Halogen compound containing

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CPC
Y10S430/126

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/126Halogen compound containing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming process and resist compostion
- Patent number 8,980,527
- Issue date Mar 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 8,975,002
- Issue date Mar 10, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,968,980
- Issue date Mar 3, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,940,471
- Issue date Jan 27, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,940,473
- Issue date Jan 27, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,921,027
- Issue date Dec 30, 2014
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,906,589
- Issue date Dec 9, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,906,591
- Issue date Dec 9, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable photoacid generators
- Patent number 8,900,792
- Issue date Dec 2, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and radiation-sensitive acid...
- Patent number 8,889,336
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,889,335
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,883,395
- Issue date Nov 11, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,871,429
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition for ArF immersion...
- Patent number 8,815,492
- Issue date Aug 26, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 8,808,975
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,808,959
- Issue date Aug 19, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,741,545
- Issue date Jun 3, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,709,700
- Issue date Apr 29, 2014
- International Business Machines Corporation
- Sen Liu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 8,685,614
- Issue date Apr 1, 2014
- FUJIFILM Corporation
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,663,901
- Issue date Mar 4, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,658,345
- Issue date Feb 25, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,910
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,909
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,623,584
- Issue date Jan 7, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,617,791
- Issue date Dec 31, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,574,811
- Issue date Nov 5, 2013
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...
- Publication number 20130337384
- Publication date Dec 19, 2013
- FUJIFILM CORPORATION
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...
- Publication number 20130260316
- Publication date Oct 3, 2013
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130183624
- Publication date Jul 18, 2013
- JSR Corporation
- Ken MARUYAMA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING PROCESS AND RESIST COMPOSTION
- Publication number 20130183621
- Publication date Jul 18, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017489
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017490
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017491
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011788
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011790
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011792
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011793
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011786
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011794
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011787
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011789
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011795
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219904
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZABLE PHOTOACID GENERATORS
- Publication number 20120171616
- Publication date Jul 5, 2012
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120082936
- Publication date Apr 5, 2012
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120052443
- Publication date Mar 1, 2012
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- Publication number 20120045719
- Publication date Feb 23, 2012
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS
- Publication number 20110300484
- Publication date Dec 8, 2011
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SIGNAL FILTERING SYSTEM AND RELATED METHODS
- Publication number 20110287730
- Publication date Nov 24, 2011
- Richard M. Miller
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110236824
- Publication date Sep 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20110200940
- Publication date Aug 18, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20110183259
- Publication date Jul 28, 2011
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY

Halogen compound containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, novel compoun...

Sulfonium derivatives and the use therof as latent acids

Pattern forming process and resist compostion

Positive resist composition and method of forming resist pattern

Positive resist composition for immersion exposure and pattern form...

Radiation-sensitive resin composition and compound

Actinic-ray- or radiation-sensitive resin composition and method of...

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition

Salt and photoresist composition comprising the same

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Polymerizable photoacid generators

Radiation-sensitive resin composition and radiation-sensitive acid...

Radiation-sensitive resin composition

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Chemically amplified positive resist composition for ArF immersion...

Positive resist composition for immersion exposure and pattern-form...

Resist composition, method of forming resist pattern, novel compoun...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Positive photosensitive composition

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition and method for producing resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...

RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...

RADIATION-SENSITIVE RESIN COMPOSITION

PATTERN FORMING PROCESS AND RESIST COMPOSTION

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

POLYMERIZABLE PHOTOACID GENERATORS

RADIATION-SENSITIVE RESIN COMPOSITION

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS

SIGNAL FILTERING SYSTEM AND RELATED METHODS

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...