Gas analysis

Industry

CPC
H01J37/32981

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32981Gas analysis

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,142,465
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Sho Hiraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low open area and coupon endpoint detection
- Patent number 12,080,574
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting location of a wafer and a top plate...
- Patent number 12,014,910
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,942,312
- Issue date Mar 26, 2024
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic pressure control for processing chambers implementing real-...
- Patent number 11,869,754
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Tina Dhekial-Phukan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for residual gas analysis
- Patent number 11,791,141
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Method of detecting radicals using mass spectrometry
- Patent number 11,784,031
- Issue date Oct 10, 2023
- Inficon, Inc.
- Norbert Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for passivating a target
- Patent number 11,661,651
- Issue date May 30, 2023
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,557,469
- Issue date Jan 17, 2023
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 11,545,376
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inline measurement of process gas dissociation using infrared absor...
- Patent number 11,521,839
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Ramesh Gopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for passivating a target
- Patent number 11,512,387
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal repeatability and in-situ showerhead temperature monitoring
- Patent number 11,508,558
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Timothy Joseph Franklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantification of processing chamber species by electron energy sweep
- Patent number 11,430,643
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling dry etch process characteristics using waferless dry cl...
- Patent number 11,273,469
- Issue date Mar 15, 2022
- Tokyo Electron Limited
- Brian J. Coppa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing module, and se...
- Patent number 11,215,506
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Kyeonghun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Atmospheric-pressure ionization and fragmentation of molecules for...
- Patent number 11,133,170
- Issue date Sep 28, 2021
- Indiana University Research and Technology Corporation
- Jacob T. Shelley
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image based plasma sheath profile detection on plasma processing tools
- Patent number 10,957,521
- Issue date Mar 23, 2021
- Lam Research Corporation
- Yuhou Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing apparatus, substrate processing module, and se...
- Patent number 10,935,429
- Issue date Mar 2, 2021
- Samsung Electronics Co., Ltd.
- Kyeonghun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus with optical cavity for determining process rate
- Patent number 10,930,478
- Issue date Feb 23, 2021
- Lam Research Corporation
- Jagadeeshwari Manne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching organic region
- Patent number 10,903,085
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contaminant cleaning systems and related methods using one or more...
- Patent number 10,871,477
- Issue date Dec 22, 2020
- The United States of America, as represented by the Secretary of the Navy
- Mary M. Graupmann
- B08 - CLEANING
Information Patent Grant
In-situ real-time plasma chamber condition monitoring
- Patent number 10,854,433
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active showerhead
- Patent number 10,804,079
- Issue date Oct 13, 2020
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus for target object and inspection method for pr...
- Patent number 10,796,889
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Akira Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual sensor for chamber cleaning endpoint
- Patent number 10,777,394
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling dry etch process characteristics using waferless dry cl...
- Patent number 10,773,282
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Brian J. Coppa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD
- Publication number 20240384404
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Wei XU
- B08 - CLEANING
Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING DEVICE
- Publication number 20240363319
- Publication date Oct 31, 2024
- Dah Young Vacuum Equipment Co., Ltd.
- Tzu-Hou Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20240266155
- Publication date Aug 8, 2024
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240234113
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Takari YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE ANALYSIS OF PLASMA CONDITIONS
- Publication number 20240234112
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Michal Danek
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR UNIFORM HIGH THROUGHPUT MULTIPLE LAYER FILMS
- Publication number 20240194455
- Publication date Jun 13, 2024
- INTEVAC, INC.
- Thomas P. Nolan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR PLASMA GENERATION IN A WIDE PRESSURE RANGE AN...
- Publication number 20240177979
- Publication date May 30, 2024
- INFICON AG
- Astrid WALDNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASSIVATION EQUIPMENT AND PASSIVATION METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20240162003
- Publication date May 16, 2024
- Naidun-tech Co., Ltd.
- Chi-Wen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC PRESSURE CONTROL FOR PROCESSING CHAMBERS IMPLEMENTING REAL-...
- Publication number 20240153750
- Publication date May 9, 2024
- Applied Materials, Inc.
- Tina Dhekial-Phukan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES
- Publication number 20240145216
- Publication date May 2, 2024
- ASM IP HOLDING, B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFYING METHOD AND SURFACE MODIFYING APPARATUS
- Publication number 20240079214
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Yuji Mimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement Apparatus for Alternating Currents and Voltages of Phys...
- Publication number 20240038512
- Publication date Feb 1, 2024
- Mario Hesse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM
- Publication number 20240030013
- Publication date Jan 25, 2024
- Horiba Stec, Co., Ltd.
- Miyako HADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE INSPECTION APPARATUS
- Publication number 20240014053
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Dongchi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS
- Publication number 20240006158
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...
- Publication number 20230395361
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hsiang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386807
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386808
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR FOR MEASUREMENT OF RADICALS
- Publication number 20230375506
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Mehran Moalem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-INVASIVE MEASUREMENT OF PLASMA SYSTEMS
- Publication number 20230335382
- Publication date Oct 19, 2023
- Dublin City University
- Patrick McNally
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETECTING RADICALS USING MASS SPECTROMETRY
- Publication number 20230215711
- Publication date Jul 6, 2023
- Inficon, Inc.
- Norbert Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20230187190
- Publication date Jun 15, 2023
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...
- Publication number 20230105279
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230072102
- Publication date Mar 9, 2023
- TOKYO ELECTRON LIMITED
- Sho HIRAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGE DETECTION APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION...
- Publication number 20230064343
- Publication date Mar 2, 2023
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO DETECT AND QUANTIFY RADICAL CONCENTRATION IN SEMICONDU...
- Publication number 20220392812
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Mehran Moalem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DRY CLEAN OF TUBE FURNACE
- Publication number 20220356570
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Eddy Lay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PASSIVATING A TARGET
- Publication number 20220307126
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Chao DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND MONITORING DEVICE
- Publication number 20220254617
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Ken HIRANO
- H01 - BASIC ELECTRIC ELEMENTS

