in a nitrogen-containing ambient

Industry

CPC
H01L21/28202

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/28202in a nitrogen-containing ambient

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with treated interfacial layer on silicon germ...
- Patent number 12,148,843
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 12,024,777
- Issue date Jul 2, 2024
- Wonik IPS Co., Ltd.
- Dae Seong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,009,409
- Issue date Jun 11, 2024
- United Microelectronics Corp.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for integrating gate dielectric layers of diff...
- Patent number 11,961,740
- Issue date Apr 16, 2024
- Shanghai Huali Integrated Circuit Corporation
- Lian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,961,734
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,955,332
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,929,403
- Issue date Mar 12, 2024
- Kabushiki Kaisha Toshiba
- Masaharu Shimabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of cutting metal gates and structures formed thereof
- Patent number 11,923,251
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hsiu Perng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device with treated interfacial layer on silicon germ...
- Patent number 11,688,812
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming memory device
- Patent number 11,637,017
- Issue date Apr 25, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Wen Chung Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,631,753
- Issue date Apr 18, 2023
- United Microelectronics Corp.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,575,039
- Issue date Feb 7, 2023
- Kabushiki Kaisha Toshiba
- Tatsuya Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of cutting metal gates and structures formed thereof
- Patent number 11,545,400
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hsiu Perng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacture for single crystal capacitor dielectric for a...
- Patent number 11,495,734
- Issue date Nov 8, 2022
- AKOUSTIS, INC.
- Jeffrey B. Shealy
- C30 - CRYSTAL GROWTH
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,417,517
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, manufacturing method thereof, and pressure tr...
- Patent number 11,349,000
- Issue date May 31, 2022
- Hitachi, Ltd.
- Masahiro Masunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor film forming method using hydrazine-based compound gas
- Patent number 11,348,794
- Issue date May 31, 2022
- Tokyo Electron Limited
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer and method for manufacturing semiconductor wafe...
- Patent number 11,328,924
- Issue date May 10, 2022
- Xiamen Changelight Co., Ltd.
- Kaixuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal oxidation processes for 3D NAND
- Patent number 11,322,347
- Issue date May 3, 2022
- Applied Materials, Inc.
- Johanes F. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic mixer
- Patent number 11,271,526
- Issue date Mar 8, 2022
- Vrije Universiteit Brussel
- Maarten Kuijk
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Semiconductor device having high-κ dielectric layer and method for...
- Patent number 11,201,055
- Issue date Dec 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for deposition of titanium oxynitride for use in integrated...
- Patent number 11,195,712
- Issue date Dec 7, 2021
- ASM IP Holding B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
VFET devices with ILD protection
- Patent number 11,164,959
- Issue date Nov 2, 2021
- International Business Machines Corporation
- Zhenxing Bi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of cutting metal gates and structures formed thereof
- Patent number 11,152,267
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hsiu Perng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microelectronic devices with conductive contacts to silicide region...
- Patent number 11,043,414
- Issue date Jun 22, 2021
- Micron Technology, Inc.
- Kenichi Kusumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,043,434
- Issue date Jun 22, 2021
- ABLIC INC.
- Hitomi Sakurai
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device with treated interfacial layer on silicon germ...
- Patent number 11,031,508
- Issue date Jun 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure having oxide layer
- Patent number 11,018,022
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- I-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal oxide layer, and plasma-enhanced chemical...
- Patent number 11,004,677
- Issue date May 11, 2021
- Samsung Display Co., Ltd.
- Dong Kyun Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential type sensing circuit with differential input and outpu...
- Patent number 10,930,746
- Issue date Feb 23, 2021
- Ememory Technology Inc.
- Chen-Hao Po
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER
- Publication number 20240395564
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR APPARATUS, SEMICONDUCTOR APPARATUS MANUFACTURING METH...
- Publication number 20240355668
- Publication date Oct 24, 2024
- Canon Medical Systems Corporation
- Tatsuya SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240282843
- Publication date Aug 22, 2024
- UNITED MICROELECTRONICS CORP.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240266163
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20240014034
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Chang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABR...
- Publication number 20230360932
- Publication date Nov 9, 2023
- Samsung Electronics Co., Ltd.
- Dohyung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH TREATED INTERFACIAL LAYER ON SILICON GERM...
- Publication number 20230282753
- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...
- Publication number 20230274938
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao-Ming TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20230207668
- Publication date Jun 29, 2023
- UNITED MICROELECTRONICS CORP.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20230207669
- Publication date Jun 29, 2023
- UNITED MICROELECTRONICS CORP.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING STANDARD-GATE TRANSISTORS AND EXTENDED-GATE TRANSISTORS...
- Publication number 20230133296
- Publication date May 4, 2023
- International Business Machines Corporation
- RUQIANG BAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURE FOR SINGLE CRYSTAL CAPACITOR DIELECTRIC FOR A...
- Publication number 20230023845
- Publication date Jan 26, 2023
- Akoustis, Inc.
- Jeffrey B. SHEALY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME
- Publication number 20230019366
- Publication date Jan 19, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Haibo CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20220328308
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20220262629
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR INTEGRATING GATE DIELECTRIC LAYERS OF DIFF...
- Publication number 20220139711
- Publication date May 5, 2022
- Shanghai Huali Integrated Circuit Corporation
- Lian LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE
- Publication number 20220127725
- Publication date Apr 28, 2022
- WONIK IPS CO., LTD.
- Dae Seong LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE LAYER, SEMICONDUCTOR STRUCTURE, AND MANUFACTURING METHODS THE...
- Publication number 20220037479
- Publication date Feb 3, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Li Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME
- Publication number 20210351280
- Publication date Nov 11, 2021
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Li Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR RELIABLY FORMING MICROELECTRONIC DEVICES WITH CONDUCTIV...
- Publication number 20210296167
- Publication date Sep 23, 2021
- Micron Technology, Inc.
- Kenichi Kusumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH TREATED INTERFACIAL LAYER ON SILICON GERM...
- Publication number 20210296507
- Publication date Sep 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER
- Publication number 20210280432
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Cutting Metal Gates and Structures Formed Thereof
- Publication number 20210280473
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsu-Hsiu Perng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatments To Improve Device Performance
- Publication number 20210193468
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Cutting Metal Gates and Structures Formed Thereof
- Publication number 20210118748
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsu-Hsiu Perng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20210111020
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND PRESSURE TR...
- Publication number 20200303505
- Publication date Sep 24, 2020
- Hitachi, Ltd
- Masahiro MASUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR DEPOSITION OF TITANIUM OXYNITRIDE FOR USE IN INTEGRATED...
- Publication number 20200251330
- Publication date Aug 6, 2020
- ASM IP HOLDING B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20200235227
- Publication date Jul 23, 2020
- UNITED MICROELECTRONICS CORP.
- Chung-Fu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER AND METHOD FOR MANUFACTURING SEMICONDUCTOR WAFE...
- Publication number 20200219715
- Publication date Jul 9, 2020
- Xiamen Changelight Co. Ltd.
- Kaixuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS

