from patterned photocathode

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CPC
H01J2237/31779

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31779from patterned photocathode

Industries

Patents Grantslast 30 patents

Information Patent Grant
Modular parallel electron lithography
- Patent number 10,937,630
- Issue date Mar 2, 2021
- John Bennett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated photoemission sources and scalable photoemission structures
- Patent number 9,881,762
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Ravi K. Bonam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct write lithography system
- Patent number 8,610,093
- Issue date Dec 17, 2013
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Direct write lithography system
- Patent number 8,153,991
- Issue date Apr 10, 2012
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam irradiation device
- Patent number 7,829,863
- Issue date Nov 9, 2010
- Kyoto University
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography method and apparatus using a dynamically...
- Patent number 7,696,498
- Issue date Apr 13, 2010
- KLA-Tencor Technologies Corporation
- Allen M. Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hetero-junction electron emitter with Group III nitride and activat...
- Patent number 7,446,474
- Issue date Nov 4, 2008
- Applied Materials, Inc.
- Juan Ramon Maldonado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method
- Patent number 7,306,896
- Issue date Dec 11, 2007
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter for electron-beam projection lithography system, and method...
- Patent number 7,256,406
- Issue date Aug 14, 2007
- Samsung Electronics Co., Ltd.
- In-kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam pattern generator with photocathode comprising low wo...
- Patent number 7,161,162
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Juan Ramon Maldonado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tiling of modulator arrays
- Patent number 7,106,417
- Issue date Sep 12, 2006
- Silicon Light Machines Corporation
- David T. Amm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography system having improved electron gun
- Patent number 7,095,037
- Issue date Aug 22, 2006
- Andres Fernadez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generating electrons with an activated photocathode
- Patent number 7,015,467
- Issue date Mar 21, 2006
- Applied Materials, Inc.
- Juan Ramon Maldonado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method and apparatus
- Patent number 7,011,927
- Issue date Mar 14, 2006
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron bombardment of wide bandgap semiconductors for generating...
- Patent number 7,005,795
- Issue date Feb 28, 2006
- The Board of Trustees of the Leland Stanford Junior University
- Daniel S. Pickard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Retarding electron beams in multiple electron beam pattern generation
- Patent number 6,936,981
- Issue date Aug 30, 2005
- Applied Materials, Inc.
- Mark Alan Gesley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct write lithography system
- Patent number 6,919,952
- Issue date Jul 19, 2005
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method and apparatus
- Patent number 6,849,856
- Issue date Feb 1, 2005
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system comprising a converter plate and means for prote...
- Patent number 6,844,560
- Issue date Jan 18, 2005
- Mapper Lithography IP B.V.
- Marco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless photon-electron spot-grid array printer
- Patent number 6,841,787
- Issue date Jan 11, 2005
- Applied Materials, Inc.
- Gilad Almogy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulator driven photocathode electron beam generator
- Patent number 6,828,574
- Issue date Dec 7, 2004
- Applied Materials, Inc.
- Paul C. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam lithography system with multiple beam modula...
- Patent number 6,724,002
- Issue date Apr 20, 2004
- Applied Materials, Inc.
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography system using a photocathode with a patter...
- Patent number 6,538,256
- Issue date Mar 25, 2003
- Applied Materials, Inc.
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron projection
- Patent number 6,515,292
- Issue date Feb 4, 2003
- California Institute of Technology
- Axel Scherer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam electron beam lithography system
- Patent number 6,429,443
- Issue date Aug 6, 2002
- Applied Materials, Inc.
- Marian Mankos
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Uniformity correction for large area electron source
- Patent number 6,407,399
- Issue date Jun 18, 2002
- Electron Vision Corporation
- William R. Livesay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned heat conducting photocathode for electron beam source
- Patent number 6,376,984
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Andres Fernandez
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gated photocathode for controlled single and multiple electron beam...
- Patent number 6,376,985
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Kim Y. Lee
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MODULAR PARALLEL ELECTRON LITHOGRAPHY
- Publication number 20210335572
- Publication date Oct 28, 2021
- John Bennett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT WRITE LITHOGRAPHY SYSTEM
- Publication number 20120224155
- Publication date Sep 6, 2012
- MAPPER LITHOGRAPHY IP BV
- Pieter KRUIT
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM SOURCE SYSTEM AND METHOD
- Publication number 20120223245
- Publication date Sep 6, 2012
- John Bennett
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Irradiation Device
- Publication number 20090127473
- Publication date May 21, 2009
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS USING A DYNAMICALLY...
- Publication number 20080169436
- Publication date Jul 17, 2008
- KLA-Tencor Techologies Corporation
- Allen M. Carroll
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of operating emitter for electron-beam projection lithograph...
- Publication number 20070278425
- Publication date Dec 6, 2007
- Samsung Electronics Co., Ltd.
- In-kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam duplication lithography method
- Publication number 20060151719
- Publication date Jul 13, 2006
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Hetero-junction electron emitter with group III nitride and activat...
- Publication number 20060055321
- Publication date Mar 16, 2006
- APPLIED MATERIALS, INC.
- Juan Ramon Maldonado
- B82 - NANO-TECHNOLOGY
Information Patent Application
Direct write lithography system
- Publication number 20050224726
- Publication date Oct 13, 2005
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam duplication lithography method and apparatus
- Publication number 20050121623
- Publication date Jun 9, 2005
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Emitter for electron-beam projection lithography system, and method...
- Publication number 20050077833
- Publication date Apr 14, 2005
- In-kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam lithography system having improved electron gun
- Publication number 20040232357
- Publication date Nov 25, 2004
- Andres Fernadez
- B82 - NANO-TECHNOLOGY
Information Patent Application
Generating electrons with an activated photocathode
- Publication number 20040140432
- Publication date Jul 22, 2004
- APPLIED MATERIALS, INC.
- Juan Ramon Maldonado
- B82 - NANO-TECHNOLOGY
Information Patent Application
Retarding electron beams in multiple electron beam pattern generation
- Publication number 20040090194
- Publication date May 13, 2004
- APPLIED MATERIALS, INC.
- Mark Alan Gesley
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam pattern generator with photocathode comprising low wo...
- Publication number 20040069960
- Publication date Apr 15, 2004
- APPLIED MATERIALS, INC.
- Juan Ramon Maldonado
- B82 - NANO-TECHNOLOGY
Information Patent Application
Direct write lithography system
- Publication number 20030219572
- Publication date Nov 27, 2003
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
Field emission photo-cathode array for lithography system and litho...
- Publication number 20030178583
- Publication date Sep 25, 2003
- Bert Jan Kampherbeek
- B82 - NANO-TECHNOLOGY
Information Patent Application
Maskless photon-electron spot-grid array printer
- Publication number 20030122091
- Publication date Jul 3, 2003
- Gilad Almogy
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron bombardment of wide bandgap semiconductors for generating...
- Publication number 20030089912
- Publication date May 15, 2003
- Daniel S. Pickard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam lithography system having improved electron gun
- Publication number 20030048427
- Publication date Mar 13, 2003
- APPLIED MATERIALS, INC.
- Andres Fernandez
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multiple electron beam lithography system with multiple beam modula...
- Publication number 20030042434
- Publication date Mar 6, 2003
- Marian Mankos
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system comprising a converter platc and means for prote...
- Publication number 20030030014
- Publication date Feb 13, 2003
- Marco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
GATE PHOTOCATHODE FOR CONTROLLED SINGLE AND MULTIPLE ELECTRON BEAM...
- Publication number 20010038263
- Publication date Nov 8, 2001
- KIM Y. LEE
- B82 - NANO-TECHNOLOGY

