floresca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE CHARGED PARTICLE BEAMS
- Publication number 20220005665
- Publication date Jan 6, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF AUTOMATICALLY FOCUSING A CHARGED PARTICLE BEAM ON A SURFA...
- Publication number 20210249220
- Publication date Aug 12, 2021
- Applied Materials, Inc.
- Robert TRAUNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged Particle Beam System, Method for Determining Range for Auto...
- Publication number 20210166911
- Publication date Jun 3, 2021
- HITACHI HIGH-TECH CORPORATION
- Kosuke MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR EXAMINING A BEAM OF CHARGED PARTICLES
- Publication number 20210110996
- Publication date Apr 15, 2021
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus Adjustment Method for Charged Particle Beam Device and Charge...
- Publication number 20210035772
- Publication date Feb 4, 2021
- JEOL Ltd.
- Kazunori Tsukamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210027980
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOFOCUS METHOD FOR A SCANNING ELECTRON MICROSCOPE
- Publication number 20210027979
- Publication date Jan 28, 2021
- TASMIT, INC.
- Daisuke KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE
- Publication number 20200365364
- Publication date Nov 19, 2020
- Hitachi, Ltd
- Atsuko SHINTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR GENERATING A MULTIPLICITY OF PARTICLE BEAMS, AND MULT...
- Publication number 20200211810
- Publication date Jul 2, 2020
- CARL ZEISS MICROSCOPY GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200144090
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR SELECTIVE AUTOFOCUS
- Publication number 20200118786
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Bernhard G. MUELLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200105501
- Publication date Apr 2, 2020
- Hitachi High-Technologies Corporation
- Noritsugu Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM IRRADIATION APPARATUS, MULTIPLE ELECTRON BEA...
- Publication number 20200013585
- Publication date Jan 9, 2020
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS

Focus adjustment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for examining a beam of charged particles

Focus adjustment method for charged particle beam device and charge...

Multi charged particle beam writing apparatus and method of adjusti...

Method of automatically focusing a charged particle beam on a surfa...

Autofocus method for a scanning electron microscope

Electronic microscope device

Particle beam focusing

Field curvature correction for multi-beam inspection systems

Inspection device

Charged particle beam apparatus

Charged particle beam system, method for determining range for auto...

Method of automatically focusing a charged particle beam on a surfa...

Focused ion beam apparatus

Apparatus using multiple charged particle beams

Rock sample preparation method by using focused ion beam for minimi...

Charged particle beam apparatus using focus evaluation values for p...

Multiple electron beam irradiation apparatus, multiple electron bea...

Method and system for focus adjustment of a multi-beam scanning ele...

Plasma processing apparatus

Method for driving member and processing apparatus

Plasma processing apparatus

Charged particle beam apparatus

Displacement measuring apparatus, electron beam inspection apparatu...

Height detection apparatus and charged particle beam apparatus

Charged particle beam apparatus and method for adjusting imaging co...

Multi charged particle beam writing apparatus and multi charged par...

Multibeam-focus adjusting method, multibeam-focus measuring method,...

Method of verifying operation parameter of scanning electron micros...

Charged particle beam system and methods

Multi charged particle beam writing method and multi charged partic...

Patents Applicationslast 30 patents

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

CHARGED PARTICLE BEAM AXIAL CALIBRATION

MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...

Charged Particle Beam Device and Method for Controlling Same

CHARGED PARTICLE DEVICE AND METHOD

OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS

Charged Particle Beam Apparatus

Charged Particle Beam System

METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...

MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...

Method Of Imaging And Milling A Sample

Charged Particle Beam Device

PLASMA PROCESSING APPARATUS, AND METHOD AND PROGRAM FOR CONTROLLING...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...

METHOD OF AUTOMATICALLY FOCUSING A CHARGED PARTICLE BEAM ON A SURFA...

PARTICLE BEAM FOCUSING

APPARATUS USING MULTIPLE CHARGED PARTICLE BEAMS

METHOD OF AUTOMATICALLY FOCUSING A CHARGED PARTICLE BEAM ON A SURFA...

Charged Particle Beam System, Method for Determining Range for Auto...

METHOD AND APPARATUS FOR EXAMINING A BEAM OF CHARGED PARTICLES

Focus Adjustment Method for Charged Particle Beam Device and Charge...

PLASMA PROCESSING APPARATUS

AUTOFOCUS METHOD FOR A SCANNING ELECTRON MICROSCOPE

INSPECTION DEVICE

APPARATUS FOR GENERATING A MULTIPLICITY OF PARTICLE BEAMS, AND MULT...

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

SYSTEM AND METHOD FOR SELECTIVE AUTOFOCUS

CHARGED PARTICLE BEAM APPARATUS

MULTIPLE ELECTRON BEAM IRRADIATION APPARATUS, MULTIPLE ELECTRON BEA...