in a nitrogen-containing ambient

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device with treated interfacial layer on silicon germ...

Method of processing substrate

Semiconductor device and method for fabricating the same

Manufacturing method for integrating gate dielectric layers of diff...

Treatments to enhance material structures

Treatments to enhance material structures

Method of manufacturing semiconductor device

Methods of cutting metal gates and structures formed thereof

Semiconductor device with treated interfacial layer on silicon germ...

Method of forming memory device

Semiconductor device and method for fabricating the same

Semiconductor device

Methods of cutting metal gates and structures formed thereof

Method of manufacture for single crystal capacitor dielectric for a...

Treatments to enhance material structures

Semiconductor device, manufacturing method thereof, and pressure tr...

Semiconductor film forming method using hydrazine-based compound gas

Semiconductor wafer and method for manufacturing semiconductor wafe...

Conformal oxidation processes for 3D NAND

Electronic mixer

Semiconductor device having high-κ dielectric layer and method for...

Process for deposition of titanium oxynitride for use in integrated...

VFET devices with ILD protection

Methods of cutting metal gates and structures formed thereof

Microelectronic devices with conductive contacts to silicide region...

Method of manufacturing a semiconductor device

Semiconductor device with treated interfacial layer on silicon germ...

Method for forming semiconductor device structure having oxide layer

Method for forming metal oxide layer, and plasma-enhanced chemical...

Differential type sensing circuit with differential input and outpu...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER

SEMICONDUCTOR APPARATUS, SEMICONDUCTOR APPARATUS MANUFACTURING METH...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME

METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABR...

SEMICONDUCTOR DEVICE WITH TREATED INTERFACIAL LAYER ON SILICON GERM...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

INTEGRATING STANDARD-GATE TRANSISTORS AND EXTENDED-GATE TRANSISTORS...

METHOD OF MANUFACTURE FOR SINGLE CRYSTAL CAPACITOR DIELECTRIC FOR A...

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

MANUFACTURING METHOD FOR INTEGRATING GATE DIELECTRIC LAYERS OF DIFF...

METHOD OF PROCESSING SUBSTRATE

OXIDE LAYER, SEMICONDUCTOR STRUCTURE, AND MANUFACTURING METHODS THE...

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME

METHODS FOR RELIABLY FORMING MICROELECTRONIC DEVICES WITH CONDUCTIV...

SEMICONDUCTOR DEVICE WITH TREATED INTERFACIAL LAYER ON SILICON GERM...

SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER

Methods of Cutting Metal Gates and Structures Formed Thereof

Treatments To Improve Device Performance

Methods of Cutting Metal Gates and Structures Formed Thereof

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND PRESSURE TR...

PROCESS FOR DEPOSITION OF TITANIUM OXYNITRIDE FOR USE IN INTEGRATED...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR WAFER AND METHOD FOR MANUFACTURING SEMICONDUCTOR WAFE...