Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus

Industry

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H01J37/32798

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cooling device, semiconductor manufacturing apparatus, and semicond...
- Patent number 12,146,696
- Issue date Nov 19, 2024
- Canon Kabushiki Kaisha
- Makoto Nomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,020,909
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Jang-Yeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for handling an implant
- Patent number 11,955,321
- Issue date Apr 9, 2024
- NOVA PLASMA LTD.
- Amnon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control device, processing apparatus, and control method
- Patent number 11,894,249
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,721,526
- Issue date Aug 8, 2023
- MKS Instruments, Inc.
- Francesco Braghiroli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support assembly with arc resistant coolant conduit
- Patent number 11,646,183
- Issue date May 9, 2023
- Applied Materials, Inc.
- Stephen Donald Prouty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bonding method for cleaning non-bonding surface of substrate
- Patent number 11,626,302
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Yuji Mimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,476,092
- Issue date Oct 18, 2022
- MKS Instruments, Inc.
- Kenneth Trenholm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrahigh selective nitride etch to form FinFET devices
- Patent number 11,469,079
- Issue date Oct 11, 2022
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bonding system with cleaning apparatus for cleaning non-bonding sur...
- Patent number 11,424,142
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Yuji Mimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Processing method
- Patent number 11,414,753
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Hideomi Hane
- B08 - CLEANING
Information Patent Grant
Adjustment method for filter unit and plasma processing apparatus
- Patent number 11,328,908
- Issue date May 10, 2022
- Tokyo Electron Limited
- Nozomu Nagashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power cable with an overmolded probe for power transfer to a non-th...
- Patent number 11,289,240
- Issue date Mar 29, 2022
- Volt Holdings, LLC
- Peter Farrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply member, plasma processing apparatus, and method for form...
- Patent number 11,164,726
- Issue date Nov 2, 2021
- TOSHIBA MEMORY CORPORATION
- Tetsuyuki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 11,155,918
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatuses having a dielectric injector
- Patent number 11,152,194
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling wafer uniformity
- Patent number 11,062,886
- Issue date Jul 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Hua Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power cable with an overmolded probe for power transfer to a non-th...
- Patent number 11,024,445
- Issue date Jun 1, 2021
- Peter Farrell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus and method for handling an implant
- Patent number 10,978,277
- Issue date Apr 13, 2021
- NOVA PLASMA LTD.
- Amnon Lam
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ion source and cleaning method thereof
- Patent number 10,971,339
- Issue date Apr 6, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power cable with an overmolded probe for power transfer to a non-th...
- Patent number 10,896,771
- Issue date Jan 19, 2021
- Volt Holdings, LLC
- Peter Farrell
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Grant
Substrate treating apparatus and inspection method
- Patent number 10,636,631
- Issue date Apr 28, 2020
- Semes Co., Ltd.
- Jae Hwan Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 10,515,786
- Issue date Dec 24, 2019
- Tokyo Electron Limited
- Shingo Koiwa
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method for inspecting shower plate of plasma processing apparatus
- Patent number 10,424,466
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching method of magnetic film and ion beam etching appar...
- Patent number 10,388,491
- Issue date Aug 20, 2019
- Canon Anelva Corporation
- Yoshimitsu Kodaira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature control system and temperature control method
- Patent number 10,312,062
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Tsutomu Hiroki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and method of discriminating state thereof
- Patent number 10,233,536
- Issue date Mar 19, 2019
- ULVAC, Inc.
- Shinya Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-chemical coating apparatus
- Patent number 10,186,401
- Issue date Jan 22, 2019
- W & L Coating Systems GmbH
- Michael Liehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and method f...
- Patent number 10,181,406
- Issue date Jan 15, 2019
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for conditioning a processing chamber for steady etching rat...
- Patent number 10,177,017
- Issue date Jan 8, 2019
- Applied Materials, Inc.
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER LID AND COATING
- Publication number 20240344199
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240194445
- Publication date Jun 13, 2024
- PSK INC.
- Chi Young LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Purge Ring for Reduced Substrate Backside Deposition
- Publication number 20240018648
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Geraldine VASQUEZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE
- Publication number 20230296512
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Allen L. D'AMBRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230290610
- Publication date Sep 14, 2023
- JUSUNG ENGINEERING CO., LTD.
- Seung Youb Sa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230251567
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230230815
- Publication date Jul 20, 2023
- Samsung Electronics Co., Ltd.
- Jang-Yeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230215700
- Publication date Jul 6, 2023
- TOKYO ELECTRON LIMITED
- Kae KUMAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20230215691
- Publication date Jul 6, 2023
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES
- Publication number 20230084901
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Kwame EASON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BONDING METHOD FOR CLEANING NON-BONDING SURFACE OF SUBSTRATE
- Publication number 20220351987
- Publication date Nov 3, 2022
- TOKYO ELECTRON LIMITED
- Yuji Mimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220328289
- Publication date Oct 13, 2022
- Kokusai Electric Corporation
- Yasutoshi TSUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA VIEWPORT
- Publication number 20220301835
- Publication date Sep 22, 2022
- LAM RESEARCH CORPORATION
- Bin Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICOND...
- Publication number 20210404711
- Publication date Dec 30, 2021
- Canon Kabushiki Kaisha
- Makoto Nomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER
- Publication number 20210351018
- Publication date Nov 11, 2021
- LAM RESEARCH CORPORATION
- Keechan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...
- Publication number 20210343448
- Publication date Nov 4, 2021
- Volt Holdings, LLC
- Peter Farrell
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
CERAMIC STRUCTURE, LOWER ELECTRODE, AND DRY ETCHING MACHINE
- Publication number 20210335575
- Publication date Oct 28, 2021
- HKC Corporation Limited
- Yi MENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING WAFER UNIFORMITY
- Publication number 20210296100
- Publication date Sep 23, 2021
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Hsiao-Hua Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH ARC RESISTANT COOLANT CONDUIT
- Publication number 20210296101
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Stephen Donald PROUTY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HANDLING AN IMPLANT
- Publication number 20210257192
- Publication date Aug 19, 2021
- NOVA PLASMA LTD.
- Amnon LAM
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...
- Publication number 20200381219
- Publication date Dec 3, 2020
- MKS Instruments, Inc.
- Kenneth Trenholm
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ION SOURCE AND CLEANING METHOD THEREOF
- Publication number 20200279720
- Publication date Sep 3, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu ADACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD FOR FORM...
- Publication number 20200258719
- Publication date Aug 13, 2020
- Toshiba Memory Corporation
- Tetsuyuki MATSUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...
- Publication number 20200090833
- Publication date Mar 19, 2020
- Volt Holdings, LLC
- Peter Farrell
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE
- Publication number 20190348317
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Allen L. D'AMBRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING WAFER UNIFORMITY
- Publication number 20190164730
- Publication date May 30, 2019
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Hsiao-Hua Peng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING APPARATUS AND INSPECTION METHOD
- Publication number 20190043699
- Publication date Feb 7, 2019
- Semes Co., LTD.
- Jae Hwan CHO
- G01 - MEASURING TESTING
Information Patent Application
ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES
- Publication number 20180269070
- Publication date Sep 20, 2018
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...
- Publication number 20180182652
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Yuji SESHIMO
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS AND METHOD FOR HANDLING AN IMPLANT
- Publication number 20180138022
- Publication date May 17, 2018
- NOVA PLASMA LTD.
- Amnon LAM
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cooling device, semiconductor manufacturing apparatus, and semicond...

