for changing properties of the objects or for applying thin layers thereon

Industry

CPC
H01J37/317

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/317for changing properties of the objects or for applying thin layers thereon

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 12,211,701
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Calibration hardware for ion implanter
- Patent number 12,205,840
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repeller assembly for mounting into an arc chamber of an ion implan...
- Patent number 12,198,890
- Issue date Jan 14, 2025
- Plansee USA LLC
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controller and control techniques for linear accelerator and ion im...
- Patent number 12,193,140
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonator, linear accelerator, and ion implanter having dielectric-...
- Patent number 12,185,451
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal motion enhanced ion source
- Patent number 12,154,755
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 12,142,453
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system
- Patent number 12,125,665
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Vaporizer, ion source and method for generating aluminum-containing...
- Patent number 12,112,915
- Issue date Oct 8, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Sami K. Hahto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual source injector with switchable analyzing magnet
- Patent number 12,112,918
- Issue date Oct 8, 2024
- Axcelis Technologies, Inc.
- Wilhelm Platow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Cathode mechanism of electron emission source, and method for manuf...
- Patent number 12,106,928
- Issue date Oct 1, 2024
- NuFlare Technology, Inc.
- Ryoei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 12,094,685
- Issue date Sep 17, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPAR...
- Publication number 20250037960
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER
- Publication number 20250014862
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsuyoshi NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shield Ring Mounting Using Compliant Hardware
- Publication number 20250014870
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jordan B. Tye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTER
- Publication number 20250014860
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi MATSUSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...
- Publication number 20250006459
- Publication date Jan 2, 2025
- Carl Zeiss MultiSEM GmbH
- Daniel Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA
- Publication number 20240420937
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yu Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
- Publication number 20240420919
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Aaron P. WEBB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED GAS BOX AND ION SOURCE
- Publication number 20240420920
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...
- Publication number 20240412889
- Publication date Dec 12, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404785
- Publication date Dec 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS
- Publication number 20240395493
- Publication date Nov 28, 2024
- NuFlare Technology, Inc.
- Toshiki KUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBLIQUE ANGLED ION IMPLANTATION FOR SUBSTRATE STRESS CONTROL
- Publication number 20240395500
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20240385526
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM
- Publication number 20240379321
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FASTENER FOR SECURING FACEPLATE TO ION SOURCE
- Publication number 20240379319
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- John Alexander Walder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND RELATED METHODS
- Publication number 20240379320
- Publication date Nov 14, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM ADDITIVE MANUFACTURING SYSTEM AND CONTROL COMPONENTS
- Publication number 20240367232
- Publication date Nov 7, 2024
- Sciaky, Inc.
- Scott Stecker
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Heated Plasma Flood Gun Sweeper
- Publication number 20240371602
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS

for changing properties of the objects or for applying thin layers thereon

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Gate structure of semiconductor device and method of manufacture

Method and system for the removal and/or avoidance of contamination...

Calibration hardware for ion implanter

Charged particle beam writing apparatus, charged particle beam writ...

Method for reducing line-end space in integrated circuit patterning

Repeller assembly for mounting into an arc chamber of an ion implan...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Systems and methods for optimizing full horizontal scanned beam dis...

Controller and control techniques for linear accelerator and ion im...

Resonator, linear accelerator, and ion implanter having dielectric-...

Semiconductor manufacturing apparatus, semiconductor device and man...

Ribbon beam angle adjustment in an ion implantation system

Device to control uniformity of extracted ion beam

Toroidal motion enhanced ion source

Multi-beam inspection apparatus

Vacuum apparatus

Devices and methods for examining and/or processing an element for...

Device and method for implanting particles into a substrate

Multi-source charged particle illumination apparatus

Ion implantation system

Particle beam system and the use thereof for flexibly setting the c...

Ion beam processing apparatus, electrode assembly, and method of cl...

Vaporizer, ion source and method for generating aluminum-containing...

Dual source injector with switchable analyzing magnet

Cathode mechanism of electron emission source, and method for manuf...

Apparatus and methods for beam processing of substrates

Ion implanter and ion implantation method

Multi-charged particle beam writing apparatus, and multi-charged pa...

Energy filter element for ion implantation systems for the use in t...

Patents Applicationslast 30 patents

BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPAR...

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER

Shield Ring Mounting Using Compliant Hardware

ION IMPLANTATION METHOD AND ION IMPLANTER

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS

INTEGRATED GAS BOX AND ION SOURCE

LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

ION IMPLANTER AND ION IMPLANTATION METHOD

ION IMPLANTER AND ION IMPLANTATION METHOD

BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS

OBLIQUE ANGLED ION IMPLANTATION FOR SUBSTRATE STRESS CONTROL

Method for Reducing Line-End Space in Integrated Circuit Patterning

ION IMPLANTATION SYSTEM

FASTENER FOR SECURING FACEPLATE TO ION SOURCE

ION IMPLANTATION SYSTEM AND RELATED METHODS

FOCUSED ION BEAM SYSTEM

ELECTRON BEAM ADDITIVE MANUFACTURING SYSTEM AND CONTROL COMPONENTS

Heated Plasma Flood Gun Sweeper

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...