Focused ion beam

Industry

CPC
H01J2237/31713

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31713Focused ion beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam quality control using a movable mass resolving device
- Patent number 11,049,691
- Issue date Jun 29, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microstructure manufacturing method and microstructure manufacturin...
- Patent number 10,546,721
- Issue date Jan 28, 2020
- Hitachi, Ltd.
- Keiji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation to alter etch rate
- Patent number 10,325,754
- Issue date Jun 18, 2019
- FEI Company
- David Foord
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging and processing for plasma ion source
- Patent number 9,691,583
- Issue date Jun 27, 2017
- FEI Company
- Thomas G. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation at high temperature surface equilibrium conditions
- Patent number 9,218,991
- Issue date Dec 22, 2015
- Infineon Technologies Americas Corp.
- Michael A. Briere
- C30 - CRYSTAL GROWTH
Information Patent Grant
Imaging and processing for plasma ion source
- Patent number 9,105,438
- Issue date Aug 11, 2015
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and sample production method
- Patent number 8,933,423
- Issue date Jan 13, 2015
- Hitachi High-Technologies Corporation
- Terutaka Nanri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source with integrated electrostatic energy filter
- Patent number 8,710,452
- Issue date Apr 29, 2014
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and sample transporting apparatus
- Patent number 8,674,324
- Issue date Mar 18, 2014
- Hitachi High-Tech Science Corporation
- Masakatsu Hasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 8,658,994
- Issue date Feb 25, 2014
- Nexgen Semi Holding, Inc.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus, and sample processing and observat...
- Patent number 8,455,824
- Issue date Jun 4, 2013
- Hitachi High-Technologies Corporation
- Hiroyuki Muto
- G01 - MEASURING TESTING
Information Patent Grant
Dual beam apparatus with tilting sample stage
- Patent number 8,431,891
- Issue date Apr 30, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to direct pattern metals on a substrate
- Patent number 8,278,220
- Issue date Oct 2, 2012
- FEI Company
- Theresa Holtermann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 8,095,231
- Issue date Jan 10, 2012
- FEI Company
- David J. Tasker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Ion beam processing apparatus
- Patent number 7,700,931
- Issue date Apr 20, 2010
- Hitachi High-Tchnologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 7,664,566
- Issue date Feb 16, 2010
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,659,526
- Issue date Feb 9, 2010
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,507,960
- Issue date Mar 24, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,501,644
- Issue date Mar 10, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,495,245
- Issue date Feb 24, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,495,242
- Issue date Feb 24, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,495,244
- Issue date Feb 24, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,488,960
- Issue date Feb 10, 2009
- NexGen Semi Holding, Inc.
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 7,308,334
- Issue date Dec 11, 2007
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 7,259,373
- Issue date Aug 21, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for single ion implantation
- Patent number 7,002,166
- Issue date Feb 21, 2006
- Qucor Pty Ltd
- David Norman Jamieson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 6,889,113
- Issue date May 3, 2005
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam apparatus having a gas injector in which one of a...
- Patent number 6,576,913
- Issue date Jun 10, 2003
- Seiko Instruments Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single ion implantation system
- Patent number 5,539,203
- Issue date Jul 23, 1996
- Iwao Ohdomari
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Ion Beam Quality Control Using A Movable Mass Resolving Device
- Publication number 20190198292
- Publication date Jun 27, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implantation to Alter Etch Rate
- Publication number 20150348752
- Publication date Dec 3, 2015
- FEI Company
- David Foord
- G01 - MEASURING TESTING
Information Patent Application
Ion Implantation at High Temperature Surface Equilibrium Conditions
- Publication number 20140147998
- Publication date May 29, 2014
- INTERNATIONAL RECTIFIER CORPORATION
- Michael A. Briere
- C30 - CRYSTAL GROWTH
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND SAMPLE PRODUCTION METHOD
- Publication number 20140076717
- Publication date Mar 20, 2014
- Hitachi High-Technologies Corporation
- Terutaka Nanri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING AND PROCESSING FOR PLASMA ION SOURCE
- Publication number 20130320229
- Publication date Dec 5, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS
- Publication number 20130320209
- Publication date Dec 5, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND SAMPLE TRANSPORTING APPARATUS
- Publication number 20130240730
- Publication date Sep 19, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Masakatsu HASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVAT...
- Publication number 20120326028
- Publication date Dec 27, 2012
- Hiroyuki MUTO
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH S...
- Publication number 20120286149
- Publication date Nov 15, 2012
- The Regents of the University of California
- Manuel Gamero-Castano
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20120112323
- Publication date May 10, 2012
- NEXGEN SEMI HOLDING, INC.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle Source with Integrated Electrostatic Energy Filter
- Publication number 20120112090
- Publication date May 10, 2012
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PRECISION FABRICATION OF MICRO- AND NANO-DEVI...
- Publication number 20110309553
- Publication date Dec 22, 2011
- Corporation for National Research Initiatives
- Michael A. HUFF
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH S...
- Publication number 20110290639
- Publication date Dec 1, 2011
- The Regents of the University of California
- Manuel Gamero-Castano
- G01 - MEASURING TESTING
Information Patent Application
ION BEAM PROCESSING APPARATUS
- Publication number 20100176297
- Publication date Jul 15, 2010
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY
- Publication number 20100138028
- Publication date Jun 3, 2010
- FEI Company
- DAVID J. TASKER
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20100098922
- Publication date Apr 22, 2010
- NEXGEN SEMI HOLDING, INC.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD TO DIRECT PATTERN METALS ON A SUBSTRATE
- Publication number 20100032302
- Publication date Feb 11, 2010
- FEI Company
- THERESA HOLTERMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect recognizing method, defect observing method, and charged par...
- Publication number 20090134327
- Publication date May 28, 2009
- Yutaka Ikku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVAT...
- Publication number 20090020698
- Publication date Jan 22, 2009
- Hitachi High-Technologies Corporation
- Hiroyuki MUTO
- G01 - MEASURING TESTING
Information Patent Application
GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY
- Publication number 20080097621
- Publication date Apr 24, 2008
- FEI Company
- DAVID J. TASKER
- G05 - CONTROLLING REGULATING
Information Patent Application
ION BEAM PROCESSING APPARATUS
- Publication number 20080073582
- Publication date Mar 27, 2008
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284695
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284537
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284538
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and method for controlled particle beam manufacturing
- Publication number 20070284527
- Publication date Dec 13, 2007
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278419
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278418
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278428
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and method for controlled particle beam manufacturing
- Publication number 20070045534
- Publication date Mar 1, 2007
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Graphical automated machine control and metrology
- Publication number 20050188309
- Publication date Aug 25, 2005
- FEI Company
- David J. Tasker
- G05 - CONTROLLING REGULATING

