in projection exposure systems

Industry

CPC
G02B27/0043

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G02Optics G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS G02B27/00Other optical systems Other optical apparatus

Current Industry

G02B27/0043in projection exposure systems

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Imaging optical system, exposure apparatus, and article manufacturi...
- Patent number 11,966,043
- Issue date Apr 23, 2024
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring device with measurement beam homogenization
- Patent number 11,703,591
- Issue date Jul 18, 2023
- Leica Geosystems AG
- Reto Stutz
- G01 - MEASURING TESTING
Information Patent Grant
Folded projection system
- Patent number 11,480,808
- Issue date Oct 25, 2022
- Apple Inc.
- Refael Della Pergola
- G02 - OPTICS
Information Patent Grant
Method for correcting an image, storage medium and projection device
- Patent number 11,287,646
- Issue date Mar 29, 2022
- XI'AN ZHONGXING NEW SOFTWARE CO., LTD.
- Yonghui Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical device, projection optical system, exposure apparatus using...
- Patent number 10,884,236
- Issue date Jan 5, 2021
- Canon Kabushiki Kaisha
- Choshoku Sai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Folded projection system
- Patent number 10,802,291
- Issue date Oct 13, 2020
- Apple Inc.
- Refael Della Pergola
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical system for field mapping and/or pupil mapping
- Patent number 10,656,411
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Holger Muenz
- G02 - OPTICS
Information Patent Grant
Image display device and light guiding device with diffraction elem...
- Patent number 10,566,021
- Issue date Feb 18, 2020
- Seiko Epson Corporation
- Toshiyuki Noguchi
- G02 - OPTICS
Information Patent Grant
Lithography apparatus, a method of manufacturing a device and a con...
- Patent number 10,534,270
- Issue date Jan 14, 2020
- ASML Netherlands B.V.
- Norbertus Josephus Martinus Van Den Nieuwelaar
- G02 - OPTICS
Information Patent Grant
Structured-light projector
- Patent number 10,386,706
- Issue date Aug 20, 2019
- Himax Technologies Limited
- Ming-Shu Hsiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system, projection method, and projection program
- Patent number 10,345,687
- Issue date Jul 9, 2019
- Optim Corporation
- Shunji Sugaya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography apparatus and method of manufacturing a device
- Patent number 10,261,422
- Issue date Apr 16, 2019
- ASML Netherlands B.V.
- Norbertus Josephus Martinus Van Den Nieuwelaar
- G02 - OPTICS
Information Patent Grant
Methods and devices for driving micromirrors
- Patent number 10,061,202
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Jan Horn
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System correction from long timescales
- Patent number 9,829,800
- Issue date Nov 28, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for compensating at least one defect of an opt...
- Patent number 9,798,249
- Issue date Oct 24, 2017
- Carl Zeiss SMT GmbH
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system for EUV microlithography
- Patent number 9,304,400
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Optical writing head and image forming apparatus
- Patent number 8,994,769
- Issue date Mar 31, 2015
- Canon Kabushiki Kaisha
- Kazuya Nobayashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
8928718
- Patent number 8,928,718
- Issue date Jan 6, 2015
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Magnification control for lithographic imaging system
- Patent number 8,922,750
- Issue date Dec 30, 2014
- Corning Incorporated
- Robert D. Grejda
- G02 - OPTICS
Information Patent Grant
Illumination system for a microlithgraphic exposure apparatus
- Patent number 8,873,151
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Alexander Sohmer
- G02 - OPTICS
Information Patent Grant
Projection objective with diaphragms
- Patent number 8,488,104
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Methods and devices for driving micromirrors
- Patent number 8,345,224
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Jan Horn
- G02 - OPTICS
Information Patent Grant
Telecentricity corrector for microlithographic projection system
- Patent number 8,314,922
- Issue date Nov 20, 2012
- Corning Incorporated
- Jim D Cornell
- G02 - OPTICS
Information Patent Grant
Pattern generator
- Patent number 7,957,055
- Issue date Jun 7, 2011
- Micronic Mydata AB
- Torbjorn Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic projection apparatus, reflector assembly for use there...
- Patent number 7,852,460
- Issue date Dec 14, 2010
- ASML Netherlands B.V.
- Levinus Pieter Bakker
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Eye Glow Suppression in Waveguide Based Displays
- Publication number 20230213767
- Publication date Jul 6, 2023
- DIGILENS INC.
- Alastair John Grant
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20220011571
- Publication date Jan 13, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, ARTICLE MANUFACTURING METHOD,...
- Publication number 20210088781
- Publication date Mar 25, 2021
- Canon Kabushiki Kaisha
- Tetsuya YAMAMOTO
- G02 - OPTICS
Information Patent Application
Folded Projection System
- Publication number 20210026153
- Publication date Jan 28, 2021
- Apple Inc.
- Refael Della Pergola
- G02 - OPTICS
Information Patent Application
METHOD FOR CORRECTING AN IMAGE, STORAGE MEDIUM AND PROJECTION DEVICE
- Publication number 20190384056
- Publication date Dec 19, 2019
- ZTE Corporation
- Yonghui WU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY APPARATUS, A METHOD OF MANUFACTURING A DEVICE AND A CON...
- Publication number 20190187568
- Publication date Jun 20, 2019
- ASML NETHERLANDS B.V.
- Norbertus Josephus Martinus VAN DEN NIEUWELAAR
- G02 - OPTICS
Information Patent Application
PROJECTION SYSTEM, PROJECTION METHOD, AND PROJECTION PROGRAM
- Publication number 20190137854
- Publication date May 9, 2019
- OPTIM CORPORATION
- Shunji SUGAYA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STRUCTURED-LIGHT PROJECTOR
- Publication number 20190086776
- Publication date Mar 21, 2019
- HIMAX TECHNOLOGIES LIMITED
- Ming-Shu Hsiao
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS USING...
- Publication number 20190041631
- Publication date Feb 7, 2019
- Canon Kabushiki Kaisha
- Choshoku SAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM FOR FIELD MAPPING AND/OR PUPIL MAPPING
- Publication number 20180210192
- Publication date Jul 26, 2018
- Carl Zeiss SMT GMBH
- Holger Muenz
- G02 - OPTICS
Information Patent Application
IMAGE DISPLAY DEVICE AND LIGHT GUIDING DEVICE
- Publication number 20180151194
- Publication date May 31, 2018
- SEIKO EPSON CORPORATION
- Toshiyuki NOGUCHI
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING A DEVICE
- Publication number 20170219933
- Publication date Aug 3, 2017
- ASML NETHERLANDS B.V.
- Norbertus Josephus Martinus VAN DEN NIEUWELAAR
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPT...
- Publication number 20140347646
- Publication date Nov 27, 2014
- Vladimir Dmitriev
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND DEVICES FOR DRIVING MICROMIRRORS
- Publication number 20130088698
- Publication date Apr 11, 2013
- Carl Zeiss SMT GMBH
- Jan Horn
- G02 - OPTICS
Information Patent Application
OPTICAL WRITING HEAD AND IMAGE FORMING APPARATUS
- Publication number 20120182371
- Publication date Jul 19, 2012
- Canon Kabushiki Kaisha
- Kazuya Nobayashi
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE WITH DIAPHRAGMS
- Publication number 20110285979
- Publication date Nov 24, 2011
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
METHODS AND DEVICES FOR DRIVING MICROMIRRORS
- Publication number 20110188017
- Publication date Aug 4, 2011
- Carl Zeiss SMT GMBH
- Jan Horn
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY
- Publication number 20110177463
- Publication date Jul 21, 2011
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
MAGNIFICATION CONTROL FOR LITHOGRAPHIC IMAGING SYSTEM
- Publication number 20110122383
- Publication date May 26, 2011
- Robert D. Grejda
- G02 - OPTICS
Information Patent Application
Pattern generator
- Publication number 20100208327
- Publication date Aug 19, 2010
- Torbjorn Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
TELECENTRICITY CORRECTOR FOR MICROLITHOGRAPHIC PROJECTION SYSTEM
- Publication number 20090323040
- Publication date Dec 31, 2009
- Jim D. Cornell
- G02 - OPTICS
Information Patent Application
Pattern generator
- Publication number 20090191489
- Publication date Jul 30, 2009
- Torbjorn Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Pattern generator
- Publication number 20090147345
- Publication date Jun 11, 2009
- Torbjorn Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...
- Publication number 20090141356
- Publication date Jun 4, 2009
- Fumitaro Masaki
- G02 - OPTICS
Information Patent Application
Efficient EUV collector designs
- Publication number 20080266650
- Publication date Oct 30, 2008
- Jose Sasian
- G02 - OPTICS
Information Patent Application
Mask Structure for Manufacturing an Integrated Circuit by Photolith...
- Publication number 20080204686
- Publication date Aug 28, 2008
- Wolfgang Henke
- G02 - OPTICS

