In-situ cleaning

Industry

CPC
H01L21/02661

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02661In-situ cleaning

Industries

Patents Grantslast 30 patents

Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Fully strained channel
- Patent number 12,080,761
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with conformal source/drain layer
- Patent number 12,057,495
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yao-Sheng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a source/drain
- Patent number 11,929,401
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor device including semiconductor liner and method for f...
- Patent number 11,929,279
- Issue date Mar 12, 2024
- SK Hynix Inc.
- Jin Woong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,901,442
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light emitting display device and manufacturing method thereof
- Patent number 11,871,617
- Issue date Jan 9, 2024
- Samsung Display Co., Ltd.
- Keun Woo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,742,248
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and forming method thereof
- Patent number 11,705,507
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yao-Sheng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,677,015
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 11,616,133
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing display apparatus
- Patent number 11,563,040
- Issue date Jan 24, 2023
- Samsung Display Co., Ltd.
- Jongoh Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial monocrystalline channel for storage transistors in 3-dime...
- Patent number 11,557,606
- Issue date Jan 17, 2023
- SUNRISE MEMORY CORPORATION
- Chenming Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective deposition utilizing n-type dopants and/or al...
- Patent number 11,557,474
- Issue date Jan 17, 2023
- ASM IP Holding B.V.
- John Tolle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Light emitting display device and manufacturing method thereof
- Patent number 11,552,149
- Issue date Jan 10, 2023
- Samsung Display Co., Ltd.
- Keun Woo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and methods of its production
- Patent number RE49285
- Issue date Nov 8, 2022
- SWEGAN AB
- Erik Janzén
Information Patent Grant
Epitaxial growth methods and structures thereof
- Patent number 11,456,360
- Issue date Sep 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-assisted atomic layer epitaxy of cubic and hexagonal InN fil...
- Patent number 11,443,942
- Issue date Sep 13, 2022
- The Government of the United States of America, as represented by the Secreta...
- Neeraj Nepal
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 11,367,620
- Issue date Jun 21, 2022
- Samsung Electronics Co., Ltd.
- Dong-Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor, display apparatus including the same, and man...
- Patent number 11,329,117
- Issue date May 10, 2022
- Samsung Display Co., Ltd.
- Dongsung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 11,316,030
- Issue date Apr 26, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully strained channel
- Patent number 11,233,123
- Issue date Jan 25, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a source/drain
- Patent number 11,217,672
- Issue date Jan 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 11,164,737
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method, control system and plant for processing a semiconductor waf...
- Patent number 11,158,549
- Issue date Oct 26, 2021
- Siltronic AG
- Stefan Welsch
- B24 - GRINDING POLISHING
Information Patent Grant
Array substrate and manufacturing method therefor, display panel an...
- Patent number 11,101,301
- Issue date Aug 24, 2021
- BOE Technology Group Co., Ltd.
- Xueyan Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for a hybrid design for efficient and economical plasma...
- Patent number 11,087,959
- Issue date Aug 10, 2021
- Nano-Master, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial monocrystalline channel for storage transistors in 3-dime...
- Patent number 11,049,873
- Issue date Jun 29, 2021
- SUNRISE MEMORY CORPORATION
- Chenming Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,024,723
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yao-Sheng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PVD buffer layers for LED fabrication
- Patent number 11,011,676
- Issue date May 18, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240371636
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Min Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FULLY STRAINED CHANNEL
- Publication number 20240371941
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A SEMICONDUCTOR STRUCTURE
- Publication number 20240321579
- Publication date Sep 26, 2024
- ASM IP HOLDING B.V.
- Devika Choudhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A CONFORMAL AND CONTINUOUS CRYSTALLINE SILICON NA...
- Publication number 20240222114
- Publication date Jul 4, 2024
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Claudia Fafard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming a Source/Drain
- Publication number 20240213330
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manfacturing Co., Ltd.
- Chien-Wei Lee
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240203709
- Publication date Jun 20, 2024
- Jusung Engineering Co., Ltd.
- Kyung Ran PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER FILM STRUCTURE AND METHOD FOR PRODUCING SAME
- Publication number 20240158954
- Publication date May 16, 2024
- TOSOH CORPORATION
- Yuya TSUCHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240145581
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...
- Publication number 20240105450
- Publication date Mar 28, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Yoganand Saripalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORM EPITAXIAL GROWTH OVER CRYSTALLINE TEMPLATE
- Publication number 20240088222
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Shawn THOMAS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING AN EPITAXIAL WAFER
- Publication number 20240063027
- Publication date Feb 22, 2024
- Shin-Etsu Handotai Co., Ltd.
- Katsuyoshi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH CONFORMAL SOURCE/DRAIN LAYER
- Publication number 20230327004
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yao-Sheng HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230295837
- Publication date Sep 21, 2023
- Kokusai Electric Corporation
- Kaichiro MINAMI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS OF FORMING SILICON GERMANIUM STRUCTURES
- Publication number 20230245888
- Publication date Aug 3, 2023
- ASM IP HOLDING, B.V.
- Wonjong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND WAFER PROCESSING FURNACE FOR FORMING AN EPITAXIAL STACK...
- Publication number 20230223258
- Publication date Jul 13, 2023
- ASM IP Holding B.V.
- Dieter Pierreux
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS FOR SELECTIVE DEPOSITION UTILIZING N-TYPE DOPANTS AND/OR AL...
- Publication number 20230145240
- Publication date May 11, 2023
- ASM IP HOLDING B.V.
- John Tolle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIFT PIN, WAFER PROCESSING APPARATUS COMPRISING SAME, AND METHOD FO...
- Publication number 20230039939
- Publication date Feb 9, 2023
- SK SILTRON CO., LTD.
- Mi Ri KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LOW TEMPERATURE SELECTIVE EPITAXY IN A DEE...
- Publication number 20230036426
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Temperature Plasma-Assisted Atomic Layer Epitaxy of Hexagonal I...
- Publication number 20220406591
- Publication date Dec 22, 2022
- The Government of the United States of America, as represented by the Secreta...
- Neeraj Nepal
- C30 - CRYSTAL GROWTH
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220375751
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Yi-Chiau HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20220376091
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF
- Publication number 20220367639
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tesuji UENO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20220344151
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Min Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Device and Method
- Publication number 20220262926
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZING GROWTH METHOD FOR IMPROVING QUALITY OF MOCVD EPITAXIAL T...
- Publication number 20220199395
- Publication date Jun 23, 2022
- Wenzhou University
- Rong Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Strained Channel
- Publication number 20220149157
- Publication date May 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GROWING A NON-POLAR A-PLANE GALLIUM NITRIDE USING ALUMIN...
- Publication number 20220122836
- Publication date Apr 21, 2022
- COLLABORATIVE RESEARCHIN ENGINEERING, SCIENCE AND TECHNOLOGY CENTER
- Anas BIN KAMARUNDZAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Source/Drain
- Publication number 20220123117
- Publication date Apr 21, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Wei Lee
- C30 - CRYSTAL GROWTH
Information Patent Application
Selective Deposition of Germanium
- Publication number 20220108888
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20220102193
- Publication date Mar 31, 2022
- SK HYNIX INC.
- Jin Woong KIM
- H01 - BASIC ELECTRIC ELEMENTS

