Impurity or contaminant control

Industry

CPC
H01J2237/31705

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31705Impurity or contaminant control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for hi-precision ion implantation
- Patent number 11,699,570
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Supakit Charnvanichborikarn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple arc chamber source
- Patent number 11,183,365
- Issue date Nov 23, 2021
- Axcelis Technologies, Inc.
- Joshua Max Abeshaus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,183,358
- Issue date Nov 23, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 10,847,338
- Issue date Nov 24, 2020
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion injecting device using vacant baffle and faraday cups, and ion...
- Patent number 10,811,259
- Issue date Oct 20, 2020
- BOE Technology Group Co., Ltd.
- Xuefeng Lv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electostatic filter and method for controlling ion beam properties...
- Patent number 10,804,068
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implantation using solid aluminum iodide (ALI3) for producing atomi...
- Patent number 10,774,419
- Issue date Sep 15, 2020
- Axcelis Technologies, Inc.
- Dennis Elliott Kamenitsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen co-gas when using aluminum iodide as an ion source material
- Patent number 10,676,370
- Issue date Jun 9, 2020
- Axcelis Technologies, Inc.
- Neil Colvin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conductive beam optic containing internal heating element
- Patent number 10,504,682
- Issue date Dec 10, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ cleaning using hydrogen peroxide as co-gas to primary dopan...
- Patent number 10,170,286
- Issue date Jan 1, 2019
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implantation using solid aluminum iodide (AlI3) for producing atomi...
- Patent number 10,087,520
- Issue date Oct 2, 2018
- Axcelis Technologies, Inc.
- Dennis Elliott Kamenitsa
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Ion source liner having a lip for ion implantation systems
- Patent number 9,978,555
- Issue date May 22, 2018
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with charge and direction control
- Patent number 9,865,429
- Issue date Jan 9, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined electrostatic lens system for ion implantation
- Patent number 9,679,739
- Issue date Jun 13, 2017
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light bath for particle suppression
- Patent number 9,583,308
- Issue date Feb 28, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced trace metals contamination ion source for an ion implantati...
- Patent number 9,543,110
- Issue date Jan 10, 2017
- Axcelis Technologies, Inc.
- Neil Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion generating method
- Patent number 9,318,298
- Issue date Apr 19, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Masateru Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-vacuum high speed pre-chill and post-heat stations
- Patent number 9,236,216
- Issue date Jan 12, 2016
- Axcelis Technologies, Inc.
- William D. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and a method for in-situ cleaning thereof
- Patent number 9,142,379
- Issue date Sep 22, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with charge and direction control
- Patent number 8,922,122
- Issue date Dec 30, 2014
- Taiwan Semiconductor Manufaturing Company, Ltd.
- Chih-Hong Hwang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ion source and a method for in-situ cleaning thereof
- Patent number 8,809,800
- Issue date Aug 19, 2014
- Varian Semicoductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphite member for beam-line internal member of ion implantation a...
- Patent number 8,673,450
- Issue date Mar 18, 2014
- Toyo Tanso Co., Ltd.
- Kiyoshi Saito
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Beam line system of ion implanter
- Patent number 8,558,198
- Issue date Oct 15, 2013
- United Microelectronics Corp.
- Boon-Chau Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass analysis magnet for a ribbon beam
- Patent number 8,263,941
- Issue date Sep 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Victor Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable louvered plasma electron flood enclosure
- Patent number 8,242,469
- Issue date Aug 14, 2012
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 8,154,210
- Issue date Apr 10, 2012
- Semequip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS
- Publication number 20240331973
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Method for the Simulation of an Energy-Filtered Ion Implantation...
- Publication number 20240232470
- Publication date Jul 11, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A Method for the Simulation of an Energy-Filtered Ion Implantation...
- Publication number 20240135066
- Publication date Apr 25, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...
- Publication number 20230235449
- Publication date Jul 27, 2023
- Axcelis Technologies, Inc.
- David M. Burtner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20220020556
- Publication date Jan 20, 2022
- mi2-factory GmbH
- Florian KRIPPENDORF
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS AND METHOD FOR METAL CONTAMINATION CONTROL IN AN ION IMPL...
- Publication number 20210249222
- Publication date Aug 12, 2021
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20210027975
- Publication date Jan 28, 2021
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POROUS CARBONACEOUS VACUUM CHAMBER LINERS
- Publication number 20210013000
- Publication date Jan 14, 2021
- Entegris, Inc.
- Troy SCOGGINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ARC CHAMBER SOURCE
- Publication number 20200335302
- Publication date Oct 22, 2020
- Axcelis Technologies, Inc.
- Joshua Max Abeshaus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW EMISSION CLADDING AND ION IMPLANTER
- Publication number 20200234917
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW EMISSION CLADDING AND ION IMPLANTER
- Publication number 20200234910
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...
- Publication number 20200161076
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION INJECTING DEVICE, AND ION INJECTING METHOD THEREOF
- Publication number 20190267241
- Publication date Aug 29, 2019
- BOE TECHNOLOGY GROUP CO., LTD.
- Xuefeng LV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS
- Publication number 20190267209
- Publication date Aug 29, 2019
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDUCTIVE BEAM OPTIC CONTAINING INTERNAL HEATING ELEMENT
- Publication number 20190259560
- Publication date Aug 22, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20190122850
- Publication date Apr 25, 2019
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hydrogen CO-Gas When Using Aluminum Iodide as an Ion Source Material
- Publication number 20180346342
- Publication date Dec 6, 2018
- Axcelis Technologies, Inc.
- Neil Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GALLIUM IMPLANTATION CLEANING METHOD
- Publication number 20180247800
- Publication date Aug 30, 2018
- International Business Machines Corporation
- Oleg Gluschenkov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GALLIUM IMPLANTATION CLEANING METHOD
- Publication number 20180247801
- Publication date Aug 30, 2018
- International Business Machines Corporation
- Oleg Gluschenkov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CLEANING USING HYDROGEN PEROXIDE AS CO-GAS TO PRIMARY DOPAN...
- Publication number 20180096828
- Publication date Apr 5, 2018
- Axcelis Technologies, Inc.
- Neil K. Colvin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRA-THIN CORROSION RESISTANT HARD OVERCOAT FOR HARD DISK MEDIA
- Publication number 20170243610
- Publication date Aug 24, 2017
- INTEVAC, INC.
- Terry Bluck
- G11 - INFORMATION STORAGE
Information Patent Application
ION SOURCE LINER HAVING A LIP FOR ION IMPLANTATION SYSTEMS
- Publication number 20170133193
- Publication date May 11, 2017
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...
- Publication number 20170092473
- Publication date Mar 30, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combined Electrostatic Lens System for Ion Implantation
- Publication number 20160189912
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CONTROLLING ION IMPLANTER
- Publication number 20150162166
- Publication date Jun 11, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Feng TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLA...
- Publication number 20150132929
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION GENERATING METHOD
- Publication number 20150129775
- Publication date May 14, 2015
- SEN Corporation
- Masateru Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source and a method for in-situ cleaning thereof
- Publication number 20140319369
- Publication date Oct 30, 2014
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS

