for cleaning followed by drying, rinsing, stripping, blasting or the like

Industry

CPC
H01L21/67028

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67028for cleaning followed by drying, rinsing, stripping, blasting or the like

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning apparatus, substrate cleaning method, and non-tr...
- Patent number 12,202,016
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Yuki Ito
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,191,166
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Takashi Uno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 12,172,198
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Post-CMP cleaning and apparatus
- Patent number 12,170,195
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Grant
Methods and systems for cleaning high aspect ratio structures
- Patent number 12,170,196
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Schubert S. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for component for semiconductor production appar...
- Patent number 12,139,788
- Issue date Nov 12, 2024
- Taiyo Nippon Sanso Corporation
- Akira Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing tools and methods thereof
- Patent number 12,142,513
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Jagan Rangarajan
- B24 - GRINDING POLISHING
Information Patent Grant
Probe cleaning sheet for preventing a probe pin damage and manufact...
- Patent number 12,140,618
- Issue date Nov 12, 2024
- CKT TEK CO., LTD.
- Li-Wen Hsu
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 12,131,923
- Issue date Oct 29, 2024
- Ebara Corporation
- Yuta Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and substrate cleaning method
- Patent number 12,131,919
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Tsunenaga Nakashima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,131,918
- Issue date Oct 29, 2024
- Semes Co., Ltd.
- Sang Min Lee
- B08 - CLEANING
Information Patent Grant
Pressure vessel and closure system for improved pressure processing
- Patent number 12,121,884
- Issue date Oct 22, 2024
- Brian Hansen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for fabricating semiconductor device having upper and low...
- Patent number 12,110,593
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treatment device
- Patent number 12,109,597
- Issue date Oct 8, 2024
- Shibaura Mechatronics Corporation
- Daisuke Matsushima
- B08 - CLEANING
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing system
- Patent number 12,112,958
- Issue date Oct 8, 2024
- Highlight Tech Corp.
- Chwung-Shan Kou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and single wafer processing system for processing of semicon...
- Patent number 12,103,052
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Shan Hu
- B08 - CLEANING
Information Patent Grant
Semiconductor device and cleaning system
- Patent number 12,106,975
- Issue date Oct 1, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chao Guo
- B08 - CLEANING
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid preparation device, and substrate processing device
- Patent number 12,064,739
- Issue date Aug 20, 2024
- SCREEN Holdings Co., Ltd.
- Hajime Nishide
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Die bonding apparatus, cleaning head and manufacturing method for s...
- Patent number 12,053,806
- Issue date Aug 6, 2024
- FASFORD TECHNOLOGY CO., LTD.
- Itsuki Ikarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,057,327
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate lift mechanism and reactor including same
- Patent number 12,040,217
- Issue date Jul 16, 2024
- ASM IP Holding B.V.
- Eric Hill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,014,938
- Issue date Jun 18, 2024
- Semes Co., Ltd.
- Yong Hee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer treatment device
- Patent number 12,014,937
- Issue date Jun 18, 2024
- PICO & TERA CO., LTD.
- Bum Je Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer plasma resistant coating by atomic layer deposition
- Patent number 12,002,657
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component for use in a lithographic apparatus, method of protecting...
- Patent number 12,001,149
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System dedicated for parts cleaning
- Patent number 11,986,868
- Issue date May 21, 2024
- ASM IP Holding B.V.
- Yukihiro Mori
- B08 - CLEANING
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOW...
- Publication number 20240425988
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Yong-Jhin CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240429068
- Publication date Dec 26, 2024
- Tokyo Electron Limited
- Yosuke KAWABUCHI
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER TRANSFER DEVICE
- Publication number 20240420977
- Publication date Dec 19, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Hongshuai MA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20240399422
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240395570
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Yoshitomo SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...
- Publication number 20240385512
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- WU-HUNG KO
- B08 - CLEANING
Information Patent Application
METHOD AND DEVICE FOR PRODUCING AND PREPARING ELECTRONIC COMPONENTS
- Publication number 20240387270
- Publication date Nov 21, 2024
- EV GROUP E. THALLNER GMBH
- Jurgen Burggraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240371661
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240361072
- Publication date Oct 31, 2024
- SCREEN Holdings Co., Ltd.
- Tomohiro UEMURA
- F26 - DRYING
Information Patent Application
CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240342672
- Publication date Oct 17, 2024
- SCREEN Holdings Co., Ltd.
- Hajime NISHIDE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DRY ICE CLEANING APPARATUS FOR SEMICONDUCTOR WAFERS AND METHOD FOR...
- Publication number 20240332036
- Publication date Oct 3, 2024
- Taiyo Nippon Sanso Corporation
- Yoshiki YANO
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...
- Publication number 20240321597
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Kaoru YAMAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TREATMENT DEVICE
- Publication number 20240304468
- Publication date Sep 12, 2024
- PICO & TERA CO., LTD.
- Bum Je WOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING SYSTEM
- Publication number 20240290634
- Publication date Aug 29, 2024
- HIGHLIGHT TECH CORP.
- CHWUNG-SHAN KOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AN...
- Publication number 20240274477
- Publication date Aug 15, 2024
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20240249918
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRONIC APPARATUS AND MANUFACTURING METHOD THEREOF
- Publication number 20240251595
- Publication date Jul 25, 2024
- SAMSUNG DISPLAY CO., LTD.
- YOUNG SEO CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240234171
- Publication date Jul 11, 2024
- SEMES CO., LTD.
- Do Hyeon YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240234160
- Publication date Jul 11, 2024
- SCREEN Holdings Co., Ltd.
- Keiji MAGARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE RESTRAINING SYSTEM
- Publication number 20240234196
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Marinus Augustinus Christiaan VERSCHUREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240222154
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Won Sik SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEAN AND DRY MODULE FOR CLEANING A SUBSTRATE
- Publication number 20240222152
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Jason A. RYE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME
- Publication number 20240222153
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Joonhwan Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240213046
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Nobuhiko Mouri
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS AND BONDING SYSTEM
- Publication number 20240203758
- Publication date Jun 20, 2024
- Yamaha Robotics Holdings Co., Ltd.
- Hiroshi KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING SUPERCRITICAL F...
- Publication number 20240186135
- Publication date Jun 6, 2024
- SEMES CO., LTD.
- Hae Won CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING HYGIENE OF A PORTABLE PACKAGED FOOD CONTAINER
- Publication number 20240181107
- Publication date Jun 6, 2024
- ECOLAB USA INC.
- Wenbin Wei
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240178009
- Publication date May 30, 2024
- SEMES CO., LTD.
- Kang Sul KIM
- H01 - BASIC ELECTRIC ELEMENTS

