for producing different ions simultaneously

Industry

CPC
H01J2237/0825

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0825for producing different ions simultaneously

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam treatment apparatus
- Patent number 10,603,517
- Issue date Mar 31, 2020
- Electronics and Telecommunications Research Institute
- Dong Hoon Song
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Deposition tool for combinatorial thin film material libraries
- Patent number 10,363,537
- Issue date Jul 30, 2019
- Universiteit Gent
- Christophe Detavernier
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Covering material stripping method and stripping device using ion i...
- Patent number 9,824,858
- Issue date Nov 21, 2017
- SHINMAYWA INDUSTRIES, LTD.
- Kensuke Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas coupled arc chamber cooling
- Patent number 9,275,820
- Issue date Mar 1, 2016
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for processing a substrate
- Patent number 9,093,372
- Issue date Jul 28, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Technique for processing a substrate
- Patent number 9,064,795
- Issue date Jun 23, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for dual energy implantation for ultra-shallow junction form...
- Patent number 9,024,281
- Issue date May 5, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple nozzle gas cluster ion beam system
- Patent number 8,981,322
- Issue date Mar 17, 2015
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source, ion beam processing/observation apparatus, charged part...
- Patent number 8,779,400
- Issue date Jul 15, 2014
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure made using improved pseudo-simultaneous mul...
- Patent number 8,558,195
- Issue date Oct 15, 2013
- Corning Incorporated
- Sarko Cherekdjian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source, ion beam processing/observation apparatus, charged part...
- Patent number 8,481,980
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for dual energy implantation for ultra-shallow junction form...
- Patent number 8,466,050
- Issue date Jun 18, 2013
- Semiconductor Manufacturing International (Shanghai) Corporation
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Navigation and sample processing using an ion source containing bot...
- Patent number 8,455,822
- Issue date Jun 4, 2013
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of irradiating substrate with gas cluster ion beam formed fr...
- Patent number 8,304,033
- Issue date Nov 6, 2012
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, and magnetic recording medium manuf...
- Patent number 8,281,740
- Issue date Oct 9, 2012
- Canon Anelva Corporation
- Kazuto Yamanaka
- G11 - INFORMATION STORAGE
Information Patent Grant
Gas cluster ion beam system with cleaning apparatus
- Patent number 8,173,980
- Issue date May 8, 2012
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple nozzle gas cluster ion beam processing system and method o...
- Patent number 8,097,860
- Issue date Jan 17, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-beam ion/electron spectra-microscope
- Patent number 7,947,951
- Issue date May 24, 2011
- National University of Singapore
- Anjam Khursheed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods of forming a gas cluster ion beam using a low...
- Patent number 7,670,964
- Issue date Mar 2, 2010
- Tokyo Electron Limited
- Scott Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source configuration for production of ionized clusters, ionize...
- Patent number 7,459,704
- Issue date Dec 2, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of silicon-on-insulator structure using plasma immersio...
- Patent number 6,893,907
- Issue date May 17, 2005
- Applied Materials, Inc.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Through-the-lens neutralization for charged particle beam system
- Patent number 6,683,320
- Issue date Jan 27, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-beam ion-beam assembly
- Patent number 6,236,163
- Issue date May 22, 2001
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source having auxillary ion chamber
- Patent number 5,107,170
- Issue date Apr 21, 1992
- Nissin Electric Co., Ltd.
- Junzo Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM TREATMENT APPARATUS
- Publication number 20180361173
- Publication date Dec 20, 2018
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Dong Hoon SONG
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
COVERING MATERIAL STRIPPING METHOD AND STRIPPING DEVICE USING ION I...
- Publication number 20170207065
- Publication date Jul 20, 2017
- ShinMaywa Industries, Ltd.
- Kensuke UEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Tool for Combinatorial Thin Film Material Libraries
- Publication number 20160030909
- Publication date Feb 4, 2016
- Universiteit Gent
- Christophe DETAVERNIER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PART...
- Publication number 20130284593
- Publication date Oct 31, 2013
- Hiroyasu Shichi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...
- Publication number 20130264491
- Publication date Oct 10, 2013
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR PROCESSING A SUBSTRATE
- Publication number 20130260544
- Publication date Oct 3, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUE FOR PROCESSING A SUBSTRATE
- Publication number 20130260543
- Publication date Oct 3, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE MADE USING IMPROVED PSEUDO-SIMULTANEOUS MUL...
- Publication number 20120126147
- Publication date May 24, 2012
- Sarko Cherekdjian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Navigation and Sample Processing Using an Ion Source Containing bot...
- Publication number 20120056088
- Publication date Mar 8, 2012
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS
- Publication number 20110272593
- Publication date Nov 10, 2011
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...
- Publication number 20110143512
- Publication date Jun 16, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- HANMING WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...
- Publication number 20100193708
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...
- Publication number 20100193472
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM
- Publication number 20100193701
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUF...
- Publication number 20100025363
- Publication date Feb 4, 2010
- Canon ANELVA Corporation
- Kazuto Yamanaka
- G11 - INFORMATION STORAGE
Information Patent Application
Multi-beam ion/electron spectra-microscope
- Publication number 20090321634
- Publication date Dec 31, 2009
- National University of Singapore
- Anjam Khursheed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PART...
- Publication number 20090230299
- Publication date Sep 17, 2009
- Hiroyasu Shichi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW...
- Publication number 20080230714
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Scott Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source configuration for production of ionized clusters, ionize...
- Publication number 20060169915
- Publication date Aug 3, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication of silicon-on-insulator structure using plasma immersio...
- Publication number 20040166612
- Publication date Aug 26, 2004
- APPLIED MATERIALS, INC.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Through-the-lens neutralization for charged particle beam system
- Publication number 20020134949
- Publication date Sep 26, 2002
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Through-the-lens-collection of secondary particles for a focused io...
- Publication number 20010032938
- Publication date Oct 25, 2001
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS

