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CPC
Y10S430/114

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/114Initiator containing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number RE46765
- Issue date Mar 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number RE46736
- Issue date Feb 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,798,235
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,703,196
- Issue date Jul 11, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,465,292
- Issue date Oct 11, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist overcoat compositions and methods of forming electronic...
- Patent number 9,458,348
- Issue date Oct 4, 2016
- Rohm and Haas Electronic Materials LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,335,630
- Issue date May 10, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,316,912
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,298,090
- Issue date Mar 29, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist overcoat compositions and methods of forming electronic...
- Patent number 9,212,293
- Issue date Dec 15, 2015
- Rohm and Haas Electronic Materials LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative-type photoresist composition for thick film and use thereof
- Patent number 9,170,491
- Issue date Oct 27, 2015
- Everlight Chemical Industrial Corporation
- Yi Jing Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming pattern, actinic-ray- or radiation-sensitive resi...
- Patent number 9,086,623
- Issue date Jul 21, 2015
- FUJIFILM Corporation
- Keita Kato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 9,046,772
- Issue date Jun 2, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,040,224
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, and compound
- Patent number 9,023,584
- Issue date May 5, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polymer, resist composition including the photosensi...
- Patent number 9,023,582
- Issue date May 5, 2015
- Samsung Display Co., Ltd.
- Sang-Jun Choi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and patterning process using same
- Patent number 9,023,586
- Issue date May 5, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Film, method for manufacturing the film and masking method using th...
- Patent number 9,017,920
- Issue date Apr 28, 2015
- Shenzhen Futaihong Precision Industry Co., Ltd.
- Quan Zhou
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,017,924
- Issue date Apr 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Liquid crystal display
- Patent number 9,011,987
- Issue date Apr 21, 2015
- Samsung Display Co., Ltd.
- Jun Hyup Lee
- G02 - OPTICS
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 8,999,624
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,986,918
- Issue date Mar 24, 2015
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition, polymer, and resist pattern-...
- Patent number 8,980,529
- Issue date Mar 17, 2015
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydrophilic photoacid generator and resist composition comprising same
- Patent number 8,980,526
- Issue date Mar 17, 2015
- Korea Kumho Petrochemical Co., Ltd.
- Dae Kyung Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,956,801
- Issue date Feb 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Kensuke Matsuzawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,956,802
- Issue date Feb 17, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 8,951,710
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,945,812
- Issue date Feb 3, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,932,796
- Issue date Jan 13, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20170255098
- Publication date Sep 7, 2017
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20140342274
- Publication date Nov 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20140255853
- Publication date Sep 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20140242519
- Publication date Aug 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20140178821
- Publication date Jun 26, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME
- Publication number 20140170563
- Publication date Jun 19, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...
- Publication number 20140141372
- Publication date May 22, 2014
- Sang-Jun Choi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20140072916
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polyol Photosensitizers, Carrier Gas UV Laser Ablation Sensitizers,...
- Publication number 20140061905
- Publication date Mar 6, 2014
- NDSU Research Foundation
- Dean C. Webster
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISI...
- Publication number 20130309607
- Publication date Nov 21, 2013
- DAI NIPPON PRINTING CO., LTD.
- Mami Katayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, AND COMPOUND
- Publication number 20130280658
- Publication date Oct 24, 2013
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130244176
- Publication date Sep 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC...
- Publication number 20130244180
- Publication date Sep 19, 2013
- Rohm and Haas Electronic Material LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20130230804
- Publication date Sep 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130224656
- Publication date Aug 29, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Kensuke Matsuzawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...
- Publication number 20130203000
- Publication date Aug 8, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130202999
- Publication date Aug 8, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LIQUID CRYSTAL DISPLAY
- Publication number 20130194525
- Publication date Aug 1, 2013
- SAMSUNG DISPLAY CO., LTD.
- Jun Hyup LEE
- G02 - OPTICS
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20130177850
- Publication date Jul 11, 2013
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME
- Publication number 20130177852
- Publication date Jul 11, 2013
- KOREA KUMHO PETROCHEMICAL CO., LTD.
- Dae Kyung YOON
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...
- Publication number 20130160939
- Publication date Jun 27, 2013
- FIH (HONG KONG) LIMITED
- QUAN ZHOU
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20130122421
- Publication date May 16, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESI...
- Publication number 20130049149
- Publication date Feb 28, 2013
- FUJIFILM CORPORATION
- Keita KATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20130004740
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...
- Publication number 20120288691
- Publication date Nov 15, 2012
- FUJIFILM CORPORATION
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE
- Publication number 20120264057
- Publication date Oct 18, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20120219887
- Publication date Aug 30, 2012
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYOL PHOTOSENSITIZERS, CARRIER GAS UV LASER ABLATION SENSITIZERS,...
- Publication number 20120196948
- Publication date Aug 2, 2012
- NDSU Research Foundation
- Dean C. Webster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120183892
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Initiator containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemically amplified negative resist composition and patterning pro...

Chemically amplified negative resist composition and patterning pro...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Photoresist overcoat compositions and methods of forming electronic...

Pattern-forming method, and radiation-sensitive composition

Positive type resist composition for use in liquid immersion exposu...

Pattern-forming method, and radiation-sensitive composition

Photoresist overcoat compositions and methods of forming electronic...

Negative-type photoresist composition for thick film and use thereof

Method of forming pattern, actinic-ray- or radiation-sensitive resi...

Monomer, polymer, resist composition, and patterning process

Resist composition, method of forming resist pattern and compound

Pattern-forming method, and radiation-sensitive composition

Radiation-sensitive composition, and compound

Photosensitive polymer, resist composition including the photosensi...

Positive resist composition and patterning process using same

Film, method for manufacturing the film and masking method using th...

Resist composition, method of forming resist pattern, polymeric com...

Liquid crystal display

Developable bottom antireflective coating composition and pattern f...

Hybrid photoresist composition and pattern forming method using the...

Radiation-sensitive resin composition, polymer, and resist pattern-...

Hydrophilic photoacid generator and resist composition comprising same

Resist composition and method of forming resist pattern

Pattern forming method, chemical amplification resist composition a...

Chemically amplified negative resist composition and patterning pro...

Resist composition and method of forming resist pattern

Hybrid photoresist composition and pattern forming method using the...

Patents Applicationslast 30 patents

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME

PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

Polyol Photosensitizers, Carrier Gas UV Laser Ablation Sensitizers,...

PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISI...

RADIATION-SENSITIVE COMPOSITION, AND COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

LIQUID CRYSTAL DISPLAY

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME

FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESI...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...

PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

POLYOL PHOTOSENSITIZERS, CARRIER GAS UV LASER ABLATION SENSITIZERS,...

RESIST COMPOSITION AND PATTERNING PROCESS