for changing properties of the objects or for applying thin layers thereon

Industry

CPC
H01J37/317

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/317for changing properties of the objects or for applying thin layers thereon

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of failure analysis for defect locations
- Patent number 12,339,202
- Issue date Jun 24, 2025
- Shanghai Huali Integrated Circuit Corporation
- Qiang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system including a multi-beam deflection device and a...
- Patent number 12,340,973
- Issue date Jun 24, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen supply device, and ion beam irradiation apparatus equipped...
- Patent number 12,340,974
- Issue date Jun 24, 2025
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, combined processing apparatus, and recordin...
- Patent number 12,326,660
- Issue date Jun 10, 2025
- Kioxia Corporation
- Noriko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 12,327,707
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-voltage electron beam control of conductive state at a complex-...
- Patent number 12,322,522
- Issue date Jun 3, 2025
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for fabricating unique chips using a charged part...
- Patent number 12,322,569
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Feature patterning using pitch relaxation and directional end-pushi...
- Patent number 12,315,737
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzung-Hua Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three layer resonator coil for linear accelerator
- Patent number 12,308,206
- Issue date May 20, 2025
- Applied Materials, Inc.
- William Herron Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced deposition rate by thermal isolation cover for GIS manipul...
- Patent number 12,308,207
- Issue date May 20, 2025
- Applied Materials Israel Ltd.
- Sean Kashy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle beam system
- Patent number 12,293,896
- Issue date May 6, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of post-curing additive manufacturing parts using electron...
- Patent number 12,285,915
- Issue date Apr 29, 2025
- Ford Global Technologies, LLC
- Christopher Michael Seubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source module
- Patent number 12,288,663
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder state detection device and substrate holder state...
- Patent number 12,278,083
- Issue date Apr 15, 2025
- SCREEN Holdings Co., Ltd.
- Yuji Okita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implanter
- Patent number 12,255,046
- Issue date Mar 18, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 12,249,483
- Issue date Mar 11, 2025
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding device
- Patent number 12,249,479
- Issue date Mar 11, 2025
- Nissin Ion Equipment Co., Ltd.
- Yusuke Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlled ion implantation
- Patent number 12,247,283
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens designs
- Patent number 12,243,714
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Laura Del Tin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam sputtering apparatus and method
- Patent number 12,243,715
- Issue date Mar 4, 2025
- Institute of Geological and Nuclear Sciences Limited
- Richard John Futter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 12,243,708
- Issue date Mar 4, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation apparatus with overlapping beam columns a...
- Patent number 12,243,710
- Issue date Mar 4, 2025
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam resist composition
- Patent number RE50296
- Issue date Feb 11, 2025
- The University of Manchester
- Scott Lewis
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Radiation Heating to Dry Moisture from Air Bearing Shaft
- Publication number 20250201510
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR GUIDE STAR ALIGNMENT OF AN ION IMPLANTER
- Publication number 20250201513
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Radiation Heating to Clean Deposits from Air Bearing Shaft
- Publication number 20250201514
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Natural Frequency Adjuster For Extraction Electrodes
- Publication number 20250201508
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT
- Publication number 20250191944
- Publication date Jun 12, 2025
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM SPUTTERING APPARATUS AND METHOD
- Publication number 20250183003
- Publication date Jun 5, 2025
- Institute Of Geological And Nuclear Sciences Limited
- Richard John Futter Futter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE RANGE HEATED ELECTROSTATIC CHUCK
- Publication number 20250183085
- Publication date Jun 5, 2025
- Axcelis Technologies, Inc.
- John Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20250174424
- Publication date May 29, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD
- Publication number 20250166959
- Publication date May 22, 2025
- Axcelis Technologies, Inc.
- Andy Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Replicating Nano Factory and Uses Thereof
- Publication number 20250162884
- Publication date May 22, 2025
- West Nanorobotics LLC
- Tory C Weston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIXED POSITION FILAMENT
- Publication number 20250157775
- Publication date May 15, 2025
- Axcelis Technologies, Inc.
- Steve T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...
- Publication number 20250157789
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jungwook SHON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE IMPLANT FOR WAFER CURVATURE CONTROL
- Publication number 20250157821
- Publication date May 15, 2025
- Axcelis Technologies, Inc.
- Sean Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...
- Publication number 20250149290
- Publication date May 8, 2025
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20250140517
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC ION BEAM SHAPE SELECTION
- Publication number 20250140510
- Publication date May 1, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140513
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Satoshi TOMIMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
- Publication number 20250140520
- Publication date May 1, 2025
- Axcelis Technologies, Inc.
- Michael Cristoforo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND METHOD
- Publication number 20250140522
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chun-Wei Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...
- Publication number 20250140523
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION
- Publication number 20250140567
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...
- Publication number 20250132126
- Publication date Apr 24, 2025
- Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- Fengqi SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS DESIGNS
- Publication number 20250125120
- Publication date Apr 17, 2025
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM
- Publication number 20250118524
- Publication date Apr 10, 2025
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION HARDWARE FOR ION IMPLANTER
- Publication number 20250118585
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20250118529
- Publication date Apr 10, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...
- Publication number 20250112025
- Publication date Apr 3, 2025
- Energy Sciences Inc.
- Imtiaz Rangwalla
- H01 - BASIC ELECTRIC ELEMENTS

