from patterned cold cathode

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CPC
H01J2237/31781

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31781from patterned cold cathode

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Individually switched field emission arrays
- Patent number 9,748,071
- Issue date Aug 29, 2017
- Massachusetts Institute of Technology
- Stephen Angelo Guerrera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electron beam lithography using array cat...
- Patent number 9,715,995
- Issue date Jul 25, 2017
- KLA-Tencor Corporation
- Keith Standiford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing apparatus and lithography system using the same
- Patent number 7,646,003
- Issue date Jan 12, 2010
- Samsung Electronics Co., Ltd.
- Chang-Wook Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus using a patterned emitter
- Patent number 6,815,681
- Issue date Nov 9, 2004
- Samsung Electronics Co., Ltd.
- Dong-wook Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron projection lithography apparatus using secondary electrons
- Patent number 6,784,438
- Issue date Aug 31, 2004
- Samsung Electronics Co., Ltd.
- In-kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical field enhanced electron image projector
- Patent number 4,968,894
- Issue date Nov 6, 1990
- Texas Instruments Incorporated
- George R. Misium
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Thermo-enhanced electron image projector
- Patent number 4,928,018
- Issue date May 22, 1990
- Texas Instruments, Incorporated
- George R. Misium
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electro-lithography method
- Patent number 4,119,688
- Issue date Oct 10, 1978
- International Business Machines Corporation
- Hiroyuki Hiraoka
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focusing apparatus and lithography system using the same
- Publication number 20060151712
- Publication date Jul 13, 2006
- Chang-Wook Moon
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron projection lithography apparatus using secondary electrons
- Publication number 20040084637
- Publication date May 6, 2004
- In-kyeong Yoo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam lithography apparatus using a patterned emitter
- Publication number 20040007680
- Publication date Jan 15, 2004
- Dong-Wook Kim
- B82 - NANO-TECHNOLOGY

from patterned cold cathode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam lithography apparatus and charged particle be...

Charged particle beam lithography apparatus and charged particle be...

Individually switched field emission arrays

Apparatus and methods for electron beam lithography using array cat...

Focusing apparatus and lithography system using the same

Electron beam lithography apparatus using a patterned emitter

Electron projection lithography apparatus using secondary electrons

Electrical field enhanced electron image projector

Thermo-enhanced electron image projector

Electro-lithography method

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

Focusing apparatus and lithography system using the same

Electron projection lithography apparatus using secondary electrons

Electron beam lithography apparatus using a patterned emitter