In situ cleaning of vessels and/or internal parts

Industry

CPC
H01J37/32862

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32862In situ cleaning of vessels and/or internal parts

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 12,368,023
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,354,857
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 12,352,932
- Issue date Jul 8, 2025
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 12,347,653
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shutter disk for physical vapor deposition (PVD) chamber
- Patent number 12,338,527
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate
- Patent number 12,308,214
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, purge gas control method, and vacuu...
- Patent number 12,285,786
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Norihiko Amikura
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and stage cleaning method
- Patent number 12,261,060
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Tsutomu Hiroki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 12,255,055
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,227,837
- Issue date Feb 18, 2025
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency source for inductively coupled and capacitively cou...
- Patent number 12,217,937
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for performing an in-situ etch of reaction ch...
- Patent number 12,203,166
- Issue date Jan 21, 2025
- ASM IP Holding B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 12,198,901
- Issue date Jan 14, 2025
- Jusung Engineering Co., Ltd.
- Yong Hyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 12,191,125
- Issue date Jan 7, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
- Patent number 12,170,192
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Colin John Dickinson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intersecting module
- Patent number 12,152,303
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Syuan Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING SYSTEM AND PROCESSING METHOD
- Publication number 20250232967
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD
- Publication number 20250218741
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jin Hyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20250207249
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250201539
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER
- Publication number 20250191896
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Ryo MIYAMA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250191889
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20250183016
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Yi Zhou
- B08 - CLEANING
Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20250179629
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...
- Publication number 20250183017
- Publication date Jun 5, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Xiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...
- Publication number 20250174430
- Publication date May 29, 2025
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT
- Publication number 20250140537
- Publication date May 1, 2025
- Applied Materials, Inc.
- Zaoyuan Ge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...
- Publication number 20250101581
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20250079142
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- B08 - CLEANING
Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM
- Publication number 20250046586
- Publication date Feb 6, 2025
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PORT CROSS FLOW SYSTEM
- Publication number 20250037980
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Rupankar Choudhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
- Publication number 20250022696
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES
- Publication number 20250006466
- Publication date Jan 2, 2025
- Advanced Energy Industries, Inc.
- Scott Polak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240412958
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE
- Publication number 20240404835
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Leonard M. TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MITIGATION OF FIRST WAFER EFFECT
- Publication number 20240379343
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Yongqian Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR WASHING SUBSTRATE TREATMENT APPARATUS
- Publication number 20240371614
- Publication date Nov 7, 2024
- Jusung Engineering Co., Ltd.
- Jeong HEO
- B08 - CLEANING
Information Patent Application
METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES
- Publication number 20240363317
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

In situ cleaning of vessels and/or internal parts

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method

In-situ closed-loop management of radio frequency power generator

System and method for residual gas analysis

Optical image capturing system, image capturing device and electron...

Uniform in situ cleaning and deposition

Shutter disk for physical vapor deposition (PVD) chamber

Method of performing maintenance on substrate processing apparatus

Method of processing substrate

Stage, plasma processing apparatus, and cleaning method

Method and apparatus for low temperature selective epitaxy in a dee...

Throughput improvement with interval conditioning purging

Substrate processing apparatus, purge gas control method, and vacuu...

Plasma processing apparatus and cleaning method

Substrate processing apparatus and stage cleaning method

Integrated cleaning process for substrate etching

Plasma generating device and process executing apparatus including...

Ex situ coating of chamber components for semiconductor processing

Conditioning of a processing chamber

Sorption chamber walls for semiconductor equipment

Radio frequency source for inductively coupled and capacitively cou...

Apparatus and methods for performing an in-situ etch of reaction ch...

Method for cleaning chamber of substrate processing apparatus

Cleaning a structure surface in an EUV chamber

Removing metal contamination from surfaces of a processing chamber

Cleaning method and plasma processing apparatus

System and method for residual gas analysis

Plasma abatement system utilizing water vapor and oxygen reagent

Ex situ coating of chamber components for semiconductor processing

Intersecting module

Multi-zone gas distribution systems and methods

Patents Applicationslast 30 patents

PROCESSING SYSTEM AND PROCESSING METHOD

SUBSTRATE TREATING APPARATUS AND METHOD

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

CONDITIONING OF A PROCESSING CHAMBER

METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...

RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER

PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM

MULTI-PORT CROSS FLOW SYSTEM

APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...

GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE

APPARATUS FOR CLEANING PLASMA CHAMBERS

MITIGATION OF FIRST WAFER EFFECT

METHOD FOR WASHING SUBSTRATE TREATMENT APPARATUS

METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES