Imaging systems for maskless apparatus

Industry

CPC
H01J2237/31722

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31722Imaging systems for maskless apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,513,565
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shot data generation method and multi charged particle beam writing...
- Patent number 9,514,914
- Issue date Dec 6, 2016
- NuFlare Technology, Inc.
- Hideo Inoue
- G11 - INFORMATION STORAGE
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 9,305,799
- Issue date Apr 5, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system, modulation devic...
- Patent number 8,987,677
- Issue date Mar 24, 2015
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Modulation device and charged particle multi-beamlet lithography sy...
- Patent number 8,841,636
- Issue date Sep 23, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 8,835,082
- Issue date Sep 16, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,759,787
- Issue date Jun 24, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,492,731
- Issue date Jul 23, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
System and Method for Maskless Direct Write Lithography
- Publication number 20160211117
- Publication date Jul 21, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20150212429
- Publication date Jul 30, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20150200074
- Publication date Jul 16, 2015
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140367588
- Publication date Dec 18, 2014
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20140353527
- Publication date Dec 4, 2014
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM
- Publication number 20140264086
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR EXPOSING A WAFER
- Publication number 20140264085
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE
- Publication number 20140264066
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140038107
- Publication date Feb 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20140014850
- Publication date Jan 16, 2014
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
DUAL PASS SCANNING
- Publication number 20120286170
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system, modulation devic...
- Publication number 20110266418
- Publication date Nov 3, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Modulation device and charged particle multi-beamlet lithography sy...
- Publication number 20110261340
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20110260040
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

Imaging systems for maskless apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Using wafer geometry to improve scanner correction effectiveness fo...

Shot data generation method and multi charged particle beam writing...

Method and system for E-beam lithography with multi-exposure

Charged particle multi-beamlet lithography system, modulation devic...

Modulation device and charged particle multi-beamlet lithography sy...

Method and system for E-beam lithography with multi-exposure

Charged particle multi-beamlet lithography system with modulation d...

Charged particle multi-beamlet lithography system with modulation d...

Patents Applicationslast 30 patents

System and Method for Maskless Direct Write Lithography

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS

Method and System for E-Beam Lithography with Multi-Exposure

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

CHARGED PARTICLE LITHOGRAPHY SYSTEM

METHOD FOR EXPOSING A WAFER

DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE

Method and System for E-Beam Lithography with Multi-Exposure

Charged particle multi-beamlet lithography system with modulation d...

DUAL PASS SCANNING

Charged particle multi-beamlet lithography system, modulation devic...

Modulation device and charged particle multi-beamlet lithography sy...

Charged particle multi-beamlet lithography system with modulation d...