in projection exposure systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Imaging optical system, exposure apparatus, and article manufacturi...

Measuring device with measurement beam homogenization

Folded projection system

Method for correcting an image, storage medium and projection device

Optical device, projection optical system, exposure apparatus using...

Folded projection system

EUV exposure apparatus with reflective elements having reduced infl...

Optical system for field mapping and/or pupil mapping

Image display device and light guiding device with diffraction elem...

Lithography apparatus, a method of manufacturing a device and a con...

Structured-light projector

Projection system, projection method, and projection program

EUV exposure apparatus with reflective elements having reduced infl...

Lithography apparatus and method of manufacturing a device

Methods and devices for driving micromirrors

EUV exposure apparatus with reflective elements having reduced infl...

System correction from long timescales

Method and apparatus for compensating at least one defect of an opt...

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Illumination system for EUV microlithography

Optical writing head and image forming apparatus

8928718

Magnification control for lithographic imaging system

Illumination system for a microlithgraphic exposure apparatus

Projection objective with diaphragms

Methods and devices for driving micromirrors

Telecentricity corrector for microlithographic projection system

Pattern generator

Lithographic projection apparatus, reflector assembly for use there...

Patents Applicationslast 30 patents

Eye Glow Suppression in Waveguide Based Displays

IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...

EXPOSURE METHOD, EXPOSURE APPARATUS, ARTICLE MANUFACTURING METHOD,...

Folded Projection System

METHOD FOR CORRECTING AN IMAGE, STORAGE MEDIUM AND PROJECTION DEVICE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LITHOGRAPHY APPARATUS, A METHOD OF MANUFACTURING A DEVICE AND A CON...

PROJECTION SYSTEM, PROJECTION METHOD, AND PROJECTION PROGRAM

STRUCTURED-LIGHT PROJECTOR

OPTICAL DEVICE, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS USING...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL SYSTEM FOR FIELD MAPPING AND/OR PUPIL MAPPING

IMAGE DISPLAY DEVICE AND LIGHT GUIDING DEVICE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING A DEVICE

METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPT...

EUV Exposure Apparatus

METHODS AND DEVICES FOR DRIVING MICROMIRRORS

OPTICAL WRITING HEAD AND IMAGE FORMING APPARATUS

PROJECTION OBJECTIVE WITH DIAPHRAGMS

METHODS AND DEVICES FOR DRIVING MICROMIRRORS

ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY

MAGNIFICATION CONTROL FOR LITHOGRAPHIC IMAGING SYSTEM

Pattern generator

TELECENTRICITY CORRECTOR FOR MICROLITHOGRAPHIC PROJECTION SYSTEM

Pattern generator

Pattern generator

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...

Efficient EUV collector designs

Mask Structure for Manufacturing an Integrated Circuit by Photolith...