for repairing masks

Industry

CPC
H01J2237/31742

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31742for repairing masks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam blanker and method for blanking a charged particle beam
- Patent number 10,410,820
- Issue date Sep 10, 2019
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low energy ion milling or deposition
- Patent number 9,206,504
- Issue date Dec 8, 2015
- FEI Company
- Johannes Jacobus Lambertus Mulders
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle-beam processing using a cluster source
- Patent number 8,835,880
- Issue date Sep 16, 2014
- FEI Company
- Clive Chandler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect repair apparatus and method for EUV mask using a hydrogen io...
- Patent number 8,460,842
- Issue date Jun 11, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for counting secondary particles
- Patent number 8,093,567
- Issue date Jan 10, 2012
- Fibics Incorporated
- Ken Guillaume Lagarec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam defining process enhancement
- Patent number 7,886,260
- Issue date Feb 8, 2011
- Intel Corporation
- Hsin Wey Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ high-resolution light-optical channel for optical viewing a...
- Patent number 7,781,733
- Issue date Aug 24, 2010
- International Business Machines Corporation
- Steven B. Herschbein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing method and system
- Patent number 7,391,039
- Issue date Jun 24, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichi Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EPL mask processing method and device thereof
- Patent number 7,060,397
- Issue date Jun 13, 2006
- SII NanoTechnology Inc.
- Yo Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 6,979,822
- Issue date Dec 27, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for automatic optimal location of an operation on...
- Patent number 6,970,759
- Issue date Nov 29, 2005
- Centre National d'Etudes Spatiales (C.N.E.S.)
- Romain Desplats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dual-focused ion beams for semiconductor image scanning and mask re...
- Patent number 6,653,029
- Issue date Nov 25, 2003
- Taiwan Semiconductor Manufacturing Co. Ltd
- Chuan-Yuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for assisting backside focused ion beam device modification
- Patent number 6,566,681
- Issue date May 20, 2003
- International Business Machines Corporation
- David E. Lackey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for repairing pattern defect, photo mask using the method, a...
- Patent number 6,335,129
- Issue date Jan 1, 2002
- Kabushiki Kaisha Toshiba
- Mitsuyo Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect repair system and method which controls a dose of a par...
- Patent number 6,028,953
- Issue date Feb 22, 2000
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method of producing dual ion/electron source
- Patent number 5,977,549
- Issue date Nov 2, 1999
- United Microelectronics Corp.
- Yuh-Lin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer fixing unit for focused ion beam apparatus
- Patent number 5,969,364
- Issue date Oct 19, 1999
- Samsung Electronics Co., Ltd.
- Sang-young Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and method for irradiating focused ion beam
- Patent number 5,852,297
- Issue date Dec 22, 1998
- Tohru Ishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus using focused ion beam generating m...
- Patent number 5,825,035
- Issue date Oct 20, 1998
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask defect repair system and method
- Patent number 5,799,104
- Issue date Aug 25, 1998
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-masking FIB milling
- Patent number 5,616,921
- Issue date Apr 1, 1997
- Schlumberger Technologies Inc.
- Christopher G. Talbot
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process method and apparatus using focused ion beam generating means
- Patent number 5,583,344
- Issue date Dec 10, 1996
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image-to-image registration focused ion beam system
- Patent number 5,541,411
- Issue date Jul 30, 1996
- FEI Company
- John M. Lindquist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment and observation apparatus using scanning probe
- Patent number 5,532,494
- Issue date Jul 2, 1996
- Hitachi, Ltd.
- Yoshimi Kawanami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of repairing a pattern using a photomask pattern repair device
- Patent number 5,504,339
- Issue date Apr 2, 1996
- Kabushiki Kaisha Toshiba
- Satoshi Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process method and apparatus using focused ion beam generating means
- Patent number 5,504,340
- Issue date Apr 2, 1996
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system
- Patent number 5,435,850
- Issue date Jul 25, 1995
- FEI Company
- Jorgen Rasmussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout overlay for FIB operations
- Patent number 5,401,972
- Issue date Mar 28, 1995
- Schlumberger Technologies, Inc.
- Christopher G. Talbot
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT
- Publication number 20240310722
- Publication date Sep 19, 2024
- Carl Zeiss SMT GMBH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Energy Ion Milling or Deposition
- Publication number 20140302252
- Publication date Oct 9, 2014
- FEI Company
- Johannes Jacobus Lambertus Mulders
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Defect repair apparatus and method for EUV mask
- Publication number 20110189593
- Publication date Aug 4, 2011
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR COUNTING SECONDARY PARTICLES
- Publication number 20100084568
- Publication date Apr 8, 2010
- FIBICS INCORPORATED
- Ken Guillaume Lagarec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused ion beam defining process enhancement
- Publication number 20080301615
- Publication date Dec 4, 2008
- Hsin Wey Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU HIGH-RESOLUTION LIGHT-OPTICAL CHANNEL FOR OPTICAL VIEWING A...
- Publication number 20080283777
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Steven B. Herschbein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam Apparatus
- Publication number 20080156998
- Publication date Jul 3, 2008
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-particle-beam processing using a cluster source
- Publication number 20080142735
- Publication date Jun 19, 2008
- FEI Company
- Clive Chandler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing method and system
- Publication number 20060255270
- Publication date Nov 16, 2006
- Yuichi Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM
- Publication number 20050279934
- Publication date Dec 22, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Application
EPL mask processing method and device thereof
- Publication number 20030232258
- Publication date Dec 18, 2003
- Yo Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and device for automatic optimal location of an operation on...
- Publication number 20030079187
- Publication date Apr 24, 2003
- Romain Desplats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dual-focused ion beams for semiconductor image scanning and mask re...
- Publication number 20030031961
- Publication date Feb 13, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chuan-Yuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for assisting backside focused ion beam device modification
- Publication number 20030015671
- Publication date Jan 23, 2003
- International Business Machines Corporation
- David E. Lackey
- H01 - BASIC ELECTRIC ELEMENTS