Gas analysis

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and monitoring device

Low open area and coupon endpoint detection

Method and system for adjusting location of a wafer and a top plate...

Glow plasma gas measurement signal processing

Gas analyzer apparatus

Dynamic pressure control for processing chambers implementing real-...

System and method for residual gas analysis

Method of detecting radicals using mass spectrometry

Methods and apparatus for passivating a target

Gas analyzer apparatus

Plasma parameters and skew characterization by high speed imaging

Inline measurement of process gas dissociation using infrared absor...

Methods and apparatus for passivating a target

Thermal repeatability and in-situ showerhead temperature monitoring

Quantification of processing chamber species by electron energy sweep

Controlling dry etch process characteristics using waferless dry cl...

Substrate processing apparatus, substrate processing module, and se...

Atmospheric-pressure ionization and fragmentation of molecules for...

Method and apparatus for determining process rate

Image based plasma sheath profile detection on plasma processing tools

Substrate processing apparatus, substrate processing module, and se...

Apparatus with optical cavity for determining process rate

Method for etching organic region

Contaminant cleaning systems and related methods using one or more...

In-situ real-time plasma chamber condition monitoring

Active showerhead

Processing apparatus for target object and inspection method for pr...

Virtual sensor for chamber cleaning endpoint

Controlling dry etch process characteristics using waferless dry cl...

Patents Applicationslast 30 patents

SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

PLASMA MONITORING DEVICE

GAS ANALYZER APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

IMAGE ANALYSIS OF PLASMA CONDITIONS

METHOD AND APPARATUS FOR UNIFORM HIGH THROUGHPUT MULTIPLE LAYER FILMS

DEVICE AND METHOD FOR PLASMA GENERATION IN A WIDE PRESSURE RANGE AN...

PASSIVATION EQUIPMENT AND PASSIVATION METHOD FOR SEMICONDUCTOR DEVICE

DYNAMIC PRESSURE CONTROL FOR PROCESSING CHAMBERS IMPLEMENTING REAL-...

RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES

SURFACE MODIFYING METHOD AND SURFACE MODIFYING APPARATUS

Measurement Apparatus for Alternating Currents and Voltages of Phys...

ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM

CHARGED-PARTICLE INSPECTION APPARATUS

CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS

METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

SENSOR FOR MEASUREMENT OF RADICALS

NON-INVASIVE MEASUREMENT OF PLASMA SYSTEMS

METHOD OF DETECTING RADICALS USING MASS SPECTROMETRY

GAS ANALYZER APPARATUS

METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

DISCHARGE DETECTION APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION...

APPARATUS TO DETECT AND QUANTIFY RADICAL CONCENTRATION IN SEMICONDU...

IN-SITU DRY CLEAN OF TUBE FURNACE

METHODS AND APPARATUS FOR PASSIVATING A TARGET

PLASMA PROCESSING APPARATUS AND MONITORING DEVICE