Focused ion beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and device for implanting ions in wafers

Ion beam quality control using a movable mass resolving device

Microstructure manufacturing method and microstructure manufacturin...

Ion implantation to alter etch rate

Imaging and processing for plasma ion source

Ion implantation at high temperature surface equilibrium conditions

Imaging and processing for plasma ion source

Charged particle beam device and sample production method

Charged particle source with integrated electrostatic energy filter

Charged particle beam apparatus and sample transporting apparatus

Apparatus and method for controlled particle beam manufacturing

Charged particle beam apparatus, and sample processing and observat...

Dual beam apparatus with tilting sample stage

Method to direct pattern metals on a substrate

Graphical automated machine control and metrology

Ion beam processing apparatus

Graphical automated machine control and metrology

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Apparatus and method for controlled particle beam manufacturing

Graphical automated machine control and metrology

Apparatus and method for controlled particle beam manufacturing

Method and system for single ion implantation

Graphical automated machine control and metrology

Focused ion beam apparatus having a gas injector in which one of a...

Single ion implantation system

Patents Applicationslast 30 patents

Ion Beam Quality Control Using A Movable Mass Resolving Device

Ion Implantation to Alter Etch Rate

Ion Implantation at High Temperature Surface Equilibrium Conditions

CHARGED PARTICLE BEAM DEVICE AND SAMPLE PRODUCTION METHOD

IMAGING AND PROCESSING FOR PLASMA ION SOURCE

ION BEAM PROCESSING APPARATUS

CHARGED PARTICLE BEAM APPARATUS AND SAMPLE TRANSPORTING APPARATUS

CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVAT...

METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH S...

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

Charged Particle Source with Integrated Electrostatic Energy Filter

SYSTEM AND METHOD FOR PRECISION FABRICATION OF MICRO- AND NANO-DEVI...

METHOD AND APPARATUS FOR PROVIDING BEAMS OF NANODROPLETS FOR HIGH S...

ION BEAM PROCESSING APPARATUS

GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

METHOD TO DIRECT PATTERN METALS ON A SUBSTRATE

Defect recognizing method, defect observing method, and charged par...

CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVAT...

GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY

ION BEAM PROCESSING APPARATUS

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

Apparatus and method for controlled particle beam manufacturing

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

Apparatus and method for controlled particle beam manufacturing

Graphical automated machine control and metrology