for repairing masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for repairing a photolithographic mask

Beam blanker and method for blanking a charged particle beam

Low energy ion milling or deposition

Charged particle-beam processing using a cluster source

Defect repair apparatus and method for EUV mask using a hydrogen io...

Method and system for counting secondary particles

Focused ion beam defining process enhancement

In-situ high-resolution light-optical channel for optical viewing a...

Semiconductor processing method and system

EPL mask processing method and device thereof

Charged particle beam system

Method and device for automatic optimal location of an operation on...

Dual-focused ion beams for semiconductor image scanning and mask re...

Apparatus for assisting backside focused ion beam device modification

Method for repairing pattern defect, photo mask using the method, a...

Mask defect repair system and method which controls a dose of a par...

Apparatus and method of producing dual ion/electron source

Wafer fixing unit for focused ion beam apparatus

Focused ion beam apparatus and method for irradiating focused ion beam

Processing method and apparatus using focused ion beam generating m...

Mask defect repair system and method

Self-masking FIB milling

Process method and apparatus using focused ion beam generating means

Image-to-image registration focused ion beam system

Treatment and observation apparatus using scanning probe

Method of repairing a pattern using a photomask pattern repair device

Process method and apparatus using focused ion beam generating means

Gas injection system

Layout overlay for FIB operations

Patents Applicationslast 30 patents

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

Low Energy Ion Milling or Deposition

Defect repair apparatus and method for EUV mask

METHOD AND SYSTEM FOR COUNTING SECONDARY PARTICLES

Focused ion beam defining process enhancement

IN-SITU HIGH-RESOLUTION LIGHT-OPTICAL CHANNEL FOR OPTICAL VIEWING A...

Focused Ion Beam Apparatus

Charged-particle-beam processing using a cluster source

Semiconductor processing method and system

CHARGED PARTICLE BEAM SYSTEM

EPL mask processing method and device thereof

Method and device for automatic optimal location of an operation on...

Dual-focused ion beams for semiconductor image scanning and mask re...

Apparatus for assisting backside focused ion beam device modification