for changing properties of the objects or for applying thin layers thereon

Industry

CPC
H01J37/317

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/317for changing properties of the objects or for applying thin layers thereon

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Particle beam system
- Patent number 12,293,896
- Issue date May 6, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of post-curing additive manufacturing parts using electron...
- Patent number 12,285,915
- Issue date Apr 29, 2025
- Ford Global Technologies, LLC
- Christopher Michael Seubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source module
- Patent number 12,288,663
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder state detection device and substrate holder state...
- Patent number 12,278,083
- Issue date Apr 15, 2025
- SCREEN Holdings Co., Ltd.
- Yuji Okita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implanter
- Patent number 12,255,046
- Issue date Mar 18, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 12,249,483
- Issue date Mar 11, 2025
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding device
- Patent number 12,249,479
- Issue date Mar 11, 2025
- Nissin Ion Equipment Co., Ltd.
- Yusuke Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlled ion implantation
- Patent number 12,247,283
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens designs
- Patent number 12,243,714
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Laura Del Tin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam sputtering apparatus and method
- Patent number 12,243,715
- Issue date Mar 4, 2025
- Institute of Geological and Nuclear Sciences Limited
- Richard John Futter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 12,243,708
- Issue date Mar 4, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation apparatus with overlapping beam columns a...
- Patent number 12,243,710
- Issue date Mar 4, 2025
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam resist composition
- Patent number RE50296
- Issue date Feb 11, 2025
- The University of Manchester
- Scott Lewis
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 12,211,701
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Calibration hardware for ion implanter
- Patent number 12,205,840
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repeller assembly for mounting into an arc chamber of an ion implan...
- Patent number 12,198,890
- Issue date Jan 14, 2025
- Plansee USA LLC
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...
- Publication number 20250149290
- Publication date May 8, 2025
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20250140517
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC ION BEAM SHAPE SELECTION
- Publication number 20250140510
- Publication date May 1, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140513
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Satoshi TOMIMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
- Publication number 20250140520
- Publication date May 1, 2025
- Axcelis Technologies, Inc.
- Michael Cristoforo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND METHOD
- Publication number 20250140522
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chun-Wei Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...
- Publication number 20250140523
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION
- Publication number 20250140567
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...
- Publication number 20250132126
- Publication date Apr 24, 2025
- Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- Fengqi SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS DESIGNS
- Publication number 20250125120
- Publication date Apr 17, 2025
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM
- Publication number 20250118524
- Publication date Apr 10, 2025
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION HARDWARE FOR ION IMPLANTER
- Publication number 20250118585
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20250118529
- Publication date Apr 10, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...
- Publication number 20250112025
- Publication date Apr 3, 2025
- Energy Sciences Inc.
- Imtiaz Rangwalla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION
- Publication number 20250112026
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT
- Publication number 20250104965
- Publication date Mar 27, 2025
- Axcelis Technologies, Inc.
- Wilhelm Platow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...
- Publication number 20250104966
- Publication date Mar 27, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...
- Publication number 20250104964
- Publication date Mar 27, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
- Publication number 20250095951
- Publication date Mar 20, 2025
- Kabushiki Kaisha Toshiba
- Kazuyuki HIGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...
- Publication number 20250095952
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Ori Noked
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...
- Publication number 20250095957
- Publication date Mar 20, 2025
- SHINE Technologies, LLC
- Ross Radel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...
- Publication number 20250095960
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Sang Woo SEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM
- Publication number 20250087441
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Thomas P. Nolan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM PROFILING USING OPTICAL TOMOGRAPHY
- Publication number 20250087448
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS

for changing properties of the objects or for applying thin layers thereon

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle beam system

Methods of post-curing additive manufacturing parts using electron...

Charged particle source module

Closed loop faraday correction of a horizontal beam current profile...

Substrate holder state detection device and substrate holder state...

Embedded high-z marker material and process for alignment of multil...

Ion implantation method and ion implanter

Charged particle beam writing method and charged particle beam writ...

Substrate holding device

Method and apparatus for controlled ion implantation

Method and system for determining a charged particle beam exposure...

Lens designs

Ion beam sputtering apparatus and method

Repellent electrode for electron repelling

Ion generator and ion implanter

Electron beam irradiation apparatus with overlapping beam columns a...

Effective temperature calculation method for multi-charged particle...

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Electron beam resist composition

Stage apparatus and electron beam lithography system

Localized stress modulation by implant to back of wafer

Multiple charged-particle beam apparatus with low crosstalk

Gate structure of semiconductor device and method of manufacture

Method and system for the removal and/or avoidance of contamination...

Calibration hardware for ion implanter

Charged particle beam writing apparatus, charged particle beam writ...

Method for reducing line-end space in integrated circuit patterning

Repeller assembly for mounting into an arc chamber of an ion implan...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Systems and methods for optimizing full horizontal scanned beam dis...

Patents Applicationslast 30 patents

MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

DYNAMIC ION BEAM SHAPE SELECTION

CHARGED PARTICLE BEAM DEVICE

APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SEMICONDUCTOR PROCESS APPARATUS AND METHOD

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...

MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...

ION SOURCE WITH WIRE FORM METAL DOPANT

LENS DESIGNS

ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM

CALIBRATION HARDWARE FOR ION IMPLANTER

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...

INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION

HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...

METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...

ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS

CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...

ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...

ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM

ION BEAM PROFILING USING OPTICAL TOMOGRAPHY

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE