Frequency modulation

Industry

CPC
H01J37/32155

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32155Frequency modulation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method
- Patent number 12,154,792
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,119,208
- Issue date Oct 15, 2024
- Daihen Corporation
- Yuya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator, plasma treatment device, and method for providing...
- Patent number 12,087,544
- Issue date Sep 10, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,057,294
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF current measurement in semiconductor processing tool
- Patent number 12,051,630
- Issue date Jul 30, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,996,276
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for tuning a MHz RF generator within a cycle of...
- Patent number 11,929,235
- Issue date Mar 12, 2024
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitance measurement without disconnecting from high power circuit
- Patent number 11,881,381
- Issue date Jan 23, 2024
- Lam Research Corporation
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor having a function of tuning low frequency RF power d...
- Patent number 11,830,747
- Issue date Nov 28, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing coated substrates
- Patent number 11,814,718
- Issue date Nov 14, 2023
- Bühler Alzenau GmbH
- Jürgen Pistner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-frequency power supply system
- Patent number 11,756,768
- Issue date Sep 12, 2023
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD apparatus for in-situ deposition of film stacks
- Patent number 11,746,420
- Issue date Sep 5, 2023
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for pulse modulation of radio frequency power sup...
- Patent number 11,749,502
- Issue date Sep 5, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Gang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for common excitation of frequency generators
- Patent number 11,749,504
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Gary Leray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and method for fabricating semiconductor devic...
- Patent number 11,725,271
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Ki Woong Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive pulse shaping with post match sensor
- Patent number 11,715,624
- Issue date Aug 1, 2023
- MKS Instruments, Inc.
- Jonathan W. Smyka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,581,169
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and tuning method for mitigating RF load impedance variat...
- Patent number 11,527,384
- Issue date Dec 13, 2022
- MKS Instruments, Inc.
- Aaron M. Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 11,437,219
- Issue date Sep 6, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive periodic waveform controller
- Patent number 11,367,592
- Issue date Jun 21, 2022
- MKS Instruments, Inc.
- Larry J. Fisk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment of power and frequency based on three or more states
- Patent number 11,361,942
- Issue date Jun 14, 2022
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator, plasma treatment device, and method for providing...
- Patent number 11,355,316
- Issue date Jun 7, 2022
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and method for fabricating semiconductor devic...
- Patent number 11,339,467
- Issue date May 24, 2022
- Samsung Electronics Co., Ltd.
- Ki Woong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to enhance sheath formation, evolution and pul...
- Patent number 11,315,757
- Issue date Apr 26, 2022
- MKS Instruments, Inc.
- Linnell Martinez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,295,937
- Issue date Apr 5, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control apparatus
- Patent number 11,195,697
- Issue date Dec 7, 2021
- SPP Technologies Co., Ltd.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...
- Publication number 20240429026
- Publication date Dec 26, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240355584
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
- Publication number 20240347400
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION
- Publication number 20240332003
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Qinghua Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS
- Publication number 20240321551
- Publication date Sep 26, 2024
- Sony Semiconductor Solutions Corporation
- Kiyotaka TABUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20240290588
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING POWER SUPPLY WITH POWERED CROWBAR
- Publication number 20240282552
- Publication date Aug 22, 2024
- EHT Ventures LLC
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCHING
- Publication number 20240274408
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY GENERATION DEVICE FOR PROVIDING BIAS POWER IN SEMICONDUCT...
- Publication number 20240274406
- Publication date Aug 15, 2024
- EN2CORE TECHNOLOGY, INC.
- Se Hong PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY APPARATUS
- Publication number 20240222077
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222082
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222076
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuya UENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...
- Publication number 20240222078
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222083
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION OF IMPEDANCE MODULATION IN A PLASMA GENERATOR BY FREQU...
- Publication number 20240212983
- Publication date Jun 27, 2024
- Advanced Energy Industries, Inc.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND PLASMA DENSITY CONTROL METHOD
- Publication number 20240203690
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Hyoung Kyu SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
- Publication number 20240194446
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TUNING A MHZ RF GENERATOR WITHIN A CYCLE OF...
- Publication number 20240186111
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240120176
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT
- Publication number 20240096598
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240006152
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20230366094
- Publication date Nov 16, 2023
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adaptive Pulse Shaping With Post Match Sensor
- Publication number 20230326721
- Publication date Oct 12, 2023
- MKS Instruments, Inc.
- Jonathan SMYKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETI...
- Publication number 20230317427
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Duk Hyun SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230268161
- Publication date Aug 24, 2023
- TOKYO ELECTRON LIMITED
- Cedric THOMAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230215693
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Chan Yong AN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20230207294
- Publication date Jun 29, 2023
- Samsung Electronics Co., Ltd.
- Hadong JIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20230197424
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS

Frequency modulation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma etching method

High-frequency power supply device

Plasma generator, plasma treatment device, and method for providing...

Plasma reactor having a variable coupling of low frequency RF power...

Plasma processing apparatus and plasma processing method

RF current measurement in semiconductor processing tool

Ion collector for use in plasma systems

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and lower stage

Systems and methods for tuning a MHz RF generator within a cycle of...

Capacitance measurement without disconnecting from high power circuit

Plasma reactor having a function of tuning low frequency RF power d...

Method for producing coated substrates

High-frequency power supply system

PECVD apparatus for in-situ deposition of film stacks

System and method for pulse modulation of radio frequency power sup...

Methods and apparatus for common excitation of frequency generators

Sputtering apparatus and method for fabricating semiconductor devic...

Adaptive pulse shaping with post match sensor

Ion collector for use in plasma systems

Apparatus and tuning method for mitigating RF load impedance variat...

Frequency tuning for a matchless plasma source

Adaptive periodic waveform controller

Adjustment of power and frequency based on three or more states

Plasma generator, plasma treatment device, and method for providing...

Sputtering apparatus and method for fabricating semiconductor devic...

Method and apparatus to enhance sheath formation, evolution and pul...

Broadband plasma processing systems and methods

Sequential deposition and high frequency plasma treatment of deposi...

Plasma control apparatus

Patents Applicationslast 30 patents

PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL

PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS

RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

PULSING POWER SUPPLY WITH POWERED CROWBAR

HIGH ENERGY ATOMIC LAYER ETCHING

FREQUENCY GENERATION DEVICE FOR PROVIDING BIAS POWER IN SEMICONDUCT...

HIGH-FREQUENCY POWER SUPPLY APPARATUS

HIGH-FREQUENCY POWER SUPPLY SYSTEM

HIGH-FREQUENCY POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...

METHOD OF CONTROLLING HIGH-FREQUENCY POWER SUPPLY SYSTEM

COMPENSATION OF IMPEDANCE MODULATION IN A PLASMA GENERATOR BY FREQU...

SUBSTRATE TREATMENT APPARATUS AND PLASMA DENSITY CONTROL METHOD

CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER

SYSTEMS AND METHODS FOR TUNING A MHZ RF GENERATOR WITHIN A CYCLE OF...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT

ETCHING METHOD AND ETCHING APPARATUS

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

Adaptive Pulse Shaping With Post Match Sensor

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETI...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM

ION COLLECTOR FOR USE IN PLASMA SYSTEMS