Imaging strategies

Industry

CPC
H01J2237/31723

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31723Imaging strategies

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,595,421
- Issue date Mar 14, 2017
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 9,552,964
- Issue date Jan 24, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,536,706
- Issue date Jan 3, 2017
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for charged-particle multi-beam exposure
- Patent number 9,053,906
- Issue date Jun 9, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Multi-Beam Writing Using Inclined Exposure Stripes
- Publication number 20160336147
- Publication date Nov 17, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming a Pattern on a Reticle Using Charged...
- Publication number 20160259238
- Publication date Sep 8, 2016
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...
- Publication number 20160233054
- Publication date Aug 11, 2016
- Corporation for National Research Initiatives
- Michael A. Huff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...
- Publication number 20160172151
- Publication date Jun 16, 2016
- KLA-Tencor Corporation
- Christopher F. BEVIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING WRITE DATA, MULTI CHARGED PARTICLE BEAM WRITIN...
- Publication number 20160103945
- Publication date Apr 14, 2016
- NuFlare Technology, Inc.
- Kenichi YASUI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Fabricating an Integrated Circuit with a Pattern Density-...
- Publication number 20150371821
- Publication date Dec 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN AR...
- Publication number 20150325404
- Publication date Nov 12, 2015
- Canon Kabushiki Kaisha
- Yusuke Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM
- Publication number 20140264086
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR EXPOSING A WAFER
- Publication number 20140264085
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...
- Publication number 20140268076
- Publication date Sep 18, 2014
- Corporation for National Research Initiatives
- Michael A. HUFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE
- Publication number 20140264066
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DUAL PASS SCANNING
- Publication number 20120286170
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY

Imaging strategies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi charged particle beam writing method, and multi charged parti...

Method of fabricating an integrated circuit with a pattern density-...

Self-aligned dynamic pattern generator device and method of fabrica...

Method for charged-particle multi-beam exposure

Patents Applicationslast 30 patents

Multi-Beam Writing Using Inclined Exposure Stripes

Method and System for Forming a Pattern on a Reticle Using Charged...

SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...

APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...

METHOD OF GENERATING WRITE DATA, MULTI CHARGED PARTICLE BEAM WRITIN...

Method of Fabricating an Integrated Circuit with a Pattern Density-...

LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN AR...

CHARGED PARTICLE LITHOGRAPHY SYSTEM

METHOD FOR EXPOSING A WAFER

SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...

DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE

DUAL PASS SCANNING