for changing properties of the objects or for applying thin layers thereon

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of failure analysis for defect locations

Particle beam system including a multi-beam deflection device and a...

Hydrogen supply device, and ion beam irradiation apparatus equipped...

Pattern forming method, combined processing apparatus, and recordin...

Charged particle blocking element, exposure apparatus comprising su...

Low-voltage electron beam control of conductive state at a complex-...

Method and system for fabricating unique chips using a charged part...

Feature patterning using pitch relaxation and directional end-pushi...

Three layer resonator coil for linear accelerator

Enhanced deposition rate by thermal isolation cover for GIS manipul...

Particle beam system

Methods of post-curing additive manufacturing parts using electron...

Charged particle source module

Closed loop faraday correction of a horizontal beam current profile...

Substrate holder state detection device and substrate holder state...

Embedded high-z marker material and process for alignment of multil...

Ion implantation method and ion implanter

Charged particle beam writing method and charged particle beam writ...

Substrate holding device

Method and apparatus for controlled ion implantation

Method and system for determining a charged particle beam exposure...

Lens designs

Ion beam sputtering apparatus and method

Repellent electrode for electron repelling

Ion generator and ion implanter

Electron beam irradiation apparatus with overlapping beam columns a...

Effective temperature calculation method for multi-charged particle...

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Electron beam resist composition

Stage apparatus and electron beam lithography system

Patents Applicationslast 30 patents

Radiation Heating to Dry Moisture from Air Bearing Shaft

TECHNIQUES FOR GUIDE STAR ALIGNMENT OF AN ION IMPLANTER

Radiation Heating to Clean Deposits from Air Bearing Shaft

Natural Frequency Adjuster For Extraction Electrodes

SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT

ION BEAM SPUTTERING APPARATUS AND METHOD

LARGE RANGE HEATED ELECTROSTATIC CHUCK

ION GENERATOR AND ION IMPLANTER

HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD

Self-Replicating Nano Factory and Uses Thereof

FIXED POSITION FILAMENT

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...

BACKSIDE IMPLANT FOR WAFER CURVATURE CONTROL

MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

DYNAMIC ION BEAM SHAPE SELECTION

CHARGED PARTICLE BEAM DEVICE

APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SEMICONDUCTOR PROCESS APPARATUS AND METHOD

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...

MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...

ION SOURCE WITH WIRE FORM METAL DOPANT

LENS DESIGNS

ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM

CALIBRATION HARDWARE FOR ION IMPLANTER

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...