for producing different ions simultaneously

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Automated ion-beam alignment for dual-beam instrument

Ion beam treatment apparatus

Deposition tool for combinatorial thin film material libraries

Covering material stripping method and stripping device using ion i...

Gas coupled arc chamber cooling

Technique for processing a substrate

Technique for processing a substrate

Method for dual energy implantation for ultra-shallow junction form...

Multiple nozzle gas cluster ion beam system

Ion source, ion beam processing/observation apparatus, charged part...

Semiconductor structure made using improved pseudo-simultaneous mul...

Ion source, ion beam processing/observation apparatus, charged part...

Method for dual energy implantation for ultra-shallow junction form...

Navigation and sample processing using an ion source containing bot...

Method of irradiating substrate with gas cluster ion beam formed fr...

Substrate processing apparatus, and magnetic recording medium manuf...

Gas cluster ion beam system with cleaning apparatus

Multiple nozzle gas cluster ion beam processing system and method o...

Multi-beam ion/electron spectra-microscope

Apparatus and methods of forming a gas cluster ion beam using a low...

Ion source configuration for production of ionized clusters, ionize...

Fabrication of silicon-on-insulator structure using plasma immersio...

Through-the-lens neutralization for charged particle beam system

Multiple-beam ion-beam assembly

Ion source having auxillary ion chamber

Patents Applicationslast 30 patents

ION BEAM TREATMENT APPARATUS

COVERING MATERIAL STRIPPING METHOD AND STRIPPING DEVICE USING ION I...

Deposition Tool for Combinatorial Thin Film Material Libraries

ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PART...

METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...

TECHNIQUE FOR PROCESSING A SUBSTRATE

TECHNIQUE FOR PROCESSING A SUBSTRATE

SEMICONDUCTOR STRUCTURE MADE USING IMPROVED PSEUDO-SIMULTANEOUS MUL...

Navigation and Sample Processing Using an Ion Source Containing bot...

GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS

METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...

METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM

SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUF...

Multi-beam ion/electron spectra-microscope

ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PART...

APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW...

Ion source configuration for production of ionized clusters, ionize...

Fabrication of silicon-on-insulator structure using plasma immersio...

Through-the-lens neutralization for charged particle beam system

Through-the-lens-collection of secondary particles for a focused io...