for cleaning followed by drying, rinsing, stripping, blasting or the like

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate cleaning apparatus, substrate cleaning method, and non-tr...

Substrate processing apparatus and substrate processing method

Gas cluster processing device and gas cluster processing method

Post-CMP cleaning and apparatus

Methods and systems for cleaning high aspect ratio structures

Cleaning method, method for forming semiconductor structure and sys...

Cleaning apparatus for component for semiconductor production appar...

Wafer processing tools and methods thereof

Probe cleaning sheet for preventing a probe pin damage and manufact...

Polishing apparatus and polishing method

Substrate cleaning apparatus and substrate cleaning method

Substrate processing apparatus

Pressure vessel and closure system for improved pressure processing

Apparatus for fabricating semiconductor device having upper and low...

Substrate treatment device

PECVD apparatus

Wafer processing system

Method and single wafer processing system for processing of semicon...

Semiconductor device and cleaning system

Method and system for cleaning a process chamber

Chemical liquid preparation device, and substrate processing device

Die bonding apparatus, cleaning head and manufacturing method for s...

Substrate processing apparatus and substrate processing method

Substrate lift mechanism and reactor including same

Apparatus and method for processing substrate

Wafer treatment device

Multi-layer plasma resistant coating by atomic layer deposition

Component for use in a lithographic apparatus, method of protecting...

System dedicated for parts cleaning

Fast response pedestal assembly for selective preclean

Patents Applicationslast 30 patents

APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOW...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WAFER CLEANING APPARATUS AND WAFER TRANSFER DEVICE

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...

METHOD AND DEVICE FOR PRODUCING AND PREPARING ELECTRONIC COMPONENTS

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE

DRY ICE CLEANING APPARATUS FOR SEMICONDUCTOR WAFERS AND METHOD FOR...

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...

WAFER TREATMENT DEVICE

WAFER PROCESSING SYSTEM

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AN...

Processing Chamber With Multiple Plasma Units

ELECTRONIC APPARATUS AND MANUFACTURING METHOD THEREOF

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE RESTRAINING SYSTEM

APPARATUS FOR PROCESSING SUBSTRATE

INTEGRATED CLEAN AND DRY MODULE FOR CLEANING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WAFER CLEANING APPARATUS AND BONDING SYSTEM

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING SUPERCRITICAL F...

METHOD FOR CONTROLLING HYGIENE OF A PORTABLE PACKAGED FOOD CONTAINER

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD