In situ cleaning of vessels and/or internal parts

Industry

CPC
H01J37/32862

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32862In situ cleaning of vessels and/or internal parts

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
- Patent number 12,170,192
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Colin John Dickinson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intersecting module
- Patent number 12,152,303
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Syuan Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress treatments for cover wafers
- Patent number 12,142,468
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- B24 - GRINDING POLISHING
Information Patent Grant
Cleaning method and plasma treatment device
- Patent number 12,129,544
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yoshiyuki Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Operating method of etching device
- Patent number 12,131,892
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Feng-Ju Tsai
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for toroidal plasma generation
- Patent number 12,125,689
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning stage in plasma processing apparatus, and the pl...
- Patent number 12,090,529
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Takamitsu Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 12,094,696
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Valve module and substrate processing device comprising the same
- Patent number 12,092,235
- Issue date Sep 17, 2024
- PRESYS. CO., LTD.
- Sang Min Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chambers and coatings for reducing backside damage
- Patent number 12,094,716
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Leonard M. Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for cleaning a showerhead
- Patent number 12,080,528
- Issue date Sep 3, 2024
- Lam Research Corporation
- Eric Bramwell Britcher
- B08 - CLEANING
Information Patent Grant
Chamber cleaning device and chamber cleaning method
- Patent number 12,065,734
- Issue date Aug 20, 2024
- Jusung Engineering Co., Ltd.
- Dong Hwan Lee
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning plasma chambers
- Patent number 12,057,300
- Issue date Aug 6, 2024
- Lam Research Corporation
- Adrien Lavoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus and method for cleaning off d...
- Patent number 12,051,572
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wulin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 12,051,589
- Issue date Jul 30, 2024
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and related device for removing by-product on semiconductor...
- Patent number 12,027,350
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing-Cheng Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning of SIN with CCP plasma or RPS clean
- Patent number 12,027,354
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flim forming method of carbon-containing film by microwave plasma
- Patent number 12,018,375
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and cleaning processing method
- Patent number 12,017,261
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Tomoya Hasegawa
- B08 - CLEANING
Information Patent Grant
Remote-plasma clean (RPC) directional-flow device
- Patent number 12,013,682
- Issue date Jun 18, 2024
- Lam Research Corporation
- Michael John Janicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of cleaning process chamber components
- Patent number 12,014,902
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Jong Yun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for controlling cleaning and plasma processing apparatus
- Patent number 12,009,189
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Takashi Tsuto
- B08 - CLEANING
Information Patent Grant
Thin film, in-situ measurement through transparent crystal and tran...
- Patent number 12,009,191
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Rotatable faraday cleaning apparatus and plasma processing system
- Patent number 12,009,188
- Issue date Jun 11, 2024
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang Liu
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240412958
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE
- Publication number 20240404835
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Leonard M. TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MITIGATION OF FIRST WAFER EFFECT
- Publication number 20240379343
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Yongqian Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR WASHING SUBSTRATE TREATMENT APPARATUS
- Publication number 20240371614
- Publication date Nov 7, 2024
- Jusung Engineering Co., Ltd.
- Jeong HEO
- B08 - CLEANING
Information Patent Application
METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES
- Publication number 20240363317
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240347325
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Yuki ONODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...
- Publication number 20240331988
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing-Cheng Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRUCTURE AND METHOD FOR SOLVING PARASITIC PLASMA IN PLASMA PROCESS...
- Publication number 20240321554
- Publication date Sep 26, 2024
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- Dengzhi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240321555
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Jongyun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...
- Publication number 20240304424
- Publication date Sep 12, 2024
- Helion Energy, Inc.
- Brian Campbell
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES
- Publication number 20240304428
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...
- Publication number 20240290592
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Application
CHAMBER CLEAN FOR DRY DEVELOP OF METAL ORGANIC PHOTORESISTS
- Publication number 20240274414
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- NEELA AYALASOMAYAJULA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240274415
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Masahiro YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Semiconductor Process Chamber
- Publication number 20240266149
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Qi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD
- Publication number 20240249926
- Publication date Jul 25, 2024
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Dajian HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME
- Publication number 20240247371
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Nitin Pathak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213002
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Ikko TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240203709
- Publication date Jun 20, 2024
- Jusung Engineering Co., Ltd.
- Kyung Ran PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS
- Publication number 20240203708
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Kazuhiro UEDA
- B08 - CLEANING
Information Patent Application
COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS I...
- Publication number 20240203710
- Publication date Jun 20, 2024
- Samsung Electonics Co., LTD.
- Doyoung KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240194461
- Publication date Jun 13, 2024
- Hitachi High-Tech Corporation
- Kenta TAMARU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANC...
- Publication number 20240186126
- Publication date Jun 6, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20240177978
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL CLEANING
- Publication number 20240177977
- Publication date May 30, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Gregory McKee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240175125
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Sung Duk SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240170267
- Publication date May 23, 2024
- Tokyo Electron Limited
- Yoshiki NAKANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20240150894
- Publication date May 9, 2024
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

In situ cleaning of vessels and/or internal parts

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma abatement system utilizing water vapor and oxygen reagent

Ex situ coating of chamber components for semiconductor processing

Intersecting module

Multi-zone gas distribution systems and methods

Plasma uniformity control in pulsed DC plasma chamber

Stress treatments for cover wafers

Cleaning method and plasma treatment device

Operating method of etching device

Methods and apparatus for toroidal plasma generation

Method of using dual frequency RF power in a process chamber

Method of cleaning stage in plasma processing apparatus, and the pl...

Focus ring replacement method and plasma processing system

Valve module and substrate processing device comprising the same

Chambers and coatings for reducing backside damage

Method and system for cleaning a process chamber

Vacuum pump protection against deposition byproduct buildup

Systems and methods for cleaning a showerhead

Chamber cleaning device and chamber cleaning method

Apparatus for cleaning plasma chambers

Semiconductor manufacturing apparatus and method for cleaning off d...

Tin oxide thin film spacers in semiconductor device manufacturing

Process and related device for removing by-product on semiconductor...

Cleaning of SIN with CCP plasma or RPS clean

Flim forming method of carbon-containing film by microwave plasma

Processing apparatus and cleaning processing method

Remote-plasma clean (RPC) directional-flow device

System and method of cleaning process chamber components

Method for controlling cleaning and plasma processing apparatus

Thin film, in-situ measurement through transparent crystal and tran...

Rotatable faraday cleaning apparatus and plasma processing system

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE

APPARATUS FOR CLEANING PLASMA CHAMBERS

MITIGATION OF FIRST WAFER EFFECT

METHOD FOR WASHING SUBSTRATE TREATMENT APPARATUS

METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES

ION BEAM ETCH SYSTEM AND METHOD

PLASMA PROCESSING APPARATUS

PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...

STRUCTURE AND METHOD FOR SOLVING PARASITIC PLASMA IN PLASMA PROCESS...

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...

CHAMBER CLEAN FOR DRY DEVELOP OF METAL ORGANIC PHOTORESISTS

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

Methods for Semiconductor Process Chamber

PLASMA TREATMENT METHOD

SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS

COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS I...

PLASMA PROCESSING METHOD

MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANC...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD

SEMICONDUCTOR PROCESSING TOOL CLEANING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...