from patterned photocathode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Modular parallel electron lithography

Charged particle beam lithography apparatus and charged particle be...

Charged particle beam lithography apparatus and charged particle be...

Integrated photoemission sources and scalable photoemission structures

Direct write lithography system

Direct write lithography system

Electron beam irradiation device

Electron beam lithography method and apparatus using a dynamically...

Hetero-junction electron emitter with Group III nitride and activat...

Electron beam duplication lithography method

Emitter for electron-beam projection lithography system, and method...

Electron beam pattern generator with photocathode comprising low wo...

Tiling of modulator arrays

Electron beam lithography system having improved electron gun

Generating electrons with an activated photocathode

Electron beam duplication lithography method and apparatus

Electron bombardment of wide bandgap semiconductors for generating...

Retarding electron beams in multiple electron beam pattern generation

Direct write lithography system

Electron beam duplication lithography method and apparatus

Lithography system comprising a converter plate and means for prote...

Maskless photon-electron spot-grid array printer

Modulator driven photocathode electron beam generator

Multiple electron beam lithography system with multiple beam modula...

Electron beam lithography system using a photocathode with a patter...

High resolution electron projection

Multiple beam electron beam lithography system

Uniformity correction for large area electron source

Patterned heat conducting photocathode for electron beam source

Gated photocathode for controlled single and multiple electron beam...

Patents Applicationslast 30 patents

MODULAR PARALLEL ELECTRON LITHOGRAPHY

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

DIRECT WRITE LITHOGRAPHY SYSTEM

ELECTRON BEAM SOURCE SYSTEM AND METHOD

Electron Beam Irradiation Device

ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS USING A DYNAMICALLY...

Method of operating emitter for electron-beam projection lithograph...

Electron beam duplication lithography method

Hetero-junction electron emitter with group III nitride and activat...

Direct write lithography system

Electron beam duplication lithography method and apparatus

Emitter for electron-beam projection lithography system, and method...

Electron beam lithography system having improved electron gun

Generating electrons with an activated photocathode

Retarding electron beams in multiple electron beam pattern generation

Electron beam pattern generator with photocathode comprising low wo...

Direct write lithography system

Field emission photo-cathode array for lithography system and litho...

Maskless photon-electron spot-grid array printer

Electron bombardment of wide bandgap semiconductors for generating...

Electron beam lithography system having improved electron gun

Multiple electron beam lithography system with multiple beam modula...

Lithography system comprising a converter platc and means for prote...

GATE PHOTOCATHODE FOR CONTROLLED SINGLE AND MULTIPLE ELECTRON BEAM...