Ion implantation

Industry

CPC
H01J2237/31701

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31701Ion implantation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Adjustable support for arc chamber of ion source
- Patent number 12,002,647
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear accelerator coil including multiple fluid channels
- Patent number 11,985,756
- Issue date May 14, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and systems useful for producing aluminum ions
- Patent number 11,881,376
- Issue date Jan 23, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching aluminum nitride or aluminum oxide to generate an aluminum...
- Patent number 11,699,563
- Issue date Jul 11, 2023
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer with modified surface and fabrication method th...
- Patent number 11,682,549
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yao-Wen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mixing upstream and downstream current measurements for i...
- Patent number 11,646,175
- Issue date May 9, 2023
- Axcelis Technologies, Inc.
- James DeLuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,631,567
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Load lock device having optical measuring device for acquiring dist...
- Patent number 11,521,883
- Issue date Dec 6, 2022
- NANYA TECHNOLOGY CORPORATION
- Chia-Fu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source repeller
- Patent number 11,521,821
- Issue date Dec 6, 2022
- Axcelis Technologies, Inc.
- Steven T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ionization vacuum measuring cell
- Patent number 11,164,731
- Issue date Nov 2, 2021
- INFICON AG
- Martin Wüest
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for exhaust cooling
- Patent number 11,114,285
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 11,114,277
- Issue date Sep 7, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scan and corrector magnet designs for high throughput scanned beam...
- Patent number 11,037,754
- Issue date Jun 15, 2021
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer with modified surface and fabrication method th...
- Patent number 10,916,416
- Issue date Feb 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yao-Wen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ wafer temperature measurement and control
- Patent number 10,903,097
- Issue date Jan 26, 2021
- Axcelis Technologies, Inc.
- John F. Baggett
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,861,669
- Issue date Dec 8, 2020
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for neutral beam processing based on gas cluster ion beam te...
- Patent number 10,825,685
- Issue date Nov 3, 2020
- Exogenesis Corporation
- Sean R. Kirkpatrick
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,825,654
- Issue date Nov 3, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical shaped arc chamber for indirectly heated cathode ion so...
- Patent number 10,818,469
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,790,117
- Issue date Sep 29, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact high energy ion implantation system
- Patent number 10,763,071
- Issue date Sep 1, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,741,361
- Issue date Aug 11, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation amount adjustment device and method, ion implantat...
- Patent number 10,734,189
- Issue date Aug 4, 2020
- Chengdu Boe Optoelectronics Technology Co., Ltd.
- Hao Jing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with tailored extraction shape
- Patent number 10,714,296
- Issue date Jul 14, 2020
- Axcelis Technologies, Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and assemblies using fluorine containing and inert gases fo...
- Patent number 10,622,192
- Issue date Apr 14, 2020
- Entegris, Inc.
- Sharad N. Yedave
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superjunction structure in a power semiconductor device
- Patent number 10,615,040
- Issue date Apr 7, 2020
- Infineon Technologies AG
- Roland Rupp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for modulating the intensity of a particle beam from a charg...
- Patent number 10,586,675
- Issue date Mar 10, 2020
- PANTECHNIK
- Pierre Salou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for in-situ beamline film stabilization or remova...
- Patent number 10,580,616
- Issue date Mar 3, 2020
- Axcelis Technologies, Inc.
- Teng-Chao David Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 10,573,490
- Issue date Feb 25, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
- Publication number 20240282543
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEMS USEFUL FOR PRODUCING ALUMINUM IONS
- Publication number 20240136145
- Publication date Apr 25, 2024
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HELICAL VOLTAGE STANDOFF
- Publication number 20240112883
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Diana C. Gronski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Active Cooling Of Quartz Enveloped Heaters In Vacuum
- Publication number 20230239970
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Dursun Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE FILTER MAGNET WITH VARIABLE ACHROMATICITY
- Publication number 20230139138
- Publication date May 4, 2023
- Axcelis Technologies, Inc.
- Wilhelm Platow
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LINEAR ACCELERATOR COIL INCLUDING MULTIPLE FLUID CHANNELS
- Publication number 20230119010
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
- Publication number 20220336181
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE REPELLER
- Publication number 20220319796
- Publication date Oct 6, 2022
- Axcelis Technologies, Inc.
- Steven T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Load Lock Device Having Optical Measuring Device for Acquiring Dist...
- Publication number 20220285195
- Publication date Sep 8, 2022
- NANYA TECHNOLOGY CORPORATION
- CHIA-FU CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FRACTIONING DEVICE
- Publication number 20220145447
- Publication date May 12, 2022
- AGC Glass Europe
- Philippe ROQUINY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING ALUMINUM NITRIDE OR ALUMINUM OXIDE TO GENERATE AN ALUMINUM...
- Publication number 20220139662
- Publication date May 5, 2022
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND SEMICONDUCTOR DEVICE MA...
- Publication number 20220130636
- Publication date Apr 28, 2022
- Sumitomo Heavy Industries, Ltd.
- Sayumi Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTANCE REDUCTION OF SUBSTRATE FOR TRANSMITTING INFRARED LIGHT
- Publication number 20210249223
- Publication date Aug 12, 2021
- AGC Glass Europe
- Benjamine NAVET
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Dual Cathode Ion Source
- Publication number 20200294765
- Publication date Sep 17, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MIXING UPSTREAM AND DOWNSTREAM CURRENT MEASUREMENTS FOR I...
- Publication number 20200266032
- Publication date Aug 20, 2020
- Axcelis Technologies, Inc.
- James DeLuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...
- Publication number 20200194220
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...
- Publication number 20200194221
- Publication date Jun 18, 2020
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIE STACK TEST ARCHITECTURE AND METHOD
- Publication number 20200116779
- Publication date Apr 16, 2020
- TEXAS INSTRUMENTS INCORPORATED
- Lee D. Whetsel
- G01 - MEASURING TESTING
Information Patent Application
CARBON MATERIALS FOR CARBON IMPLANTATION
- Publication number 20200051819
- Publication date Feb 13, 2020
- Entegris, Inc.
- Joseph D. SWEENEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR INCREASING BEAM CURRENT IN ION IMPLANTATION
- Publication number 20200013621
- Publication date Jan 9, 2020
- Aaron Reinicker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPACT HIGH ENERGY ION IMPLANTATION SYSTEM
- Publication number 20190371562
- Publication date Dec 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20190326089
- Publication date Oct 24, 2019
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU WAFER TEMPERATURE MEASUREMENT AND CONTROL
- Publication number 20190304820
- Publication date Oct 3, 2019
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE
- Publication number 20190295818
- Publication date Sep 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE
- Publication number 20190244785
- Publication date Aug 8, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER FOR PROCESSING A POWER SEMICONDUCTOR DEVICE
- Publication number 20190214219
- Publication date Jul 11, 2019
- INFINEON TECHNOLOGIES AG
- Roland Rupp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND ASSEMBLIES USING FLOURINE CONTAINING AND INERT GASSES F...
- Publication number 20190189402
- Publication date Jun 20, 2019
- Entegris, Inc.
- Sharad N. YEDAVE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR IN-SITU BEAMLINE FILM STABILIZATION OR REMOVA...
- Publication number 20190108972
- Publication date Apr 11, 2019
- Axcelis Technologies, Inc.
- Teng-Chao David Tao
- H01 - BASIC ELECTRIC ELEMENTS