In-situ cleaning

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Integrated epitaxy and preclean system

Fully strained channel

Semiconductor device with conformal source/drain layer

Method of forming a source/drain

Semiconductor device including semiconductor liner and method for f...

Method of manufacturing a semiconductor device and a semiconductor...

Light emitting display device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Semiconductor device and forming method thereof

Method of manufacturing a semiconductor device and a semiconductor...

Fin field-effect transistor device and method

Method for manufacturing display apparatus

Epitaxial monocrystalline channel for storage transistors in 3-dime...

Methods for selective deposition utilizing n-type dopants and/or al...

Light emitting display device and manufacturing method thereof

Semiconductor device structure and methods of its production

Epitaxial growth methods and structures thereof

Plasma-assisted atomic layer epitaxy of cubic and hexagonal InN fil...

Method of fabricating semiconductor device

Thin film transistor, display apparatus including the same, and man...

Fin field-effect transistor device and method

Fully strained channel

Method of forming a source/drain

Integrated epitaxy and preclean system

Method, control system and plant for processing a semiconductor waf...

Array substrate and manufacturing method therefor, display panel an...

Techniques for a hybrid design for efficient and economical plasma...

Epitaxial monocrystalline channel for storage transistors in 3-dime...

Semiconductor device

PVD buffer layers for LED fabrication

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

FULLY STRAINED CHANNEL

METHODS OF FORMING A SEMICONDUCTOR STRUCTURE

METHOD OF FORMING A CONFORMAL AND CONTINUOUS CRYSTALLINE SILICON NA...

Method of Forming a Source/Drain

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

MULTILAYER FILM STRUCTURE AND METHOD FOR PRODUCING SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...

UNIFORM EPITAXIAL GROWTH OVER CRYSTALLINE TEMPLATE

METHOD FOR PRODUCING AN EPITAXIAL WAFER

SEMICONDUCTOR DEVICE WITH CONFORMAL SOURCE/DRAIN LAYER

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHODS OF FORMING SILICON GERMANIUM STRUCTURES

METHOD AND WAFER PROCESSING FURNACE FOR FORMING AN EPITAXIAL STACK...

METHODS FOR SELECTIVE DEPOSITION UTILIZING N-TYPE DOPANTS AND/OR AL...

LIFT PIN, WAFER PROCESSING APPARATUS COMPRISING SAME, AND METHOD FO...

METHOD AND APPARATUS FOR LOW TEMPERATURE SELECTIVE EPITAXY IN A DEE...

Low Temperature Plasma-Assisted Atomic Layer Epitaxy of Hexagonal I...

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF

Semiconductor Device and Method of Manufacture

Fin Field-Effect Transistor Device and Method

OPTIMIZING GROWTH METHOD FOR IMPROVING QUALITY OF MOCVD EPITAXIAL T...

Fully Strained Channel

METHOD FOR GROWING A NON-POLAR A-PLANE GALLIUM NITRIDE USING ALUMIN...

Method of Forming a Source/Drain

Selective Deposition of Germanium

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME