formed by oxidation

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H01L21/3165

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3165formed by oxidation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of forming a semiconductor device by thermally treating a c...
- Patent number 9,799,523
- Issue date Oct 24, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui OuYang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanowire and method of fabricating the same
- Patent number 9,735,235
- Issue date Aug 15, 2017
- United Microelectronics Corp.
- Tsai-Yu Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post treatment methods for oxide layers on semiconductor devices
- Patent number 9,431,237
- Issue date Aug 30, 2016
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanowire and method of fabricating the same
- Patent number 9,431,483
- Issue date Aug 30, 2016
- United Microelectronics Corp.
- Tsai-Yu Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon germanium and germanium multigate and nanowire structures f...
- Patent number 9,343,302
- Issue date May 17, 2016
- Intel Corporation
- Been-Yih Jin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of forming a semiconductor device
- Patent number 9,159,582
- Issue date Oct 13, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui OuYang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 9,059,229
- Issue date Jun 16, 2015
- Hitachi Kokusai Electric Inc.
- Tadashi Terasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing localised GeOI structures, obtained by german...
- Patent number 9,040,391
- Issue date May 26, 2015
- Commissariat a l'Energie Atomique
- Jean-François Damlencourt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High rate deposition method of magnetic nanocomposites
- Patent number 9,023,422
- Issue date May 5, 2015
- Maxim Integrated Products, Inc.
- Uppili Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor gate structure and semiconductor g...
- Patent number 9,006,088
- Issue date Apr 14, 2015
- Tsinghua University
- Mei Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon germanium and germanium multigate and nanowire structures f...
- Patent number 8,936,974
- Issue date Jan 20, 2015
- Intel Corporation
- Been-Yin Jin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing a non-volatile semiconductor memory device...
- Patent number 8,865,546
- Issue date Oct 21, 2014
- Fujitsu Semiconductor Limited
- Tetsuya Yamada
- G11 - INFORMATION STORAGE
Information Patent Grant
Dense seed layer and method of formation
- Patent number 8,766,447
- Issue date Jul 1, 2014
- Infineon Technologies AG
- Stefan Wurm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device with a contact pad on a sl...
- Patent number 8,674,511
- Issue date Mar 18, 2014
- Toyota Jidosha Kabushiki Kaisha
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction using oxide spacer
- Patent number 8,592,318
- Issue date Nov 26, 2013
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of thermally treating silicon with oxygen
- Patent number 8,497,193
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and a structure for enhancing electrical insulation and dyna...
- Patent number 8,476,136
- Issue date Jul 2, 2013
- STMicroelectronics S.r.l.
- Anna Borzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a contact plug connecting to a silicide...
- Patent number 8,466,509
- Issue date Jun 18, 2013
- Fujitsu Semiconductor Limited
- Tetsuya Yamada
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods for forming conformal oxide layers on semiconductor devices
- Patent number 8,435,906
- Issue date May 7, 2013
- Applied Materials, Inc.
- Agus S. Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric structures
- Patent number 8,421,140
- Issue date Apr 16, 2013
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water cooled gas injector
- Patent number 8,409,353
- Issue date Apr 2, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Printed dopant layers
- Patent number 8,304,780
- Issue date Nov 6, 2012
- Kovio, Inc.
- Arvind Kamath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for growing thin oxide films on silicon while...
- Patent number 8,236,706
- Issue date Aug 7, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures resulting from selective oxidation
- Patent number 8,227,875
- Issue date Jul 24, 2012
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the formation of a gate oxide on a SiC substrate and SiC...
- Patent number 8,217,398
- Issue date Jul 10, 2012
- General Electric Company
- Victor Lienkong Lou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 8,183,670
- Issue date May 22, 2012
- Foundation fõr Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dense seed layer and method of formation
- Patent number 8,148,821
- Issue date Apr 3, 2012
- Infineon Technologies AG
- Stefan Wurm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating oxide layers on silicon carbide layers utili...
- Patent number 8,119,539
- Issue date Feb 21, 2012
- Cree, Inc.
- Mrinal K. Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra shallow junction formation by epitaxial interface limited dif...
- Patent number 8,067,805
- Issue date Nov 29, 2011
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system, processing method, and computer program
- Patent number 8,055,372
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Yuki Kataoka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SILICON GERMANIUM AND GERMANIUM MULTIGATE AND NANOWIRE STRUCTURES F...
- Publication number 20140170817
- Publication date Jun 19, 2014
- Been-Yih Jin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Substrate Processing Apparatus and Method of Manufacturing Semicond...
- Publication number 20140106573
- Publication date Apr 17, 2014
- Hitachi Kokusai Electric Inc.
- Tadashi TERASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20130034955
- Publication date Feb 7, 2013
- Toyota Jidosha Kabushiki Kaisha
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A CONTACT PLUG CONNECTING TO A SILICIDE...
- Publication number 20130005098
- Publication date Jan 3, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Tetsuya Yamada
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20120298039
- Publication date Nov 29, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20120208375
- Publication date Aug 16, 2012
- Foundation for Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND A STRUCTURE FOR ENHANCING ELECTRICAL INSULATION AND DYNA...
- Publication number 20120146135
- Publication date Jun 14, 2012
- STMicroelectronics S.r.l.
- Anna Borzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dense Seed Layer and Method of Formation
- Publication number 20120139117
- Publication date Jun 7, 2012
- INFINEON TECHNOLOGIES AG
- Stefan Wurm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCTION USING OXIDE SPACER
- Publication number 20120052683
- Publication date Mar 1, 2012
- LAM RESEARCH CORPORATION
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Water cooled gas injector
- Publication number 20120031332
- Publication date Feb 9, 2012
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of thermally treating silicon with oxygen
- Publication number 20110250764
- Publication date Oct 13, 2011
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...
- Publication number 20110039418
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON GERMANIUM AND GERMANIUM MULTIGATE AND NANOWIRE STRUCTURES F...
- Publication number 20110008937
- Publication date Jan 13, 2011
- Been-Yih Jin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Post Treatment Methods for Oxide Layers on Semiconductor Devices
- Publication number 20100267248
- Publication date Oct 21, 2010
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100258943
- Publication date Oct 14, 2010
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Printed Dopant Layers
- Publication number 20100244133
- Publication date Sep 30, 2010
- Arvind KAMATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES RESULTING FROM SELECTIVE OXIDATION
- Publication number 20100244158
- Publication date Sep 30, 2010
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE
- Publication number 20100221917
- Publication date Sep 2, 2010
- Sumitomo Electric Industries, Ltd.
- Takeyoshi Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Conformal Oxide Layers on Semiconductor Devices
- Publication number 20100216317
- Publication date Aug 26, 2010
- Applied Materials, Inc.
- Agus S. Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...
- Publication number 20100184267
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolated germanium nanowire on silicon fin
- Publication number 20100164102
- Publication date Jul 1, 2010
- Willy Rachmady
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20100151694
- Publication date Jun 17, 2010
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MODIFYING INSULATING FILM
- Publication number 20100105215
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20100096707
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR THE FORMATION OF A GATE OXIDE ON A SIC SUBSTRATE AND SIC...
- Publication number 20100090227
- Publication date Apr 15, 2010
- GENERAL ELECTRIC COMPANY
- Victor Lienkong Lou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCING LOCALISED Ge0I STRUCTURES, OBTAINED BY GERMAN...
- Publication number 20100044836
- Publication date Feb 25, 2010
- COMMISSARIAT A L'ENERGIE ATOMIQUE
- Jean-François Damlencourt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IC FORMED WITH DENSIFIED CHEMICAL OXIDE LAYER
- Publication number 20100032813
- Publication date Feb 11, 2010
- TEXAS INSTRUMENTS INCORPORATED
- Deborah J. Riley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Rapid Thermal Treatment Using High Energy Electromagneti...
- Publication number 20100009528
- Publication date Jan 14, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- David GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Fabricating Oxide Layers on Silicon Carbide Layers Utili...
- Publication number 20100009545
- Publication date Jan 14, 2010
- Mrinal K. Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING THIN LAYERS BY A THERMALLY ACTIVATED PROCESS USIN...
- Publication number 20090246371
- Publication date Oct 1, 2009
- Fabian Koehler
- H01 - BASIC ELECTRIC ELEMENTS

