hybrid

Industry

CPC
H01J2237/31757

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31757hybrid

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE48046
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Reliability in a maskless lithography system
- Patent number 8,890,095
- Issue date Nov 18, 2014
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and method of making a semiconductor device
- Patent number 8,298,732
- Issue date Oct 30, 2012
- Fujitsu Semiconductor Limited
- Masahiko Minemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number 7,868,300
- Issue date Jan 11, 2011
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Combined e-beam and optical exposure semiconductor lithography
- Patent number 7,296,245
- Issue date Nov 13, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Hsiang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual source lithography for direct write application
- Patent number 7,023,530
- Issue date Apr 4, 2006
- LSI Logic Corporation
- Michael J. Berman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual source lithography for direct write application
- Patent number 6,894,762
- Issue date May 17, 2005
- LSI Logic Corporation
- Michael J. Berman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined E-beam and optical exposure semiconductor lithography
- Patent number 6,875,624
- Issue date Apr 5, 2005
- Taiwan Semiconductor Manufacturing Co. Ltd
- Chin-Hsiang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing system and electron beam exposur...
- Patent number 6,764,925
- Issue date Jul 20, 2004
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method and device manufacturing method using this exposure...
- Patent number 6,741,732
- Issue date May 25, 2004
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a manufacturing method of the same
- Patent number 6,709,880
- Issue date Mar 23, 2004
- Hitachi, Ltd.
- Jiro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing a layout comprising multiple layers on a wafer
- Patent number 6,635,395
- Issue date Oct 21, 2003
- Leica Microsystems Lithography GmbH
- Peter Hahmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for achieving alignment of a beam-propagation a...
- Patent number 6,608,313
- Issue date Aug 19, 2003
- Nikon Corporation
- Hiroyasu Simizu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithographic method utilizing charged particle beam exposure and fl...
- Patent number 6,171,760
- Issue date Jan 9, 2001
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE
- Publication number 20110207053
- Publication date Aug 25, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Masahiko Minemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography system, sensor and measuring method
- Publication number 20070057204
- Publication date Mar 15, 2007
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reliability in a maskless lithography system
- Publication number 20070029507
- Publication date Feb 8, 2007
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Application
Combined e-beam and optical exposure semiconductor lithography
- Publication number 20050160383
- Publication date Jul 21, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Hsiang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THIS EXPOSURE...
- Publication number 20040071336
- Publication date Apr 15, 2004
- YOSHIKIYO YUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Combined e-beam and optical exposure semiconductor lithography
- Publication number 20030211751
- Publication date Nov 13, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Hsiang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device and a manufacturing method of the same
- Publication number 20030054580
- Publication date Mar 20, 2003
- Hitachi, Ltd.
- Jiro Yamamoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for exposing a layout comprising multiple layers on a wafer
- Publication number 20020039828
- Publication date Apr 4, 2002
- LEICA MICROSYSTEMS LITHOGRAPHY GmbH
- Peter Hahmann
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device manufacturing system and electron beam exposur...
- Publication number 20020039829
- Publication date Apr 4, 2002
- Advantest Corporation
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods and devices for achieving alignment of a beam-propagation a...
- Publication number 20010010362
- Publication date Aug 2, 2001
- NIKON CORPORATION
- Hiroyasu Simizu
- B82 - NANO-TECHNOLOGY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography system, sensor and measuring method

Lithography system, sensor and measuring method

Reliability in a maskless lithography system

Exposure method and method of making a semiconductor device

Lithography system, sensor and measuring method

Combined e-beam and optical exposure semiconductor lithography

Dual source lithography for direct write application

Dual source lithography for direct write application

Combined E-beam and optical exposure semiconductor lithography

Semiconductor device manufacturing system and electron beam exposur...

Exposure method and device manufacturing method using this exposure...

Semiconductor device and a manufacturing method of the same

Method for exposing a layout comprising multiple layers on a wafer

Methods and devices for achieving alignment of a beam-propagation a...

Lithographic method utilizing charged particle beam exposure and fl...

Patents Applicationslast 30 patents

EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE

Lithography system, sensor and measuring method

Reliability in a maskless lithography system

Combined e-beam and optical exposure semiconductor lithography

EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THIS EXPOSURE...

Combined e-beam and optical exposure semiconductor lithography

Semiconductor device and a manufacturing method of the same

Method for exposing a layout comprising multiple layers on a wafer

Semiconductor device manufacturing system and electron beam exposur...

Methods and devices for achieving alignment of a beam-propagation a...