Ion implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Adjustable support for arc chamber of ion source

Linear accelerator coil including multiple fluid channels

Method and systems useful for producing aluminum ions

Etching aluminum nitride or aluminum oxide to generate an aluminum...

Semiconductor wafer with modified surface and fabrication method th...

Method of mixing upstream and downstream current measurements for i...

Ion source with single-slot tubular cathode

Load lock device having optical measuring device for acquiring dist...

Ion source repeller

Ionization vacuum measuring cell

Apparatus for exhaust cooling

Dual cathode ion source

Method and device for implanting ions in wafers

Scan and corrector magnet designs for high throughput scanned beam...

Semiconductor wafer with modified surface and fabrication method th...

In-situ wafer temperature measurement and control

Methods and systems for plasma deposition and treatment

Method for neutral beam processing based on gas cluster ion beam te...

Ion implantation apparatus and measurement device

Cylindrical shaped arc chamber for indirectly heated cathode ion so...

Ion implantation apparatus and measurement device

Compact high energy ion implantation system

Dual cathode ion source

Ion implantation amount adjustment device and method, ion implantat...

Ion source with tailored extraction shape

Methods and assemblies using fluorine containing and inert gases fo...

Superjunction structure in a power semiconductor device

Device for modulating the intensity of a particle beam from a charg...

System and method for in-situ beamline film stabilization or remova...

Ion source and ion implantation apparatus

Patents Applicationslast 30 patents

ION IMPLANTER AND ION IMPLANTATION METHOD

Actively Cooled Gas Line For Ion Source

ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE

METHOD AND SYSTEMS USEFUL FOR PRODUCING ALUMINUM IONS

HELICAL VOLTAGE STANDOFF

Active Cooling Of Quartz Enveloped Heaters In Vacuum

CHARGE FILTER MAGNET WITH VARIABLE ACHROMATICITY

LINEAR ACCELERATOR COIL INCLUDING MULTIPLE FLUID CHANNELS

ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE

ION SOURCE REPELLER

Load Lock Device Having Optical Measuring Device for Acquiring Dist...

FRACTIONING DEVICE

ETCHING ALUMINUM NITRIDE OR ALUMINUM OXIDE TO GENERATE AN ALUMINUM...

ION IMPLANTER, ION IMPLANTATION METHOD, AND SEMICONDUCTOR DEVICE MA...

REFLECTANCE REDUCTION OF SUBSTRATE FOR TRANSMITTING INFRARED LIGHT

Dual Cathode Ion Source

METHOD OF MIXING UPSTREAM AND DOWNSTREAM CURRENT MEASUREMENTS FOR I...

Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...

SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...

DIE STACK TEST ARCHITECTURE AND METHOD

CARBON MATERIALS FOR CARBON IMPLANTATION

METHODS FOR INCREASING BEAM CURRENT IN ION IMPLANTATION

COMPACT HIGH ENERGY ION IMPLANTATION SYSTEM

ION SOURCE AND ION IMPLANTATION APPARATUS

IN-SITU WAFER TEMPERATURE MEASUREMENT AND CONTROL

ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE

ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE

ENERGY FILTER FOR PROCESSING A POWER SEMICONDUCTOR DEVICE

METHODS AND ASSEMBLIES USING FLOURINE CONTAINING AND INERT GASSES F...

SYSTEM AND METHOD FOR IN-SITU BEAMLINE FILM STABILIZATION OR REMOVA...