formed by oxidation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming a semiconductor device by thermally treating a c...

Nanowire and method of fabricating the same

Post treatment methods for oxide layers on semiconductor devices

Nanowire and method of fabricating the same

Silicon germanium and germanium multigate and nanowire structures f...

Methods of forming a semiconductor device

Substrate processing apparatus and method of manufacturing semicond...

Process for producing localised GeOI structures, obtained by german...

High rate deposition method of magnetic nanocomposites

Method for forming semiconductor gate structure and semiconductor g...

Silicon germanium and germanium multigate and nanowire structures f...

Method for manufacturing a non-volatile semiconductor memory device...

Dense seed layer and method of formation

Method of forming a semiconductor device with a contact pad on a sl...

Pitch reduction using oxide spacer

Method of thermally treating silicon with oxygen

Method and a structure for enhancing electrical insulation and dyna...

Semiconductor device having a contact plug connecting to a silicide...

Methods for forming conformal oxide layers on semiconductor devices

Dielectric structures

Water cooled gas injector

Printed dopant layers

Method and apparatus for growing thin oxide films on silicon while...

Semiconductor structures resulting from selective oxidation

Method for the formation of a gate oxide on a SiC substrate and SiC...

Semiconductor device and method of manufacturing the same

Dense seed layer and method of formation

Methods of fabricating oxide layers on silicon carbide layers utili...

Ultra shallow junction formation by epitaxial interface limited dif...

Processing system, processing method, and computer program

Patents Applicationslast 30 patents

SILICON GERMANIUM AND GERMANIUM MULTIGATE AND NANOWIRE STRUCTURES F...

Substrate Processing Apparatus and Method of Manufacturing Semicond...

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE HAVING A CONTACT PLUG CONNECTING TO A SILICIDE...

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

METHOD AND A STRUCTURE FOR ENHANCING ELECTRICAL INSULATION AND DYNA...

Dense Seed Layer and Method of Formation

PITCH REDUCTION USING OXIDE SPACER

Water cooled gas injector

Method of thermally treating silicon with oxygen

METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...

SILICON GERMANIUM AND GERMANIUM MULTIGATE AND NANOWIRE STRUCTURES F...

Post Treatment Methods for Oxide Layers on Semiconductor Devices

SEMICONDUCTOR DEVICE

Printed Dopant Layers

SEMICONDUCTOR STRUCTURES RESULTING FROM SELECTIVE OXIDATION

METHOD OF MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE

Methods for Forming Conformal Oxide Layers on Semiconductor Devices

METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...

Isolated germanium nanowire on silicon fin

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

METHOD OF MODIFYING INSULATING FILM

Method for Forming Insulation Film

METHOD FOR THE FORMATION OF A GATE OXIDE ON A SIC SUBSTRATE AND SIC...

PROCESS FOR PRODUCING LOCALISED Ge0I STRUCTURES, OBTAINED BY GERMAN...

IC FORMED WITH DENSIFIED CHEMICAL OXIDE LAYER

Method for Rapid Thermal Treatment Using High Energy Electromagneti...

Methods of Fabricating Oxide Layers on Silicon Carbide Layers Utili...

METHOD OF FORMING THIN LAYERS BY A THERMALLY ACTIVATED PROCESS USIN...