Plasma processing apparatus and plasma processing method

Method for handling an implant

Control device, processing apparatus, and control method

System and method of power generation with phase linked solid-state...

Substrate support assembly with arc resistant coolant conduit

Bonding method for cleaning non-bonding surface of substrate

System and method of power generation with phase linked solid-state...

Ultrahigh selective nitride etch to form FinFET devices

Bonding system with cleaning apparatus for cleaning non-bonding sur...

Processing method

Adjustment method for filter unit and plasma processing apparatus

Power cable with an overmolded probe for power transfer to a non-th...

Gas supply member, plasma processing apparatus, and method for form...

Film forming apparatus

Plasma processing apparatuses having a dielectric injector

Apparatus and method for controlling wafer uniformity

Power cable with an overmolded probe for power transfer to a non-th...

Apparatus and method for handling an implant

Ion source and cleaning method thereof

Power cable with an overmolded probe for power transfer to a non-th...

Substrate treating apparatus and inspection method

Mounting table and plasma processing apparatus

Method for inspecting shower plate of plasma processing apparatus

Ion beam etching method of magnetic film and ion beam etching appar...

Temperature control system and temperature control method

Sputtering apparatus and method of discriminating state thereof

Plasma-chemical coating apparatus

Plasma processing apparatus, plasma processing method, and method f...

Method for conditioning a processing chamber for steady etching rat...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING CHAMBER LID AND COATING

SUBSTRATE PROCESSING APPARATUS

Purge Ring for Reduced Substrate Backside Deposition

EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE

SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

BONDING METHOD FOR CLEANING NON-BONDING SURFACE OF SUBSTRATE

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA VIEWPORT

COOLING DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICOND...

LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER

POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...

CERAMIC STRUCTURE, LOWER ELECTRODE, AND DRY ETCHING MACHINE

APPARATUS AND METHOD FOR CONTROLLING WAFER UNIFORMITY

SUBSTRATE SUPPORT ASSEMBLY WITH ARC RESISTANT COOLANT CONDUIT

METHOD FOR HANDLING AN IMPLANT

SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...

ION SOURCE AND CLEANING METHOD THEREOF

GAS SUPPLY MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD FOR FORM...

POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...

EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE

APPARATUS AND METHOD FOR CONTROLLING WAFER UNIFORMITY

SUBSTRATE TREATING APPARATUS AND INSPECTION METHOD

ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...

APPARATUS AND METHOD FOR HANDLING AN IMPLANT