Impurity or contaminant control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Energy filter element for ion implantation systems for the use in t...

Apparatus and method for metal contamination control in an ion impl...

Energy filter element for ion implantation systems for the use in t...

System and method for hi-precision ion implantation

Multiple arc chamber source

Energy filter element for ion implantation systems for the use in t...

Method and device for implanting ions in wafers

Energy filter element for ion implantation systems for the use in t...

Ion injecting device using vacant baffle and faraday cups, and ion...

Electostatic filter and method for controlling ion beam properties...

Implantation using solid aluminum iodide (ALI3) for producing atomi...

Hydrogen co-gas when using aluminum iodide as an ion source material

Conductive beam optic containing internal heating element

In-situ cleaning using hydrogen peroxide as co-gas to primary dopan...

Implantation using solid aluminum iodide (AlI3) for producing atomi...

Ion source liner having a lip for ion implantation systems

Ion implantation with charge and direction control

Combined electrostatic lens system for ion implantation

Light bath for particle suppression

Reduced trace metals contamination ion source for an ion implantati...

Ion generator and ion generating method

In-vacuum high speed pre-chill and post-heat stations

Ion source and a method for in-situ cleaning thereof

Ion implantation with charge and direction control

Ion source and a method for in-situ cleaning thereof

Graphite member for beam-line internal member of ion implantation a...

Beam line system of ion implanter

Mass analysis magnet for a ribbon beam

Adjustable louvered plasma electron flood enclosure

Ion implantation ion source, system and method

Patents Applicationslast 30 patents

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS

A Method for the Simulation of an Energy-Filtered Ion Implantation...

A Method for the Simulation of an Energy-Filtered Ion Implantation...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

APPARATUS AND METHOD FOR METAL CONTAMINATION CONTROL IN AN ION IMPL...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

POROUS CARBONACEOUS VACUUM CHAMBER LINERS

MULTIPLE ARC CHAMBER SOURCE

LOW EMISSION CLADDING AND ION IMPLANTER

LOW EMISSION CLADDING AND ION IMPLANTER

ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...

ION INJECTING DEVICE, AND ION INJECTING METHOD THEREOF

METHOD AND DEVICE FOR IMPLANTING IONS IN WAFERS

CONDUCTIVE BEAM OPTIC CONTAINING INTERNAL HEATING ELEMENT

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

Hydrogen CO-Gas When Using Aluminum Iodide as an Ion Source Material

GALLIUM IMPLANTATION CLEANING METHOD

GALLIUM IMPLANTATION CLEANING METHOD

IN-SITU CLEANING USING HYDROGEN PEROXIDE AS CO-GAS TO PRIMARY DOPAN...

ULTRA-THIN CORROSION RESISTANT HARD OVERCOAT FOR HARD DISK MEDIA

ION SOURCE LINER HAVING A LIP FOR ION IMPLANTATION SYSTEMS

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...

Combined Electrostatic Lens System for Ion Implantation

SYSTEM AND METHOD FOR CONTROLLING ION IMPLANTER

METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLA...

ION GENERATOR AND ION GENERATING METHOD

Ion source and a method for in-situ cleaning thereof