Handling of data

Industry

CPC
H01J2237/30416

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30416Handling of data

Industries

Patents Grantslast 30 patents

Information Patent Grant
Ion implanter and model generation method
- Patent number 11,823,863
- Issue date Nov 21, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data generation method and charged particle beam irradiation device
- Patent number 11,749,499
- Issue date Sep 5, 2023
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and model generation method
- Patent number 11,527,381
- Issue date Dec 13, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,227,744
- Issue date Jan 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for operating a particle beam system
- Patent number 10,984,983
- Issue date Apr 20, 2021
- Carl Zeiss Microscopy GmbH
- Björn Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus, and multiple cha...
- Patent number 10,886,103
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window analysis
- Patent number 10,720,367
- Issue date Jul 21, 2020
- Applied Materials Israel Ltd.
- Idan Kaizerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam device and control method of charged particle...
- Patent number 10,636,620
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Hiroshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and method for controlling charged...
- Patent number 10,446,370
- Issue date Oct 15, 2019
- Hitachi High-Tech Science Corporation
- Hidekazu Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnosis method, charged particle beam lithography apparatus, and...
- Patent number 10,109,454
- Issue date Oct 23, 2018
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of generating write data for energy beam writing apparatus,...
- Patent number 9,659,747
- Issue date May 23, 2017
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and buffer memory data sto...
- Patent number 9,564,293
- Issue date Feb 7, 2017
- NuFlare Technology, Inc.
- Jun Yashima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automatic optimization of etch process for accelerated yield ramp w...
- Patent number 9,207,539
- Issue date Dec 8, 2015
- Multibeam Corporation
- David K. Lam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic optimization of etch process for accelerated yield ramp w...
- Patent number 8,999,628
- Issue date Apr 7, 2015
- Multibeam Corporation
- David K. Lam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,624,206
- Issue date Jan 7, 2014
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accelerator on a chip having a grid and plate cell
- Patent number 8,564,225
- Issue date Oct 22, 2013
- Transmute, Inc.
- Kim L. Hailey
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Focused ion beam apparatus, sample processing method using the same...
- Patent number 8,426,830
- Issue date Apr 23, 2013
- Sll Nano Technology Inc.
- Makoto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,314,409
- Issue date Nov 20, 2012
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 8,095,231
- Issue date Jan 10, 2012
- FEI Company
- David J. Tasker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for increasing throughput during location specifi...
- Patent number 7,917,241
- Issue date Mar 29, 2011
- TEL Epion Inc.
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Writing error verification method of pattern writing apparatus and...
- Patent number 7,698,682
- Issue date Apr 13, 2010
- Nuflare Technology, Inc.
- Akihito Anpo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 7,664,566
- Issue date Feb 16, 2010
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for reviewing defects by detecting images havi...
- Patent number 7,656,171
- Issue date Feb 2, 2010
- Hitachi High-Technologies Corporation
- Toshifumi Honda
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for reviewing defects by detecting images havi...
- Patent number 7,449,898
- Issue date Nov 11, 2008
- Hitachi High-Technologies Corporation
- Toshifumi Honda
- G01 - MEASURING TESTING
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 7,308,334
- Issue date Dec 11, 2007
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
TEM sample equipped with an identifying function, focused ion beam...
- Patent number 7,095,024
- Issue date Aug 22, 2006
- SII NanoTechnology Inc.
- Tatsuya Adachi
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope observation system and observation method
- Patent number 6,956,212
- Issue date Oct 18, 2005
- Hitachi, Ltd.
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Grant
Graphical automated machine control and metrology
- Patent number 6,889,113
- Issue date May 3, 2005
- FEI Company
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing mask data for partial one-shot transfer exposur...
- Patent number 6,546,544
- Issue date Apr 8, 2003
- Advantest Corporation
- Kenichi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230274907
- Publication date Aug 31, 2023
- HITACHI HIGH-TECH CORPORATION
- Teruo KOHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND MODEL GENERATION METHOD
- Publication number 20230038439
- Publication date Feb 9, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA GENERATION METHOD AND CHARGED PARTICLE BEAM IRRADIATION DEVICE
- Publication number 20220093360
- Publication date Mar 24, 2022
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND MODEL GENERATION METHOD
- Publication number 20210280388
- Publication date Sep 9, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210013003
- Publication date Jan 14, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE BEAM SYSTEM
- Publication number 20200185191
- Publication date Jun 11, 2020
- CARL ZEISS MICROSCOPY GMBH
- Björn Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS, AND MULTIPLE CHA...
- Publication number 20190378688
- Publication date Dec 12, 2019
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW ANALYSIS
- Publication number 20190355628
- Publication date Nov 21, 2019
- APPLIED MATERIALS ISRAEL LTD.
- Idan KAIZERMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR CONTROLLING CHARGED...
- Publication number 20180182596
- Publication date Jun 28, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hidekazu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS METHOD, CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, AND...
- Publication number 20170243714
- Publication date Aug 24, 2017
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...
- Publication number 20160211118
- Publication date Jul 21, 2016
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20150041684
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20150014549
- Publication date Jan 15, 2015
- NuFlare Technology, Inc.
- Jun YASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, AND BUFFER MEMORY DATA STO...
- Publication number 20140237196
- Publication date Aug 21, 2014
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Modification Schemes for Improved FIB Patterning
- Publication number 20130092826
- Publication date Apr 18, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING
- Publication number 20110049382
- Publication date Mar 3, 2011
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME...
- Publication number 20100155624
- Publication date Jun 24, 2010
- Makoto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY
- Publication number 20100138028
- Publication date Jun 3, 2010
- FEI Company
- DAVID J. TASKER
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for reviewing defects by detecting images havi...
- Publication number 20090058437
- Publication date Mar 5, 2009
- Toshifumi Honda
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...
- Publication number 20090037015
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY
- Publication number 20080097621
- Publication date Apr 24, 2008
- FEI Company
- DAVID J. TASKER
- G05 - CONTROLLING REGULATING
Information Patent Application
WRITING ERROR VERIFICATION METHOD OF PATTERN WRITING APPARATUS AND...
- Publication number 20080046787
- Publication date Feb 21, 2008
- NuFlare Technology, Inc.
- Akihito ANPO
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY SYSTEM AND ERROR DETECTION METHOD IN SAME
- Publication number 20080006777
- Publication date Jan 10, 2008
- NuFlare Technology, Inc.
- Hideo INOUE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and apparatus for reviewing defects by detecting images havi...
- Publication number 20070222464
- Publication date Sep 27, 2007
- Toshifumi Honda
- G01 - MEASURING TESTING
Information Patent Application
Graphical automated machine control and metrology
- Publication number 20050188309
- Publication date Aug 25, 2005
- FEI Company
- David J. Tasker
- G05 - CONTROLLING REGULATING
Information Patent Application
Electron microscope observation system and observation method
- Publication number 20050061975
- Publication date Mar 24, 2005
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Application
TEM sample equipped with an identifying function, focused ion beam...
- Publication number 20040227082
- Publication date Nov 18, 2004
- Tatsuya Adachi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Graphical automated machine control and metrology
- Publication number 20030067496
- Publication date Apr 10, 2003
- David J. Tasker
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of extracting characters and computer-readable recording medium
- Publication number 20010037487
- Publication date Nov 1, 2001
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS

Handling of data

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion implanter and model generation method

Data generation method and charged particle beam irradiation device

Ion implanter and model generation method

Multi-beam writing method and multi-beam writing apparatus

Particle beam system and method for operating a particle beam system

Data processing method, data processing apparatus, and multiple cha...

Process window analysis

Charged particle beam device and control method of charged particle...

Charged particle beam apparatus and method for controlling charged...

Diagnosis method, charged particle beam lithography apparatus, and...

Method of generating write data for energy beam writing apparatus,...

Charged particle beam writing apparatus, and buffer memory data sto...

Automatic optimization of etch process for accelerated yield ramp w...

Automatic optimization of etch process for accelerated yield ramp w...

Pattern modification schemes for improved FIB patterning

Accelerator on a chip having a grid and plate cell

Focused ion beam apparatus, sample processing method using the same...

Pattern modification schemes for improved FIB patterning

Graphical automated machine control and metrology

Method and system for increasing throughput during location specifi...

Writing error verification method of pattern writing apparatus and...

Graphical automated machine control and metrology

Method and apparatus for reviewing defects by detecting images havi...

Method and apparatus for reviewing defects by detecting images havi...

Graphical automated machine control and metrology

TEM sample equipped with an identifying function, focused ion beam...

Electron microscope observation system and observation method

Graphical automated machine control and metrology

Charged particle beam exposure system and method

Method of producing mask data for partial one-shot transfer exposur...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

ION IMPLANTER AND MODEL GENERATION METHOD

DATA GENERATION METHOD AND CHARGED PARTICLE BEAM IRRADIATION DEVICE

ION IMPLANTER AND MODEL GENERATION METHOD

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE BEAM SYSTEM

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS, AND MULTIPLE CHA...

PROCESS WINDOW ANALYSIS

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR CONTROLLING CHARGED...

DIAGNOSIS METHOD, CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, AND...

METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS, AND BUFFER MEMORY DATA STO...

Pattern Modification Schemes for Improved FIB Patterning

PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING

FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME...

GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY

Method and apparatus for reviewing defects by detecting images havi...

METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...

GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY

WRITING ERROR VERIFICATION METHOD OF PATTERN WRITING APPARATUS AND...

LITHOGRAPHY SYSTEM AND ERROR DETECTION METHOD IN SAME

Method and apparatus for reviewing defects by detecting images havi...

Graphical automated machine control and metrology

Electron microscope observation system and observation method

TEM sample equipped with an identifying function, focused ion beam...

Graphical automated machine control and metrology

Charged particle beam exposure system and method

Method of extracting characters and computer-readable recording medium