for X-Y scanning

Industry

CPC
H01J2237/1518

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1518for X-Y scanning

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,705,300
- Issue date Jul 18, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of influencing a charged particle beam, multipole device, an...
- Patent number 11,501,946
- Issue date Nov 15, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam irradiation apparatus and multi-charged...
- Patent number 11,417,495
- Issue date Aug 16, 2022
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, apparatus and method for bunched ribbon ion beam
- Patent number 11,217,427
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device
- Patent number 10,818,470
- Issue date Oct 27, 2020
- HITACHI HIGH-TECH CORPORATION
- Kazuki Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam low kV enhancement
- Patent number 9,443,692
- Issue date Sep 13, 2016
- FEI Company
- Mostafa Maazouz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-energy ion implanter
- Patent number 9,390,890
- Issue date Jul 12, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsuaki Kabasawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Sample observing device and sample observing method
- Patent number 8,884,225
- Issue date Nov 11, 2014
- Ebara Corporation
- Tsutomu Karimata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,624,206
- Issue date Jan 7, 2014
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,314,409
- Issue date Nov 20, 2012
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflector array, exposure apparatus, and device manufacturing method
- Patent number 8,143,588
- Issue date Mar 27, 2012
- Canon Kabushiki Kaisha
- Kenichi Nagae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and method thereof
- Patent number 8,080,809
- Issue date Dec 20, 2011
- Nuflare Technology, Inc.
- Takayuki Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and systems for testing digital-to-analog converter/amplifi...
- Patent number 7,898,447
- Issue date Mar 1, 2011
- NuFlare Technology, Inc.
- Yoshikuni Goshima
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Deflector array, exposure apparatus, and device manufacturing method
- Patent number 7,795,597
- Issue date Sep 14, 2010
- Canon Kabushiki Kaisha
- Kenichi Nagae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer-scale microcolumn array using low temperature co-fired cerami...
- Patent number 7,598,594
- Issue date Oct 6, 2009
- Electronics and Telecommunications Research Institute
- Jin Woo Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic deflection system with low aberrations and vertical b...
- Patent number 7,315,029
- Issue date Jan 1, 2008
- Applied Materials, Inc.
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput/high resolution particle beam system
- Patent number 4,445,039
- Issue date Apr 24, 1984
- The Perkin-Elmer Corp.
- Nelson C. Yew
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
- Publication number 20240096587
- Publication date Mar 21, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER
- Publication number 20230282439
- Publication date Sep 7, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF INFLUENCING A CHARGED PARTICLE BEAM, MULTIPOLE DEVICE, AN...
- Publication number 20220277921
- Publication date Sep 1, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED...
- Publication number 20210319974
- Publication date Oct 14, 2021
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS
- Publication number 20210296075
- Publication date Sep 23, 2021
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200043695
- Publication date Feb 6, 2020
- Hitachi High-Technologies Corporation
- Kazuki IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS
- Publication number 20190267209
- Publication date Aug 29, 2019
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUSED ION BEAM LOW KV ENHANCEMENT
- Publication number 20150325403
- Publication date Nov 12, 2015
- FEI Company
- Mostafa Maazouz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-ENERGY ION IMPLANTER
- Publication number 20140352615
- Publication date Dec 4, 2014
- SEN Corporation
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam Low kV Enhancement
- Publication number 20140239175
- Publication date Aug 28, 2014
- FEI Company
- Mostafa Maazouz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE OBSERVING DEVICE AND SAMPLE OBSERVING METHOD
- Publication number 20130161511
- Publication date Jun 27, 2013
- EBARA CORPORATION
- Tsutomu Karimata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Modification Schemes for Improved FIB Patterning
- Publication number 20130092826
- Publication date Apr 18, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING
- Publication number 20110049382
- Publication date Mar 3, 2011
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR TESTING DIGITAL-TO-ANALOG CONVERTER/AMPLIFI...
- Publication number 20110012617
- Publication date Jan 20, 2011
- Yoshikuni GOSHIMA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Deflector Array, Exposure Apparatus, and Device Manufacturing Method
- Publication number 20100248166
- Publication date Sep 30, 2010
- Canon Kabushiki Kaisha
- Kenichi Nagae
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER...
- Publication number 20090032725
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF
- Publication number 20090008568
- Publication date Jan 8, 2009
- NuFlare Technology, Inc.
- Takayuki ABE
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
- Publication number 20080017807
- Publication date Jan 24, 2008
- Canon Kabushiki Kaisha
- Kenichi Nagae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatic deflection system with low aberrations and vertical b...
- Publication number 20070075262
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer-scale microcolumn array using low temperature co-fired cerami...
- Publication number 20060131698
- Publication date Jun 22, 2006
- Jin Woo Jeong
- B82 - NANO-TECHNOLOGY

for X-Y scanning

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor wafer

Method and device for implanting ions in wafers

Method of influencing a charged particle beam, multipole device, an...

Multi-charged particle beam irradiation apparatus and multi-charged...

System, apparatus and method for bunched ribbon ion beam

Method and device for implanting ions in wafers

Charged particle beam device

Focused ion beam low kV enhancement

High-energy ion implanter

Sample observing device and sample observing method

Pattern modification schemes for improved FIB patterning

Pattern modification schemes for improved FIB patterning

Deflector array, exposure apparatus, and device manufacturing method

Charged particle beam writing apparatus and method thereof

Methods and systems for testing digital-to-analog converter/amplifi...

Deflector array, exposure apparatus, and device manufacturing method

Wafer-scale microcolumn array using low temperature co-fired cerami...

Electrostatic deflection system with low aberrations and vertical b...

High throughput/high resolution particle beam system

Patents Applicationslast 30 patents

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM

SEMICONDUCTOR WAFER

METHOD OF INFLUENCING A CHARGED PARTICLE BEAM, MULTIPOLE DEVICE, AN...

MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED...

METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS

CHARGED PARTICLE BEAM DEVICE

METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS

FOCUSED ION BEAM LOW KV ENHANCEMENT

HIGH-ENERGY ION IMPLANTER

Focused Ion Beam Low kV Enhancement

SAMPLE OBSERVING DEVICE AND SAMPLE OBSERVING METHOD

Pattern Modification Schemes for Improved FIB Patterning

PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING

METHODS AND SYSTEMS FOR TESTING DIGITAL-TO-ANALOG CONVERTER/AMPLIFI...

Deflector Array, Exposure Apparatus, and Device Manufacturing Method

APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF

DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Electrostatic deflection system with low aberrations and vertical b...

Wafer-scale microcolumn array using low temperature co-fired cerami...